JPH02721U - - Google Patents
Info
- Publication number
- JPH02721U JPH02721U JP7779788U JP7779788U JPH02721U JP H02721 U JPH02721 U JP H02721U JP 7779788 U JP7779788 U JP 7779788U JP 7779788 U JP7779788 U JP 7779788U JP H02721 U JPH02721 U JP H02721U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- locking shoulder
- support
- support device
- guide surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000630 rising effect Effects 0.000 claims 2
- 238000001514 detection method Methods 0.000 description 1
Landscapes
- Separation Of Particles Using Liquids (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779788U JPH02721U (un) | 1988-06-14 | 1988-06-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779788U JPH02721U (un) | 1988-06-14 | 1988-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02721U true JPH02721U (un) | 1990-01-05 |
Family
ID=31302759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7779788U Pending JPH02721U (un) | 1988-06-14 | 1988-06-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02721U (un) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS58217184A (ja) * | 1982-06-09 | 1983-12-17 | 三菱電機株式会社 | ウエハ乾燥装置 |
| JPS63178531A (ja) * | 1987-01-20 | 1988-07-22 | Fujitsu Ltd | 水洗式中間ステ−ジ |
-
1988
- 1988-06-14 JP JP7779788U patent/JPH02721U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS58217184A (ja) * | 1982-06-09 | 1983-12-17 | 三菱電機株式会社 | ウエハ乾燥装置 |
| JPS63178531A (ja) * | 1987-01-20 | 1988-07-22 | Fujitsu Ltd | 水洗式中間ステ−ジ |