JPH0294252U - - Google Patents
Info
- Publication number
- JPH0294252U JPH0294252U JP326989U JP326989U JPH0294252U JP H0294252 U JPH0294252 U JP H0294252U JP 326989 U JP326989 U JP 326989U JP 326989 U JP326989 U JP 326989U JP H0294252 U JPH0294252 U JP H0294252U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- chamber
- rod
- processing chamber
- side valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005192 partition Methods 0.000 claims 3
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP326989U JPH0726362Y2 (ja) | 1989-01-13 | 1989-01-13 | 真空処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP326989U JPH0726362Y2 (ja) | 1989-01-13 | 1989-01-13 | 真空処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0294252U true JPH0294252U (enExample) | 1990-07-26 |
| JPH0726362Y2 JPH0726362Y2 (ja) | 1995-06-14 |
Family
ID=31204757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP326989U Expired - Lifetime JPH0726362Y2 (ja) | 1989-01-13 | 1989-01-13 | 真空処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0726362Y2 (enExample) |
-
1989
- 1989-01-13 JP JP326989U patent/JPH0726362Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0726362Y2 (ja) | 1995-06-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |