JPH0299961U - - Google Patents
Info
- Publication number
- JPH0299961U JPH0299961U JP716389U JP716389U JPH0299961U JP H0299961 U JPH0299961 U JP H0299961U JP 716389 U JP716389 U JP 716389U JP 716389 U JP716389 U JP 716389U JP H0299961 U JPH0299961 U JP H0299961U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- sample
- thin film
- film
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims 3
- 239000010408 film Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP716389U JPH0299961U (et) | 1989-01-25 | 1989-01-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP716389U JPH0299961U (et) | 1989-01-25 | 1989-01-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0299961U true JPH0299961U (et) | 1990-08-09 |
Family
ID=31211950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP716389U Pending JPH0299961U (et) | 1989-01-25 | 1989-01-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0299961U (et) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009157228A1 (ja) * | 2008-06-26 | 2009-12-30 | キヤノンアネルバ株式会社 | スパッタリング装置、スパッタリング方法及び発光素子の製造方法 |
| JP2021123749A (ja) * | 2020-02-05 | 2021-08-30 | アリオス株式会社 | 反応性スパッタ装置 |
-
1989
- 1989-01-25 JP JP716389U patent/JPH0299961U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009157228A1 (ja) * | 2008-06-26 | 2009-12-30 | キヤノンアネルバ株式会社 | スパッタリング装置、スパッタリング方法及び発光素子の製造方法 |
| JP2021123749A (ja) * | 2020-02-05 | 2021-08-30 | アリオス株式会社 | 反応性スパッタ装置 |