JPH031058Y2 - - Google Patents

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Publication number
JPH031058Y2
JPH031058Y2 JP1983149044U JP14904483U JPH031058Y2 JP H031058 Y2 JPH031058 Y2 JP H031058Y2 JP 1983149044 U JP1983149044 U JP 1983149044U JP 14904483 U JP14904483 U JP 14904483U JP H031058 Y2 JPH031058 Y2 JP H031058Y2
Authority
JP
Japan
Prior art keywords
valve
line
chemical
concentrated
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983149044U
Other languages
Japanese (ja)
Other versions
JPS6058298U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14904483U priority Critical patent/JPS6058298U/en
Publication of JPS6058298U publication Critical patent/JPS6058298U/en
Application granted granted Critical
Publication of JPH031058Y2 publication Critical patent/JPH031058Y2/ja
Granted legal-status Critical Current

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  • Measurement Of Levels Of Liquids Or Fluent Solid Materials (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Description

【考案の詳細な説明】 逆浸透法による水の精製装置において逆浸透膜
の機能の維持及び精製された水の品質の維持のた
めには、精製装置自体の周期的な洗浄、消毒が必
要である。洗浄、消毒としては逆浸透膜面の物理
的汚れが発生する様な使い方の場合の汚れの洗出
しのための洗浄、スケール成分の附着がある場合
の化学溶解洗浄あるいは処理水の無菌化を維持す
る場合の消毒洗浄がある。特に無菌水の製造に際
しては透過水の貯留、供給装置での細菌汚染ある
いは端末部からの汚染等に対処するため、水を常
時流動させたり、紫外線殺菌ランプを利用する等
各種の対策を二重、三重に採用することが一般的
に行われているが、それにもかかわらず無菌状態
を保つためには周期的に逆浸透装置を含めた設備
全体の消毒洗浄が必要である。
[Detailed description of the invention] In order to maintain the function of the reverse osmosis membrane and the quality of purified water in water purification equipment using reverse osmosis, the purification equipment itself must be periodically cleaned and disinfected. be. For cleaning and disinfection, we use cleaning to remove dirt when the reverse osmosis membrane surface is physically contaminated, chemical dissolution cleaning when there is adhesion of scale components, or maintaining sterilization of treated water. There is disinfection cleaning when necessary. In particular, when producing sterile water, in order to prevent permeated water from accumulating, bacterial contamination in the supply equipment, or contamination from the terminal, various countermeasures are taken, such as constantly flowing water and using ultraviolet germicidal lamps. However, in order to maintain sterile conditions, it is necessary to periodically disinfect and clean the entire equipment, including the reverse osmosis equipment.

しかしながら薬液洗浄に際しては薬液の調整、
各種バルブの開閉と複雑な操作が必要な上、薬洗
后のリンス運転に長時間を要するため、操作技術
を習得した専門家を必要とし、しかも多大な労力
を要するという欠点があつた。本考案はかかる問
題点を解消した自動薬洗装置に関するものであ
る。
However, when cleaning chemical solutions, adjusting the chemical solution,
In addition to requiring complicated operations such as opening and closing various valves, it also takes a long time to perform the rinsing operation after washing the chemicals, so it requires an expert who has acquired operating techniques and has the disadvantage of requiring a large amount of labor. The present invention relates to an automatic chemical washing device that solves these problems.

即ち本考案の要旨は、高圧ポンプ2と逆浸透膜
3とで構成される逆浸透装置において液面制御装
置15を備えた薬液タンク9を備え、原水ライン
19に止水弁1が透過水ライン4に弁6が、濃縮
排水ライン5には調節弁16と弁17が設けら
れ、原水ライン19から弁12、吸引器13を経
由して原水を薬液タンク9に導入する薬液調整ラ
イン20が設けられ、薬液タンク9からは弁10
を有する薬液供給ライン21がでて、原水ライン
19に接続しており、さらに薬液タンク9は濃縮
排水ライン5と弁11を経由して接続しており、
透過水ライン4からは弁6の手前から、濃縮排水
ライン5からは調圧弁16と弁17の間から各々
薬液返送ラインが薬液タンク9にむけてのびてお
り、透過水ライン4と濃縮排水ラインとは弁7を
経由して接続されている逆浸透装置であり、薬洗
時には原水が薬液調整ライン20から送り込ま
れ、同時に濃厚薬液が吸引器13により薬液容器
14から送りこまれ、薬液タンク9内で液が所定
の液面に達すると液面制御装置15により検知さ
れ、該装置15からの信号により所定の弁が開閉
して透過水側と濃縮排水側とを薬液が循環して薬
洗を行い、所定時間後所定の弁が自動的に開閉し
て薬液の送液を停止するとともに原水を導入して
透過水と濃縮排水を系外に排出する薬洗とリンス
運転を自動的に行わせ得ることを特徴とする逆浸
透装置にある。
That is, the gist of the present invention is that a reverse osmosis device consisting of a high-pressure pump 2 and a reverse osmosis membrane 3 is equipped with a chemical tank 9 equipped with a liquid level control device 15, and a water stop valve 1 is connected to the raw water line 19 in the permeated water line. 4 is provided with a valve 6, the concentrated drainage line 5 is provided with a regulating valve 16 and a valve 17, and a chemical solution adjustment line 20 is provided that introduces raw water from the raw water line 19 into the chemical solution tank 9 via the valve 12 and the suction device 13. from the chemical tank 9 to the valve 10.
A chemical solution supply line 21 with
A chemical solution return line extends from the permeated water line 4 to the front of the valve 6, and a chemical solution return line extends from the concentrated drainage line 5 to the chemical solution tank 9 from between the pressure regulating valve 16 and the valve 17. is a reverse osmosis device connected via a valve 7, and during chemical washing, raw water is sent from the chemical liquid adjustment line 20, and at the same time, concentrated chemical liquid is sent from the chemical liquid container 14 by the suction device 13, and is pumped into the chemical liquid tank 9. When the liquid reaches a predetermined liquid level, it is detected by the liquid level control device 15, and a predetermined valve is opened and closed in response to a signal from the device 15, and the chemical solution circulates between the permeated water side and the concentrated waste water side to perform chemical washing. After a predetermined time, a predetermined valve automatically opens and closes to stop feeding the chemical solution, and at the same time, chemical washing and rinsing operations can be automatically performed in which raw water is introduced and permeated water and concentrated wastewater are discharged from the system. The reverse osmosis device is characterized by:

本考案においてラインとは配管等水や薬液の流
れる通路をいう。
In the present invention, a line refers to a passage such as piping through which water or a chemical solution flows.

以下本考案を実施例の図面に従つて説明する。
図面は本考案の実施例を示す系統図である。図に
おいて原水は原水ライン19により止水弁1を経
由して高圧ポンプ2に供給される。高圧ポンプに
より昇圧された原水は逆浸透膜3に供給され、膜
の透過水は透過水ライン4にて弁6を経由して採
水され、膜を透過しなかつた濃縮水は濃縮排水ラ
イン5を通つて系外に排出される。濃縮排水ライ
ン5には調圧弁16と弁17が設けられており、
調圧弁16は逆浸透膜内の原水圧力を調整するも
のである。濃縮排水弁18は薬洗時に薬液を薬液
タンク9へ戻すためのものである。透過水ライン
中の弁6は通常の透過水の流路、弁7,8はそれ
ぞれリンス液の系外への排出及び薬液の薬液タン
ク9への戻しのためのものである。弁10は薬液
循環用、弁11は薬液の系外への排出用、弁12
は薬液タンク19への薬液調製用の注水弁、吸引
器13は薬液容器14からの濃厚薬液吸入用、液
面制御装置15は薬液タンクの液面を検知してそ
の時発生する信号により弁12を制御するための
ものである。
The present invention will be described below with reference to drawings of embodiments.
The drawing is a system diagram showing an embodiment of the present invention. In the figure, raw water is supplied to a high-pressure pump 2 via a water stop valve 1 through a raw water line 19. The raw water pressurized by the high-pressure pump is supplied to the reverse osmosis membrane 3, the permeated water from the membrane is collected via the valve 6 in the permeated water line 4, and the concentrated water that has not passed through the membrane is concentrated to the concentrated drainage line 5. is discharged from the system through. The concentrated drainage line 5 is provided with a pressure regulating valve 16 and a valve 17.
The pressure regulating valve 16 is for regulating the raw water pressure within the reverse osmosis membrane. The concentration drain valve 18 is for returning the chemical liquid to the chemical liquid tank 9 during chemical washing. Valve 6 in the permeate line is a normal flow path for permeate water, and valves 7 and 8 are for discharging the rinse liquid out of the system and returning the chemical solution to the chemical tank 9, respectively. Valve 10 is for circulating the chemical solution, valve 11 is for discharging the chemical solution out of the system, valve 12
is a water injection valve for preparing a chemical solution into the chemical solution tank 19, the suction device 13 is for inhaling concentrated drug solution from the drug solution container 14, and the liquid level control device 15 detects the liquid level of the drug solution tank and controls the valve 12 according to a signal generated at that time. It is for control.

通常運転時、弁7,8,10,11,12,1
8は閉じ、弁1,6,17が開いており、原水は
逆浸透膜にて透過水と濃縮排水に分離され、透過
水は弁6を経由して貯槽又は使用個所に直接給
水、濃縮排水は弁17を経由して系外に排出され
る。
During normal operation, valves 7, 8, 10, 11, 12, 1
8 is closed, valves 1, 6, and 17 are open, and the raw water is separated into permeate water and concentrated waste water by the reverse osmosis membrane, and the permeate water is directly supplied to the storage tank or the point of use via valve 6, and the concentrated waste water is is discharged from the system via valve 17.

薬洗運転に際してはまず弁12が開き薬液調製
ライン20から薬液タンク9へ注水されると同時
に薬液容器の薬液を吸引する。薬液タンク内で薬
液が所定の液面に達すると液面制御装置15から
の信号により弁12は閉止されるとともに弁1,
6,17が閉じ、弁8,10,18が開き、高圧
ポンプ2が起動し、薬液が逆浸透装置内を循環す
る。この薬液循環運転が所定時間継続后自動的に
弁1,7,11,17を開き、弁8,10,18
を閉じ、逆浸透装置内の薬液を洗い出すためのリ
ンス運転が行われる。
During the chemical washing operation, the valve 12 is first opened and water is injected from the chemical liquid preparation line 20 into the chemical liquid tank 9, and at the same time, the chemical liquid in the chemical liquid container is sucked. When the chemical solution reaches a predetermined level in the chemical tank, the valve 12 is closed by a signal from the liquid level control device 15, and the valves 1,
6, 17 are closed, valves 8, 10, 18 are opened, high pressure pump 2 is activated, and the chemical solution circulates within the reverse osmosis device. After this chemical solution circulation operation continues for a predetermined time, valves 1, 7, 11, and 17 are automatically opened, and valves 8, 10, and 18 are automatically opened.
is closed, and a rinsing operation is performed to wash out the chemical solution inside the reverse osmosis device.

すなわち薬液タンク内の薬液は弁11を通じて
系外へ排出され、装置内に残留した薬液は弁1を
通じて装置内にとりこまれた原水により透過水ラ
イン4及び濃縮排水ライン5共洗い出される。所
定時間継続后は自動的に弁7,11を閉じ、弁
6,17を開き通常の運転状態に戻る。
That is, the chemical liquid in the chemical liquid tank is discharged to the outside of the system through the valve 11, and the chemical liquid remaining in the apparatus is washed out together with the permeated water line 4 and the concentrated drainage line 5 by the raw water introduced into the apparatus through the valve 1. After a predetermined period of time, the valves 7 and 11 are automatically closed and the valves 6 and 17 are opened to return to the normal operating state.

本考案は以上の如き構成からなるものであるか
ら、薬洗運転開始のスイツチ操作のみで、複雑な
操作と長時間を要する薬洗運転を簡単に行わせる
ことができ、かつ薬洗運転完了后は自動的に通常
運転に復帰させることができる。また薬洗運転条
件に合せ薬液循環時間及びリンス運転時間をタイ
マーにより容易にかつ任意に設定することが出来
る。さらには危険薬品の使用に際しても取扱い容
易で危険の少い装置を提供しうる。
Since the present invention has the above-mentioned configuration, a chemical washing operation that requires complicated operations and a long time can be easily performed by simply operating a switch to start a chemical washing operation, and after the chemical washing operation is completed, the chemical washing operation can be easily performed. can automatically return to normal operation. Further, the chemical circulation time and the rinsing operation time can be easily and arbitrarily set according to the chemical washing operation conditions using a timer. Furthermore, it is possible to provide an apparatus that is easy to handle and has little risk when using dangerous chemicals.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の実施例を示す系統図である。 1……止水弁、2……高圧ポンプ、3……逆浸
透膜、4……透過水ライン、5……濃縮排水ライ
ン、6,7,8,10,11,12,17,18
……弁、13……吸引器、14……薬液容器、1
5……液面制御装置、16……調圧弁、19……
原水ライン、20……薬液調整ライン、21……
薬液供給ライン。
The drawing is a system diagram showing an embodiment of the present invention. 1...Water stop valve, 2...High pressure pump, 3...Reverse osmosis membrane, 4...Permeated water line, 5...Concentrated drainage line, 6, 7, 8, 10, 11, 12, 17, 18
...Valve, 13...Suction device, 14...Medicine container, 1
5...Liquid level control device, 16...Pressure regulating valve, 19...
Raw water line, 20... Chemical solution adjustment line, 21...
Chemical supply line.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 高圧ポンプ2と逆浸透膜3とで構成される逆浸
透装置において原水ライン19に止水弁1が、透
過水ライン4に弁6が、濃縮排水ライン5に調圧
弁16と弁17が設けられ、液面制御装置15を
備えた薬液タンク9が弁10を有する薬液供給ラ
イン21と、吸引器13と弁12とを有する薬液
調整ライン20との2本のラインで原水ラインと
接続され、該薬液タンク9はさらに弁8を有する
透過水薬液返送ラインで透過水ライン4と接続さ
れ、かつ濃縮排水ライン5とは弁18を有する濃
縮排水側薬液返送ラインと弁11を有する排薬液
ラインとの2本のラインで接続されており、透過
水ライン4と濃縮排水ライン5とは弁7を経由し
て接続されており、液面制御装置からの信号及び
該信号発生後所定時間でこれらの弁を自動的に開
閉させることにより、薬液を逆浸透膜の透過水側
及び濃縮排水側に循環させ、ついで薬洗後原水を
受け入れ、透過水、濃縮排水共系外に排出させる
リンス運転を自動的に行わせ得ることを特徴とす
る逆浸透装置。
In a reverse osmosis device composed of a high-pressure pump 2 and a reverse osmosis membrane 3, a water stop valve 1 is provided in the raw water line 19, a valve 6 is provided in the permeated water line 4, and a pressure regulating valve 16 and a valve 17 are provided in the concentrated drainage line 5. A chemical liquid tank 9 equipped with a liquid level control device 15 is connected to the raw water line through two lines: a chemical liquid supply line 21 having a valve 10 and a chemical liquid adjustment line 20 having an aspirator 13 and a valve 12. The chemical tank 9 is further connected to the permeated water line 4 through a permeated water chemical return line having a valve 8, and the concentrated drainage line 5 is connected to a concentrated drainage side chemical return line having a valve 18 and a drained chemical liquid line having a valve 11. The permeated water line 4 and the concentrated waste water line 5 are connected via a valve 7, and these valves are activated by a signal from the liquid level control device and at a predetermined time after the signal is generated. By automatically opening and closing, the chemical solution is circulated to the permeated water side and the concentrated wastewater side of the reverse osmosis membrane, and then the raw water after chemical washing is accepted, and the rinse operation is automatically performed in which the permeated water and concentrated wastewater are discharged to the outside of the system. A reverse osmosis device characterized in that it can perform osmosis.
JP14904483U 1983-09-27 1983-09-27 Automatic chemical washing type reverse osmosis equipment Granted JPS6058298U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14904483U JPS6058298U (en) 1983-09-27 1983-09-27 Automatic chemical washing type reverse osmosis equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14904483U JPS6058298U (en) 1983-09-27 1983-09-27 Automatic chemical washing type reverse osmosis equipment

Publications (2)

Publication Number Publication Date
JPS6058298U JPS6058298U (en) 1985-04-23
JPH031058Y2 true JPH031058Y2 (en) 1991-01-14

Family

ID=30330963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14904483U Granted JPS6058298U (en) 1983-09-27 1983-09-27 Automatic chemical washing type reverse osmosis equipment

Country Status (1)

Country Link
JP (1) JPS6058298U (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0691990B2 (en) * 1985-10-23 1994-11-16 東レ株式会社 Purified water production equipment
JP5710655B2 (en) * 2013-01-10 2015-04-30 株式会社東芝 Seawater desalination equipment

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109179A (en) * 1974-02-06 1975-08-28
JPS5190984A (en) * 1975-02-04 1976-08-10 Gyakushintokinoyona makubunrikyojidofuratsushingushisutemu
JPS5763102A (en) * 1980-09-30 1982-04-16 Hitachi Plant Eng & Constr Co Ltd Membrane separator

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56151694U (en) * 1980-04-07 1981-11-13

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109179A (en) * 1974-02-06 1975-08-28
JPS5190984A (en) * 1975-02-04 1976-08-10 Gyakushintokinoyona makubunrikyojidofuratsushingushisutemu
JPS5763102A (en) * 1980-09-30 1982-04-16 Hitachi Plant Eng & Constr Co Ltd Membrane separator

Also Published As

Publication number Publication date
JPS6058298U (en) 1985-04-23

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