JPH03119641A - Electron beam diffraction device - Google Patents

Abstract

PURPOSE:To improve the adjustment precision of the incident angle and incident direction by providing a deflecting coil between an electron gun and a sample. CONSTITUTION:A deflecting coil 2 deflects the radiation direction of an electron beam (a) radiated toward a sample S in a dog-legged shape so as to invariably pass one point of a sample face like an electron beam (h), and the incident angle and incident direction are adjusted. The rough adjustment of the incident angle and incident direction of the radiated electron beam to the sample S is performed by a manipulator 3, and the fine adjustment is performed by the coil 2. The adjustment of the incident angle and incident direction of the electron beam to the sample S can be performed with high precision at a high speed with a simple structure.

Description

[Detailed description of the invention] [Industrial application field]

The present invention relates to a structure for changing the incident angle and direction of incidence of an electron beam on a sample in an electron beam diffraction apparatus.

[Conventional technology]

In an electron beam diffraction apparatus, it is necessary to adjust the incident angle and direction of incidence of the electron beam onto a sample so as to be optimal for the intended measurement. For this reason, conventional cutting electron beam diffraction equipment uses
As shown in Figure 2, the sample is tilted and rotated to test the electron beam. However, in an electron beam diffraction device, the sample is held in a vacuum, so tilting and rotating the sample requires rotating the sample. The sample stage that is being held must be operated from outside the vacuum, and a mechanism that accurately transmits the driving force from outside the vacuum to the movement mechanism inside the vacuum, or a special motor that can be used in a vacuum, is required. However, the problem is that it is extremely complicated and expensive. Another problem with mechanical operation is that it is difficult to increase the speed at which the incident angle and direction of incidence are changed.

[Problem to be solved by the invention]

An object of the present invention is to enable easy and highly accurate adjustment of the incident angle and direction of incidence of an electron beam on a sample in an electron beam diffraction apparatus.

[Means to solve the problem]

In the electron beam diffraction apparatus, a deflection coil was provided between the electron gun and the sample to fix the irradiation position of the electron beam and deflect only the incident direction of the electron beam. For CtV] Adjustment of the incident angle and direction of the electron beam on the sample has conventionally been performed by rotating and tilting the sample, resulting in a complex structure and could only be controlled at low speed and with low accuracy. The present invention does not mechanically control the orientation of the sample, but electrically controls the direction of the electron beam.
The aim is to adjust the incident angle and direction of the electron beam onto the sample at high speed and with high precision. By installing a deflection coil between the electron gun and the sample, the electron beam can be deflected by simply adjusting the voltage applied to the coil. It is now possible to easily adjust the incident direction with high precision and high speed.

【Example】

FIG. 1 shows an embodiment of the present invention. In FIG.
is a sample, T is a vacuum chamber in which the sample is placed, P is a vacuum pump that evacuates the vacuum chamber T, 1 is an electron gun that irradiates the sample S with an electron beam, and 2 is located between the sample S and the electron gun 1. Two sets of deflection coils are arranged in each set to deflect the electron beam in both the X and Y directions, and the irradiation direction of the electron beam a to be irradiated toward the sample S is always set at one point 0 on the sample surface as shown in the figure.
The electron beam is deflected in a dogleg shape so that it passes through the sample, and the incident angle and direction of the electron beam on the sample are adjusted. 3 is a simple manipulator that has a function of setting the sample S at an arbitrary angle with respect to the irradiated electron beam, and can adjust the incident angle and direction of incidence of the electron beam on the sample. Adjustment of the incident angle and direction of incidence of the electron beam on the sample can be performed using both the manipulator 3 and the deflection coil 2. However, large rough adjustments are performed using the manipulator 3, and fine adjustments that require high precision are performed using the deflection coil 2. It is effective to do so. Further, by making the deflection coil 2 large-sized, it is also possible to perform the above adjustment using only the deflection coil 2. 4 is a fluorescent plate that converts the electron beam diffracted on the sample surface into light. 0Although not shown in the drawing, the light generated by the fluorescent plate 4 is detected, the diffraction pattern is measured, and the diffraction pattern is analyzed. By doing this, we can analyze the structure of the sample.

【effect】

According to the present invention, the angle and direction of incidence of the electron beam on the sample can be adjusted by a simple mechanism by electrically controlling the direction of the electron beam instead of mechanically controlling the orientation of the sample. It has become possible to adjust the incident angle and direction of the electron beam onto the sample at high speed and with high precision.

[Brief explanation of drawings]

FIG. 1 is a configuration diagram of an embodiment of the present invention, and FIG. 2 is an explanatory diagram of sample drive in a conventional example. S...sample, T...vacuum chamber, P...vacuum bomb...electron gun, 2...deflection coil, 3...manipulator, 4...fluorescent plate.

Claims (1)

[Claims] An electron beam diffraction apparatus characterized in that a deflection coil is provided between an electron gun and a sample to fix the irradiation position of the electron beam and deflect only the incident direction of the electron beam.