JPH0293335A - Semiconductor type pressure sensor - Google Patents

Semiconductor type pressure sensor

Info

Publication number
JPH0293335A
JPH0293335A JP63244203A JP24420388A JPH0293335A JP H0293335 A JPH0293335 A JP H0293335A JP 63244203 A JP63244203 A JP 63244203A JP 24420388 A JP24420388 A JP 24420388A JP H0293335 A JPH0293335 A JP H0293335A
Authority
JP
Japan
Prior art keywords
pressure
thermocouple
atmosphere
sensitive element
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63244203A
Other languages
Japanese (ja)
Inventor
Toshisuke Hishii
菱井 利祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63244203A priority Critical patent/JPH0293335A/en
Publication of JPH0293335A publication Critical patent/JPH0293335A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the deterioration of characteristics by atmospheric moisture by hermetically confining the atmosphere on the circuit pattern forming side of a pressure-sensitive elements and providing a thermocouple in the formed hermetically closed chamber. CONSTITUTION:A cap 7 is fixed to the upper part of a stem 3 by an adhesive and the atmosphere is hermetically confined on the surface side of a pressure- sensitive element 1 to form a hermetically closed chamber 8 and the thermocouple 6 is mounted in said chamber 8 in order to measure the internal temp. thereof. The temp. of the chamber 8 is cleared by the thermocouple 6 and the effect thereof is removed by data processing and output caused only by pressure to be measured is obtained. Since the element 1 is hermetically closed on the surface side thereof, the element 1 receives no effect of the open air. By this method, the deterioration of characteristics due to the moisture contained in the atmosphere can be prevented.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体式圧力センサに関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a semiconductor pressure sensor.

特に、大気中に含まれる水分等による特性劣化を防ぐこ
とのできるゲージ圧力測定用の半導体式圧力センサに関
するものである。
In particular, the present invention relates to a semiconductor pressure sensor for measuring gauge pressure that can prevent characteristic deterioration due to moisture contained in the atmosphere.

[従来の技術] 従来の半導体式圧力センサは、その原理上、大気やその
他の気体をセンサチップ表面に導入するる水分や腐食性
物質の影響によって、アルミ配線の腐食や圧力感度特性
の劣化が起りやすいことが知られている。
[Conventional technology] Conventional semiconductor pressure sensors, in principle, suffer from corrosion of aluminum wiring and deterioration of pressure sensitivity characteristics due to the influence of moisture and corrosive substances introduced into the sensor chip surface by atmospheric air or other gases. It is known to occur easily.

そこで、従来、ゲージ圧測定用の半導体式圧力センサに
おいては、感圧素子の回路パタン形成面側をゲル状シリ
コーンで覆ったうえで大気に開放しである。また、被測
定気体圧力は、パー、ケージの圧力導入ポートを通して
、感圧素子の裏面から導入するようにしである。このよ
うに、被測定気体圧力を感圧素子の裏面から導入するこ
とにより、その水分等の影響は1回路パタン形成面であ
るところの感圧素子の表面に及ばないようになっている
Therefore, conventionally, in semiconductor pressure sensors for measuring gauge pressure, the circuit pattern-forming surface side of the pressure-sensitive element is covered with gel-like silicone and then exposed to the atmosphere. Further, the gas pressure to be measured is introduced from the back side of the pressure sensitive element through the pressure introduction port of the cage. In this way, by introducing the gas pressure to be measured from the back surface of the pressure sensitive element, the influence of moisture etc. does not reach the surface of the pressure sensitive element, which is the surface on which one circuit pattern is formed.

[解決すべき課題] 上述した従来の半導体式圧力センサは、大気に開放され
ている側が、ゲル状シリコーンで覆われているのではあ
るが、ゲル状シリコーンは、多少の透湿性があるため、
大気に含まれる水分等の影響がセンサチップ表面に及び
、アルミ配線の腐食や圧力感度特性の劣化が起こりやす
いという問題点があった。
[Problems to be Solved] In the conventional semiconductor pressure sensor described above, the side exposed to the atmosphere is covered with gel silicone, but gel silicone has some moisture permeability, so
There is a problem in that the sensor chip surface is affected by moisture contained in the atmosphere, which tends to cause corrosion of the aluminum wiring and deterioration of pressure sensitivity characteristics.

本発明は上述した問題点にかんがみてなされたもので、
大気中に含まれる水分等による特性劣化のないゲージ圧
力測定用の半導体式圧力センサの提供を目的とする。
The present invention has been made in view of the above-mentioned problems.
The object of the present invention is to provide a semiconductor pressure sensor for measuring gauge pressure that is free from characteristic deterioration due to moisture contained in the atmosphere.

[課題の解決手段] 上記目的を達成するために本発明の半導体式圧力センサ
は、ダイアフラムを有する感圧素子の回路パタン形成面
側を大気圧に密閉して密閉室を形成するとともに、この
密閉室の内部に熱電体を設けた構成としである。
[Means for Solving the Problems] In order to achieve the above object, the semiconductor pressure sensor of the present invention seals the circuit pattern forming surface side of a pressure sensitive element having a diaphragm to atmospheric pressure to form a sealed chamber, and also forms a sealed chamber. The structure is such that a thermoelectric body is provided inside the chamber.

[実施例] 以下、本発明の実施例について図面を参照して説明する
[Examples] Examples of the present invention will be described below with reference to the drawings.

く第1実施例〉 第1図は本発明の第1実施例の縦断面図、第2図は感圧
素子の斜視断面図である。
First Embodiment> FIG. 1 is a longitudinal sectional view of a first embodiment of the present invention, and FIG. 2 is a perspective sectional view of a pressure-sensitive element.

本実施例の特徴とする点は、ダイアフラムを有する感圧
素子の回路パタン形成面側を密閉する構造として、大気
圧に等しい気体圧力を密閉する点、および密閉室内部に
熱電対を設置する点にある。
The features of this embodiment are that the structure seals the circuit pattern forming side of the pressure sensitive element having a diaphragm to seal gas pressure equal to atmospheric pressure, and that a thermocouple is installed inside the sealed chamber. It is in.

第1図において、1は感圧素子、2は台座、3はステム
、4は圧力導入ポート、5はリード端子、6は熱電対、
7はキャップ、8は密閉室である。
In FIG. 1, 1 is a pressure sensitive element, 2 is a pedestal, 3 is a stem, 4 is a pressure introduction port, 5 is a lead terminal, 6 is a thermocouple,
7 is a cap, and 8 is a sealed chamber.

感圧素子lは、シリコン単結晶10からなり、第2図に
示すように裏面から化学的エツチングあるいは機械的研
磨によりダイアフラム11が形成されている0表面側に
は、拡散抵抗12およびアルミ配線13が施され、ブリ
ッジ回路が形成されている。
The pressure sensitive element 1 is made of a silicon single crystal 10, and as shown in FIG. 2, a diaphragm 11 is formed from the back side by chemical etching or mechanical polishing, and a diffused resistor 12 and an aluminum wiring 13 are formed on the front side. is applied to form a bridge circuit.

台座2は、ステム3と感圧素子1との熱膨張係数の差異
による熱歪の影響を低減するため、シリコンの熱膨張係
数とほぼ等しいパイレックスガラスからなっている。こ
の台座2は、感圧素子1と静電接若法により接着されて
おり、また、接着剤によってステム3に固定されている
The pedestal 2 is made of Pyrex glass, which has a coefficient of thermal expansion approximately equal to that of silicon, in order to reduce the influence of thermal distortion due to the difference in coefficient of thermal expansion between the stem 3 and the pressure-sensitive element 1. This pedestal 2 is bonded to the pressure sensitive element 1 by electrostatic welding, and is also fixed to the stem 3 with an adhesive.

キャップ7は接着剤によってステム3の上部に固定され
、感圧素子lの表面側に大気を密閉して、密閉室8を形
成している。
The cap 7 is fixed to the upper part of the stem 3 with an adhesive to seal off the atmosphere on the surface side of the pressure sensitive element 1, thereby forming a sealed chamber 8.

この密閉室8の内部温度を測定するために熱電対6が設
置されている。
A thermocouple 6 is installed to measure the internal temperature of this sealed chamber 8.

次に、このような半導体式圧力センサの動作について説
明する。
Next, the operation of such a semiconductor pressure sensor will be explained.

本実施例において、密閉室8の圧力はボイルシャルルの
法則から明らかなように温度に比例して増加することと
なるが、熱電対6によって密閉室8内の温度を知ること
ができるため、マイクロコンピュータ等によって、デー
タ処理することにより、この影響を除去し、被測定圧力
だけに起因した出力を知ることができる。
In this embodiment, the pressure in the sealed chamber 8 increases in proportion to the temperature as is clear from Boyle-Charles' law, but since the temperature inside the sealed chamber 8 can be determined by the thermocouple 6, the pressure in the sealed chamber 8 increases in proportion to the temperature. By processing the data using a computer or the like, this influence can be removed and the output caused only by the measured pressure can be known.

そして、感圧素子lの表面側は密閉されているので、密
閉室8に封入する大気を乾燥しておけば、外部環境が高
湿度雰囲気になっても、その影1を受けることはない。
Since the surface side of the pressure-sensitive element 1 is sealed, if the air sealed in the sealed chamber 8 is kept dry, even if the external environment becomes a high-humidity atmosphere, the pressure-sensitive element 1 will not be affected by the air.

く第2実施例〉 第3図は本発明の第2実施例の縦断面図、第4図は感圧
素子の斜視断面図である。これらの図において、前記第
1実施例と同様な部分については同じ符号を付して、そ
の説明は省略する。
Second Embodiment FIG. 3 is a longitudinal sectional view of a second embodiment of the present invention, and FIG. 4 is a perspective sectional view of a pressure-sensitive element. In these figures, the same parts as in the first embodiment are designated by the same reference numerals, and the explanation thereof will be omitted.

本実施例が前記第1実施例と異なっている点は、第4図
に明示するように、熱電対14を、感圧素子1の表面に
真空蒸着あるいはスパッタリング法により異種金属を蒸
着することによって形成した薄膜熱電対とした点にある
The difference between this embodiment and the first embodiment is that, as clearly shown in FIG. The point is that the thin film thermocouple was formed.

この実施例においては、薄膜熱電対14により、シリコ
ンlOの表面の温度を直接に測ることができるため、密
閉室8内部の温度を、より正確にデータ処理し、温度補
正することができるという利点がある。
In this embodiment, the thin film thermocouple 14 can directly measure the temperature of the surface of the silicon IO, so the advantage is that the temperature inside the sealed chamber 8 can be more accurately processed and corrected. There is.

また、拡散抵抗12やアルミ配線13を形成する際に用
いるプレーナφプロセスの延長として熱電対14を形成
することができるので、より作り易くなるという利点が
ある。
Further, since the thermocouple 14 can be formed as an extension of the planar φ process used when forming the diffused resistor 12 and the aluminum wiring 13, there is an advantage that it is easier to manufacture.

[発明の効果] 以上説明したように本発明は、ダイアフラムを有する電
圧素子の回路パタン形成面側を大気圧に密閉して密閉室
を形成するとともに、この密閉室の内部に熱電体を設け
ることにより、大気中に含まれる水分等による特性劣化
のないゲージ圧力測定用の半導体式圧力センサを得るこ
とができるという効果がある。
[Effects of the Invention] As explained above, the present invention includes forming a sealed chamber by sealing the circuit pattern forming surface side of a voltage element having a diaphragm to atmospheric pressure, and providing a thermoelectric body inside this sealed chamber. This has the effect that it is possible to obtain a semiconductor pressure sensor for measuring gauge pressure that is free from characteristic deterioration due to moisture contained in the atmosphere.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1実施例の縦断面図、第2図は同上
感圧素子の斜視断面図、第3図は本発明の第2実施例の
縦断面図、第4図は同上感圧素子の斜視断面図である。 1:感圧素子 2二台座 3:ステム 4:圧力導入ポート 5:リード端子 6:熱電対 7:キャップ 8:密閉室 lO:シリコン
FIG. 1 is a longitudinal cross-sectional view of the first embodiment of the present invention, FIG. 2 is a perspective cross-sectional view of the same pressure-sensitive element, FIG. 3 is a longitudinal cross-sectional view of the second embodiment of the present invention, and FIG. 4 is the same as the above. FIG. 2 is a perspective cross-sectional view of a pressure sensitive element. 1: Pressure sensitive element 2 2 Pedestal 3: Stem 4: Pressure introduction port 5: Lead terminal 6: Thermocouple 7: Cap 8: Sealed chamber 1O: Silicon

Claims (1)

【特許請求の範囲】[Claims] ダイアフラムを有する感圧素子の回路パタン形成面側を
大気圧に密閉して密閉室を形成するとともに、この密閉
室の内部に熱電体を設けたことを特徴とする半導体式圧
力センサ。
A semiconductor pressure sensor characterized in that a circuit pattern forming surface side of a pressure sensitive element having a diaphragm is sealed to atmospheric pressure to form a sealed chamber, and a thermoelectric body is provided inside the sealed chamber.
JP63244203A 1988-09-30 1988-09-30 Semiconductor type pressure sensor Pending JPH0293335A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63244203A JPH0293335A (en) 1988-09-30 1988-09-30 Semiconductor type pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63244203A JPH0293335A (en) 1988-09-30 1988-09-30 Semiconductor type pressure sensor

Publications (1)

Publication Number Publication Date
JPH0293335A true JPH0293335A (en) 1990-04-04

Family

ID=17115304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63244203A Pending JPH0293335A (en) 1988-09-30 1988-09-30 Semiconductor type pressure sensor

Country Status (1)

Country Link
JP (1) JPH0293335A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007271379A (en) * 2006-03-30 2007-10-18 Denso Corp Semiconductor device, sensor device, and method for manufacturing semiconductor device
JP2008156854A (en) * 2006-12-21 2008-07-10 Takuo Yukimoto Anti-slip mechanism of stepped-type gently-sloped sea bank

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007271379A (en) * 2006-03-30 2007-10-18 Denso Corp Semiconductor device, sensor device, and method for manufacturing semiconductor device
JP2008156854A (en) * 2006-12-21 2008-07-10 Takuo Yukimoto Anti-slip mechanism of stepped-type gently-sloped sea bank

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