JPH03135058A - Microwave circuit component - Google Patents

Microwave circuit component

Info

Publication number
JPH03135058A
JPH03135058A JP27339889A JP27339889A JPH03135058A JP H03135058 A JPH03135058 A JP H03135058A JP 27339889 A JP27339889 A JP 27339889A JP 27339889 A JP27339889 A JP 27339889A JP H03135058 A JPH03135058 A JP H03135058A
Authority
JP
Japan
Prior art keywords
metal layer
substrate
metal
wiring conductor
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27339889A
Other languages
Japanese (ja)
Inventor
Tomohiro Yoshida
大広 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP27339889A priority Critical patent/JPH03135058A/en
Publication of JPH03135058A publication Critical patent/JPH03135058A/en
Pending legal-status Critical Current

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Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To enhance a design property and a breakdown-strength yield of an impedance matching circuit by a method wherein a space interconnection conductor and a surface metal layer formed on the surface of an insulating substrate under it are connected to a metal layer on the rear so as to be passed through the substrate and a desired electrostatic capacity is obtained. CONSTITUTION:A hole is made in an alumina substrate; a through hole is filled with a metal such as Mo or the like; and a protrusion is poslished and flattened. Au/Pt/Ti are vapor-deposited on both faces of the substrate and are patterned; a metal layer 13 is formed. The whole layer 13 is covered with a resist; Au/Pt/ Ti are vapor-deposited and patterned; and a microstrip line 11 and an open stub 104 are formed. The metal layer 13 on the substrate is connected electrically to a rear metal 15 of the substrate by using a metal plug 14 which has been filled in the through hole; a space interconnection conductor 11a is insulated from the metal layer 13 via an air layer 12 at the lower part; and an electrostatic capacity is obtained.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) マイクロ波半導体装置のインピーダンス整合回路部品の
一つに絶縁基板の両面に金属層を固着し、表面金属層に
エツチング加工を施して所望のパターン、例えばマイク
ロ波伝送線路などに形成し、その他の集中定数素子、例
えばマイクロ波伝送線路などに形成し、その他の集中定
数素子2例えば薄膜抵抗、MIM(金属−誘導体−金属
)キャパシタを具備したものがある。第3図にその一例
を示し説明する。
[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) A metal layer is fixed to both sides of an insulating substrate as one of the impedance matching circuit components of a microwave semiconductor device, and the surface metal layer is etched. to form a desired pattern, such as a microwave transmission line, and form other lumped constant elements, such as a microwave transmission line, to form other lumped constant elements 2, such as thin film resistors, MIM (metal-dielectric-metal) Some are equipped with capacitors. An example is shown in FIG. 3 and will be explained.

アルミナ基板101の裏面にはAu / Pt / T
iからなる金属層102が蒸着により形成されており、
この基板の表面にもAu / Pt / Tiでなるマ
イクロストリップ線路103、オープンスタブ104お
よびMIMキャパシタ105等が形成されている。
The back surface of the alumina substrate 101 is made of Au/Pt/T.
A metal layer 102 consisting of i is formed by vapor deposition,
Also formed on the surface of this substrate are a microstrip line 103 made of Au/Pt/Ti, an open stub 104, an MIM capacitor 105, and the like.

上記MIMキャパシタ105は拡大して第4図に断面図
で示すように、マイクロストリップ線路103と電気的
に接続された金属層部106と、誘電体108.および
基板上の金属層107とから構成されている。また、基
板上の金属層107は導出用半導体109とスルーホー
ル110により上記裏面金属層102と電気的に接続さ
れている。すなわち、MIMキャパシタ105は回路的
に並列に接続されている、、すなわち、MIMキャパシ
タ105は回路的に並列に接続されており、インピーダ
ンス整合回路素子として重要な作用を有している。
As shown in an enlarged cross-sectional view in FIG. 4, the MIM capacitor 105 includes a metal layer 106 electrically connected to the microstrip line 103, a dielectric 108. and a metal layer 107 on the substrate. Further, the metal layer 107 on the substrate is electrically connected to the back metal layer 102 through a lead-out semiconductor 109 and a through hole 110. That is, the MIM capacitors 105 are connected in parallel in a circuit, that is, the MIM capacitors 105 are connected in parallel in a circuit, and have an important function as an impedance matching circuit element.

(発明が解決しようとするi題) 上記従来のMIMキャパシタの構造には次にあげる重大
な問題点がある。すなわち、MIMキャパシタの等両回
路は第5図に示すように、金属層106と金属層107
の間に発生する静電容量Cと引き出し用導体109の部
分に発生するインダクタンスLで表わされる。従って、
周波数が高くなると本来の機能である容量性リアクタン
スは次第に小さくなり、周波数が1/(2πm>以上で
は逆に誘導性リアクタンスになってしまい、インピーダ
ンス整合回路の設計が非常に複雑かつ困難なものとなる
(Problem to be Solved by the Invention) The structure of the conventional MIM capacitor described above has the following serious problems. That is, as shown in FIG.
It is represented by the capacitance C generated between the two and the inductance L generated at the lead-out conductor 109. Therefore,
As the frequency increases, the capacitive reactance, which is its original function, gradually becomes smaller, and when the frequency exceeds 1/(2πm>, it becomes an inductive reactance, making the design of an impedance matching circuit extremely complicated and difficult. Become.

また、MIMキャパシタ形成に際して、誘電体108と
して窒化膜(Sl、 N4 )や酸化膜(Sin、 )
などをプラズマCVD装置(CV D : Chemi
cal VaporDeposition)などを用い
て形成するが、この絶縁膜の膜質は下地のアルミナ基板
、金属層の表面粗さの状態に大きく依存するため、直流
およびマイクロ波印加時に必要なMIMキャパシタの破
壊耐圧の大きさのばらつきが多く、に工にキャパシタの
歩留りを大きく低下させてしまうという重大な問題があ
る。
In addition, when forming the MIM capacitor, a nitride film (Sl, N4) or an oxide film (Sin, ) is used as the dielectric 108.
etc. using plasma CVD equipment (CVD: Chemi
Cal VaporDeposition), etc. However, the film quality of this insulating film largely depends on the underlying alumina substrate and the surface roughness of the metal layer, so the breakdown voltage of the MIM capacitor required when DC and microwaves are applied is There are many variations in size, which poses a serious problem in that it greatly reduces the yield of capacitors.

本発明は、上記従来の問題点に鑑みてなされたもので、
インピーダンス整合回路の設計性に優れ、かつ耐圧歩留
を大幅に向上できるマイクロ波部品を提供することを目
的とする。
The present invention has been made in view of the above-mentioned conventional problems.
The purpose of the present invention is to provide a microwave component that has an excellent impedance matching circuit design and can significantly improve the withstand voltage yield.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段) 本発明にかかるマイクロ波回路部品は、絶縁基板上にマ
イクロストリップ線路を含んで形成されたマイクロ波回
路部品が、マイクロストリップ線路が形成する導電体の
一部に設けられた空間配線導体、該空間配線導体と該空
間配線導体下の絶縁基板表面に設けられた所望面積の表
面金属層、および前記表面金属層と該表面金属層下の絶
縁基板を貫通し裏面の金属層とを電気的に接続する導電
接続体部を具備し、前記空間配線導体と前記表面金属層
とは空気層を介して所望の静電容量を得るようにしたこ
とを特徴とする。
(Means for Solving the Problems) A microwave circuit component according to the present invention includes a microwave circuit component formed on an insulating substrate including a microstrip line, and a part of the conductor formed by the microstrip line. A space wiring conductor provided, a surface metal layer having a desired area provided on the surface of the space wiring conductor and the insulating substrate under the space wiring conductor, and a surface metal layer that penetrates the surface metal layer and the insulating substrate under the surface metal layer and then passes through the back surface of the space wiring conductor. The space wiring conductor and the surface metal layer are characterized in that the space wiring conductor and the surface metal layer are configured to have a desired capacitance via an air layer.

(作 用) 本発明のマイクロ波回路部品により、従来問題点であっ
たMIMキャパシタが原因であるインピーダンス整合回
路の設計性や耐圧不良による歩留りの低下が大幅に改善
できるので、このマイクロ波部品を用いて高性能で安価
なマイクロ波半導体装置が製作できる。
(Function) With the microwave circuit component of the present invention, it is possible to significantly improve the design of the impedance matching circuit, which has been a problem in the past, and the decrease in yield due to poor withstand voltage. Using this method, high-performance and inexpensive microwave semiconductor devices can be manufactured.

(実施例) 以下1本発明の一実施例につき第1図および第2図を参
照して説明する。なお、説明において従来と変わらない
部分については、図面に従来と同じ番号を付けて示し説
明を省略する。
(Example) An example of the present invention will be described below with reference to FIGS. 1 and 2. In addition, in the description, parts that are the same as in the prior art are shown in the drawings with the same numbers as in the prior art, and the explanation will be omitted.

アルミナ基板101上のマイクロストリップ線路11が
所望の部位にて空間配線されており、この空間配線導体
11aの下方に空気層12を介してアルミナ基板101
上に基板上の金属層13が形成されている。また、この
基板上の金属層13はアルミナ基板101に形成された
貫通孔に例えばモリブデン(No)などを充填した金属
柱14(導電接続体部)によって基板の裏面金属層15
と電気的に接続されている。
The microstrip line 11 on the alumina substrate 101 is space-wired at a desired location, and the alumina substrate 101 is placed below the space wiring conductor 11a via an air layer 12.
A metal layer 13 on the substrate is formed thereon. Further, the metal layer 13 on this substrate is connected to the rear surface metal layer 13 of the substrate by a metal column 14 (conductive connection body part) filled with, for example, molybdenum (No) in a through hole formed in the alumina substrate 101.
electrically connected to.

上記マイクロ波部品は以下の方法で形成される。The microwave component described above is formed by the following method.

まず、アルミナ基板にレーザビームによって開孔し、あ
るいはアルミナ基板を焼結する前に開孔を設けておいて
焼結することによって貫通孔を形成する。次に、上記貫
通孔にMOなどを充填し、アルミナ基板の表面から突出
した部分には研磨を施して平坦にする。次に、アルミナ
基板の両面にAu / Pt / Tiを蒸着し、レジ
ストを用いたパターニングにより基板上の金属層13を
形成する。次に、上記基板上の金属M!J13全体をレ
ジストで被覆しAu/Pt/Tiを蒸着し、ついで、パ
ターニングを施してマイクロストリップ線路11および
オーブンスタブ104を形成する。
First, a through hole is formed in an alumina substrate by using a laser beam or by providing an opening before sintering the alumina substrate and then sintering the alumina substrate. Next, the through hole is filled with MO or the like, and the portion protruding from the surface of the alumina substrate is polished to make it flat. Next, Au/Pt/Ti is vapor-deposited on both sides of the alumina substrate, and a metal layer 13 on the substrate is formed by patterning using a resist. Next, the metal M on the above substrate! The entire J13 is coated with a resist, Au/Pt/Ti is deposited, and then patterned to form the microstrip line 11 and the oven stub 104.

上記実施例では空間配線用金属層としてAu/Pt/T
iを用いる場合を例示したが、これに限られるものでな
く、金属層の機械強度を大にするため、さらに下地金属
層としてNo層等を追加してもよい。
In the above embodiment, Au/Pt/T is used as the metal layer for space wiring.
Although the case where i is used is illustrated, the present invention is not limited to this, and in order to increase the mechanical strength of the metal layer, a No layer or the like may be further added as a base metal layer.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、叙上の如くマイクロ波部品の回路設計
性が大幅に向上し、歩留りも大幅に向上するので、これ
を用いたマイクロ波半導体装置の高性能化、低価格化を
図ることができる顕著な効果がある。
According to the present invention, as described above, the circuit design of microwave components is greatly improved and the yield is also greatly improved, so it is desirable to improve the performance and lower the cost of microwave semiconductor devices using the same. It has a remarkable effect.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明にかかる一実施例のマイクロ波部品の斜
視図、第2図は第1図の一部を拡大して示す断面図、第
3図は従来例のマイクロ波部品の斜視図、第4図は第3
図の一部を拡大して示す断面図、第5図はMIMキャパ
シタの等価回路図である。 11・・・マイクロストリップ線路 11a・・・空間配線導体 12・・・空気層    13・・・基板上の金属層1
4・・・金属柱(導電接続体部) I5・・・裏面金属層
FIG. 1 is a perspective view of a microwave component according to an embodiment of the present invention, FIG. 2 is an enlarged cross-sectional view of a part of FIG. 1, and FIG. 3 is a perspective view of a conventional microwave component. , Figure 4 is the third
FIG. 5, which is a sectional view showing a part of the figure enlarged, is an equivalent circuit diagram of the MIM capacitor. 11...Microstrip line 11a...Space wiring conductor 12...Air layer 13...Metal layer 1 on the board
4...Metal pillar (conductive connection body part) I5...Back metal layer

Claims (1)

【特許請求の範囲】  絶縁基板上にマイクロストリップ線路を含 んで形成されたマイクロ波回路部品が、マイクロストリ
ップ線路を形成する導電体の一部に設けられた空間配線
導体、該空間配線導体と該空間配線導体下の絶縁基板表
面に設けられた所望面積の表面金属層、および前記表面
金属層と該表面金属層下の絶縁基板を貫通し裏面の金属
層とを電気的に接続する導電接続体部を具備し、前記空
間配線導体と前記表面金属層とは空気層を介して所望の
静電容量を得るようにしたことを特徴とするマイクロ波
回路部品。
[Claims] A microwave circuit component formed on an insulating substrate and including a microstrip line includes a space wiring conductor provided on a part of a conductor forming the microstrip line, and a space wiring conductor that is connected to the space wiring conductor. A surface metal layer with a desired area provided on the surface of the insulating substrate under the space wiring conductor, and a conductive connector that penetrates the surface metal layer and the insulating substrate under the surface metal layer and electrically connects the metal layer on the back surface. A microwave circuit component, characterized in that the space wiring conductor and the surface metal layer have a desired capacitance via an air layer.
JP27339889A 1989-10-20 1989-10-20 Microwave circuit component Pending JPH03135058A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27339889A JPH03135058A (en) 1989-10-20 1989-10-20 Microwave circuit component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27339889A JPH03135058A (en) 1989-10-20 1989-10-20 Microwave circuit component

Publications (1)

Publication Number Publication Date
JPH03135058A true JPH03135058A (en) 1991-06-10

Family

ID=17527342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27339889A Pending JPH03135058A (en) 1989-10-20 1989-10-20 Microwave circuit component

Country Status (1)

Country Link
JP (1) JPH03135058A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107946274A (en) * 2017-11-23 2018-04-20 成都海威华芯科技有限公司 A kind of mmic chip and its back side dicing lane manufacture craft

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107946274A (en) * 2017-11-23 2018-04-20 成都海威华芯科技有限公司 A kind of mmic chip and its back side dicing lane manufacture craft

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