JPH02753U - - Google Patents
Info
- Publication number
- JPH02753U JPH02753U JP7717788U JP7717788U JPH02753U JP H02753 U JPH02753 U JP H02753U JP 7717788 U JP7717788 U JP 7717788U JP 7717788 U JP7717788 U JP 7717788U JP H02753 U JPH02753 U JP H02753U
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- gas flow
- pair
- insulator
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 3
Landscapes
- Lasers (AREA)
Description
第１図及び第２図はそれぞれ本考案の第１及び
第２の実施例に係る模式的な横断面図である。
１……第１の放電電極、２……第２の放電電極
、３……絶縁体、４……放電空間、５……通常グ
ロー放電が起らない放電空間風下部分、６……ガ
ス流、７……ガス循環器、８……レーザ管、９…
…ガス流路、１０……ガス流ガイド、である。
1 and 2 are schematic cross-sectional views of the first and second embodiments of the present invention, respectively. DESCRIPTION OF SYMBOLS 1...First discharge electrode, 2...Second discharge electrode, 3...Insulator, 4...Discharge space, 5...Leftward portion of the discharge space where glow discharge does not normally occur, 6...Gas flow , 7... gas circulator, 8... laser tube, 9...
. . . gas flow path, 10 . . . gas flow guide.
Claims (1)
し、このレーザ管内に、光の誘導放出を可能にす
る放電を得るための一対の放電電極と、前記放電
電極対間隙の放電空間に高速なガス流を形成する
ためのガス循環器と、ガス流路とを少くとも備え
た放電励起高速繰り返しエキシマレーザ装置にお
いて、前記ガス流路の少くとも一部に絶縁体で形
成したガス流ガイドを備え、さらに、前記放電電
極対のうち少くとも一方の放電電極のグロー放電
を起す部分以外の少くとも一部の電極表面を絶縁
体によつて覆つた構造を持つことを特徴とする放
電励起高速繰り返しエキシマレーザ装置。 It has a laser tube sandwiched between a pair of resonator mirrors, and inside this laser tube, there is a pair of discharge electrodes for obtaining a discharge that enables stimulated emission of light, and a high-speed discharge electrode is provided in the discharge space between the pair of discharge electrodes. A discharge-excited high-speed repetition excimer laser device comprising at least a gas circulator for forming a gas flow and a gas flow path, wherein at least a portion of the gas flow path is provided with a gas flow guide formed of an insulator. , further comprising a structure in which at least a part of the electrode surface of at least one discharge electrode of the pair of discharge electrodes other than the part where glow discharge occurs is covered with an insulator. Excimer laser equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7717788U JPH02753U (en) | 1988-06-09 | 1988-06-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7717788U JPH02753U (en) | 1988-06-09 | 1988-06-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02753U true JPH02753U (en) | 1990-01-05 |
Family
ID=31302172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7717788U Pending JPH02753U (en) | 1988-06-09 | 1988-06-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02753U (en) |
-
1988
- 1988-06-09 JP JP7717788U patent/JPH02753U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1236778A (en) | Transverse discharge gas laser | |
| JPS5550678A (en) | Laser discharge tube | |
| JPH02753U (en) | ||
| JPH0189456U (en) | ||
| GB1536624A (en) | Lazers | |
| JPS61192466U (en) | ||
| JPH01115262U (en) | ||
| JPH01135755U (en) | ||
| JPH01140856U (en) | ||
| JPS6217164U (en) | ||
| JPH079404Y2 (en) | Corona preionization discharge excited excimer laser system | |
| JPS6359365U (en) | ||
| JPH0171457U (en) | ||
| JPH0192160U (en) | ||
| JPS6445181A (en) | Discharge-pumped excimer laser | |
| JPH01118467U (en) | ||
| JPH0261055U (en) | ||
| JPS6422057U (en) | ||
| JPS63128751U (en) | ||
| JPS6190265U (en) | ||
| JPH01108784A (en) | Gas laser apparatus | |
| JPH045666U (en) | ||
| JPH0330394U (en) | ||
| JPS6447070U (en) | ||
| JPH03276536A (en) | Discharge tube |