JPH03114131A - High frequency inductively coupled plasma mass spectrometer - Google Patents

High frequency inductively coupled plasma mass spectrometer

Info

Publication number
JPH03114131A
JPH03114131A JP1253509A JP25350989A JPH03114131A JP H03114131 A JPH03114131 A JP H03114131A JP 1253509 A JP1253509 A JP 1253509A JP 25350989 A JP25350989 A JP 25350989A JP H03114131 A JPH03114131 A JP H03114131A
Authority
JP
Japan
Prior art keywords
high frequency
mass spectrometer
scattered light
inductively coupled
coupled plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1253509A
Other languages
Japanese (ja)
Inventor
Kenichi Sakata
健一 阪田
Tadashi Uchiyama
正 内山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP1253509A priority Critical patent/JPH03114131A/en
Publication of JPH03114131A publication Critical patent/JPH03114131A/en
Pending legal-status Critical Current

Links

Landscapes

  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To prevent injection of scattered light to a mass spectrometer by putting a scattered light preventing part consisting of a plurality of scattered light preventing plates which are surface-blackened in the surrounding of an ion passing route from a skimmer to a detector of a mass spectrometer. CONSTITUTION:When vaporized sample is led to high frequency inductively coupled plasma 7 to be ionized or to emit light, the ions in the plasma 7 are converged passing between ion lens 14a, 14b after passing a nozzle 8, a skimmer 9, and a drawing out electrode 9''. At that time, since scattered light in the route of ions is prevented from scattering by the scattered light preventing part 21, the scattered light does not return to the ion route. As a result, strength of detecting signal is not affected. The scattered light preventing part 21 consists of a plurality of scattered light preventing plates 22a-22n which are surface- blackened and put in the surrounding of the ion route from a skimmer 9 to a mass filter 16.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、高周波誘導コイルに高周波エネルギーを供給
し高周波磁界を形成して高周波誘導結合プラズマを生じ
させ、該プラズマを用いて試料を励起してイオンを生じ
させ、該イオンをノズルとスキマーからなるインターフ
ェイスを介して質量分析計に導いて検出することにより
、前記試料中の被測定元素を分析する高周波誘導結合プ
ラズマ質量分析装置に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention supplies high-frequency energy to a high-frequency induction coil to form a high-frequency magnetic field to generate high-frequency inductively coupled plasma, and uses the plasma to excite a sample. The present invention relates to a high frequency inductively coupled plasma mass spectrometer that analyzes an element to be measured in the sample by generating ions through a nozzle and a skimmer, and guiding the ions to a mass spectrometer for detection through an interface consisting of a nozzle and a skimmer.

〈従来の技術〉 第2図は、高周波誘導結合プラズマを用いた分析計の一
般的な構成説明図である。この図において、プラズマト
ーチ1の外室1bと最外室1cにはガス調節器2を介し
てアルゴンガス供給源3からアルゴンガスが供給され、
内室1aには試料導入装置4内の固体試料がレーザ光源
5から照射されたレーザ光によって気化されてのちキャ
リアガスであるアルゴンガスによって搬入されるように
なっている。尚、試料が液体の場合は、第2図の試料導
入装置4とレーザ光源5が除去され、導入される液体試
料を霧化してプラズマトーチ1の内室1aに供給するネ
プライザが装着される。また、試料は固体であることよ
りも液体であることが多い。
<Prior Art> FIG. 2 is an explanatory diagram of a general configuration of an analyzer using high-frequency inductively coupled plasma. In this figure, argon gas is supplied from an argon gas supply source 3 to an outer chamber 1b and an outermost chamber 1c of a plasma torch 1 via a gas regulator 2.
A solid sample in the sample introducing device 4 is vaporized by a laser beam irradiated from a laser light source 5 and then carried into the inner chamber 1a by argon gas as a carrier gas. If the sample is a liquid, the sample introducing device 4 and laser light source 5 shown in FIG. 2 are removed, and a nebulizer is installed to atomize the introduced liquid sample and supply it to the inner chamber 1a of the plasma torch 1. Also, the sample is more likely to be a liquid than a solid.

一方、プラズマト−チ1に巻回された高周波誘導コイル
6には高周波電源10によって高周波電流が流され、該
コイル6の周囲に高周波磁界(図示せず)が形成されて
いる。この状態で上記高周波磁界の近傍でアルゴンガス
中に電子かイオンが植え付けられると、該高周波磁界の
作用によって瞬時に高周波誘導結合プラズマ7か生ずる
On the other hand, a high frequency current is passed through a high frequency induction coil 6 wound around the plasma torch 1 by a high frequency power source 10, and a high frequency magnetic field (not shown) is formed around the coil 6. When electrons or ions are planted in the argon gas in the vicinity of the high frequency magnetic field in this state, high frequency inductively coupled plasma 7 is instantaneously generated by the action of the high frequency magnetic field.

また、ノズル8とスキマー9に挟まれたフォアチャンバ
ー本体11内は、真空ポンプ12によって例えば1 ’
Fo r r 、に吸引されている。更に、センターチ
ャンバー13内にはイオンレンズ14a、14bが設け
られると共に、該センターチャンバー13の内部は第1
油拡散ポンプ15によって例えば10−’Torr、に
吸引され、マスフィルタ(例えば四垂極マスフィルタ)
16を収容しているリアチャンバー17内は第2油拡散
ポンプ18によって例えば10−’Torr、に吸引さ
れている。
Further, the inside of the forechamber main body 11 sandwiched between the nozzle 8 and the skimmer 9 is pumped by a vacuum pump 12, for example.
For r r, is attracted to. Furthermore, ion lenses 14a and 14b are provided inside the center chamber 13, and the inside of the center chamber 13 is
The oil is sucked to, for example, 10-' Torr by the oil diffusion pump 15, and then passed through a mass filter (for example, a quadrupole mass filter).
The interior of the rear chamber 17 housing the oil pump 16 is suctioned to, for example, 10-'Torr by a second oil diffusion pump 18.

この状態で高周波誘導結合プラズマ中に上述のようにし
て気化された試料が導入され、イオン化や発光が行われ
る。該プラズマ7内のイオンは、ノズル8.スキマー9
.および引出し電極9−を経由してのちイオンレンズ1
4a、14b (若しくはダブレット四重径レンズ)の
間を通って収束され、その後、マスフィルタ16を通り
二次電子増倍管19に導かれて検出される。この検出信
号が信号処理部20に送出されて演ユ・処理されること
によって、前記試料中の被測定元素分析値が求められる
ようになっている。
In this state, the sample vaporized as described above is introduced into the high-frequency inductively coupled plasma, and ionization and light emission are performed. The ions in the plasma 7 are transferred to the nozzle 8. skimmer 9
.. and the ion lens 1 via the extraction electrode 9-.
4a and 14b (or a doublet quadruple diameter lens), and then passed through a mass filter 16, guided to a secondary electron multiplier 19, and detected. This detection signal is sent to the signal processing section 20, where it is played and processed, thereby determining the analysis value of the element to be measured in the sample.

〈発明が解決しようとする問題点〉 然るに、上記従来例においては、高周波誘導結合プラズ
マ7内のイオンが、ノズル8→スキマ9→引出し電極9
−→イオンレンズ14a、14bを通って、マスフィル
タ16に至る。ここで、マスフィルタ16における電場
のフィルタ作用により、マスフィルタ16を質量に従っ
て選択的に通過し、その後、二次電子増倍管19に到達
して検出されるようになっている。スキマー8の先端か
ら入射する光は、ダブレット四重径レンズ14bで効果
的に遮断できるが、イオンが通る通路上で引出し電極9
−やイオンレンズ14a、14bによって散乱された光
は遮断できないという欠点があった。
<Problems to be Solved by the Invention> However, in the above conventional example, the ions in the high frequency inductively coupled plasma 7 flow from the nozzle 8 to the gap 9 to the extraction electrode 9.
-→It passes through the ion lenses 14a and 14b and reaches the mass filter 16. Here, due to the filtering effect of the electric field in the mass filter 16, the electrons selectively pass through the mass filter 16 according to their mass, and then reach the secondary electron multiplier 19 and are detected. Although the light incident from the tip of the skimmer 8 can be effectively blocked by the doublet quadruple diameter lens 14b, the extraction electrode 9
There is a drawback that the light scattered by - and the ion lenses 14a and 14b cannot be blocked.

本発明は、かかる状況に鑑みてなされものであり、その
課題は、センターチャンバーの壁などからの散乱光が質
量分析計検出器に入射しないような高周波誘導結合プラ
ズマ質量分析装置を提供することにある。
The present invention has been made in view of this situation, and its object is to provide a high frequency inductively coupled plasma mass spectrometer in which scattered light from the walls of the center chamber etc. does not enter the mass spectrometer detector. be.

く課題を解決するための手段〉 本発明は、高周波誘導コイルに高周波エネルギーを供給
し高周波磁界を形成して高周波誘導結合プラズマを生じ
させ、該プラズマを用いて試料を励起してイオンを生じ
させ、該イオンをノズルとスキマーからなるインターフ
ェイスを介して質量分析計に導いて検出することにより
、前記試料中の被測定元素を分析する高周波誘導結合プ
ラズマ質量分析装置において、黒色の表面処理が施され
た複数の光散乱防止板からなる光散乱防止部を前記スキ
マーから質量分析計検出器に至るイオンの通路周辺に配
設することによって前記課題を解決したものである。
Means for Solving the Problems> The present invention supplies high frequency energy to a high frequency induction coil to form a high frequency magnetic field to generate high frequency inductively coupled plasma, and uses the plasma to excite a sample to generate ions. , in a high frequency inductively coupled plasma mass spectrometer that analyzes the element to be measured in the sample by guiding the ions to a mass spectrometer through an interface consisting of a nozzle and a skimmer and detecting them. The above-mentioned problem is solved by disposing a light scattering prevention section consisting of a plurality of light scattering prevention plates around the ion path from the skimmer to the mass spectrometer detector.

く作用〉 本発明は次のように作用する。即ち、気化された試料が
高周波誘導結合プラズマの中に導入されてイオン化や発
光が行われると、該プラズマ内のイオンは、ノズル、ス
キマー、および引出しZ ’Fkを経由してのちイオン
レンズ(若しくはダブレット四重径レンズ)の間を通っ
て収束される。このとき、イオンが通る通路上で散乱さ
れた光は光散乱防止部で散乱が防止され(例えば吸収さ
れるなどして光散乱が防止される)、該散乱光がイオン
が通る通路に再び戻るようなことはない、従って、質量
分析計の光ノイズが低下する。
Function> The present invention functions as follows. That is, when a vaporized sample is introduced into a high-frequency inductively coupled plasma to undergo ionization and light emission, the ions in the plasma pass through a nozzle, skimmer, and drawer Z'Fk, and then pass through an ion lens (or It is focused through a doublet (quadruple diameter lens). At this time, the light scattered on the path that the ions pass through is prevented from scattering by the light scattering prevention part (for example, it is absorbed and light scattering is prevented), and the scattered light returns to the path that the ions take. This is not the case, thus reducing the optical noise of the mass spectrometer.

〈実施例〉 以下、本発明について図を用いて詳細に説明する。第1
図は本発明実施例の構成説明図であり、図中、第3図と
同一記号は同一意味を持たせて使用しここでの重複説明
は省略する。また、第2図は光散乱防止部を示す本発明
実施例の要部構成斜視図である。第1図及び第2図にお
いて、21は黒色の表面処理が施された複数の光散乱防
止板、22a〜22nからなりスキマー9からマスフィ
ルタ16に至るイオンの通路周辺に配設された光散乱防
止部である。
<Example> Hereinafter, the present invention will be described in detail using the drawings. 1st
The figure is an explanatory diagram of the configuration of an embodiment of the present invention, and in the figure, the same symbols as in FIG. 3 are used with the same meaning, and repeated explanation here will be omitted. Moreover, FIG. 2 is a perspective view of the main part configuration of the embodiment of the present invention showing a light scattering prevention section. In FIGS. 1 and 2, reference numeral 21 indicates a plurality of light scattering prevention plates 22a to 22n with black surface treatment, and light scattering plates arranged around the ion path from the skimmer 9 to the mass filter 16. This is the prevention part.

このような構成からなる本発明の実施例において、気化
された試料か第1図の高周波誘導結合プラズマ7の中に
導入されてイオン化や発光が行われると、該プラズマ7
内のイオンは、ノズル8゜スキマー9.及び引出し電極
9−を経由してのちイオンレンズ14a、14b(若し
くはダブレット四重極レンズ)の間を通って収束される
。このとき、イオンが通る通路上で散乱された光は光散
乱防止部21で散乱が防止され(例えば吸収されるなど
して光散乱が防止される)るなめ、散乱光がイオンの通
る通路に再び戻るようなことはない。
In the embodiment of the present invention having such a configuration, when a vaporized sample is introduced into the high-frequency inductively coupled plasma 7 shown in FIG. 1 and ionization and light emission are performed, the plasma 7
The ions in the nozzle 8° skimmer 9. After passing through the extraction electrode 9- and the ion lenses 14a and 14b (or doublet quadrupole lens), it is focused. At this time, the light scattered on the path through which the ions pass is prevented from scattering by the light scattering prevention unit 21 (for example, is absorbed, thereby preventing light scattering), so that the scattered light is prevented from scattering on the path through which the ions pass. I'll never go back.

このようにして光散乱が防止されながら引出し電極9−
やイオンレンズ14a、14b (若しくはタブレット
四重極レンズ)の間を通ったイオンは、その後、マスフ
ィルタ16を通り二次電子増倍管19に導かれて検出さ
れる。この検出信号が信号処理部20に送出されて演算
・処理されることによって、前記試料中の被測定元素分
析値が求められる。
In this way, while light scattering is prevented, the extraction electrode 9-
The ions that have passed between the ion lenses 14a and 14b (or the tablet quadrupole lens) are then guided to the secondary electron multiplier 19 through the mass filter 16 and detected. This detection signal is sent to the signal processing section 20 where it is calculated and processed, thereby obtaining the analysis value of the element to be measured in the sample.

尚、本発明は上述の実施例に限定されることなく種々の
変形が可能であり、例えば光散乱防止板2fa〜2In
の形状を角錐状としても良いものとする。
It should be noted that the present invention is not limited to the above-mentioned embodiments, and can be modified in various ways, such as light scattering prevention plates 2fa to 2In.
The shape may be pyramidal.

〈発明の効果〉 以上詳しく説明したような本発明によれば、高周波誘導
結合プラズマ質量分析装置において、黒色の表面処理が
施された複数の光散乱防止板からなる光散乱防止部を前
記スキマーから質量分析計検出器に至るイオンの通路周
辺に配設したなめ、センターチャンバーの壁等からの散
乱光が質量分析計検出器に入射しないような高周波誘導
結合プラズマ質量分析装置が実現する。
<Effects of the Invention> According to the present invention as described in detail above, in a high-frequency inductively coupled plasma mass spectrometer, a light scattering prevention section consisting of a plurality of light scattering prevention plates with a black surface treatment is removed from the skimmer. A high-frequency inductively coupled plasma mass spectrometer is realized in which scattered light from the walls of the central chamber and the like disposed around the ion path leading to the mass spectrometer detector does not enter the mass spectrometer detector.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例の構成説明図、第2図は本発明実
施例の要部構成斜視図、第3図は従来例の構成説明図で
ある。 1・・・・・・プラズマトーチ、2・・・・・・流量制
御部、3・・・・・・アルゴンガス供給源、4・・・・
・・試料セル、6・・・・・・高周波誘導コイル、 7・・・・・・高周波誘導結合プラズマ、8・・・・・
・ノズル、9・・・・・・スキマー、16・・・・・・
マスフィルタ、17・・・・・・リアチャンバー、20
・・・・・・信号処理部、21・・・・・・光散乱防止
部、 21a〜2in・・・・・・光散乱防止板化 理 人 弁 理 士
FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention, FIG. 2 is a perspective view of the main part configuration of the embodiment of the invention, and FIG. 3 is an explanatory diagram of the configuration of a conventional example. 1... Plasma torch, 2... Flow rate control unit, 3... Argon gas supply source, 4...
...Sample cell, 6...High frequency induction coil, 7...High frequency inductively coupled plasma, 8...
・Nozzle, 9... Skimmer, 16...
Mass filter, 17... Rear chamber, 20
...Signal processing unit, 21...Light scattering prevention section, 21a~2in...Light scattering prevention board, patent attorney

Claims (1)

【特許請求の範囲】[Claims]  高周波誘導コイルに高周波エネルギーを供給し高周波
磁界を形成して高周波誘導結合プラズマを生じさせ、該
プラズマを用いて試料を励起してイオンを生じさせ、該
イオンをノズルとスキマーからなるインターフェイスを
介して質量分析計に導いて検出することにより、前記試
料中の被測定元素を分析する高周波誘導結合プラズマ質
量分析装置において、黒色の表面処理が施された複数の
光散乱防止板からなる光散乱防止部を前記スキマーから
質量分析計検出器に至るイオンの通路周辺に配設したこ
とを特徴とする高周波誘導結合プラズマ質量分析装置。
High frequency energy is supplied to a high frequency induction coil to form a high frequency magnetic field to generate a high frequency inductively coupled plasma, the plasma is used to excite the sample to generate ions, and the ions are transferred through an interface consisting of a nozzle and a skimmer. In a high-frequency inductively coupled plasma mass spectrometer that analyzes the element to be measured in the sample by guiding it to a mass spectrometer and detecting it, a light scattering prevention section consisting of a plurality of light scattering prevention plates each having a black surface treatment is used. A high frequency inductively coupled plasma mass spectrometer, characterized in that: is arranged around the ion path from the skimmer to the mass spectrometer detector.
JP1253509A 1989-09-28 1989-09-28 High frequency inductively coupled plasma mass spectrometer Pending JPH03114131A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1253509A JPH03114131A (en) 1989-09-28 1989-09-28 High frequency inductively coupled plasma mass spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1253509A JPH03114131A (en) 1989-09-28 1989-09-28 High frequency inductively coupled plasma mass spectrometer

Publications (1)

Publication Number Publication Date
JPH03114131A true JPH03114131A (en) 1991-05-15

Family

ID=17252365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1253509A Pending JPH03114131A (en) 1989-09-28 1989-09-28 High frequency inductively coupled plasma mass spectrometer

Country Status (1)

Country Link
JP (1) JPH03114131A (en)

Similar Documents

Publication Publication Date Title
JPH05251038A (en) Plasma ion mass spectrometry device
US6833710B2 (en) Probe assembly for detecting an ion in a plasma generated in an ion source
JPH03114131A (en) High frequency inductively coupled plasma mass spectrometer
JP2792140B2 (en) High frequency inductively coupled plasma mass spectrometer
JPH0638372Y2 (en) High frequency inductively coupled plasma mass spectrometer
JP4164027B2 (en) Apparatus and method for elemental mass spectrometry
JPH0465059A (en) High frequency induction coupling plasma mass spectrograph
JP2956139B2 (en) Quadrupole mass filter
JP2953010B2 (en) High frequency inductively coupled plasma mass spectrometer
JPH0448628Y2 (en)
JP3676540B2 (en) Inductively coupled plasma mass spectrometer
JPS62202450A (en) High frequency inductive coupling plasma-mass spectrometer
JP3085381B2 (en) Plasma ionization mass spectrometer
JPH08233677A (en) Ultra-high vacuum measuring method and vacuum gauge for ultra-high vacuum
JP4038506B2 (en) Laser ablation apparatus and sample analysis apparatus
JPH05242855A (en) High-frequency inductive coupling plasma mass-spectrometer
JPH01115042A (en) Sample stand of scanning type electronic microscope
JPH0431759A (en) Method for analyzing component to be measured
JP2956164B2 (en) High frequency inductively coupled plasma mass spectrometer
JP2926949B2 (en) High frequency inductively coupled plasma mass spectrometer
JPS62208535A (en) High-frequency inductive coupling plasma/mass analyzer
JP2982189B2 (en) High frequency inductively coupled plasma mass spectrometer
JPH02170045A (en) Sample feeding device
JPH04137449A (en) High-frequency inductive coupling plasma mass spectrometer
JPS6398948A (en) High frequency inductive coupling plasma/mass spectrometer