JPH03147325A - Drying of precision cleaning - Google Patents

Drying of precision cleaning

Info

Publication number
JPH03147325A
JPH03147325A JP28310189A JP28310189A JPH03147325A JP H03147325 A JPH03147325 A JP H03147325A JP 28310189 A JP28310189 A JP 28310189A JP 28310189 A JP28310189 A JP 28310189A JP H03147325 A JPH03147325 A JP H03147325A
Authority
JP
Japan
Prior art keywords
cleaning
pure water
drying
cleaned
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28310189A
Other languages
Japanese (ja)
Inventor
Toru Usui
臼井 徹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SONITSUKU FUEROO KK
Original Assignee
SONITSUKU FUEROO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SONITSUKU FUEROO KK filed Critical SONITSUKU FUEROO KK
Priority to JP28310189A priority Critical patent/JPH03147325A/en
Publication of JPH03147325A publication Critical patent/JPH03147325A/en
Pending legal-status Critical Current

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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Drying Of Solid Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To execute a cleaning and drying operation of an extremely high cleaning degree over the whole surface of a cleaned face without causing a stain or the like by a method wherein, after a work has been immersed in pure water and its cleaning operation has been finished, a pulling-up speed of the work is set to an ultralow speed when the work is pulled up from the pure water and the work and a drying gas at its periphery are heated to increase their temperature by using heat rays such as infrared rays or the like. CONSTITUTION:A work 1, as an object to be cleaned, which has been handed over from a precision cleaning operation in a previous stage by using a holder 11 is immersed in pure water 2 inside a pure-water cleaning tank 4; the work 1 is pulled up into a drying gas 3 vertically from the surface of the pure water 2 at an ultralow speed as far as possible. In a pulling-up process, the drying gas 3 is heated to increase its temperature by using infrared rays as heat rays which are radiated from infrared lamps 16, 16; also the work 1 is heated to increase its temperature and its drying operation is promoted; an ultraprecise drying operation is executed without producing a stain or the like on a cleaned face and without causing a disturbance by a spraying operation of the drying gas 3.

Description

【発明の詳細な説明】 く産5!.1二−の利用分野〉 開示技術は電子機器のウェハ等の部品や、光学レンズや
ガラス簀の部品の超精密洗浄の技術分野に属する。
[Detailed description of the invention] Production 5! .. 12- Field of Application> The disclosed technology belongs to the technical field of ultra-precision cleaning of parts such as wafers of electronic devices, parts of optical lenses and glass cages.

〈要旨の概要〉 而して、この出願の発明は前工程の製造工程等から搬送
ざれて米る被洗浄物を所定段数の複数段の薬液や超音波
による精密洗浄後に純水洗浄槽の純水により仕上げ洗浄
を行って該純水洗浄槽の純水から上部の乾燥ガス中に被
洗浄物を引き上げてその洗浄面に付着している純水を除
去するようにした精密洗浄の乾燥方法に関する発明であ
り、特に、純水洗浄槽内の洗浄水の純水中にて什上げ洗
浄するべく浸漬した被洗浄物を該純水の水面から上部の
乾燥ガス中に垂直等で超低速で引き上げし、而して、乾
燥ガス中で赤外線ランプや近赤外線ランプ等により赤外
線等の熱線を被洗浄物に放射して当該引き上げプロセス
にて瞬間的に速やかに乾燥することが出来るようにした
精密洗浄の乾燥方法に係る発明である。
<Summary of the gist> The invention of this application is to clean the object to be cleaned, which has been transported from the previous manufacturing process, etc., in a predetermined number of stages using a chemical solution or ultrasonic waves, and then clean it in a pure water cleaning tank. Relating to a drying method for precision cleaning in which finishing cleaning is performed with water, and the object to be cleaned is lifted from the pure water of the pure water cleaning tank into the drying gas at the upper part to remove the pure water adhering to the cleaning surface. This invention is particularly a method for lifting an object to be cleaned, which has been immersed in pure water in a pure water cleaning tank for final cleaning, from the surface of the pure water into the dry gas above at an extremely low speed vertically or the like. Precision cleaning is performed by emitting heat rays such as infrared rays onto the object to be cleaned using an infrared lamp or near-infrared lamp in a drying gas so that it can be instantly and quickly dried in the lifting process. This invention relates to a drying method.

〈従来技術〉 周知の如く、近時の市民生活、産業社会は精密科学技術
に負うところが多く、特に、電子機器や電子制御による
機械装置や光学機器に負うところが大であり、そのため
、該種電子機器や光学機器の精密さはその程度が極めて
厳しく要求されるようになり、所謂IC部品や電子光学
部品はその精密精度の故に製品面に朋埃等の付着が訂さ
れず、ミクロン単位の精細度が求められ、したがって、
該種精密部品の製造工程の終段工程の洗浄工程ではミク
ロン単位の精密洗浄を越えてサブミクロン単位の超精密
洗浄が要求されるようになってきており、部品製造工程
においては前工程の製造工程によって製造されたワーク
の被洗浄物(以下ワークと略称)が終段の洗浄工程にお
いで薬液による洗浄や超音波による洗浄作用を受けて製
品化される工程が不可欠となってきている。
<Prior art> As is well known, modern civil life and industrial society owe much to precision science and technology, and in particular to electronic equipment, electronically controlled mechanical devices, and optical equipment. The precision of equipment and optical equipment has become extremely demanding, and because of their precision, so-called IC parts and electronic optical parts do not allow dust to adhere to the product surface, and can be manufactured with micron-level precision. degree is required, therefore,
In the cleaning process at the final stage of the manufacturing process for these types of precision parts, ultra-precision cleaning at the submicron level is now required, going beyond precision cleaning at the micron level. BACKGROUND ART It has become essential to have a process in which a workpiece to be cleaned (hereinafter referred to as a workpiece) manufactured in a process is subjected to cleaning with a chemical solution or ultrasonic waves in the final cleaning process, and then turned into a product.

く発明が解決しようとする課題〉 しかしながら、在米態様の洗浄工程にJ3いては相段の
精密洗浄工程後に純水洗浄惜内の純水中に被洗浄物庖浸
漬して、該純水による最終仕上げ洗浄を(1つで仕−ト
げ洗浄後に純水から被洗浄物を弓きトげして、ワークの
洗浄面に付着する純水を−F部の空気や了察ガス等の乾
燥ガスにより吹き付は乾燥している。
Problems to be Solved by the Invention> However, in the cleaning process in the United States, after the precision cleaning process, the object to be cleaned is immersed in pure water inside the pure water washing tank, and the cleaning process is carried out using the pure water. Final finishing cleaning (1 step - After cleaning, remove the object to be cleaned from the pure water, remove the pure water that adheres to the cleaning surface of the workpiece, and dry the air, cleaning gas, etc. in the F part. The spray is dry due to the gas.

しかしながら、理論的にも、又、実際にも該種純水洗浄
槽内に於ける純水や乾燥ガスもまた100%純粋でめる
ことは不可能に近く、極めて僅かながらサブミクロン単
位の邸埃や前工程での薬液洗浄等の残留薬液分が存在し
ており、したがって、仕上げ洗浄工程における純水中に
浸漬した被洗浄物を乾燥ガス中に引き七げて乾燥する工
程でその洗浄面に純水が付着1−ると、乾燥ガスの吹き
付けによる乾燥段階でワークの洗浄面に濃縮された純水
中の塵埃や薬液が所謂シミとなって残留し、サブミクロ
ン単位の超精密洗浄にかなうことが出来ないという難点
がおった。
However, both theoretically and practically, it is almost impossible to obtain 100% pure pure water and dry gas in the deionized water cleaning tank, and there is a very small amount of water in the submicron level. There are dust and residual chemical components from chemical cleaning in the previous process. Therefore, in the final cleaning process, the cleaning surface is If pure water adheres to the surface of the workpiece, the dust and chemical solution concentrated on the cleaning surface of the workpiece during the drying stage by blowing drying gas will remain as so-called stains, making it difficult to perform ultra-precision cleaning at submicron scale. The problem was that I couldn't make it come true.

〈発明の目的〉 この出願の発明の目的は上述従来技術に基づく電子機器
や光学製品の超精密部品の製造工程における最終洗浄工
程での超精密洗浄における課題を解決すべき技術的課題
とし、実験とテストの結果に対する理論的分析等により
純水洗浄槽の純水中に浸漬したワークの引き上げプロセ
スにおいて、その洗浄面にシミ等を生ずるような塵埃等
の付着を完全に近く防止することが出来るようにして超
精密部品製造産業における洗浄技術利用分野に益する優
れた精密洗浄の乾燥方法を提供せんとするものである。
<Object of the Invention> The object of the invention of this application is to solve the problem of ultra-precision cleaning in the final cleaning process in the manufacturing process of ultra-precision parts of electronic devices and optical products based on the above-mentioned conventional technology, and to conduct experiments. Through theoretical analysis of test results, etc., it is possible to almost completely prevent the adhesion of dust, etc. that would cause stains on the cleaning surface during the lifting process of a workpiece immersed in pure water in a pure water cleaning tank. In this way, it is an object of the present invention to provide an excellent precision cleaning drying method that is beneficial to the field of cleaning technology application in the ultra-precision parts manufacturing industry.

く問題点を解決するための手段・作用〉1一連日的に沿
い先述特許請求の範囲を要旨とするこの発明の構成は前
述課題を解決するために、電子閤器ヤ)光学製品等の超
精密部品等の製造工程に続く洗浄工程において、前段の
所定段数の複数段の精密洗浄終了後のワークを純水洗浄
槽に於いて純水により仕上げ洗浄を行うに際し、該純水
洗浄槽の純水に対し予め側方向きの層流を与えておき、
確実に純水内の塵疾ヤ前段からの薬液残留分等を捕捉濾
過して循環させるようにし、上部の乾燥ガスに於いても
所定の低速で側方向きや−[から下向きに循環させてJ
3き、フィルタ等によりサブミク[Jン甲位までの塵埃
等を濾過捕捉しておくと共に赤外線ランプ等を点灯し、
ワークの上昇部位に赤外線等の熱線を放射するようにし
、而して、そこにワークを漫潰し、浸漬後の該ワークを
純水洗浄(負の純水から上部の乾燥ガス中に引き上げす
るに際し、水面に対し直角状に可及的に超低速で引き上
げし、被洗浄物の洗浄面に純水の凝集ツノと表面張力に
よる高さ分だけ薄膜状に純水をイ」肴させ、そして、洗
浄面に付着した薄膜状の純水は当該所定高ざまで随伴し
て付着するが、その付着高さの上縁部分に於いては乾燥
ガスに直ちに接触するために、引き上げする超低速に比
し瞬間的に乾燥がなされ、更に、赤外線等の熱線により
加熱されて乾燥速度を可及的に早く1−るようにして洗
浄面には塵埃や前段の薬液による濃縮作用を介してのシ
ミ等が生ぜず、設計通りの超精密洗浄乾燥された洗浄面
を有する製品が1qられるようにした技術的手段を講じ
たものである。
Means and Actions for Solving the Problems〉1 In order to solve the problems mentioned above, the structure of the present invention, which is summarized in the above-mentioned claims, is intended to solve the problems mentioned above. In the cleaning process that follows the manufacturing process of precision parts, etc., when finishing cleaning the workpiece after completing the predetermined number of stages of precision cleaning in the deionized water cleaning tank with pure water, the pure water in the deionized water cleaning tank A lateral laminar flow is applied to the water in advance,
Make sure to capture and filter any residual chemical solution from the previous stage of the pure water, and circulate the dry gas in the upper part at a predetermined low speed in the lateral and downward directions. J
3. Filter and capture dust up to the submicron level using a filter, etc., and turn on an infrared lamp, etc.
Heat rays such as infrared rays are radiated to the rising part of the workpiece, the workpiece is crushed there, and the workpiece after immersion is washed with pure water (when it is lifted from the negative pure water into the dry gas at the top). , raise the water perpendicularly to the water surface at the lowest speed possible, and apply pure water to the surface of the object to be cleaned in a thin film by the height created by the agglomerated horns and surface tension of the purified water, and The thin film of pure water that adheres to the cleaning surface adheres to the specified height, but the upper edge of the adhesion height immediately comes into contact with the drying gas, so it is pulled up at a very low speed. It dries instantly, and is further heated by heat rays such as infrared rays to speed up the drying speed as much as possible, removing dust and stains from the concentration effect of the previous chemical on the cleaning surface. We have taken technical measures to ensure that 1q of products with a cleaning surface that has been ultra-precisely cleaned and dried as designed can be produced without causing any problems.

〈発明の背景〉 而して、当業者である出願人の文型なる実験やテストに
よれば、最終仕上げ洗浄における純水中に浸漬したワー
クの洗浄面に大小の差はあるものの、純水がスポットや
ブロック状的に、即ら、水滴状に付着している場合には
乾燥プロセスでの濃縮による塵埃や前段の薬液の付着が
生ずるが、洗浄血に付着する純水が広範囲の薄膜状の付
着状態でおる場合には、濃縮作用による乾燥ガスを介し
ての乾燥によってもそれほどa埃や薬液の付着が生じな
いことが判明した。
<Background of the Invention> According to the experiments and tests conducted by the applicant, who is a person skilled in the art, although there are differences in the size of the cleaning surface of a workpiece immersed in pure water during final finishing cleaning, pure water If the blood adheres in the form of spots or blocks, that is, in the form of water droplets, dust or chemicals from the previous stage will adhere due to concentration during the drying process, but pure water adhering to the washed blood may form a thin film over a wide area. It has been found that when the material is in an adherent state, the adhesion of atom dust and chemical solution does not occur so much even when drying is performed using a drying gas due to the concentration effect.

かかるデータと結果に基づき、第3図に示す様に(当該
第3図実線は親水性の態様であり、疎水性の場合は点線
に示す様に逆になる)、例えば、精密部品としての光学
部品のワークのガラスプレート1を図示しない仕上げ洗
浄槽中の洗浄槽の純水2中に浸漬した俊、上部の乾燥ガ
ス3中に引き上げ1−るプロセスで可及的にゼロに近い
超低速で引き上げすると、純水2の凝集力と表面張力の
バランスにより被洗)9物1の洗浄面2は高さhの膜状
の純水2の付着が牛じて上部の乾燥ガス3に接続されて
おり、そこで、被洗浄物1を超低速で矢印方向に、即ち
、水面に直角に垂直状に引き上げすると、洗浄面に付着
1−る純水2の薄膜は所定高ざhよりは上位に兵士がり
せず、したがって、被洗浄物1の超低速による引き上げ
では純水2のhの高さより上で薄膜状の付着純水2が直
ちに乾燥ガス3に接触し、引き上げする被洗浄物1の超
低速に対しては付着する純水2の上端縁部がら乾燥が瞬
間的に行われて′a縮現象による塵埃の付着や前段から
の薬液の残留分によるシミ等が生ぜず、したがって、シ
ミが出来ず、サブミクロン単位の超精密乾燥された洗浄
面の被洗浄物1を得ることが出来ることが分った。
Based on such data and results, as shown in FIG. 3 (the solid line in FIG. 3 is a hydrophilic aspect, and the opposite is shown in the dotted line in the case of hydrophobicity), for example, optical A glass plate 1 of a component workpiece is immersed in pure water 2 of a cleaning tank (not shown) in a finishing cleaning tank, and then pulled up into a dry gas 3 at the top at an ultra-low speed as close to zero as possible. When pulled up, due to the balance between the cohesive force and surface tension of the pure water 2, the cleaning surface 2 of the 9 objects 1 (to be washed) is connected to the drying gas 3 at the top, with a film of pure water 2 adhering to a height h. Therefore, when the object to be cleaned 1 is pulled up at an extremely low speed in the direction of the arrow, that is, perpendicularly to the water surface, the thin film of pure water 2 adhering to the surface to be cleaned rises above the predetermined height h. Therefore, when the object 1 to be cleaned is pulled up at an extremely low speed, the thin film of adhered pure water 2 immediately comes into contact with the drying gas 3 above the height h of the purified water 2, and the object 1 to be cleaned is pulled up. At extremely low speeds, the upper edge of the adhering pure water 2 dries instantaneously, preventing the adhesion of dust due to the shrinkage phenomenon and stains due to the residual chemical solution from the previous stage. It has been found that it is possible to obtain the object 1 to be cleaned, which has a surface to be cleaned that has been dried ultra-precisely on a submicron scale.

これは前述した如く、被洗浄物1の洗浄面に於ける付着
純水のhの高さの頂部前後の薄膜状で広面積の水膜部分
が純水の凝集力と表面張力によりhの高さ以上には薄膜
状に付着せず、又、hの高さの頂部近辺に於いては薄膜
状の純水の端縁部か直ちに乾燥ガス3に接触するために
、瞬間的に乾燥が行われるものであることか分った。
As mentioned above, this is due to the thin, wide-area water film part around the top of the height h of the adhering pure water on the cleaning surface of the object to be cleaned 1 due to the cohesive force and surface tension of the pure water. Further, near the top of the height h, the edge of the thin film of pure water immediately comes into contact with the drying gas 3, so that drying occurs instantaneously. I realized that it was something that would happen.

したがって、この理論によれば高さhの付着純水の高さ
以上の部分にはスポット状やブロック的な水滴状の付着
1i[!水が生ぜず、(〕たがって、シミ等が生じない
という理論解析も得られることC,:なる。
Therefore, according to this theory, spot-like or block-like water droplet-like adhesion 1i[! C: The theoretical analysis that water does not occur and therefore stains do not occur can be obtained.

而して、被洗浄物1の純水2からの引き上げプロセスに
おいては、純水の側方への層流を行えば良いものである
Therefore, in the process of lifting the object 1 to be cleaned from the pure water 2, it is sufficient to perform a laminar flow of the pure water to the side.

更に、赤外線ランプ16等を点灯してワーク1に対し赤
外線、近赤外線等の熟線17を放射しておくことにより
ワーク1とその近辺の乾燥ガスがhO熱デI温して例6
純水の乾燥速度が可及的に早められることも分った。
Furthermore, by lighting an infrared lamp 16 or the like to emit infrared rays, near-infrared rays, etc., to the workpiece 1, the workpiece 1 and the drying gas in its vicinity are heated to the temperature of
It has also been found that the drying speed of pure water can be increased as much as possible.

〈実施例〉 次に、この出願の発明の1実施例を第3図を参照して第
1.2図に従って説明すれば以下の通りである。
<Embodiment> Next, an embodiment of the invention of this application will be described below with reference to FIG. 3 and according to FIGS. 1.2.

図示実施例において、4は仕上げ洗浄2の純水洗浄槽で
おり、図示しない所定の複数段の前段の各精密洗浄)a
の終段に接続されて設けられており、ぞの前後の両側面
には純水2の循環用の貯留タンク5.5′が設けられて
循環ポンプ6、濾過用フィルタ7、所定温度に加熱する
ヒータ8を有して循環回路9により接続されており、槽
本体の内部には両側、及び、内側に所定サイズの微細孔
を多数穿設された多孔板10.10・・・が上下向きに
立設して設けられて、貯留タンク5か65′側へ上下部
の流速が周速になるように純水2を所定の低速で横方向
へ層流状に流動させるようになっており、槽本体外での
循環プロセスで所定温度にヒータ8により加熱されると
共にフィルタ7により塵埃等のサブミクロン単位の塵埃
も完全に除去されるようにされている。
In the illustrated embodiment, reference numeral 4 denotes a pure water cleaning tank for finishing cleaning 2, in which predetermined pre-stage precision cleaning (a) of a plurality of predetermined stages (not shown) is shown.
Storage tanks 5 and 5' for circulating pure water 2 are provided on both front and rear sides of the tank, and the circulation pump 6, filter 7, and water are heated to a predetermined temperature. It has a heater 8 and is connected by a circulation circuit 9. Inside the tank body, there are perforated plates 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10, 10. It is installed vertically and allows the pure water 2 to flow in a laminar flow in the lateral direction at a predetermined low speed so that the flow velocity in the upper and lower parts becomes the circumferential velocity towards the storage tank 5 or 65'. In a circulation process outside the tank body, it is heated to a predetermined temperature by a heater 8, and at the same time, a filter 7 completely removes dust and other submicron particles.

そして、槽本体内部番こは純水2にワーク1(第1図に
於いては表側から裏側に所定数平行に配列して)を前段
の精密洗浄から引き継いで純水2中に浸漬するホルダ1
1が適宜の昇降装置12によりワーク1の浸漬、引き上
げを自在にするようにされており、該純水2の水面上部
に於けるチτ・シバ13内に於いては空気等の乾燥ガス
3に対し、ヂX・シバ13内を所定の低速で循環させる
ナブミクロン捕捉フィルタを内蔵する循環ファン14と
乾燥ガス3を所定温度に加熱するヒータ15が所定位置
姿勢で設けられている。
The internal number of the tank body is a holder that immerses the workpieces 1 (in Fig. 1, a predetermined number of them are arranged in parallel from the front side to the back side) into the pure water 2, taking over from the previous stage precision cleaning. 1
The workpiece 1 can be freely immersed and pulled up by a suitable lifting device 12, and a dry gas 3 such as air is contained in the water 13 above the water surface of the pure water 2. On the other hand, a circulation fan 14 having a built-in Nabumicron trapping filter that circulates the inside of the DiX-shiba 13 at a predetermined low speed and a heater 15 that heats the dry gas 3 to a predetermined temperature are provided at a predetermined position and orientation.

又、ワーク1の上昇位置レベルに対し両側位置で熱線放
射用の赤外線ランプ16.16が設置されている。
Further, infrared lamps 16, 16 for emitting heat rays are installed at both sides of the elevated position level of the workpiece 1.

而して、前段階で製造され、所定の洗浄液や超音波によ
り所定段数精密洗浄されたワーク1の純水洗浄[4内に
於ける仕上げ洗浄に際しては、予め循環ポンプ6、フィ
ルタ7、ヒータ8により循環回路9を介しザブミクロン
単位の塵埃を除去され、所定温度に加熱された純水2を
貯留タンク5側から5′側へ多孔板10.10・・・を
介して上下部の速度が同一速度になるようにして側方へ
層流状態で流動させてあき、又、上部の乾燥ガス13中
では循環ファン14とヒータ15により上部の乾燥ガス
の空気3をヂトンバ13内に於いて所定の低速でサブミ
クロン中位の穿埃を捕捉除去して循環させておく。
The workpiece 1 manufactured in the previous stage and precisely cleaned in a predetermined number of stages using a predetermined cleaning liquid or ultrasonic waves is cleaned with pure water [for the final cleaning in 4, the circulation pump 6, filter 7, and heater 8 are The pure water 2, which has been heated to a predetermined temperature after removing dust on the order of microns, is passed through the circulation circuit 9 from the storage tank 5 side to the 5' side via perforated plates 10, 10, etc., so that the speed of the upper and lower parts is the same. The dry gas 13 in the upper part is caused to flow laterally in a laminar flow state, and the air 3 in the upper dry gas is brought into the diton bar 13 at a predetermined level by a circulation fan 14 and a heater 15. It captures and removes medium-sized submicron dust at low speed and circulates it.

そして、赤外線ランプ16.16を点灯して熱線の赤外
線を放1」L乾燥ガス13を加熱昇温しておく。
Then, the infrared lamps 16 and 16 are turned on to emit hot infrared rays to heat the 1"L dry gas 13 and raise its temperature.

この位置はワーク、1の上昇レベルに位置されている。This position is located at the elevated level of the workpiece 1.

而して、ホルダ11により前段の精密洗浄からバトンタ
ッチされた被洗浄物1を純水洗浄槽4内の純水2に浸漬
し、所定時間経過後に昇降装置12を介して可及的ゼロ
に近い超低速で純水2の水面から垂直状に乾燥ガス3中
に引き上げしていく。
Then, the object to be cleaned 1 that has been baton-touched from the previous precision cleaning by the holder 11 is immersed in the pure water 2 in the pure water cleaning tank 4, and after a predetermined time has elapsed, it is heated as close to zero as possible via the lifting device 12. It is pulled up vertically from the surface of pure water 2 into dry gas 3 at extremely low speed.

そして、該引き上げプロセスにおいて、前述原理態様に
より被洗浄物1の洗浄面には所定高ざhだけ純水2が薄
膜状に付着するが、該りの高さの頂部以上には随伴上昇
しないために、乾燥ガス3と接触し、上昇速度の超低速
に比し、瞬間的に乾燥作用が行われ、しかも、薄膜状の
純水2に対して行われるために、先述した如く、スポッ
ト的ブロック状的な水滴状の濃縮現象か起こらず、又、
赤外線ランプ16.16から放射される熱線の赤外線に
より乾燥ガス3が加熱昇温され、又、ワーク1も加熱昇
温されるため乾燥が促進され、したがって、洗浄面には
シミ等が生ぜず、又、乾燥ガス3の吹き付は等による擾
乱も生ぜず、設計通りの超精密乾燥が行われる。
In the lifting process, the purified water 2 adheres to the cleaning surface of the object 1 to be cleaned in a thin film form by a predetermined height h according to the above-mentioned principle, but does not rise above the top of the height. When the drying gas 3 comes into contact with the drying gas 3, the drying action is instantaneous compared to the ultra-low rising speed, and since it is performed on the thin film of pure water 2, as mentioned above, spot blocking occurs. No water droplet-like concentration phenomenon occurs, and
The drying gas 3 is heated and heated by the infrared rays of heat rays emitted from the infrared lamp 16.16, and the workpiece 1 is also heated and heated, so drying is accelerated, and therefore, stains etc. do not occur on the cleaning surface. In addition, the blowing of the drying gas 3 does not cause any disturbance due to etc., and ultra-precise drying is performed as designed.

このようにした乾燥作業を艮復することにより、精度の
高い乾燥が19られる。
By repeating the drying operation as described above, highly accurate drying can be achieved.

尚、被洗浄物1の純水2に対する昇降間に前述した如く
、補水洗浄槽4内の純水2に対する層流状の側方流動を
することにより、上下方向に於いて全く同速の層流が得
られて、塵埃や前段階からの混入薬液の沈降等が生ぜず
、又、乾燥ガス3も循環ファン14による上部への@環
流を側方に向ける層流として形成させるために、循環フ
ァン14中のフィルタ等により濾過されてサブミクロン
単位の不811]にして混入する塵埃も濾過除去するこ
とが出来る。
As mentioned above, while the object 1 to be cleaned is being raised and lowered relative to the pure water 2, by creating a laminar lateral flow with respect to the pure water 2 in the supplementary water cleaning tank 4, a layer with exactly the same speed in the vertical direction is created. The drying gas 3 is also circulated so that the circulation fan 14 forms a laminar flow toward the upper side by the circulation fan 14, and the drying gas 3 is circulated. It is also possible to filter and remove dust that is filtered by the filter in the fan 14 and turned into submicron particles.

尚、この出願の発明の実施態様は上述実施例に限るもの
でないことは勿論であり、例えば、前段の薬液による精
密洗浄プロセスにおいても適用することが可能である等
種々の態様が採用可能である。
It goes without saying that the embodiments of the invention of this application are not limited to the above-mentioned embodiments; for example, various embodiments can be adopted, such as being applicable to the precision cleaning process using a chemical solution in the first stage. .

く弁明の効果〉 以上、この出願の発明によれば、電子部品や光学部品等
の超精密部品の仕上げ工程における精密洗浄の1変の仕
上げ洗浄に33ける純水を介しての純水洗浄槽での純水
中へのワークの浸漬による洗浄終了後、該純水から該ワ
ークを引き上げするプロセスにおいて、該純水の引き上
げ速度を超低速にすることにより被洗浄物の洗浄面には
純水の薄膜状の水が純水の凝集力と表面張力のバランス
を介して所定高さにのみ薄膜状に付着して上昇し、それ
以上は上昇しないために、引き上げプロセスにおいてス
ボツ[−的やブロック状的な水滴状の純水が付着せず、
又、赤外線や近赤外線等の熱線でワークやその周辺の乾
燥ガスを加熱昇温するため、乾燥速度がより促進され可
及的に速やかに瞬間的に乾燥がなされ、したがって、該
純水に混入しているサブミクロン単位の塵俟ヤ前工程の
洗浄液等の濃縮現象が起こらず、そのため、シミ等も生
ぜず、洗浄面仝而が極めて高い清浄度の洗浄乾燥が)q
られるという優れた効果が秦される。
Effects of the Defense> As described above, according to the invention of this application, a deionized water cleaning tank using deionized water in 33 steps is used for finishing cleaning, which is one variation of precision cleaning in the finishing process of ultra-precision parts such as electronic parts and optical parts. After cleaning by immersing the workpiece in pure water, in the process of lifting the workpiece from the pure water, the speed at which the pure water is pulled up is set to an extremely low speed so that the surface of the workpiece to be cleaned is covered with pure water. Due to the balance between the cohesive force and surface tension of pure water, the thin film of water adheres to a certain height and rises, and does not rise any further. Pure water in the form of water droplets does not adhere,
In addition, since the workpiece and the drying gas around it are heated and heated with heat rays such as infrared rays and near-infrared rays, the drying speed is accelerated and instantaneous drying is performed as quickly as possible. There is no condensation of sub-micron dust or cleaning liquid used in the previous process, so there is no staining, and the cleaning surface is extremely clean during cleaning and drying.
The excellent effect of being defeated is Qin.

又、仕上げ洗浄用の純水が洗浄槽内で側方に層流として
循環されるために、洗浄槽内に不測にして混入する塵埃
等が滞留せず、確実に循環工程において濾過等により捕
捉除去されるという効果がある。
In addition, since the pure water for finishing cleaning is circulated laterally in the cleaning tank as a laminar flow, dust and other particles that accidentally enter the cleaning tank do not accumulate and are reliably captured by filtration during the circulation process. It has the effect of being removed.

又、上部の乾燥ガスにおいても精密濾過処理がなされて
いることにより、超低速を介して純水から引き上げする
被洗浄物の洗浄面の乾燥プロセスにおいても、不測にし
て混入する勺ブミクロン単位の塵埃等も付石しないとい
う優れた効果が奏される。
In addition, since the upper drying gas is also subjected to precision filtration treatment, even during the drying process of the cleaning surface of the object to be cleaned, which is pulled up from pure water at an ultra-low speed, dust in the order of 100 microns can be accidentally mixed in. It also has the excellent effect of not adding stones.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明のゴ実施例の縦断面図、第2図は同側
面図、第3図は原理的態様の断面図である。 2・・・純水、  1・・・被洗浄物、 17・・・熱
線J 2−−一純え 1−一一破夾浄物 17−−−恭繰
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, FIG. 2 is a side view of the same, and FIG. 3 is a sectional view of the basic embodiment. 2...Pure water, 1...Object to be cleaned, 17...Heat ray J 2--1 Purity 1-11 Decontaminated object 17--Kyo repeat

Claims (2)

【特許請求の範囲】[Claims] (1)被洗浄物に対する前段の精密洗浄に次ぐ純水によ
る仕上げ洗浄後に乾燥ガス中で該被洗浄物の洗浄面の水
分を除去する乾燥方法において、上記純水の洗浄水に浸
漬した被洗浄物を超低速で水面から上記乾燥ガス中に引
き上げ、而して乾燥ガス中にて被洗浄物に熱線を放射す
るようにすることを特徴とする精密洗浄の乾燥方法。
(1) In a drying method in which moisture is removed from the surface of the object to be cleaned in a dry gas after final cleaning with pure water following the preliminary precision cleaning of the object, the object to be cleaned is immersed in the above-mentioned purified water. A drying method for precision cleaning, characterized in that an object is pulled up from the water surface into the drying gas at an extremely low speed, and then heat rays are radiated onto the object to be cleaned in the drying gas.
(2)上記熱線が赤外線であることを特徴とする特許請
求の範囲第1項記載の精密洗浄の乾燥方法。
(2) The precision cleaning drying method according to claim 1, wherein the heat ray is an infrared ray.
JP28310189A 1989-11-01 1989-11-01 Drying of precision cleaning Pending JPH03147325A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28310189A JPH03147325A (en) 1989-11-01 1989-11-01 Drying of precision cleaning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28310189A JPH03147325A (en) 1989-11-01 1989-11-01 Drying of precision cleaning

Publications (1)

Publication Number Publication Date
JPH03147325A true JPH03147325A (en) 1991-06-24

Family

ID=17661232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28310189A Pending JPH03147325A (en) 1989-11-01 1989-11-01 Drying of precision cleaning

Country Status (1)

Country Link
JP (1) JPH03147325A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100515440B1 (en) * 2002-04-15 2005-09-16 태화일렉트론(주) LCD glass washer and dryer using hot D.I Water and Infra-Red Lamp

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931241A (en) * 1982-07-17 1984-02-20 エム・ア−・エヌ−ロ−ラント・ドルツクマシ−ネン・アクチエンゲゼルシヤフト Device for bonding plurality of web section which is printed by rotary press and is cut in longitudinal direction
JPS5931241B2 (en) * 1975-11-12 1984-08-01 松下電器産業株式会社 ghost
JPH01210092A (en) * 1988-02-18 1989-08-23 Sonitsuku Fueroo Kk Drying of precision cleansing

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931241B2 (en) * 1975-11-12 1984-08-01 松下電器産業株式会社 ghost
JPS5931241A (en) * 1982-07-17 1984-02-20 エム・ア−・エヌ−ロ−ラント・ドルツクマシ−ネン・アクチエンゲゼルシヤフト Device for bonding plurality of web section which is printed by rotary press and is cut in longitudinal direction
JPH01210092A (en) * 1988-02-18 1989-08-23 Sonitsuku Fueroo Kk Drying of precision cleansing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100515440B1 (en) * 2002-04-15 2005-09-16 태화일렉트론(주) LCD glass washer and dryer using hot D.I Water and Infra-Red Lamp

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