JPH0268549A - Rack mechanism for photographic sensitive material processing - Google Patents

Rack mechanism for photographic sensitive material processing

Info

Publication number
JPH0268549A
JPH0268549A JP22044388A JP22044388A JPH0268549A JP H0268549 A JPH0268549 A JP H0268549A JP 22044388 A JP22044388 A JP 22044388A JP 22044388 A JP22044388 A JP 22044388A JP H0268549 A JPH0268549 A JP H0268549A
Authority
JP
Japan
Prior art keywords
shutter
movable shutter
processing
fixed
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22044388A
Other languages
Japanese (ja)
Inventor
Takashi Nakamura
敬 中村
Hiroshi Matsuoka
寛 松岡
Tetsuya Norizuki
法月 哲也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP22044388A priority Critical patent/JPH0268549A/en
Priority to US07/398,356 priority patent/US4933699A/en
Publication of JPH0268549A publication Critical patent/JPH0268549A/en
Pending legal-status Critical Current

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  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

PURPOSE:To slow down the deterioration of processing liquid and to perform stable processing for a long period by moving flexible moving shutters in a groove formed in a rack plate and evading the contacting between the processing liquid and air as much as possible. CONSTITUTION:The respective moving shutters 20 are elevated before a photo sensitive material A is carried in a tank to form a gap with fixed shutters 22, thereby opening the conveyance path for the photo sensitive material A. Then the photo sensitive material A is dipped in the liquid developer and developed and after the photo sensitive material A is carried out of the tank, the respective moving shutters 20 are pressed down to abut on the fixed shutters 22. Therefore, while the photo sensitive material A is developed, the liquid developer and air contact each other across the gap between the moving shutters 20 and fixed shutters 22, but when the photosensitive material A is not developed, the contacting between the liquid developer and air is evaded as much as possible.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、原稿又は原画を透過した光線あるいは原稿又
は原画を反射した光線により露光された写真感光材料を
、処理液中に浸漬して現像処理等を行うための写真感光
材料処理用ラック機構に関する。
Detailed Description of the Invention [Industrial Application Field] The present invention is a method of developing a photographic material that has been exposed to light that has passed through an original or an original or reflected from the original, by immersing it in a processing solution. The present invention relates to a rack mechanism for processing photographic light-sensitive materials.

〔従来の技術〕[Conventional technology]

一般に、ハロゲン化銀写真感光材料を用いる自動現像装
置において、写真感光材料は現像槽内に収容した現像液
中に、写真感光材料を所定時間浸漬搬送することにより
現像が行われる。
Generally, in an automatic developing apparatus using a silver halide photographic material, the photographic material is developed by being immersed in a developer contained in a developer tank for a predetermined period of time.

現像後の写真感光材料は、必要に応じて漂白、定着、水
洗等の処理が行われる。そして、これらの処理液を収容
した槽内に写真感光材料を有効に浸漬搬送するために、
例えば各処理液を収容する槽は並列に配設される。また
、各処理液中に写真感光材料を有効に浸漬させるために
、各処理槽は縦長形状であり、写真感光材料は各処理槽
内を垂直方向に搬送される。すなわち、写真感光材料は
現像槽内の現像液に垂直方向下方に搬送され、現像槽底
部において反転されたのち、垂直方向上方に搬送されて
次の処理ト曹に送られる。
After development, the photographic light-sensitive material is subjected to treatments such as bleaching, fixing, and washing with water, as necessary. In order to effectively immerse and transport the photographic material into a tank containing these processing solutions,
For example, tanks containing each treatment liquid are arranged in parallel. Further, in order to effectively immerse the photographic light-sensitive material in each processing solution, each processing tank has a vertically elongated shape, and the photographic light-sensitive material is conveyed vertically within each processing tank. That is, the photographic material is conveyed vertically downward into the developer solution in the developer tank, turned over at the bottom of the developer tank, and then conveyed vertically upward to be sent to the next processing chamber.

一方、現像液は空気中の酸素との接触により酸化して劣
化するので、現像液と空気との接触は避ける必要がある
。そのために、現像液面上に非接触にシャッタを配設し
、写真感光材料が搬送路を走行するときだけ搬送路を開
口して現像液と空気との接触を極力避ける構成の現像槽
がある。
On the other hand, since the developer is oxidized and deteriorated by contact with oxygen in the air, it is necessary to avoid contact between the developer and air. For this purpose, there is a developing tank that has a structure in which a shutter is disposed above the surface of the developer in a non-contact manner, and the conveyance path is opened only when the photographic light-sensitive material travels along the conveyance path, thereby avoiding contact between the developer and air as much as possible. .

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

写真感光材料を搬送する機構として、複数の搬送ローラ
を搬送路を介して2列に交互配設し、この搬送ローラの
周面に写真感光材料を接触させ、両者の摩擦により写真
感光材料を搬送するローラトランスポート機構がある。
As a mechanism for conveying the photosensitive material, a plurality of conveyance rollers are alternately arranged in two rows via a conveyance path, the photosensitive material is brought into contact with the circumferential surface of the conveyance rollers, and the photosensitive material is conveyed by friction between the two. There is a roller transport mechanism that does this.

このような機構においては酸化防止対策をするには、搬
送ローラ等が互いに近接しているので、容易に液面シャ
ッタを設けることができず、液面と外気との接触は避け
られない。
In such a mechanism, in order to prevent oxidation, since the conveyance rollers and the like are close to each other, it is not possible to easily provide a liquid level shutter, and contact between the liquid level and the outside air is unavoidable.

本発明の目的は、上記問題を解消することにあり、ロー
ラトランスポート機構により写真感光材料を搬送する機
構であっても、処理液と空気との接触を極力避けること
のできる写真感光材料処理用ラック機構を提供すること
にある。
An object of the present invention is to solve the above problems, and to provide a device for processing photographic materials that can avoid contact between the processing liquid and air as much as possible even in a mechanism that transports photographic materials using a roller transport mechanism. The purpose of the present invention is to provide a rack mechanism.

〔課題を解決するための手段及び作用〕本発明に係る上
記目的は、処理液を収容した槽内に設けたラックの、対
向する一対の側板間に略U字状に配設した複数対の搬送
ローラからなるローラトランスポート機構により、写真
感光材料を上方から搬入して処理液に浸漬し、搏底部で
反転して上方に搬出する写真感光材料処理用ラック機構
であって、前記搬送ローラ間の一部に垂直方向の空隙を
設けて搬送ローラを配設し、前記側板の対向面に、垂直
上方から前記)船道ローラ間の空隙を通って処理液面の
上方に略水平に延びる溝を形成し、該溝内を両側端が挿
通し前記空隙における写真感光材料の搬送路を越えた位
置で固定シャンクにより上方からの移動を制限され、か
つ該制限位置に設けた固定ンヤッタと密接する可撓性の
移動シャッタを備えた写真感光材料処理用ラック機構に
よって達成される。
[Means and effects for solving the problem] The above object of the present invention is to provide a plurality of pairs of racks arranged in a substantially U-shape between a pair of opposing side plates of a rack provided in a tank containing a processing liquid. A rack mechanism for processing photosensitive materials in which a photosensitive material is carried in from above, immersed in a processing liquid, reversed at the bottom and carried out upward by a roller transport mechanism consisting of carrying rollers, A conveying roller is provided with a vertical gap in a part of the side plate, and a groove is formed on the opposing surface of the side plate to extend substantially horizontally from above through the gap between the channel rollers and above the processing liquid level. , the both ends of which are inserted into the groove, are restricted from moving from above by a fixed shank at a position beyond the conveyance path of the photographic light-sensitive material in the gap, and are brought into close contact with a fixed shank provided at the restricted position. This is accomplished by a photographic material processing rack mechanism with a flexible moving shutter.

すなわら、前記溝内の移動ンヤッタを移動して適宜固定
シャンクと離接させ写真感光材料搬送路の開閉すること
により、槽内の処理液が空気と接触するのを極力防止す
ることができ、処理液の酸化等の空気による悪影響を減
らすことができる。
In other words, by moving the movable shank in the groove and separating it from the fixed shank as appropriate to open and close the photographic material conveyance path, it is possible to prevent the processing liquid in the tank from coming into contact with air as much as possible. , it is possible to reduce the adverse effects caused by air, such as oxidation of the processing liquid.

従って、写真感光材料を処理を長期間にわたって良好に
行うことができる。
Therefore, the photographic material can be processed satisfactorily over a long period of time.

なお、前記移動シャッタの前記固定ンヤッタと接する端
部の上部に、所定厚の部材を幅方向にわたって設けるこ
とにより、移動シャッタが密封位置において弛んで移動
ンヤッタと固定シャッタとの間に間隙が生じても、移動
シャッタと固定シャッタとの間隙を密封することができ
る。
In addition, by providing a member having a predetermined thickness across the width of the movable shutter at the upper part of the end thereof that contacts the fixed shutter, the movable shutter is loosened in the sealed position and a gap is created between the movable shutter and the fixed shutter. Also, the gap between the movable shutter and the fixed shutter can be sealed.

また、前記移動シャッタの前記固定シャッタと接する端
部に、高剛性部材を幅方向にわたって設けることにより
、移動ンヤッタの端部が補強されるので、端部が弛んで
制限部材との間に間隙が生ずることはなく、確実な密封
が保証される。
Furthermore, by providing a high-rigidity member across the width at the end of the movable shutter that contacts the fixed shutter, the end of the movable shutter is reinforced, so that the end becomes slack and a gap is created between the end and the limiting member. This will not occur and a reliable seal will be ensured.

また、前記移動シャッタの前記固定シャッタと接する端
部の下方に移動シャッタ支持部材を設けることにより、
移動シャッタの端部が弛んで移動シャッタと固定シャッ
タとの間に間隙が生ずることはなく、確実な密封が保証
される。
Further, by providing a movable shutter support member below the end of the movable shutter that contacts the fixed shutter,
The ends of the movable shutter do not slacken and create gaps between the movable shutter and the fixed shutter, ensuring a reliable seal.

なお、本発明に用いる写真感光材料としては、処理液中
に浸漬して処理を行うものであれば、いかなる写真感光
材料であってもよい。
The photographic light-sensitive material used in the present invention may be any photographic light-sensitive material as long as it is processed by immersing it in a processing solution.

例えば、長尺の写真用フィルムや印画紙を現像液に浸漬
して現像する構成に有効であり、また、シート状に切断
した写真用フィルムや印画紙を現像液に浸漬して現像す
る構成にも有効である。
For example, it is effective for a configuration in which a long length of photographic film or photographic paper is immersed in a developer solution for development, and it is also effective in a configuration in which a sheet-shaped photographic film or photographic paper is immersed in a developer solution for development. is also valid.

〔実施態様〕[Embodiment]

以下、添付図面に基づいて、本発明の実施態様を説明す
る。
Embodiments of the present invention will be described below based on the accompanying drawings.

第1図は、写真感光材料現像槽の概略断面図である。FIG. 1 is a schematic cross-sectional view of a photographic material developing tank.

現像液を収容した槽2内には、感光材料Aを槽内に案内
するラック4が装填しである。該ラック4の2枚の側板
6の間には感光材料Aを搬送する複数の搬送ローラ群8
を略U字状に配設したローラトランスポート機構を備え
ている。搬送ローラ8は感光材料搬送路を介して交互に
配設してあり、各搬送ローラ8は当接していない。した
がって、感光材料Aを搬送ローラ8の周面との摩擦によ
って搬送する。
A rack 4 for guiding the photosensitive material A into the tank is loaded in the tank 2 containing the developer. Between the two side plates 6 of the rack 4, there are a plurality of conveying roller groups 8 for conveying the photosensitive material A.
It is equipped with a roller transport mechanism in which the rollers are arranged in a substantially U-shape. The conveyance rollers 8 are arranged alternately through the photosensitive material conveyance path, and the conveyance rollers 8 are not in contact with each other. Therefore, the photosensitive material A is transported by friction with the peripheral surface of the transport roller 8.

槽2の底部には、槽内の現像液を適温に加熱するヒータ
10と、現像液を撹拌するための撹拌部材12を設けで
ある。撹拌部材12は、円板14の両面にフィン16を
設けた構成であり、図示しない駆動手段により回転駆動
されて、現像液を撹拌する。
A heater 10 for heating the developer in the tank to an appropriate temperature and a stirring member 12 for stirring the developer are provided at the bottom of the tank 2. The stirring member 12 has a configuration in which fins 16 are provided on both sides of a disc 14, and is rotationally driven by a driving means (not shown) to stir the developer.

搬送ローラ8により槽内に上方から下方に向けて搬入さ
れる感光材料Aは、槽底部において反転され、上方に向
けて搬送され搬出される。従来のローラトランスポート
機構は上下の搬送ローラ間に空隙がなく、搬送ローラ8
の少なくとも一つは現像液面と交差しており、現像液と
空気とに接触する構成であった。これに対し、本実施態
様におけるローラトランスポート機構は、搬送ローラ8
が現像液面と交差しないように、搬送ローラ8間に空隙
を形成する構成である。そして、空隙に現像液面が位置
するように現像液を槽内に収容する。
The photosensitive material A, which is carried into the tank from above to below by the transport roller 8, is reversed at the bottom of the tank, and is transported upward and discharged. In the conventional roller transport mechanism, there is no gap between the upper and lower transport rollers, and the transport roller 8
At least one of them intersects with the surface of the developer and is in contact with the developer and air. On the other hand, the roller transport mechanism in this embodiment has the transport roller 8
A gap is formed between the conveyance rollers 8 so that the conveyance rollers 8 do not intersect with the developer surface. Then, the developer is stored in the tank so that the developer level is located in the gap.

第2図はラック上部の斜視図である。ラック側板6は厚
みが10胴の金属板又はプラスチックからなり、この側
板6には2列の溝18が形成してあり、それぞれの溝1
8は側板6のほぼ中央から下方に延び、湾曲してから搬
送ローラ8間のそれぞれの空隙まで達してほぼ水平に延
びている。そして、a18の下端部は感光材料Aの搬送
路との交差点を越えた位置まで達している。
FIG. 2 is a perspective view of the upper part of the rack. The rack side plate 6 is made of a metal plate or plastic with a thickness of 10 mm, and two rows of grooves 18 are formed in the side plate 6.
8 extends downward from approximately the center of the side plate 6, curves, reaches each gap between the conveying rollers 8, and extends approximately horizontally. The lower end of a18 has reached a position beyond the intersection with the transport path of the photosensitive material A.

ラック側板6の溝18には、可撓性の移動シャッタ20
が挿通ずる。移動シャッタ20は例えばABS樹脂、金
属等の薄板によって構成されて可撓性を有し、側板6の
溝18内を溝18の形状に従って移動することができる
A flexible movable shutter 20 is installed in the groove 18 of the rack side plate 6.
is inserted. The movable shutter 20 is made of a thin plate made of ABS resin, metal, etc., has flexibility, and can move within the groove 18 of the side plate 6 according to the shape of the groove 18.

また、側板6の溝18の延長線上には、固定シャッタ2
2が設けてあり、固定/ヤノタ22は溝内を移動する移
動シャッタ20の端部と当接し、移動シャッタ20の移
動を制限する。更に、固定シャッタ22は槽2の内壁と
密接する。
Further, on the extension line of the groove 18 of the side plate 6, a fixed shutter 2 is provided.
2 is provided, and the stationary shutter 22 abuts against the end of the movable shutter 20 moving within the groove to limit the movement of the movable shutter 20. Furthermore, the fixed shutter 22 is in close contact with the inner wall of the tank 2.

また、側板6には、二つの移動シャッタ20間を閉塞す
る固定シャック24が設けてあり、固定シャッタ24は
移動シャッタ20と密接する構成である。
Further, the side plate 6 is provided with a fixed shack 24 that closes the space between the two movable shutters 20, and the fixed shutter 24 is configured to be in close contact with the movable shutter 20.

これらの移動シャッタ20及び固定シャンク22.24
は側板間にわたって設けてあり、移動シャッタ20が固
定シャッタ22と当接することにより、現像液が槽内に
密封状態に保たれる。したがって、現像液が空気と触れ
ることはなく、酸化して劣化することはない。なお、移
動シャンク20及び固定シャッタ22.24が現像液と
接触していると、現像液、定着液等の表面張力により現
像液、定着液等がこれらの上面に付着し、結晶が生ずる
などして密封性が悪くなる。そのため、移動シャッタ2
0及び固定シャッタ22.24は現像液と近接するよう
に設けることが好ましい。ここで、移動シャンク20及
び固定ンヤッタ22゜24と現像液との間には、わずか
の空気が存在しており、現像液が酸化してしまう。しか
し、この空気による酸化後は空気が飽和するので、以後
の酸化は起こらず、現像液に対する悪影響はほとんどな
い。
These moving shutters 20 and fixed shanks 22,24
is provided between the side plates, and when the movable shutter 20 comes into contact with the fixed shutter 22, the developer is kept in a sealed state within the tank. Therefore, the developing solution does not come into contact with air and does not deteriorate due to oxidation. Note that if the movable shank 20 and the fixed shutters 22, 24 are in contact with the developer, the developer, fixer, etc. may adhere to the upper surfaces of these due to the surface tension of the developer, fixer, etc., and crystals may form. This will result in poor sealing. Therefore, the movable shutter 2
It is preferable that the zero and fixed shutters 22 and 24 be provided in close proximity to the developer. Here, a small amount of air exists between the moving shank 20 and the stationary printers 22 and 24 and the developer, which causes the developer to oxidize. However, since the air becomes saturated after this oxidation with air, no further oxidation occurs and there is almost no adverse effect on the developer.

移動シャッタ20は矢印で示すように移動することがで
きる。感光材料Aを槽内に搬入する前に、まず各移動シ
ャッタ20を上方に引き上げて、各固定シャッタ22と
の間に所定の間隙を生じさせ、感光材料Aの搬送路を開
口する。そして、感光材料Aを現像液に浸漬して現像を
行い、感光材料Aを槽外に搬出した後に、各移動シャッ
タ20を下方に押し下げて、各固定シャッタ22と当接
させる。したがって、感光材料Aの現像中は、移動シャ
ッタ20と固定シャッタ22との間隙を介して現像液と
空気が接触するが、感光材料Aを現像していないときは
、現像液と空気との接触を極力防止することができる。
The movable shutter 20 can be moved as indicated by the arrow. Before carrying the photosensitive material A into the tank, first, each movable shutter 20 is pulled upward to create a predetermined gap between it and each fixed shutter 22, and a conveyance path for the photosensitive material A is opened. After the photosensitive material A is immersed in a developer to be developed and the photosensitive material A is carried out of the tank, each movable shutter 20 is pushed down and brought into contact with each fixed shutter 22. Therefore, while the photosensitive material A is being developed, the developer and air come into contact through the gap between the movable shutter 20 and the fixed shutter 22, but when the photosensitive material A is not being developed, the developer and the air come into contact with each other. can be prevented as much as possible.

第3図〜第5図は移動/ヤノタ2Qの下端部近傍の断面
図であり、幅方向中央において切断した図である。
3 to 5 are cross-sectional views of the vicinity of the lower end of the moving/yanota 2Q, taken at the center in the width direction.

第3図に示す移動シャッタ20は、下端の上部に所定厚
を有する密封部材26を幅方向にわたって設けた構成で
ある。移動ンヤンタ20が感光材料の搬送路を閉塞する
ときに、移動ンヤッタ20が固定シャッタ22と当接し
ないと、現像液を密封できない。移動シャッタ20の下
端の特に幅方向中央部は、自重により垂れ下がることが
あり、下端が垂れ下がると、移動シャッタ20は固定ン
ヤッタ22と幅方向にわたって当接することができない
。したがって、移動ンヤッタ20が搬送路を遮断しても
固定シャッタ22との間に空隙が生じてしまい、現像液
を密封することができない。
The movable shutter 20 shown in FIG. 3 has a structure in which a sealing member 26 having a predetermined thickness is provided across the width at the upper part of the lower end. When the moving shutter 20 closes the conveyance path of the photosensitive material, unless the moving shutter 20 comes into contact with the fixed shutter 22, the developer cannot be sealed. The lower end of the movable shutter 20, particularly the center portion in the width direction, may sag due to its own weight, and when the lower end sag, the movable shutter 20 cannot contact the fixed shutter 22 across the width direction. Therefore, even if the movable shutter 20 blocks the conveyance path, a gap is created between the movable shutter 20 and the fixed shutter 22, making it impossible to seal the developer.

そこで、あらかじめ移動シャッタ20の下端上部に密封
部材26を設けておくことにより、移動シャッタ20が
垂れ下がっても、移動シャッタ20と固定シャンク22
との空隙を密封部材26が閉塞するので、現像液を密封
することができる。
Therefore, by providing the sealing member 26 at the upper part of the lower end of the movable shutter 20 in advance, even if the movable shutter 20 hangs down, the movable shutter 20 and the fixed shank 20 can be separated.
Since the sealing member 26 closes the gap between the developer and the developer, the developer can be sealed.

第4図に示す移動シャッタ20は、下端の上部に高剛性
部材28を幅方向にわたって設けた構成である。この高
剛性部材28を設けたことにより、移動ンヤッタ20は
固定シャッタ22と当接するときに下端が垂れ下がるこ
とはなく、固定シャッタ22との間に空隙が生じること
なく固定ンヤッタ22と当接することができる。
The movable shutter 20 shown in FIG. 4 has a structure in which a highly rigid member 28 is provided across the width at the upper part of the lower end. By providing this highly rigid member 28, the lower end of the movable shutter 20 does not sag when it comes into contact with the fixed shutter 22, and the movable shutter 20 can come into contact with the fixed shutter 22 without creating a gap between the movable shutter 20 and the fixed shutter 22. can.

第5図は移動ンヤッタ20が固定シャッタ22と当接す
る位置の近傍に移動シャッタ支持部材30を幅方向にわ
たって設けた構成である。支持部材30を設けることに
より、移動シャッタ20が固定シャッタ22と当接する
ときに、移動シャッタ20が垂れ下がることはなく、移
動シャック20と固定シャッタ22との間に空隙が生じ
ることはない。また、移動シャッタ間に設けた固定シャ
ッタ24が移動シャッタ20の下端部を支持する構成で
あっても有効である。
FIG. 5 shows a structure in which a movable shutter support member 30 is provided across the width in the vicinity of the position where the movable shutter 20 contacts the fixed shutter 22. By providing the support member 30, when the movable shutter 20 comes into contact with the fixed shutter 22, the movable shutter 20 will not hang down, and no gap will be created between the movable shack 20 and the fixed shutter 22. It is also effective to have a configuration in which the fixed shutter 24 provided between the movable shutters supports the lower end portion of the movable shutter 20.

なお、移動シャッタ20の上下移動は手動により行って
もよいが、駆動手段を用いて自動により行うこともてき
る。この場合、感光材料Aの搬入と搬出に同期させて移
動ンヤソタ20を自動的に移動することができる。
Note that the movable shutter 20 may be moved up and down manually, but it can also be moved automatically using a driving means. In this case, the moving roller 20 can be automatically moved in synchronization with the loading and unloading of the photosensitive material A.

例えば、搬入側移動シャンク20より上流に感光材料検
出センサを設け、センサをシャッタ駆動手段と電気的に
接続する。そして、槽内に搬入する感光材料Aの前端を
センサが検出してから、感光材11Aが各移動シャッタ
20に達するときに同期して各移動シャッタ20を上方
に引き上げて、搬送路を開口する。
For example, a photosensitive material detection sensor is provided upstream of the carry-in side moving shank 20, and the sensor is electrically connected to the shutter drive means. Then, after the sensor detects the front end of the photosensitive material A carried into the tank, when the photosensitive material 11A reaches each movable shutter 20, each movable shutter 20 is synchronously pulled upward to open the conveyance path. .

そして、センサが感光材料Aの後端を検出してから、感
光材料Aが各移動シャッタ20を越えたときに同期して
各移動シャッタ20を押し下げて、搬送路を閉塞する。
Then, after the sensor detects the rear end of the photosensitive material A, when the photosensitive material A passes over each movable shutter 20, each movable shutter 20 is pushed down synchronously to close the conveyance path.

移動シャッタ20の作動制御は、例えば、センサによる
感光材料への検出からの時間に基づいて行う。
The operation of the movable shutter 20 is controlled, for example, based on the time since the sensor detected the photosensitive material.

なお、本実施態様は、移動シャッタ20を2つ設けた構
成であるが、2つの移動シャッタ20を一体に形成して
もよく、例えば、2つの移動シャンク20の対向部を接
続して固定し、2つの移動シャッタ20を同時に上下移
動する構成であってもよい。
Although this embodiment has a configuration in which two movable shutters 20 are provided, the two movable shutters 20 may be formed integrally, for example, the opposing parts of two movable shanks 20 may be connected and fixed. , the two movable shutters 20 may be moved up and down simultaneously.

また、本実施態様において、ラック側板6の厚みは10
市であるが、移動シャッタ20の移動のための溝18を
形成するには厚みが3 [0111以上であればよい。
Further, in this embodiment, the thickness of the rack side plate 6 is 10
However, in order to form the groove 18 for moving the movable shutter 20, the thickness should be 3 mm or more.

〔発明の効果〕〔Effect of the invention〕

本発明の写真感光材料処理用ラック機構によれば、ラッ
ク側板に形成した溝内で可撓性の移動シャッタを移動さ
せることにより、移動シャッタは固定シャッタと離接し
、処理液面上の写真感光材料搬送路を適宜開閉すること
ができる。したがって、写真感光材料を搬送しないとき
は搬送路を閉じて槽を密封し、処理液と空気との接触を
極力避けることができ、処理液の劣化を遅くすることが
できる。したがって長期間にわたって安定した処理を行
うことができる。
According to the rack mechanism for photographic photosensitive material processing of the present invention, by moving the flexible movable shutter within the groove formed in the side plate of the rack, the movable shutter comes into contact with and separates from the fixed shutter, and the photographic photosensitive material on the surface of the processing liquid is moved. The material conveyance path can be opened and closed as appropriate. Therefore, when the photographic light-sensitive material is not being transported, the transport path is closed and the tank is sealed, so that contact between the processing liquid and air can be avoided as much as possible, and deterioration of the processing liquid can be slowed down. Therefore, stable processing can be performed over a long period of time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は現像槽の概略断面図、 第2図はラック上部の斜視図、 第3図〜第5図は移動シャッタ下端部近傍の断面図であ
る。 図中符号: 2 槽         4 ラック 6 側板       8 搬送ローラ10 ヒータ 
    12 撹拌部材14 円板      16 
フィン 18 溝       20 移動シャッタ22 固定
シャッタ  24 固定シャッタ26 密封部材   
 28 高剛性部材30 支持部材 A 感光材料 (ぼか3名) 々〒 5し 図
FIG. 1 is a schematic sectional view of the developer tank, FIG. 2 is a perspective view of the upper part of the rack, and FIGS. 3 to 5 are sectional views of the vicinity of the lower end of the movable shutter. Symbols in the figure: 2 Tank 4 Rack 6 Side plate 8 Conveyance roller 10 Heater
12 Stirring member 14 Disc 16
Fin 18 Groove 20 Movable shutter 22 Fixed shutter 24 Fixed shutter 26 Sealing member
28 High rigidity member 30 Support member A Photosensitive material (3 people)

Claims (4)

【特許請求の範囲】[Claims] (1)処理液を収容した槽内に設けたラックの、対向す
る一対の側板間に略U字状に配設した複数対の搬送ロー
ラからなるローラトランスポート機構により、写真感光
材料を上方から搬入して処理液に浸漬し、槽底部で反転
して上方に搬出する写真感光材料処理用ラック機構であ
って、前記搬送ローラ間の一部に垂直方向の空隙を設け
て搬送ローラを配設し、前記側板の対向面に、垂直上方
から前記搬送ローラ間の空隙を通って処理液面の上方に
略水平に延びる溝を形成し、該溝内を両側端が挿通し前
記空隙における写真感光材料の搬送路を越えた位置で固
定シャッタにより上方からの移動を制限され、かつ該制
限位置に設けた固定シャッタと密接する可撓性の移動シ
ャッタを備えた写真感光材料処理用ラック機構。
(1) Photographic material is transported from above by a roller transport mechanism consisting of multiple pairs of transport rollers arranged in a substantially U-shape between a pair of opposing side plates of a rack installed in a tank containing processing liquid. A rack mechanism for processing photographic light-sensitive materials that is carried in, immersed in a processing solution, reversed at the bottom of the tank, and carried out upwards, wherein the carrying rollers are arranged with a vertical gap provided in a part between the carrying rollers. A groove is formed on the opposing surface of the side plate, extending vertically from above through the gap between the conveying rollers and substantially horizontally above the processing liquid level, and both ends of the groove are inserted into the groove to allow photographic exposure in the gap. A rack mechanism for processing photographic light-sensitive materials, comprising a flexible movable shutter whose movement from above is restricted by a fixed shutter at a position beyond a material conveyance path, and which comes into close contact with the fixed shutter provided at the restricted position.
(2)前記移動シャッタの前記固定シャッタと接する端
部の上部に、所定厚の部材を幅方向にわたって設けてな
る請求項(1)に記載の写真感光材料処理用ラック機構
(2) The rack mechanism for processing photographic light-sensitive materials according to claim 1, further comprising a member having a predetermined thickness provided across the width of the movable shutter at the upper end of the movable shutter in contact with the fixed shutter.
(3)前記移動シャッタの前記固定シャッタと接する端
部に、高剛性部材を幅方向にわたって設けてなる請求項
(1)または(2)に記載の写真感光材料処理用ラック
機構。
(3) The rack mechanism for processing photographic light-sensitive materials according to claim 1 or 2, further comprising a highly rigid member provided across the width at an end of the movable shutter that contacts the fixed shutter.
(4)前記移動シャッタの前記固定シャッタと接する端
部の下方に、移動シャッタ支持部材を設けてなる請求項
(1)から(3)のいずれか1項に記載の写真感光材料
処理用ラック機構。
(4) A rack mechanism for photographic material processing according to any one of (1) to (3), further comprising a movable shutter support member provided below an end of the movable shutter that contacts the fixed shutter. .
JP22044388A 1988-09-05 1988-09-05 Rack mechanism for photographic sensitive material processing Pending JPH0268549A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP22044388A JPH0268549A (en) 1988-09-05 1988-09-05 Rack mechanism for photographic sensitive material processing
US07/398,356 US4933699A (en) 1988-09-05 1989-08-24 Rack for processing photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22044388A JPH0268549A (en) 1988-09-05 1988-09-05 Rack mechanism for photographic sensitive material processing

Publications (1)

Publication Number Publication Date
JPH0268549A true JPH0268549A (en) 1990-03-08

Family

ID=16751193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22044388A Pending JPH0268549A (en) 1988-09-05 1988-09-05 Rack mechanism for photographic sensitive material processing

Country Status (1)

Country Link
JP (1) JPH0268549A (en)

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