JPS63195537A - Absolute pressure type semiconductor pressure sensor - Google Patents

Absolute pressure type semiconductor pressure sensor

Info

Publication number
JPS63195537A
JPS63195537A JP2790387A JP2790387A JPS63195537A JP S63195537 A JPS63195537 A JP S63195537A JP 2790387 A JP2790387 A JP 2790387A JP 2790387 A JP2790387 A JP 2790387A JP S63195537 A JPS63195537 A JP S63195537A
Authority
JP
Japan
Prior art keywords
pressure
substrate
sensing chip
pressure sensing
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2790387A
Other languages
Japanese (ja)
Other versions
JPH0567168B2 (en
Inventor
Fukashi Kibune
木船 深志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2790387A priority Critical patent/JPS63195537A/en
Publication of JPS63195537A publication Critical patent/JPS63195537A/en
Publication of JPH0567168B2 publication Critical patent/JPH0567168B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To obtain a pressure sensor which consists of the small number of components and does not require high-level technique for machining, fixation, etc., by fixing a silicon pressure sensing chip which has a gauge resistance at a diaphragm part on a substrate made of AlN. CONSTITUTION:The pressure sensing chip is fixed on the AlN substrate whose heat expansion coefficient is approximately equal to that of silicon as the material of the pressure sensing chip, and the periphery of the substrate 6 is formed by resin molding and coupled airtightly with a lid body 7 where a pressure introducing pipe part 2 is united. Consequently, the pressure in the internal space 3 of a container is held equal to pressure to be measured which is applied from the part 2. The space 8 between the diaphragm part of the pressure sensing chip 1 and the substrate 6, on the other hand, becomes a reference pressure chamber, which is evacuated or charged with constant-pressure gas. A thick film wiring circuit 4 is formed of a printed thick film on the surface of the AlN substrate 6 to constitute an amplifying circuit, etc., which is connected to the terminal of the pressure sensing chip 1 by a thin wire 5. The thin film wiring circuit 4 is provided on the external surface of the substrate 6 as well. Consequently, the number of components is decreased and the sensor which does not require high-level technique for machining and fixation is obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、シリコン板のゲージ抵抗が形成されたダイヤ
フラム部の一面に基準圧力、他面に測定圧力を加える絶
対圧形半導体圧力センサに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an absolute pressure type semiconductor pressure sensor that applies a reference pressure to one side of a diaphragm portion on which a gauge resistor of a silicon plate is formed, and a measurement pressure to the other side.

〔従来の技術〕[Conventional technology]

従来の絶対圧形半導体圧力センサの一般的構造は、第2
図に示すようにゲージ抵抗を形成したダイヤフラム部を
有するシリコン感圧チップ1が、シリコンに近似した熱
膨張係数をもつ耐熱ガラスあるいはシリコン等からなる
台座11を介して測定圧力が導かれる導圧管2に固定さ
れ、その導圧管が気密に貫通する底部12と蓋部13か
らなり、内部空間3が圧力基準室となる容器内に収容さ
れている。これは、例えば−40〜120℃の範囲の温
度変化において、感圧チップとそれを支持する支持体と
の間の熱膨張係数の相違による応力がダイヤフラム部に
加わり、ダイヤフラムを変形させてあたかも測定圧力が
加わり変形させた場合と同様の結果となるのを防ぐもの
である。さらに、容器内には増幅回路などの制御回路を
構成する厚膜配線回路4を形成したり203などのセラ
ミック基板14が収容され、その厚膜配線回路はチップ
lの端子とり、^りなどの細&j15のボンディングに
より接続されている。
The general structure of a conventional absolute pressure type semiconductor pressure sensor is that
As shown in the figure, a silicon pressure-sensitive chip 1 having a diaphragm portion with a gauge resistance formed thereon is guided through a pressure impulse tube 2 through a pedestal 11 made of heat-resistant glass, silicon, or the like having a coefficient of thermal expansion similar to that of silicon. It is housed in a container that is fixed to a container and has a bottom portion 12 and a lid portion 13, through which a pressure guiding tube passes through in an airtight manner, and an internal space 3 serving as a pressure reference chamber. For example, when the temperature changes in the range of -40 to 120 degrees Celsius, stress due to the difference in thermal expansion coefficient between the pressure-sensitive chip and the support that supports it is applied to the diaphragm, deforming the diaphragm and making measurements as if it were This prevents the same result as when pressure is applied to deform the material. Furthermore, a ceramic substrate 14 such as 203 is housed in which a thick film wiring circuit 4 forming a control circuit such as an amplifier circuit is formed, and the thick film wiring circuit is used for connecting the terminals of the chip l, etc. They are connected by fine & j15 bonding.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、上記の構造では特別な材料からなり、細孔を開
ける必要がある台座11が用いられるので費用がかかり
、また感圧チップ1と台座11および台座11と導圧管
2との気密な接着が必要で、高度の技術を必要とするな
どコスト高の要因を含んでいる。
However, in the above structure, the pedestal 11 is made of a special material and requires opening of pores, which is expensive, and also requires airtight adhesion between the pressure-sensitive chip 1 and the pedestal 11 and between the pedestal 11 and the impulse tube 2. This includes high cost factors such as the need for advanced technology.

本発明の目的は、上述の問題を解決して、部品点数が少
なく加工、固着等に高度の技術を必要としない絶対圧形
半導体圧力センサを提供することにある。
An object of the present invention is to solve the above-mentioned problems and provide an absolute pressure type semiconductor pressure sensor that has a small number of parts and does not require advanced technology for processing, fixing, etc.

〔問題点を解決するための手段〕[Means for solving problems]

上記の目的を達成するために、本発明は、一面側の中央
に凹部を形成してなるダイヤフラム部にゲージ抵抗を備
えたシリコン感圧チップが窒化アルミニウム IN)か
らなる基板上に凹部を基板側にして固着され、その基板
は感圧口を有する蓋体と気密に結合されてかつ基板面上
に厚膜配線回路が形成されるものとする。
In order to achieve the above object, the present invention provides a silicon pressure-sensitive chip having a gauge resistor in a diaphragm portion formed by forming a recess in the center of one side on a substrate made of aluminum nitride. The substrate is hermetically connected to a lid having a pressure-sensitive port, and a thick film wiring circuit is formed on the surface of the substrate.

(作用〕 上記のような構造とすることにより、感圧チップのダイ
ヤフラム部とMN基板との間の空間が基準圧力室となり
、基板と蓋体との間の空間に蓋体の導圧口から測定圧力
を導くことによりダイヤフラム部が変形し、圧力を検知
することができる。
(Function) With the above structure, the space between the diaphragm part of the pressure-sensitive chip and the MN board becomes a reference pressure chamber, and the space between the board and the lid body is connected to the pressure-conducting port of the lid body. By introducing the measurement pressure, the diaphragm part deforms and the pressure can be detected.

AZNは熱膨張係数がシリコンに近似しているため、温
度変化の際にも感圧チップに応力が加わることがない。
Since AZN has a coefficient of thermal expansion similar to that of silicon, no stress is applied to the pressure-sensitive chip even when the temperature changes.

〔実施例〕〔Example〕

第1図は本発明の一実施例を示し、第2図と共通の部分
には同一の符号が付されている。この場合はシリコン感
圧チップ1がAZN基板6の上に固着されている。 A
ZNは熱膨張係数が4.5 X 10−” /にでVz
Q、の7. OX 10−’/ Kより小さく、3.5
×10−”/にであるStの熱膨張係数に近似している
FIG. 1 shows an embodiment of the present invention, and parts common to those in FIG. 2 are given the same reference numerals. In this case, a silicon pressure-sensitive chip 1 is fixed on an AZN substrate 6. A
ZN has a coefficient of thermal expansion of 4.5 x 10-”/Vz
Q, 7. Less than OX 10-'/K, 3.5
The coefficient of thermal expansion of St is approximately x10-''/.

基板6の周囲は樹脂成形によって作成され、導圧管部2
が一体となった蓋体7と気密に結合される。
The periphery of the substrate 6 is made by resin molding, and the impulse tube part 2
is airtightly connected to the lid body 7, which is integrated with the lid body 7.

この結果、容器の内部空間3の圧力は導圧管部2から導
入される測定圧力に保た。れる。これに対し、感圧チッ
プ1のダイヤフラム部と基板6との間の空間8が圧力基
準室となり、真空にされるか一定圧のガスが封入される
。 A7N基板6の面上には印刷厚膜による厚膜配線回
路4が形成され、増幅回路等を構成しており、感圧チッ
プ1の端子と細線5により接続されている。この厚膜配
線回路4は、図示のように基板6の外面にも設けられる
。例えばチップ1と制御回路とを接続後調整される抵抗
などをこの外面側に設ければ有効であり、調整後表面保
護のための樹脂層9で被覆する。
As a result, the pressure in the internal space 3 of the container was maintained at the measured pressure introduced from the impulse pipe section 2. It will be done. On the other hand, the space 8 between the diaphragm portion of the pressure-sensitive chip 1 and the substrate 6 serves as a pressure reference chamber, and is evacuated or filled with gas at a constant pressure. A thick film wiring circuit 4 is formed by a printed thick film on the surface of the A7N substrate 6, and constitutes an amplifier circuit, etc., and is connected to the terminals of the pressure sensitive chip 1 by thin wires 5. The thick film wiring circuit 4 is also provided on the outer surface of the substrate 6 as shown. For example, it is effective to provide a resistor, etc., which is adjusted after connecting the chip 1 and the control circuit, on this outer surface, and after adjustment, the resistor is covered with a resin layer 9 for surface protection.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、感圧チップ材料のシリコンと近似的に
等しい熱膨張係数をもつA7N基板主に感圧チップを固
着し、さらにこの基板を容器の一部ならびに厚膜配線回
路の基板と兼用させることにより台座、別個の回路基板
が省略され、部品点数が減少する。さらに容器の一部に
導圧口を形成して容器内部空間を測定圧力室とし、感圧
チップのダイヤフラム部と基板との間の空間を圧力基準
室とすることにより、構造簡単で高度の製造技術を必要
とせず、信転性の高い小形高精度の絶対圧形半導体圧力
センサを低い製造コストで得ることができる。
According to the present invention, a pressure-sensitive chip is mainly fixed to an A7N substrate having a coefficient of thermal expansion approximately equal to that of silicon, which is a pressure-sensitive chip material, and this substrate is also used as a part of a container and a substrate for a thick-film wiring circuit. By doing so, the pedestal and separate circuit board are omitted, reducing the number of parts. Furthermore, by forming a pressure guide port in a part of the container and using the internal space of the container as a measurement pressure chamber, and the space between the diaphragm part of the pressure-sensitive chip and the substrate as a pressure reference chamber, the structure is simple and the manufacturing process is simple. A compact, high-precision absolute pressure type semiconductor pressure sensor with high reliability can be obtained at low manufacturing cost without requiring any special technology.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の断面図、第2図は従来例の
断面図である。 1:感圧チップ、2:導圧管部、4:厚膜配線回路、6
:A7N基板、7:蓋体。
FIG. 1 is a sectional view of one embodiment of the present invention, and FIG. 2 is a sectional view of a conventional example. 1: Pressure sensitive chip, 2: Impulse tube section, 4: Thick film wiring circuit, 6
: A7N board, 7: Lid body.

Claims (1)

【特許請求の範囲】[Claims] 1)一面側の中央に凹部を形成してなるダイヤフラム部
にゲージ抵抗を備えたシリコン感圧チップが窒化アルミ
ニウムからなる基板上に凹部を基板側にして固着され、
該基板は導圧口を有する蓋体と気密に結合され、かつ該
基板面上に厚膜配線回路が形成されたことを特徴とする
絶対圧形半導体圧力センサ。
1) A silicon pressure-sensitive chip with a gauge resistor in a diaphragm portion formed with a recess formed in the center of one side is fixed onto a substrate made of aluminum nitride with the recess facing the substrate,
An absolute pressure type semiconductor pressure sensor, wherein the substrate is airtightly coupled to a lid having a pressure-conducting port, and a thick film wiring circuit is formed on the surface of the substrate.
JP2790387A 1987-02-09 1987-02-09 Absolute pressure type semiconductor pressure sensor Granted JPS63195537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2790387A JPS63195537A (en) 1987-02-09 1987-02-09 Absolute pressure type semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2790387A JPS63195537A (en) 1987-02-09 1987-02-09 Absolute pressure type semiconductor pressure sensor

Publications (2)

Publication Number Publication Date
JPS63195537A true JPS63195537A (en) 1988-08-12
JPH0567168B2 JPH0567168B2 (en) 1993-09-24

Family

ID=12233845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2790387A Granted JPS63195537A (en) 1987-02-09 1987-02-09 Absolute pressure type semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPS63195537A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02167441A (en) * 1988-09-22 1990-06-27 Terumo Corp Throwaway pressure transducer and throwaway pressure transducing device
JPH02131639U (en) * 1989-04-06 1990-11-01
JPH0465643A (en) * 1990-07-05 1992-03-02 Mitsubishi Electric Corp Semiconductor pressure sensor and its manufacture
CN111003683A (en) * 2019-10-29 2020-04-14 武汉大学 SiC high-temperature pressure sensor and packaging method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02167441A (en) * 1988-09-22 1990-06-27 Terumo Corp Throwaway pressure transducer and throwaway pressure transducing device
JPH02131639U (en) * 1989-04-06 1990-11-01
JPH0465643A (en) * 1990-07-05 1992-03-02 Mitsubishi Electric Corp Semiconductor pressure sensor and its manufacture
CN111003683A (en) * 2019-10-29 2020-04-14 武汉大学 SiC high-temperature pressure sensor and packaging method thereof

Also Published As

Publication number Publication date
JPH0567168B2 (en) 1993-09-24

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