JPH0290062A - Probe card - Google Patents
Probe cardInfo
- Publication number
- JPH0290062A JPH0290062A JP63242763A JP24276388A JPH0290062A JP H0290062 A JPH0290062 A JP H0290062A JP 63242763 A JP63242763 A JP 63242763A JP 24276388 A JP24276388 A JP 24276388A JP H0290062 A JPH0290062 A JP H0290062A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- contact
- probe
- electrodes
- probe card
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 title claims abstract description 45
- 239000004065 semiconductor Substances 0.000 claims abstract description 17
- 238000005259 measurement Methods 0.000 claims description 5
- 239000011111 cardboard Substances 0.000 abstract description 8
- 238000004804 winding Methods 0.000 abstract description 2
- 239000006185 dispersion Substances 0.000 abstract 1
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000008602 contraction Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Measuring Leads Or Probes (AREA)
- Springs (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体素子の電気的測定用プローブ・カードの
構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a probe card for electrical measurements of semiconductor devices.
半導体装置の製造工程では、いわゆるウェハー処理工程
を完了した後、シリコン・ウェハー状の個々のダイが所
期の電気的特性を有するか否かを測定する工程があり、
この際、測定器とダイとの接続にはダイの電極上へプロ
ーブ・カードと呼ばれる探針を接触させることにより得
ている。In the manufacturing process of semiconductor devices, after completing the so-called wafer processing step, there is a step of measuring whether each die in the form of a silicon wafer has desired electrical characteristics.
At this time, the connection between the measuring device and the die is obtained by bringing a probe called a probe card into contact with the electrode of the die.
この従来技術の一つは、第4図に示すように、プローブ
・カード基板1からプローブ支持板4を通じてプローブ
2,3を保持し、そのプローブの先端部2b、3bを半
導体素子ダイア上の電極゛5.6に接触させることによ
り導通を得て、プローブ・カード基板1上、または、そ
の外部で電気的特性を計測する構造をとるものである。One of these conventional techniques, as shown in FIG. 4, holds probes 2 and 3 from a probe card board 1 through a probe support plate 4, and connects the tips 2b and 3b of the probes to electrodes on a semiconductor element diamond. The structure is such that conduction is established by contacting the probe card 5.6, and electrical characteristics are measured on or outside the probe card board 1.
しかし、上述した従来のプローブ・カードでは、プロー
ブ2,3の先端部2b、3bが直線上になっているので
、近年多用されるTABI造の半導体装置の如くダイ上
にバンブを形成するものでは、バンブ電極とプローブ先
端部2b、3bとの接触が不完全となり易く導通を得に
くいという欠点を有している。すなわち、第5図に示し
たように、半導体素子ダイアの電極5,6がバンブ構造
であると、高さのバラツキにより、一方の電極6とは良
好な導通を得ることができるが他方の低い電極5との間
には導通を得にくいということがある。このとき、プロ
ーブの先端部2bと低い電極とを接触させようとしてプ
ローブ・カード基板1を更に下方へ押し下げると、プロ
ーブの先端部3bが電極を損傷させたりすることもある
。However, in the conventional probe card described above, the tips 2b and 3b of the probes 2 and 3 are on a straight line, so it is not possible to form a bump on the die like in semiconductor devices manufactured by TABI, which are often used in recent years. However, it has the disadvantage that the contact between the bump electrode and the probe tips 2b and 3b tends to be incomplete, making it difficult to obtain continuity. That is, if the electrodes 5 and 6 of the semiconductor element diamond have a bump structure as shown in FIG. It may be difficult to establish continuity with the electrode 5. At this time, if the probe card board 1 is further pushed down in an attempt to bring the tip 2b of the probe into contact with the lower electrode, the tip 3b of the probe may damage the electrode.
本発明の目的は、上記の状況に鑑み、バンプ電極を備え
るウェハ上の半導体素子ダイの電気的測定を精度よく行
い得るプローブ・カードを提供することである。SUMMARY OF THE INVENTION In view of the above circumstances, an object of the present invention is to provide a probe card that can accurately perform electrical measurements of semiconductor element dies on a wafer having bump electrodes.
(課題を解決するための手段〕
本発明によれば、ウェハー状態にある半導体装置の電気
的測定に用いるプローブ・カードは、前記半導体装置の
電極と接するプローブ素子の先端がゼンマイ状に巻き込
む伸縮機能を有するプローブを備えることを含んで構成
される。(Means for Solving the Problems) According to the present invention, a probe card used for electrical measurement of a semiconductor device in a wafer state has a telescopic function in which the tip of a probe element in contact with an electrode of the semiconductor device is wound into a spiral shape. and a probe having the following.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図および第2図はそれぞれ本発明の一実施例を示す
プローブ・カードの断面構造図およびその一つの使用状
態を示す断面m遣口である0本実施例によれば、プロー
ブ2,3はプローブ支持板4によってプローブ・カード
基板1に対して固定される一方、その先端部2a、3a
はゼンマイ状に巻かれた構造に形成される。いま、この
プローブ・カード基板1を半導体素子ダイアに近づける
と、先ず一方の先端部3aが高さの高い電極6に接する
が他方の先端部2aは電極5の高さが低いのでこれと接
することができない状態となる。この場合、プローブ・
カード基板1を更に下方へ下げると、第2図に示す通り
先端部2aも電8i!5に接することができる。この際
、先に接していた電極6上のプローブ先端部3aは、ゼ
ンマイが巻かれる如く縮みながら一定の圧力で電極6と
の導通を保つので、電極を損傷することなくダイアの電
気的特性を計測することが可能となる。1 and 2 are respectively a cross-sectional structure diagram of a probe card showing an embodiment of the present invention, and a cross-sectional view showing one usage state of the probe card. According to the present embodiment, probes 2, 3, is fixed to the probe card board 1 by the probe support plate 4, while its tip portions 2a, 3a
is formed into a spiral-wound structure. Now, when this probe card board 1 is brought close to the semiconductor element diamond, first, one tip 3a comes into contact with the tall electrode 6, but the other tip 2a comes into contact with the electrode 5, which is low in height. becomes unable to do so. In this case, the probe
When the card board 1 is further lowered, as shown in FIG. 5. At this time, the probe tip 3a on the electrode 6 that was in contact with the electrode 6 contracts like a winding spring and maintains continuity with the electrode 6 with a constant pressure, so the electrical characteristics of the diamond can be maintained without damaging the electrode. It becomes possible to measure.
第3図は本発明の他の実施例を示すプローブ先端部の断
面図である0本実施例によれば、プローブ2および3の
先端部には2個以上のゼンマイ状伸縮部9,10が設け
られる0本実施例が示すように、半導体素子ダイの電極
5または6の表面が一様の高さを持たない場合であって
も、ゼンマイ状伸縮部9,10のいずれか一つが良好に
接触することができるのでより安定した導通を得て計測
できる利点がある。FIG. 3 is a sectional view of the tip of a probe showing another embodiment of the present invention. According to this embodiment, the tips of the probes 2 and 3 are provided with two or more spiral-shaped extensible parts 9 and 10. As shown in this embodiment, even if the surface of the electrode 5 or 6 of the semiconductor element die does not have a uniform height, one of the spiral-shaped expansion and contraction parts 9 and 10 can be easily Since it is possible to make contact, there is an advantage that more stable conduction can be obtained for measurement.
以上説明したように、本発明によれば、プローブの先端
部にゼンマイ状の伸縮機能を設けたことにより、半導体
素子の電極間または電極内の表面に高さのバラツキがあ
っても、電極を損傷することなく安定した導通を得るこ
とが可能となるので、従来発生していた不完全な測定技
術に基づく特性値誤認による歩留低下を防止することが
できる。As explained above, according to the present invention, the tip of the probe is provided with a spring-like expansion and contraction function, so that even if there are variations in height between the electrodes of a semiconductor element or on the surface within the electrodes, the electrodes can be Since it becomes possible to obtain stable conduction without damage, it is possible to prevent a decrease in yield due to misidentification of characteristic values based on imperfect measurement techniques, which has conventionally occurred.
発明の他の実施例を示すプローブ先端部の断面構造図、
第4図および第5図はそれぞれ従来のプローブ・カード
の構造を示す断面構造図およびその一つの使用状態を示
す断面構造図である。A cross-sectional structural diagram of a probe tip showing another embodiment of the invention,
FIGS. 4 and 5 are a cross-sectional structural view showing the structure of a conventional probe card and a cross-sectional structural view showing one state of use thereof, respectively.
1・・・プローブ・カード基板、2.3・・・プローブ
、2a、3a、9.10・・・プローブ先端のゼンマイ
状伸縮部、4・・・プローブ支持板、5,6・・・半導
体素子の電極、7・・・半導体素子ダイ。DESCRIPTION OF SYMBOLS 1... Probe card board, 2.3... Probe, 2a, 3a, 9.10... Spring-shaped extension and contraction part of the probe tip, 4... Probe support plate, 5, 6... Semiconductor Element electrode, 7... semiconductor element die.
Claims (1)
プローブ・カードにおいて、前記半導体装置の電極と接
するプローブ素子の先端がゼンマイ状に巻き込む伸縮機
能を有するプローブを備えることを特徴とするプローブ
・カード。A probe card used for electrical measurement of a semiconductor device in a wafer state, characterized in that the probe card is equipped with a probe having a telescoping function in which the tip of a probe element in contact with an electrode of the semiconductor device is wound into a spiral shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63242763A JPH0290062A (en) | 1988-09-27 | 1988-09-27 | Probe card |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63242763A JPH0290062A (en) | 1988-09-27 | 1988-09-27 | Probe card |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0290062A true JPH0290062A (en) | 1990-03-29 |
Family
ID=17093912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63242763A Pending JPH0290062A (en) | 1988-09-27 | 1988-09-27 | Probe card |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0290062A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003025588A1 (en) * | 2001-09-12 | 2003-03-27 | Advantest Corporation | Contact structure, method of manufacturing the structure, and contact assembly using the structure |
WO2003048788A1 (en) * | 2001-12-03 | 2003-06-12 | Advantest Corporation | Contact structure and production method thereof and probe contact assembly using same |
KR100457334B1 (en) * | 1997-09-11 | 2005-04-20 | 삼성전자주식회사 | Test probe |
-
1988
- 1988-09-27 JP JP63242763A patent/JPH0290062A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100457334B1 (en) * | 1997-09-11 | 2005-04-20 | 삼성전자주식회사 | Test probe |
WO2003025588A1 (en) * | 2001-09-12 | 2003-03-27 | Advantest Corporation | Contact structure, method of manufacturing the structure, and contact assembly using the structure |
WO2003048788A1 (en) * | 2001-12-03 | 2003-06-12 | Advantest Corporation | Contact structure and production method thereof and probe contact assembly using same |
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