JPH03116819A - Manufacture of semiconductor device and device therefor - Google Patents

Manufacture of semiconductor device and device therefor

Info

Publication number
JPH03116819A
JPH03116819A JP1251897A JP25189789A JPH03116819A JP H03116819 A JPH03116819 A JP H03116819A JP 1251897 A JP1251897 A JP 1251897A JP 25189789 A JP25189789 A JP 25189789A JP H03116819 A JPH03116819 A JP H03116819A
Authority
JP
Japan
Prior art keywords
sensitizing
conducted
purge box
developing
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1251897A
Inventor
Hiroshi Maejima
Mitsugi Oshima
Masashi Yamamoto
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1251897A priority Critical patent/JPH03116819A/en
Publication of JPH03116819A publication Critical patent/JPH03116819A/en
Application status is Pending legal-status Critical

Links

Abstract

PURPOSE: To control the dimensional variation of a resist pattern, and to contrive improvement in dimensional accuracy of the resist pattern by a method wherein, after a photosensitive treatment has been conducted on the photoresist coated on the substrate to be treated, the substrate is brought into an inert gas atmosphere.
CONSTITUTION: In a sensitizing-developing treatment device 1a, the unloader of a sensitizing treatment section 2 has an additional function as the loader of a developing treatment section 6, end a carrier jig 3b arranged thereon is housed in a purge box 7. On the purge box 7, a through hole 8 is perforated, and when a developing treatment is conducted, inert gas such as nitrogen gas and the like is fed into the purge box 7 through the above-mentioned through hole 8. In order to conduct sensitizing and developing treatments, the prescribed quantity of nitrogen gas, for example, is fed into the purge box 7, sensitized wafers 4 are left in a nitrogen gas atmosphere until a developing treatment is conducted. As a result, the widening of the width of a resist pattern due to the obstruction of oxide reaction and the like of the sensitized part of the resist can be prevented. Consequently, dimensional accuracy of the pattern can sharply be improved.
COPYRIGHT: (C)1991,JPO&Japio
JP1251897A 1989-09-29 1989-09-29 Manufacture of semiconductor device and device therefor Pending JPH03116819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1251897A JPH03116819A (en) 1989-09-29 1989-09-29 Manufacture of semiconductor device and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1251897A JPH03116819A (en) 1989-09-29 1989-09-29 Manufacture of semiconductor device and device therefor

Publications (1)

Publication Number Publication Date
JPH03116819A true JPH03116819A (en) 1991-05-17

Family

ID=17229580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1251897A Pending JPH03116819A (en) 1989-09-29 1989-09-29 Manufacture of semiconductor device and device therefor

Country Status (1)

Country Link
JP (1) JPH03116819A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03246930A (en) * 1990-02-26 1991-11-05 Nec Corp Aligner/developer for photosensitive organic coating film
US9480518B2 (en) 2009-07-01 2016-11-01 Biedermann Technologies Gmbh & Co. Kg Instruments for use with a bone anchor with plug member

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03246930A (en) * 1990-02-26 1991-11-05 Nec Corp Aligner/developer for photosensitive organic coating film
US9480518B2 (en) 2009-07-01 2016-11-01 Biedermann Technologies Gmbh & Co. Kg Instruments for use with a bone anchor with plug member

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