JPH03150238A - Water-repellent glass - Google Patents
Water-repellent glassInfo
- Publication number
- JPH03150238A JPH03150238A JP28819889A JP28819889A JPH03150238A JP H03150238 A JPH03150238 A JP H03150238A JP 28819889 A JP28819889 A JP 28819889A JP 28819889 A JP28819889 A JP 28819889A JP H03150238 A JPH03150238 A JP H03150238A
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass
- water
- repellent
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 51
- 239000005871 repellent Substances 0.000 title claims abstract description 33
- 239000005083 Zinc sulfide Substances 0.000 claims abstract description 21
- 229910052984 zinc sulfide Inorganic materials 0.000 claims abstract description 21
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 230000002940 repellent Effects 0.000 claims description 3
- 235000019353 potassium silicate Nutrition 0.000 claims 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 74
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 21
- 238000000034 method Methods 0.000 abstract description 17
- 239000010409 thin film Substances 0.000 abstract description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 15
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 abstract description 10
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 9
- 239000000377 silicon dioxide Substances 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- 238000010030 laminating Methods 0.000 abstract description 3
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 229920006268 silicone film Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- -1 dimethylsiloxane Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、ウィンドガラスなどの屋外で使用されるガラ
ス板の表面に撥水性を付与した積層多層膜をもつ撥水性
ガラスに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to water-repellent glass having a laminated multilayer film that imparts water repellency to the surface of a glass plate used outdoors such as a window glass.
［従来の技術］
従来、撥水性ガラスとしては、表面に撥水性を有する樹
脂などの皮膜を形成したものが知られている。しかしこ
れらの皮膜で撥水性を付与されたガラスは、屋外で太陽
光、雨風にざらされるため皮膜自身の耐候性（！ｌＩれ
ていることおよびガラスとの密着性を保持していること
が必要である。たとえば、表面にジメチルシロキサン、
メチルフェニルシロキサンなどのシリコーンを塗布し次
いで焼付けて撥水性皮膜を形成して撥水性ガラスとする
ことが知られている。しかし上記の有機の皮膜は塗布後
の焼付は処理時（、ガラスに含まれるアルカリ成分によ
る影響を受けて劣化したり接着性が低下するという問題
点を有する。[Prior Art] Conventionally, as water-repellent glass, there is known a glass whose surface is coated with a film of water-repellent resin or the like. However, glass that has been made water repellent with these films is exposed to sunlight, rain and wind outdoors, so the weather resistance of the film itself and its ability to maintain its adhesion to the glass are limited. For example, dimethylsiloxane on the surface,
It is known to apply silicone such as methylphenylsiloxane and then bake it to form a water-repellent film to obtain water-repellent glass. However, the above-mentioned organic film has the problem that the baking after coating is affected by the alkaline components contained in the glass during processing, resulting in deterioration and reduced adhesion.
、＾屈折率の薄膜と低屈折率の薄膜を交互に積層し光学
的干渉効果を有する積層多層膜を表面に形成したガラス
基板が知られている。この積層多層膜の成膜法の例とし
て、その膜の上面に形成する膜形成物質を１０重量％以
下の聞合有させて成膜すること（より界面での剥離が防
止できる方法がある（特開昭６４−３７５０４号公報）
。A glass substrate is known in which a multilayer film having an optical interference effect is formed on the surface by alternately laminating thin films with a refractive index and thin films with a low refractive index. An example of a method for forming this laminated multilayer film is to form a film with a content of 10% by weight or less of a film-forming substance on the upper surface of the film (there is a method that can further prevent peeling at the interface). (Japanese Patent Application Laid-Open No. 64-37504)
.
［発明が解決しようとする課題］
ところで光学特性をもつ積層多層膜を形成したガラスに
撥水性を付与するには、前記の問題点に加えて光学特性
をｈわないことが必要である。撥水性を有する有機のシ
リコーン系皮膜を積層多層膜の上面に形成するには、光
学特性を保持できる膜厚でかつ接着力を高めて形成する
ことが必要である。積層多層膜の形成工程は、通常真空
系で蒸着、スパッタリング、イオンプレーテングなどの
方法でおこなわれている。一方撥水性のシリコーン皮膜
の形成は、シリ］−ン溶液を塗布し焼付けるという工程
であり両者は全く別の工程となるため工数が増大する。[Problems to be Solved by the Invention] In order to impart water repellency to glass formed with a multilayer film having optical properties, it is necessary not to compromise the optical properties in addition to the above-mentioned problems. In order to form a water-repellent organic silicone film on the upper surface of a laminated multilayer film, it is necessary to form the film with a thickness that can maintain optical properties and with high adhesive strength. The process of forming a laminated multilayer film is usually performed in a vacuum system using methods such as vapor deposition, sputtering, and ion plating. On the other hand, the formation of a water-repellent silicone film is a process of applying a silicone solution and baking, which are completely different processes, which increases the number of steps.
またシリコーン系皮膜は上記のように劣化しやすいとい
う不具合がある。そこで本発明は、工程を短縮合理化す
るために積層多響膜の形成工程に連続して形成できると
ともに、皮膜の形成が可能で光線の選択透過や反射など
の光学特性を阻害しない物質について撥水性の検討をお
こなった結果得られたものである。Additionally, silicone-based films have the disadvantage of being susceptible to deterioration as described above. Therefore, in order to shorten and streamline the process, the present invention provides water repellent properties for substances that can be formed continuously with the process of forming a laminated polyphonic membrane, and that also allow the formation of a film that does not inhibit optical properties such as selective transmission and reflection of light rays. This was obtained as a result of the study.
本発明は、真空系で蒸着の可能な無機物で撥水性皮膜を
形成する物質を用いてガラス基板に耐久性の優れた撥水
性皮膜を形成して、積層多層膜の光学特性を阻害しない
撥水性ガラスとすることを目的とする。The present invention forms a highly durable water-repellent film on a glass substrate using an inorganic water-repellent film-forming substance that can be vapor-deposited in a vacuum system. Intended to be glass.
［課題を解決するための手段］
本発明の撥水性ガラスは、ガラス基板と、該ガラス基板
の表面に形成され光線を選択的に透過する積層多層膜と
、該積層多層膜の表面に形成された硫化亜鉛の皮膜とよ
りなることを特徴とする該積層多層膜とは高屈折率薄膜
と低屈折率薄膜とを交互に積層した光学的干渉膜である
。たとえば、赤外線を選択的に反射する多層膜として高
屈折率物質として酸化チタンを低屈折率物質として酸化
珪素を用いた多層膜がある。その他高屈折率物質として
酸化ジルコニウム、ＩＴＯ（インジウム−スズ一酸化物
）、低屈折率物質として酸化アルミニウム、弗化マグネ
シウム、弗化カリウムなどを組合せた多層膜が挙げられ
る。[Means for Solving the Problems] The water-repellent glass of the present invention comprises a glass substrate, a laminated multilayer film formed on the surface of the glass substrate and selectively transmitting light rays, and a laminated multilayer film formed on the surface of the laminated multilayer film. The laminated multilayer film is an optical interference film in which high refractive index thin films and low refractive index thin films are alternately laminated. For example, as a multilayer film that selectively reflects infrared rays, there is a multilayer film using titanium oxide as a high refractive index material and silicon oxide as a low refractive index material. Other high refractive index materials include zirconium oxide, ITO (indium-tin monoxide), and low refractive index materials include aluminum oxide, magnesium fluoride, potassium fluoride, and the like.
本発明の撥水性ガラスは、ガラス基板の最外表面に透明
で高屈折率をもちかつ撥水性を示す硫化亜鉛の皮膜が形
成されている。この硫化Ｍｍは無機化合物であり皮膜の
形成は、真空蒸着、イオンブレーティング、スパッタリ
ングなどのＰＶＤ法により容易く形成できる。したがっ
て、積層多層膜を形成する酸化チタン、アルミナ、二酸
化珪素などの成膜に続いて基板上に皮膜を形成すること
ができる。In the water-repellent glass of the present invention, a zinc sulfide film that is transparent, has a high refractive index, and exhibits water repellency is formed on the outermost surface of a glass substrate. This Mm sulfide is an inorganic compound, and a film can be easily formed by a PVD method such as vacuum evaporation, ion blasting, or sputtering. Therefore, a film can be formed on the substrate following the formation of a film of titanium oxide, alumina, silicon dioxide, etc. that forms a laminated multilayer film.
そのため硫化亜鉛の皮膜の成膜では、有機のシリ］−ン
皮膜の形成のように積層多層膜を形成した俊、別工程で
塗布して焼付けて強固に接着させる必要がないという利
点がある。Therefore, forming a zinc sulfide film has the advantage that unlike the formation of an organic silicone film, there is no need to apply and bake in a separate process to form a strong bond.
また硫化亜鉛皮膜は、高屈折率物質と低屈折率物質を交
互に積層した赤外線を選択的に反射する多層膜などの機
能を低下させることはない。すなわら、硫化亜鉛の皮膜
は、ｎ＝２−３０の高屈折率で酸化チタンのｎ＝２−５
０に近い屈折率値を示すためその代替品としても使用で
きる。Furthermore, the zinc sulfide film does not deteriorate the function of a multilayer film that selectively reflects infrared rays, which is made by alternately laminating high refractive index materials and low refractive index materials. In other words, the zinc sulfide film has a high refractive index of n=2-30, and the titanium oxide film has a high refractive index of n=2-5.
Since it exhibits a refractive index value close to 0, it can also be used as a substitute.
［作用］
この撥水性ガラスは、硫化亜鉛の皮膜が積層多層膜の上
面に形成されたことにより、積層多層膜の光学的特性を
阻害することなく撥水性を有することができる。また硫
化亜鉛の皮膜の形成は、ＰＶＤ法により形成できるので
、シリコーン皮膜のような別工程が不要となり工程の簡
略化ができる。[Function] This water-repellent glass can have water repellency without impairing the optical properties of the laminated multilayer film because the zinc sulfide film is formed on the upper surface of the laminated multilayer film. Further, since the zinc sulfide film can be formed by the PVD method, a separate process such as a silicone film is not required, and the process can be simplified.
［実施例］ 以下、実施例により具体的（説明する。[Example] Hereinafter, specific examples will be given.
この撥水性ガラスは、第１図に示すようにガラス基板１
と、ガラス基板１の表面に形成された酸化チタンの薄膜
層２と、薄膜層２の表面に形成された二酸化珪素の薄膜
層３とからなる積層多層膜と、その表面に形成された硫
化亜鉛の皮膜４とが積層されて構成されている。This water-repellent glass is made of a glass substrate 1 as shown in FIG.
, a laminated multilayer film consisting of a titanium oxide thin film layer 2 formed on the surface of a glass substrate 1, a silicon dioxide thin film layer 3 formed on the surface of the thin film layer 2, and a zinc sulfide film formed on the surface thereof. The film 4 is laminated.
（実施例１） 次にこの撥水性ガラスの製造方法（ついて説明する。(Example 1) Next, a method for manufacturing this water-repellent glass will be explained.
まず、自動車のドア用ガラスを洗浄したガラス基板１に
、その表面を電子ビーム蒸発法による真空蒸着装置を用
いて酸素雰囲気中で酸化チタンの薄膜層２を成膜した。First, a thin film layer 2 of titanium oxide was formed on the surface of a glass substrate 1 which had been cleaned from automobile door glass in an oxygen atmosphere using a vacuum evaporation apparatus using an electron beam evaporation method.
成膜条件は、蒸発源に酸化チタン（ＴｉＯ２）、酸素圧
１０−４〜１０−３丁ｏｒｒ、ｕ板加熱温度を２００〜
４００℃にして１０５ｎｍの膜厚の酸化チタン膜を形成
した。The film-forming conditions were: titanium oxide (TiO2) as the evaporation source, oxygen pressure of 10-4 to 10-3 orr, and U-plate heating temperature of 200 to 200℃.
A titanium oxide film with a thickness of 105 nm was formed at 400°C.
なお膜厚は、反射させる波長λ。＝１０５０ｎｍとし、
１／２．５０ｘ１０５０／４で粋出した。Note that the film thickness is the wavelength λ to be reflected. =1050nm,
It looked stylish with 1/2.50x1050/4.
この酸化チタンの薄膜層２の上面に、同じ条件で蒸発源
を二酸化珪素（ＳｉＯ２）とし、１８０ｎｍの膜厚の二
酸化珪素の薄膜を成膜した。なおこの膜厚は１／１．４
５Ｘ１０５０／４で粋出した。ざらにその上面に蒸発源
を硫化亜鉛（ＺｎＳ）とし硫化亜鉛の膜厚が１１４ｎｍ
（１／２．３０Ｘ１０５０／４で粋出）の皮膜を真空圧
を１０−２〜１０−１にして成膜して実施例１の撥水性
ガラスとした。On the upper surface of this titanium oxide thin film layer 2, a 180 nm thick silicon dioxide thin film was formed under the same conditions using silicon dioxide (SiO2) as the evaporation source. Note that this film thickness is 1/1.4
It looked stylish with 5X1050/4. Zinc sulfide (ZnS) is used as an evaporation source on the top surface of the rough surface, and the film thickness of zinc sulfide is 114 nm.
A film of 1/2.30×1050/4 was formed at a vacuum pressure of 10 −2 to 10 −1 to obtain the water-repellent glass of Example 1.
（実施例２）
実施例１において積層多層膜の構成を第２図に示ず４１
に代えＴｉ０２／Ｓｉ０２／ＴｉＯ２／Ｓｉ０２の順に
積層した以外は同様の条件で成膜した。ただし積層多層
膜の膜厚は酸化チタン１０５ｎｍ、二酸化珪素が１０８
ｎｍ、酸化チタン１０５ｎｍ、二酸化珪素１０８ｎｍで
ある。この積層多層膜の上に同様に硫化亜鉛の皮膜を実
施例１と同じ膜厚に形成して実施例２の撥水性ガラスと
した。(Example 2) In Example 1, the structure of the laminated multilayer film is not shown in FIG.
Films were formed under the same conditions except that Ti02/Si02/TiO2/Si02 were stacked in this order instead. However, the thickness of the laminated multilayer film is 105 nm for titanium oxide and 108 nm for silicon dioxide.
105 nm for titanium oxide, and 108 nm for silicon dioxide. A zinc sulfide film was similarly formed on this laminated multilayer film to the same thickness as in Example 1 to obtain water-repellent glass of Example 2.
（実施例３）
実施例１において、積層多層膜の第１層の酸化チタン膜
の薄膜層２の代りに硫化亜鉛で膜厚を１１４ｎｍに構成
した以外は同様にして実施例３の撥水性ガラスを作製し
た。(Example 3) The water-repellent glass of Example 3 was prepared in the same manner as in Example 1, except that the thin film layer 2 of the titanium oxide film, which is the first layer of the laminated multilayer film, was made of zinc sulfide with a film thickness of 114 nm. was created.
（評価）
上記で形成した薄膜をもつガラスの反射分光特性を日立
（株）製 Ｕ−３４００型 自記分光度計で調べた。結
果を第３〜６図に示す。実施例１〜３はいずれも赤外線
領域での反射が認められる。(Evaluation) The reflection spectral characteristics of the glass having the thin film formed above were examined using a self-recording spectrometer, model U-3400 manufactured by Hitachi, Ltd. The results are shown in Figures 3-6. In Examples 1 to 3, reflection in the infrared region is observed.
したがって撥水性皮膜は光学特性を阻害していないこと
を示している。しかし積層多層膜を形成していないガラ
ス基板の反射分光特性は第６図に示す様に全く赤外線の
反射を示さない。This indicates that the water-repellent film does not impede the optical properties. However, the reflection spectral characteristics of a glass substrate on which no laminated multilayer film is formed do not reflect any infrared rays, as shown in FIG.
また実施例１〜３で得た撥水性ガラスの接触角を協和科
学（株）製 ＣＡ−Ａ型 接触角計で測定すると、いず
れも９０°であった。一方撥水性皮膜を形成していない
通常のガラスは、接触角が２０〜４０°であり本実施例
の撥水性ガラスは充分な撥水性を有している。Furthermore, when the contact angles of the water-repellent glasses obtained in Examples 1 to 3 were measured using a contact angle meter, model CA-A, manufactured by Kyowa Kagaku Co., Ltd., they were all 90°. On the other hand, ordinary glass without a water-repellent film has a contact angle of 20 to 40 degrees, and the water-repellent glass of this example has sufficient water repellency.
［効果］
この撥水性ガラスは、ガラス基板と積層多層膜と硫化亜
鉛の皮膜とから構成が形成されている。[Effect] This water-repellent glass is composed of a glass substrate, a laminated multilayer film, and a zinc sulfide film.
この硫化亜鉛の皮膜が撥水性を示し、かつ高屈折率をも
つので光学特性を維持した撥水性ガラスとなる。This zinc sulfide film exhibits water repellency and has a high refractive index, resulting in water-repellent glass that maintains optical properties.
またこの硫化亜鉛の皮膜はその高屈折率を利用して積層
多層膜の−成分とすることもできる。ざらにこの積層多
層膜および硫化亜鉛皮膜は真空系で蒸発源を変えるだけ
で成膜できるので、従来のシリコン皮膜の様に塗布、焼
付は工程を必要とせず、生産性を向上させることができ
るとともに接ｎ性を向上できる。Further, this zinc sulfide film can also be used as a component of a laminated multilayer film by utilizing its high refractive index. Rarani's laminated multilayer film and zinc sulfide film can be formed in a vacuum system by simply changing the evaporation source, so unlike conventional silicon films, coating and baking processes are not required, improving productivity. At the same time, the contact properties can be improved.
第１図は本実施例１に係かる撥水性ガラスの構成断面図
であり、第２図は実施例２にかかる撥水性ガラスの構成
断面図であり、第３図〜第６図は撥水性ガラスの反射分
光特性を示す波長と反射率との関係を示すグラフであり
、第３図は実施例１の撥水性ガラス、第４図は実施例２
の撥水性ガラス、第５図は実施例３の撥水性ガラス。第
６図は積層多層膜が形成されていないガラスである。
１・・・ガラス基板
２・・・酸化チタン薄膜
３・・・二酸化珪素薄膜
４・・・硫化亜鉛皮膜FIG. 1 is a cross-sectional view of the water-repellent glass according to Example 1, FIG. 2 is a cross-sectional view of the water-repellent glass according to Example 2, and FIGS. 3 to 6 are cross-sectional views of the water-repellent glass according to Example 2. 3 is a graph showing the relationship between wavelength and reflectance showing the reflection spectral characteristics of glass, FIG. 3 is the water-repellent glass of Example 1, and FIG. 4 is the graph of Example 2.
Figure 5 shows the water-repellent glass of Example 3. FIG. 6 shows glass on which no laminated multilayer film is formed. 1...Glass substrate 2...Titanium oxide thin film 3...Silicon dioxide thin film 4...Zinc sulfide film
Claims (1)
線を選択的に透過する積層多層膜と、該積層多層膜の表
面に形成された硫化亜鉛の皮膜とよりなることを特徴と
する撥水性ガラス。(1) A repellent comprising a glass substrate, a laminated multilayer film formed on the surface of the glass substrate that selectively transmits light rays, and a zinc sulfide film formed on the surface of the laminated multilayer film. water glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28819889A JPH03150238A (en) | 1989-11-06 | 1989-11-06 | Water-repellent glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28819889A JPH03150238A (en) | 1989-11-06 | 1989-11-06 | Water-repellent glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03150238A true JPH03150238A (en) | 1991-06-26 |
Family
ID=17727082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28819889A Pending JPH03150238A (en) | 1989-11-06 | 1989-11-06 | Water-repellent glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03150238A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080212042A1 (en) * | 2004-10-01 | 2008-09-04 | Shigeru Morimoto | Circuit Breaker Arrangement in an Indicating Arrangement in an Electrically Powered Stapler |
-
1989
- 1989-11-06 JP JP28819889A patent/JPH03150238A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080212042A1 (en) * | 2004-10-01 | 2008-09-04 | Shigeru Morimoto | Circuit Breaker Arrangement in an Indicating Arrangement in an Electrically Powered Stapler |
| US9804508B2 (en) * | 2004-10-01 | 2017-10-31 | Nikon Corporation | Linear motor, stage apparatus, and exposure apparatus |
| US10459350B2 (en) | 2004-10-01 | 2019-10-29 | Nikon Corporation | Linear motor, stage apparatus, and exposure apparatus |
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