JPH0280490A - Highly heat-resistant photochromic material - Google Patents

Highly heat-resistant photochromic material

Info

Publication number
JPH0280490A
JPH0280490A JP23292488A JP23292488A JPH0280490A JP H0280490 A JPH0280490 A JP H0280490A JP 23292488 A JP23292488 A JP 23292488A JP 23292488 A JP23292488 A JP 23292488A JP H0280490 A JPH0280490 A JP H0280490A
Authority
JP
Japan
Prior art keywords
group
formula
spiroindolinonaphthoxazine
photochromic
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23292488A
Other languages
Japanese (ja)
Inventor
Tsugio Okudaira
奥平 次男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON KEMITSUKUSU KK
Nagase and Co Ltd
Nagase Sangyo KK
Original Assignee
NIPPON KEMITSUKUSU KK
Nagase and Co Ltd
Nagase Sangyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON KEMITSUKUSU KK, Nagase and Co Ltd, Nagase Sangyo KK filed Critical NIPPON KEMITSUKUSU KK
Priority to JP23292488A priority Critical patent/JPH0280490A/en
Publication of JPH0280490A publication Critical patent/JPH0280490A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/685Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE:To obtain the title material excellent in light fatigue resistance, high response, and color density by using a specified spiroindolinonaphthoxazine derivative. CONSTITUTION:This material comprises a spiroindolinonaphthoxazine derivative of formula I, wherein A is an arylenedicarbonyl group of, e.g., formula V or an arylene group of, e.g., formula VI; R is a group of any one of formulas II-IV; S1-4 and S'2 are groups known as the substituents of a photochromic spiroindolinonaphthoxazine compound and desirably selected from a halogen atom, a (halogenated) lower alkyl, a lower alkoxyl, a nitro and a cyano.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、光学機器用フォトクロミック材料、印写用フ
ォトクロミック材料、記録材料用フォトクロミック材料
、衣料、装飾品用フォトクロミック材料等として有用で
ある、新規なフォトクロミック化合物からなる高耐熱性
フォトクロミック材料に関する。詳しくは、耐熱性を改
善した該材料として有用なスピロナフトオキサジン系化
合物誘導体に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention provides a novel photochromic material useful as a photochromic material for optical equipment, a photochromic material for printing, a photochromic material for recording materials, a photochromic material for clothing, ornaments, etc. This invention relates to a highly heat-resistant photochromic material made of a compound. Specifically, the present invention relates to a spironaphthoxazine compound derivative useful as the material with improved heat resistance.

従来の技術 フォトクロミック性化合物の代表的な文献としては、ウ
ィリー インターサイエンスにューヨーク)から197
1年に刊行された「フォトクロミズム」があり、本明細
書はこの文献を公知の基本技術として記述する。
Typical literature on conventional photochromic compounds includes Wiley Interscience (New York), 197
There is a book entitled "Photochromism" published in 1999, and this specification describes this document as a known basic technology.

特にフォトクロミック性のスピロナフトオキサジン系化
合物およびその各種の置換誘導体の文献としては、特公
昭45−28892号、特公昭49−48631号、特
開昭48−23787号、特開昭55−36284号、
特開昭61−53288号、特開昭61−138686
号、特開昭61−263982号、等が知られている。
In particular, the literature on photochromic spironaphthoxazine compounds and various substituted derivatives thereof include Japanese Patent Publication No. 45-28892, Japanese Patent Publication No. 49-48631, Japanese Patent Application Publication No. 48-23787, Japanese Patent Application Publication No. 55-36284,
JP-A-61-53288, JP-A-61-138686
No. 61-263982, etc. are known.

解決しようとする問題点 従来のフォトクロミック性スピロナフトオキサジン系化
合物は、実用性のあるフォトクロミック材料であるが、
耐光疲労性、高応答性、耐熱性、発色濃度等のいくつか
についてそして特に耐熱性について、更に改善が望まし
い状態にある。本発明の主目的は、上記の耐熱性以外の
特性が実用的に満足であり、特に高温度耐熱性に優れた
該化合物を提供することである。
Problems to be solved Conventional photochromic spironaphthoxazine compounds are practical photochromic materials, but
Further improvements are desired in some respects, such as light fatigue resistance, high responsiveness, heat resistance, color density, and especially heat resistance. The main object of the present invention is to provide a compound which has practically satisfactory properties other than the above-mentioned heat resistance, and which is particularly excellent in high-temperature heat resistance.

問題点を解決するための手段 本発明者は、上記の従来技術の項に記述したスピロイン
ドリノナフトオキサジン系化合物二分子をそのナフトオ
キサラン環の9゛位または8“位または5°位にて、ア
リーレン基を介してエーテル結合またはアリーレンジカ
ルボニル基を介してエステル結合した構造を有する新規
な化合物によって、上記の目的を達成した。
Means for Solving the Problems The present inventor has prepared two molecules of the spiroindolinonaphthoxazine compound described in the prior art section at the 9'-, 8'-, or 5'-position of the naphthoxalane ring. The above object has been achieved by a novel compound having a structure in which an ether bond is formed through an arylene group or an ester bond is formed through an arylene dicarbonyl group.

従って本発明によって、下記の式 %式% [こ\に、Aはアリーレン基またはアリ−レンツカルボ
ニル基であり:そして であり、s、、s、、s’、、s3およびS、は水素原
子または公知の7オトクロミブク性スピロナフトオキサ
ジン化合物の置換基として公知である一価の置換基、例
えば、水素、ハロゲン原子、低級アルキル基(メチル等
)、低級アルコキシ基、ニトロ基、シアノ基、またはハ
ロゲン化低級アルキル基(トリフルオロメチル等)等で
ある。]によって表わされる化合物からなるフォトクロ
ミック材料が提供される。
Therefore, according to the present invention, the following formula % [where A is an arylene group or an arylene carbonyl group: and s, s, s', s3 and S are hydrogen atoms or a monovalent substituent known as a substituent of a known 7-otoclomibuclic spironaphthoxazine compound, such as hydrogen, a halogen atom, a lower alkyl group (such as methyl), a lower alkoxy group, a nitro group, a cyano group, or a halogen lower alkyl groups (such as trifluoromethyl), etc. ] A photochromic material comprising a compound represented by the following is provided.

原料および合成上の観点から、代表的に上記のへのアリ
−レンツカルボニル基としては等が例示され、上記のA
のアリーレン基としては等が例示される。
From the viewpoint of raw materials and synthesis, typical examples of the arylene carbonyl group mentioned above include the above A
Examples of the arylene group include the following.

本発明のR−0−A−0−Rの構造を有するフォトクロ
ミック性化合物は、例えば、従来技術の項に記載した公
報に開示されている化合物R−OHリーレン)−と−X
またはX (アリーレン)− Xの化合物とを脱HX反応させるか:またはRまたはH
O−(アリーレン)−〇Hとを脱HX反応させて製造す
ることができる。こ\にXはハロゲンを示し、通常はC
QまたはBrである。RおよびAは上記の定義の通りで
ある。
The photochromic compound having the structure R-0-A-0-R of the present invention is, for example, the compounds R-OH rylene)- and -X
or X (arylene) - perform a de-HX reaction with the compound of X: or R or H
It can be produced by subjecting O-(arylene)-○H to a de-HX reaction. Here, X represents halogen, usually C
Q or Br. R and A are as defined above.

具体例 烈」− 1,3,3−)ジメチル−9゛−ヒドロキシスピロイン
ドリノナフトオキサジン(以下に9゛HNOと略称する
)34.9グラムとテレフタル酸ジクロリド10グラム
を、テトラヒドロフラン(THF)200−に溶解し、
トリエチルアミン8ai2を滴下しそして撹拌しながら
、室温で1.5時間反応させた。反応後にTHFを留去
しそしてベンゼンで再結晶および脱色して、黄白色の結
晶40グラムを得た。融点は266〜267℃であった
。本発明の化合物は、その高融点にて明示されるように
優れた高温耐熱性を有し、青色の発色濃度、耐光疲労性
、応答時間についても満足であった。なお、得られた化
合物は核磁気共鳴(N!vlR)によって、上記の式に
おいて81がメチル基、S、、S、およびS、が水素原
子、そしてAがテレフタル#塘基であることが同定され
た。
Specific example - 34.9 g of 1,3,3-)dimethyl-9゛-hydroxyspiroindolinonaphthoxazine (hereinafter abbreviated as 9゛HNO) and 10 g of terephthalic acid dichloride were mixed with 200 g of tetrahydrofuran (THF). - dissolved in
Triethylamine 8ai2 was added dropwise and reacted for 1.5 hours at room temperature with stirring. After the reaction, THF was distilled off and recrystallized and decolorized with benzene to obtain 40 grams of yellowish white crystals. The melting point was 266-267°C. The compound of the present invention had excellent high-temperature heat resistance as evidenced by its high melting point, and was also satisfactory in blue color density, light fatigue resistance, and response time. The obtained compound was identified by nuclear magnetic resonance (N!vlR) as follows: In the above formula, 81 is a methyl group, S, S, and S are hydrogen atoms, and A is a terephthalic group. It was done.

刑」工(比較例) 公知の方法によって合成した、例1の原料である9’−
HNoの融点は、214〜215℃であった。従って、
従来のスピロナフトオキサジン系化合物二分子をアリー
レン系化合物を介して結合することによって、耐熱性の
目安となる融点が大目】に(例えば約50℃程度)上昇
することが認められる。
9'-, the raw material of Example 1, synthesized by a known method
The melting point of HNo was 214-215°C. Therefore,
It has been found that by bonding two molecules of a conventional spironaphthoxazine compound via an arylene compound, the melting point, which is a measure of heat resistance, increases by a large amount (for example, about 50° C.).

なお、上記の合成工程における反応用の溶媒、反応温度
および時間、装置、その他の条件等に関しては、当業者
が容易に選定可能である。各製造段階における精製方法
としては、溶剤による再結晶法、シリカカラムなどによ
るカラムクロマト分離、活性炭処理などが採用できる。
In addition, those skilled in the art can easily select the reaction solvent, reaction temperature and time, equipment, other conditions, etc. in the above synthesis step. As a purification method at each manufacturing step, recrystallization using a solvent, column chromatography using a silica column, treatment with activated carbon, etc. can be employed.

本発明のフォトクロミック化合物は、文献公知の通り、
透明性の樹脂類、たとえばジエチレングリコールビスア
リルカーボネートポリマー、ポリ(メタ)アクリレート
およびその共重合体、セルロース樹脂類、ポリ酢酸ビニ
ル、ポリビニルアルコール、ポリビニルブチラール、ポ
リエステル樹脂、ポリカーボネート、ポリスチレンおよ
びその共重合体、エポキシ樹脂、(ハロゲン化)ビスフ
ェノールAのジ(メタ)アクリレートポリマーおよびそ
の共重合体、ナイロン樹脂、ポリウレタンなどに配合し
て、好ましく使用される。配合された樹脂類は光による
変色性を有する光学素子として使用することが可能であ
る。光学素子としてはサングラス、スキー用または水泳
用ゴーグル、保護メガネレンズ、さらにはカーテン、衣
服、玩具等が好適な例として挙げられる。樹脂類への本
発明のフォトクロミック化合物の配合方法としては、染
色法、キャスティング法、配合されたポリマー溶液のコ
ーティング法など各種の方法が適用できる。その配合量
は、一般的に0.01〜5重量%程度である。
As known in the literature, the photochromic compound of the present invention is as follows:
Transparent resins, such as diethylene glycol bisallyl carbonate polymer, poly(meth)acrylate and its copolymers, cellulose resins, polyvinyl acetate, polyvinyl alcohol, polyvinyl butyral, polyester resins, polycarbonate, polystyrene and its copolymers, It is preferably used in combination with epoxy resins, di(meth)acrylate polymers of (halogenated) bisphenol A and their copolymers, nylon resins, polyurethanes, and the like. The blended resins can be used as optical elements that change color due to light. Suitable examples of optical elements include sunglasses, skiing or swimming goggles, protective glasses lenses, curtains, clothes, toys, and the like. As a method for blending the photochromic compound of the present invention into resins, various methods such as dyeing, casting, and coating with a blended polymer solution can be applied. The blending amount is generally about 0.01 to 5% by weight.

作用および効果 本発明によって、フォトクロミック性スピロナフトオキ
サジンす化合物二分子をそのナフトオキサジン環の9°
位または8°位または5°位にて、アリーレン基または
アリーレンジカルボニル基を介して結合した化合物が提
供される。この′新規化合物は、その構造によって原料
の該化合物のフォトクロミック特性をそこなうことなく
、高温度耐熱性が著しく向上する。
Effects and Effects According to the present invention, two molecules of a photochromic spironaphthoxazine compound can be combined at 9° of the naphthoxazine ring.
Compounds are provided that are bonded via an arylene group or an arylene dicarbonyl group at the 8° or 5° position. Due to its structure, this new compound has significantly improved high-temperature heat resistance without impairing the photochromic properties of the compound as a raw material.

特許出願人  長瀬産業株式会社 (ほか1名)Patent applicant: Nagase Sangyo Co., Ltd. (1 other person)

Claims (2)

【特許請求の範囲】[Claims] (1)一般式R−O−A−O−R [こゝにAはアリーレン基およびアリーレンジカルボニ
ル基からなる群から選ばれる基であり;そしてRは ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ および▲数式、化学式、表等があります▼ からなる群から選ばれる基であって、その置換基S_1
、S_2、S’_2、S_3およびS_4はフォトクロ
ミック性のスピロインドリノナフトオキサジン系化合物
の置換基として公知のものである。] によって表わされることを特徴とする、スピロインドリ
ノナフトオキサジン系化合物誘導体からなる高耐熱性フ
ォトクロミック材料。
(1) General formula R-O-A-O-R [where A is a group selected from the group consisting of arylene group and arylene dicarbonyl group; and R is ▲a mathematical formula, a chemical formula, a table, etc.▼ , ▲Mathematical formula, chemical formula,
There are tables, etc. ▼ and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ A group selected from the group consisting of the substituent S_1
, S_2, S'_2, S_3 and S_4 are known substituents of photochromic spiroindolinonaphthoxazine compounds. ] A highly heat-resistant photochromic material comprising a spiroindolinonaphthoxazine compound derivative represented by the following.
(2)置換基S_1、S_2、S’_2、S_3および
S_4が、水素原子、ハロゲン原子、低級アルキル基、
低級アルコキシ基、ニトロ基、シアノ基およびハロゲン
化低級アルキル基からなる群からそれぞれ選ばれる、上
記第1項のフォトクロミック材料。
(2) Substituents S_1, S_2, S'_2, S_3 and S_4 are hydrogen atoms, halogen atoms, lower alkyl groups,
The photochromic material according to item 1 above, each selected from the group consisting of a lower alkoxy group, a nitro group, a cyano group, and a halogenated lower alkyl group.
JP23292488A 1988-09-17 1988-09-17 Highly heat-resistant photochromic material Pending JPH0280490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23292488A JPH0280490A (en) 1988-09-17 1988-09-17 Highly heat-resistant photochromic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23292488A JPH0280490A (en) 1988-09-17 1988-09-17 Highly heat-resistant photochromic material

Publications (1)

Publication Number Publication Date
JPH0280490A true JPH0280490A (en) 1990-03-20

Family

ID=16946971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23292488A Pending JPH0280490A (en) 1988-09-17 1988-09-17 Highly heat-resistant photochromic material

Country Status (1)

Country Link
JP (1) JPH0280490A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0432841A2 (en) * 1989-12-12 1991-06-19 GREAT LAKES CHEMICAL ITALIA S.r.l. Spiro-indoline-oxazine compounds with photochromatic and photosensitizing characteristics and the process for their preparation
EP0661591A2 (en) 1993-12-29 1995-07-05 Eastman Kodak Company Photographic elements containing loaded ultraviolet absorbing polymer latex
EP0695968A2 (en) 1994-08-01 1996-02-07 Eastman Kodak Company Viscosity reduction in a photographic melt
US10000472B2 (en) 2003-07-01 2018-06-19 Transitions Optical, Inc. Photochromic compounds

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0432841A2 (en) * 1989-12-12 1991-06-19 GREAT LAKES CHEMICAL ITALIA S.r.l. Spiro-indoline-oxazine compounds with photochromatic and photosensitizing characteristics and the process for their preparation
EP0661591A2 (en) 1993-12-29 1995-07-05 Eastman Kodak Company Photographic elements containing loaded ultraviolet absorbing polymer latex
EP0695968A2 (en) 1994-08-01 1996-02-07 Eastman Kodak Company Viscosity reduction in a photographic melt
US10000472B2 (en) 2003-07-01 2018-06-19 Transitions Optical, Inc. Photochromic compounds
US10005763B2 (en) 2003-07-01 2018-06-26 Transitions Optical, Inc. Photochromic compounds
US10532997B2 (en) 2003-07-01 2020-01-14 Transitions Optical, Inc. Photochromic compounds
US10532998B2 (en) 2003-07-01 2020-01-14 Transitions Optical, Inc. Photochromic compounds

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