JPS63195537A - Absolute pressure type semiconductor pressure sensor - Google Patents
Absolute pressure type semiconductor pressure sensorInfo
- Publication number
- JPS63195537A JPS63195537A JP2790387A JP2790387A JPS63195537A JP S63195537 A JPS63195537 A JP S63195537A JP 2790387 A JP2790387 A JP 2790387A JP 2790387 A JP2790387 A JP 2790387A JP S63195537 A JPS63195537 A JP S63195537A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- substrate
- sensing chip
- pressure sensing
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 239000010703 silicon Substances 0.000 claims abstract description 11
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 238000000465 moulding Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 abstract 2
- 238000003754 machining Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
Landscapes
- Measuring Fluid Pressure (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、シリコン板のゲージ抵抗が形成されたダイヤ
フラム部の一面に基準圧力、他面に測定圧力を加える絶
対圧形半導体圧力センサに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an absolute pressure type semiconductor pressure sensor that applies a reference pressure to one side of a diaphragm portion on which a gauge resistor of a silicon plate is formed, and a measurement pressure to the other side.
従来の絶対圧形半導体圧力センサの一般的構造は、第2
図に示すようにゲージ抵抗を形成したダイヤフラム部を
有するシリコン感圧チップ1が、シリコンに近似した熱
膨張係数をもつ耐熱ガラスあるいはシリコン等からなる
台座11を介して測定圧力が導かれる導圧管2に固定さ
れ、その導圧管が気密に貫通する底部12と蓋部13か
らなり、内部空間3が圧力基準室となる容器内に収容さ
れている。これは、例えば−40〜120℃の範囲の温
度変化において、感圧チップとそれを支持する支持体と
の間の熱膨張係数の相違による応力がダイヤフラム部に
加わり、ダイヤフラムを変形させてあたかも測定圧力が
加わり変形させた場合と同様の結果となるのを防ぐもの
である。さらに、容器内には増幅回路などの制御回路を
構成する厚膜配線回路4を形成したり203などのセラ
ミック基板14が収容され、その厚膜配線回路はチップ
lの端子とり、^りなどの細&j15のボンディングに
より接続されている。The general structure of a conventional absolute pressure type semiconductor pressure sensor is that
As shown in the figure, a silicon pressure-sensitive chip 1 having a diaphragm portion with a gauge resistance formed thereon is guided through a pressure impulse tube 2 through a pedestal 11 made of heat-resistant glass, silicon, or the like having a coefficient of thermal expansion similar to that of silicon. It is housed in a container that is fixed to a container and has a bottom portion 12 and a lid portion 13, through which a pressure guiding tube passes through in an airtight manner, and an internal space 3 serving as a pressure reference chamber. For example, when the temperature changes in the range of -40 to 120 degrees Celsius, stress due to the difference in thermal expansion coefficient between the pressure-sensitive chip and the support that supports it is applied to the diaphragm, deforming the diaphragm and making measurements as if it were This prevents the same result as when pressure is applied to deform the material. Furthermore, a ceramic substrate 14 such as 203 is housed in which a thick film wiring circuit 4 forming a control circuit such as an amplifier circuit is formed, and the thick film wiring circuit is used for connecting the terminals of the chip l, etc. They are connected by fine & j15 bonding.
しかし、上記の構造では特別な材料からなり、細孔を開
ける必要がある台座11が用いられるので費用がかかり
、また感圧チップ1と台座11および台座11と導圧管
2との気密な接着が必要で、高度の技術を必要とするな
どコスト高の要因を含んでいる。However, in the above structure, the pedestal 11 is made of a special material and requires opening of pores, which is expensive, and also requires airtight adhesion between the pressure-sensitive chip 1 and the pedestal 11 and between the pedestal 11 and the impulse tube 2. This includes high cost factors such as the need for advanced technology.
本発明の目的は、上述の問題を解決して、部品点数が少
なく加工、固着等に高度の技術を必要としない絶対圧形
半導体圧力センサを提供することにある。An object of the present invention is to solve the above-mentioned problems and provide an absolute pressure type semiconductor pressure sensor that has a small number of parts and does not require advanced technology for processing, fixing, etc.
上記の目的を達成するために、本発明は、一面側の中央
に凹部を形成してなるダイヤフラム部にゲージ抵抗を備
えたシリコン感圧チップが窒化アルミニウム IN)か
らなる基板上に凹部を基板側にして固着され、その基板
は感圧口を有する蓋体と気密に結合されてかつ基板面上
に厚膜配線回路が形成されるものとする。In order to achieve the above object, the present invention provides a silicon pressure-sensitive chip having a gauge resistor in a diaphragm portion formed by forming a recess in the center of one side on a substrate made of aluminum nitride. The substrate is hermetically connected to a lid having a pressure-sensitive port, and a thick film wiring circuit is formed on the surface of the substrate.
(作用〕
上記のような構造とすることにより、感圧チップのダイ
ヤフラム部とMN基板との間の空間が基準圧力室となり
、基板と蓋体との間の空間に蓋体の導圧口から測定圧力
を導くことによりダイヤフラム部が変形し、圧力を検知
することができる。(Function) With the above structure, the space between the diaphragm part of the pressure-sensitive chip and the MN board becomes a reference pressure chamber, and the space between the board and the lid body is connected to the pressure-conducting port of the lid body. By introducing the measurement pressure, the diaphragm part deforms and the pressure can be detected.
AZNは熱膨張係数がシリコンに近似しているため、温
度変化の際にも感圧チップに応力が加わることがない。Since AZN has a coefficient of thermal expansion similar to that of silicon, no stress is applied to the pressure-sensitive chip even when the temperature changes.
第1図は本発明の一実施例を示し、第2図と共通の部分
には同一の符号が付されている。この場合はシリコン感
圧チップ1がAZN基板6の上に固着されている。 A
ZNは熱膨張係数が4.5 X 10−” /にでVz
Q、の7. OX 10−’/ Kより小さく、3.5
×10−”/にであるStの熱膨張係数に近似している
。FIG. 1 shows an embodiment of the present invention, and parts common to those in FIG. 2 are given the same reference numerals. In this case, a silicon pressure-sensitive chip 1 is fixed on an AZN substrate 6. A
ZN has a coefficient of thermal expansion of 4.5 x 10-”/Vz
Q, 7. Less than OX 10-'/K, 3.5
The coefficient of thermal expansion of St is approximately x10-''/.
基板6の周囲は樹脂成形によって作成され、導圧管部2
が一体となった蓋体7と気密に結合される。The periphery of the substrate 6 is made by resin molding, and the impulse tube part 2
is airtightly connected to the lid body 7, which is integrated with the lid body 7.
この結果、容器の内部空間3の圧力は導圧管部2から導
入される測定圧力に保た。れる。これに対し、感圧チッ
プ1のダイヤフラム部と基板6との間の空間8が圧力基
準室となり、真空にされるか一定圧のガスが封入される
。 A7N基板6の面上には印刷厚膜による厚膜配線回
路4が形成され、増幅回路等を構成しており、感圧チッ
プ1の端子と細線5により接続されている。この厚膜配
線回路4は、図示のように基板6の外面にも設けられる
。例えばチップ1と制御回路とを接続後調整される抵抗
などをこの外面側に設ければ有効であり、調整後表面保
護のための樹脂層9で被覆する。As a result, the pressure in the internal space 3 of the container was maintained at the measured pressure introduced from the impulse pipe section 2. It will be done. On the other hand, the space 8 between the diaphragm portion of the pressure-sensitive chip 1 and the substrate 6 serves as a pressure reference chamber, and is evacuated or filled with gas at a constant pressure. A thick film wiring circuit 4 is formed by a printed thick film on the surface of the A7N substrate 6, and constitutes an amplifier circuit, etc., and is connected to the terminals of the pressure sensitive chip 1 by thin wires 5. The thick film wiring circuit 4 is also provided on the outer surface of the substrate 6 as shown. For example, it is effective to provide a resistor, etc., which is adjusted after connecting the chip 1 and the control circuit, on this outer surface, and after adjustment, the resistor is covered with a resin layer 9 for surface protection.
本発明によれば、感圧チップ材料のシリコンと近似的に
等しい熱膨張係数をもつA7N基板主に感圧チップを固
着し、さらにこの基板を容器の一部ならびに厚膜配線回
路の基板と兼用させることにより台座、別個の回路基板
が省略され、部品点数が減少する。さらに容器の一部に
導圧口を形成して容器内部空間を測定圧力室とし、感圧
チップのダイヤフラム部と基板との間の空間を圧力基準
室とすることにより、構造簡単で高度の製造技術を必要
とせず、信転性の高い小形高精度の絶対圧形半導体圧力
センサを低い製造コストで得ることができる。According to the present invention, a pressure-sensitive chip is mainly fixed to an A7N substrate having a coefficient of thermal expansion approximately equal to that of silicon, which is a pressure-sensitive chip material, and this substrate is also used as a part of a container and a substrate for a thick-film wiring circuit. By doing so, the pedestal and separate circuit board are omitted, reducing the number of parts. Furthermore, by forming a pressure guide port in a part of the container and using the internal space of the container as a measurement pressure chamber, and the space between the diaphragm part of the pressure-sensitive chip and the substrate as a pressure reference chamber, the structure is simple and the manufacturing process is simple. A compact, high-precision absolute pressure type semiconductor pressure sensor with high reliability can be obtained at low manufacturing cost without requiring any special technology.
第1図は本発明の一実施例の断面図、第2図は従来例の
断面図である。
1:感圧チップ、2:導圧管部、4:厚膜配線回路、6
:A7N基板、7:蓋体。FIG. 1 is a sectional view of one embodiment of the present invention, and FIG. 2 is a sectional view of a conventional example. 1: Pressure sensitive chip, 2: Impulse tube section, 4: Thick film wiring circuit, 6
: A7N board, 7: Lid body.
Claims (1)
にゲージ抵抗を備えたシリコン感圧チップが窒化アルミ
ニウムからなる基板上に凹部を基板側にして固着され、
該基板は導圧口を有する蓋体と気密に結合され、かつ該
基板面上に厚膜配線回路が形成されたことを特徴とする
絶対圧形半導体圧力センサ。1) A silicon pressure-sensitive chip with a gauge resistor in a diaphragm portion formed with a recess formed in the center of one side is fixed onto a substrate made of aluminum nitride with the recess facing the substrate,
An absolute pressure type semiconductor pressure sensor, wherein the substrate is airtightly coupled to a lid having a pressure-conducting port, and a thick film wiring circuit is formed on the surface of the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2790387A JPS63195537A (en) | 1987-02-09 | 1987-02-09 | Absolute pressure type semiconductor pressure sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2790387A JPS63195537A (en) | 1987-02-09 | 1987-02-09 | Absolute pressure type semiconductor pressure sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63195537A true JPS63195537A (en) | 1988-08-12 |
JPH0567168B2 JPH0567168B2 (en) | 1993-09-24 |
Family
ID=12233845
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2790387A Granted JPS63195537A (en) | 1987-02-09 | 1987-02-09 | Absolute pressure type semiconductor pressure sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63195537A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02167441A (en) * | 1988-09-22 | 1990-06-27 | Terumo Corp | Throwaway pressure transducer and throwaway pressure transducing device |
JPH02131639U (en) * | 1989-04-06 | 1990-11-01 | ||
JPH0465643A (en) * | 1990-07-05 | 1992-03-02 | Mitsubishi Electric Corp | Semiconductor pressure sensor and its manufacture |
CN111003683A (en) * | 2019-10-29 | 2020-04-14 | 武汉大学 | SiC high-temperature pressure sensor and packaging method thereof |
-
1987
- 1987-02-09 JP JP2790387A patent/JPS63195537A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02167441A (en) * | 1988-09-22 | 1990-06-27 | Terumo Corp | Throwaway pressure transducer and throwaway pressure transducing device |
JPH02131639U (en) * | 1989-04-06 | 1990-11-01 | ||
JPH0465643A (en) * | 1990-07-05 | 1992-03-02 | Mitsubishi Electric Corp | Semiconductor pressure sensor and its manufacture |
CN111003683A (en) * | 2019-10-29 | 2020-04-14 | 武汉大学 | SiC high-temperature pressure sensor and packaging method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0567168B2 (en) | 1993-09-24 |
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