JPH01312541A - Photosensitive material processing device - Google Patents

Abstract

PURPOSE:To prevent the occurrence of defects in a photosensitive material, such as processing irregularity, etc., by using a guide where a projecting part is formed which extends in a direction inclined with respect to the carrying direction of the photosensitive material. CONSTITUTION:Processing solution 3 is supplied from a solution supplying port 21 to a processing tank 2 and circulated in the processing tank 2. The processing solution 3 overflows the upper part of the processing tank and is discharged from a drainage port 22. When the photosensitive material 200 is carried, each carrying roller is rotated so that processing is performed by carrying the photosensive material 200 along a specified path and immersing it in the processing solution 3. When the photosensitive material 200 is carried along a specified carrying path, the projecting part 66 is formed on the guide surface of the guide. When the photosensitive material 200 is brought into contact with the guide surface 65, the bonding is prevented and slide resistance is reduced. The projecting part 66 is formed in a direction inclined at a specified angle with respect to the carrying direction A of the photosensitive material 200. Thus, the occurrence of the failures in the photosensitive material, such as processing irregularity, stripes, etc., can be prevented.

Description

Detailed Description of the Invention <Industrial Application Field> The present invention is applicable to photosensitive material processing, such as developing, bleaching/fixing, washing, etc. of photosensitive materials in, for example, silver halide photocopiers, automatic processors, etc. The present invention relates to an apparatus and a photosensitive material processing method.

<Prior Art> A silver halide photocopying machine copies an original image onto a photosensitive material, and has the advantage of being able to make high-quality copies compared to an electrophotographic copying machine.

In general, this copying machine sends photosensitive material from a magazine to an exposure section to expose an original image, and sends the exposed photosensitive material to a processing section where it is developed and produced into a copied image.

This processing section is equipped with a developing tank, a bleaching/fixing tank, and a washing tank, and the developing process is carried out by supplying a predetermined processing solution into each of these tanks and passing the photosensitive material in the exposed section sequentially. It will be done.

A photosensitive material processing apparatus that performs such processing is equipped with a group of conveyance rollers for conveying the photosensitive material and a guide for guiding the photosensitive material between the conveyance rollers on the downstream side in the conveyance direction. The photosensitive material carried into the processing tank is lowered, and then the photosensitive material is turned over at the bottom of the processing tank.
It is transported along a route that lifts it up and carries it out of the tank.

By the way, in order to prevent the guide surface on the side facing the photosensitive material from coming into close contact with the photosensitive material, it has been proposed that the guide surface be provided with unevenness.

However, on the emulsion side of the photosensitive material, the portions that closely oppose the convex portions of the guide surface have a more significant flow of processing liquid than other portions, and the processing is accelerated. Depending on the type of photosensitive material, there is a problem in that uneven development occurs due to differences in the degree of development progress.

In particular, when linear convex portions extending in the same direction as the conveying direction of the photosensitive material are arranged on the guide guide surface at predetermined intervals along the width direction of the photosensitive material, the convex portions are opposite to each other. Streak-like unevenness appears in some areas.

<Problems to be Solved by the Invention> An object of the present invention is to eliminate the drawbacks of the above-mentioned conventional techniques and to provide a photosensitive material processing apparatus that does not cause defects such as processing unevenness in the photosensitive material.

Means to solve problems〉 Such objects are achieved by the present invention as described below.

That is, the present invention is a process for processing a photosensitive material by immersing it in a processing solution. 1. A photosensitive material processing apparatus comprising: a transport roller, a group of transport rollers for transporting a photosensitive material along a predetermined route within the processing tank, and a plurality of guides installed along the transport route of the photosensitive material, the guide comprising: A photosensitive material processing apparatus characterized in that at least a part of the protrusion has a convex portion extending in a direction inclined with respect to the transport direction of the photosensitive material on the side facing the photosensitive material.

Further, it is preferable that the guide installed on the emulsion side of the light-sensitive material is a guide having the above-mentioned convex portion.

<Embodiments> Hereinafter, preferred embodiments of the photosensitive material processing apparatus of the present invention shown in the accompanying drawings will be described in detail.

[First Configuration Example] FIG. 1 is a cross-sectional side view showing a configuration example of a photosensitive material processing apparatus of the present invention. As shown in the figure, the photosensitive material processing apparatus 1a of the present invention has a vertically long processing tank 2.
(Two or more may be arranged in parallel), and the processing liquid 3 is put therein to a predetermined level. Incidentally, fl of the processing liquid 3 is determined depending on the use of the photosensitive material processing apparatus 1a.
Examples include a fixing solution and a cleaning solution (washing water, etc.). However, the photosensitive material processing apparatus 1a of the present invention is capable of processing other than development, bleaching/fixing, and washing (for example, inversion,
adjustment, stabilization, stopping, etc.).

The processing tank 2 has a shape and dimensions that allow it to comfortably accommodate a rack 4, which will be described later. At its bottom, there is a liquid supply port 21 for supplying the processing liquid 3 into the tank; A drain port 22 for discharging the processing liquid 3 is provided near the liquid level at the top of the tank.

A portion (approximately half of the rack) of a rack 4 that supports a transport row, a guide, etc. is immersed in the processing liquid 3 in the processing tank 2.

The rack 4 includes a pair of side plates 41 and 42, which are supported parallel to each other at regular intervals by stays (not shown) placed at the four corners between the side plates. It's been done.

Between these side plates 41, 42 are six pairs of transport rollers 52, 53, 54, 55, 56, immersed in the processing liquid 3.
A pair of transport rollers 51 and 58 are provided on the photosensitive material insertion side and discharge side, respectively, above the processing tank.

Furthermore, guides 91 and 92 are installed above the pair of transport rollers 51 and 58, respectively.

One end of the rotating shaft of one or both of the conveying rollers of each pair of conveying rollers 51 to 58 is extended to the outside of the side plate 16 or 18,
Gears are attached (not shown). These gears are meshed through predetermined relay gears, and are used to convey the photosensitive material including the morph, transmission, power transmission member, etc. installed outside the processing tank 2. When a rotational force is applied to one of the conveyance rollers by a driving means (not shown), the conveyance rollers of each pair of conveyance rollers rotate in a predetermined direction at a predetermined speed.

A lid body 8 composed of lid pieces 81, 82 and 83 fixed between side plates 41, 42 is installed near the liquid level of the processing liquid 3. An entrance 84 and an exit 85 for carrying the photosensitive material 200 are formed between the lid pieces 81 and 82 and between the lid pieces 82 and 83, respectively.

Note that the processing liquid may evaporate from the carry-in port 84 and the carry-out port 85, or the processing liquid in the processing tank may deteriorate due to contact with outside air.
In particular, in order to prevent oxidation, a shutter (not shown) may be provided to open and close the loading inlet 84 and the unloading outlet 85. As an example of the structure of this shutter, the lid 8
A movable lid that can be moved in the left-right direction in FIG. can be mentioned.

Guides 61 and 71, which will be described later, are installed between the pair of transport rollers 52 and 53, facing both sides of the photosensitive material 200, respectively. The guides 61 and 71 are for guiding the photosensitive material 200 between the pair of conveying rollers 530 on the downstream side in the conveying direction. Therefore, guides 61 and 7
1 are installed so as to be inclined so that their upper ends, that is, their ends on the conveying roller pair 53 side are close to each other.

Also, between the pair of conveying rollers 53 and 54, and between the pair of conveying rollers 55.
Guides 62, 72, 63, 73, and 64 are provided between the 56 questions and the pair of transport rollers 56, 57, respectively.
．． 74 has been installed. These guides are also the same as the above guides.

It has the same function as 61 and 71. Note that in the guides 63.73 and 64.74, since the photosensitive material 200 rises between the guides, the guides are installed at an angle so that the upper ends of the guides approach each other.

A 1-inversion guide 75 is installed at the bottom of the processing tank 2 . This reversing guide 75 has a curved surface curved in an arc shape, and the photosensitive material 2 is guided along this curved surface (guiding surface).
00 is inverted.

In addition, each of the above-mentioned guides is fixed between the side plates 41 and 42 by arbitrary attachment means.

The photosensitive material 200 is transported along a predetermined path by each of the transport roller pairs and guides. That is, guide 9
1 and the pair of transport rollers 51, the photosensitive material 200 is carried into the processing liquid 3 through the entrance 84, and then passed through the pair of transport rollers 52.
．． 53 and 54 in turn, and the guide 61.7
1 and the guides 62 and 72, it descends inside the processing tank 2. The photosensitive material 200 sent out from the transport roller pair 54 is reversed by a reversing guide 75 installed near the bottom of the processing tank 2, and is successively held between transport roller pairs 55, 56 and 57, and also by guides 63, 73 and 57. Guided by guides 64 and 74, it ascends inside the processing tank 2. Photosensitive material 200 sent out from conveyance roller pair 57
is pulled up from the processing liquid 3, transported out of the processing tank through the transport port 85, and sent to the next process via the transport roller pair 58 and the guide 92.

A space (
Hereinafter referred to as "inner space"), the photosensitive material 200 is normally transported with its emulsion side facing the inner space S (however, the back side of the photosensitive material 200 is the inner space S).
(Can also be transported on its side).

The photosensitive material processing apparatus of the present invention is characterized by the shape of the guide.

FIG. 4 is a front view showing the configuration of a guide installed in the photosensitive material processing apparatus 1a shown in FIG. 1. As shown in the figure, the photosensitive material 200 of the guide 61, 62, 63, 64
The guide surface 65, which is the surface facing the photosensitive material 20
Linear convex portions 66 extending in a direction inclined at a predetermined angle with respect to the transport direction A of 0 are formed at predetermined intervals, preferably at equal intervals, in the width direction of the photosensitive material 200. This convex portion 66 can reduce the sliding resistance when the photosensitive material 200 comes into contact with the guide surface 65 of the guide.

Further, a slit-shaped opening 67 is formed between adjacent convex portions 66,66. This opening 67 allows the processing liquid 3 to pass through the guide, promoting flow and stirring of the processing liquid.

Note that the shape and formation pattern of this opening are not limited to those shown in the drawings.

The linear protrusions 66 are not all inclined in the same direction, but as shown in FIG. The reason is that if all the convex portions are inclined in the same direction, as the photosensitive material 200 slides along the guide surface 65 of the guide, the photosensitive material 200 will be unevenly distributed on one side of the guide. It is from.

Further, it is preferable that the linear convex portion 66 is formed so as to widen toward both ends of the guide when viewed from the downstream side in the conveyance direction of the photosensitive material 200.

This is because if the convex portions 66 are formed in such a pattern, the tip portion 202 of the photosensitive material 200 can be scooped up, and it is possible to prevent snagging, folding, etc.

Inclination angle α of the linear convex portion 66 with respect to the photosensitive material conveyance direction
Regarding α, when α becomes smaller, the photosensitive material tends to become uneven and the photosensitive material is more likely to be damaged by the protrusions 66, and conversely, when α becomes larger, the photosensitive material tends to hit the protrusions 66.

Therefore, it is preferable that the inclination angle α is about 25° to 40°.

According to the guide having the convex portions 66 in the above-described pattern,
5. When transporting the photosensitive material 200. The convex portion 66 is the photosensitive material 20
0 closely face each other or come into contact over time over almost the entire surface, so that uneven processing can be prevented. Therefore, a guide whose guiding surface 65 faces the emulsion surface of the photosensitive material 200;
That is, it is preferable to apply a guide having the above-described pattern of convex portions 66 to all or some of the guides 61, 62, 63, and 64 installed in the inner space S.

Moreover, in the present invention, the guide 71.72.73.74.7
5. A guide having the convex portion 66 in the pattern described above may be applied to all or part of 91 and 92. In particular, when the convex portion 66 is provided on the reversing guide 75, the tip of the photosensitive material There is also the advantage that damage to 202 is reduced.

In the present invention, the term "protrusion" is not limited to cases in which a protrusion is actively provided like the above-mentioned protrusion 66, but is a broad concept that includes everything that functions as a protrusion. For example, in a guide that has a recess or through hole recessed from the guide surface of the guide, the portion other than the recess or through hole actually functions as a convex portion, so such a portion is
It is included in "convex part".

The constituent materials of each of the above guides are durable and chemically resistant to the processing liquid 3 (no deformation, expansion, strength reduction, etc.), and do not alter the processing liquid and adversely affect development characteristics, etc. Preferred examples include various resins such as nylon, Teflon, hard vinyl chloride, polypropylene, and polyethylene, ceramics such as alumina, corrosion-resistant metals such as stainless steel, titanium, and Hastelloy, or combinations thereof. be able to.

Further, the entire guide surface or the convex portion 66 of the guide may be subjected to various treatments such as the following depending on the purpose. For example, depending on the constituent material of the guide, the entire guide surface or the convex portion 66 may be
Various surface treatments such as coating with Teflon, nylon, fluororesin, electrolytic polishing, electrolytic or dip plating can be applied to the surface.

Furthermore, the materials constituting each of the conveyance roller pairs 51 to 58 are the same as those of the guide, and the shapes (such as whether they are continuous in the axial direction) and the configurations of the conveyance rollers in the inner space S and the other conveyance rollers are the same. Materials etc. may be different.

[Second Configuration Example] FIG. 2 is a sectional side view showing another configuration example of the photosensitive material processing apparatus of the present invention, and FIG. 5 is a front view showing the configuration of a guide installed in the apparatus.

The photosensitive material processing apparatus 1'ts shown in FIG. 2 differs from the photosensitive material processing apparatus 1a of the first configuration example in the shape of the guide, but the other configurations and functions are the same, so a description thereof will be omitted.

As shown in FIG. 2, the guide 100 serves as the guides 61 and 64 in the photosensitive material processing apparatus 1a, and the guide 101 also serves as the guides 62 and 63.

As shown in FIG.
The guide plate 102 is fixed to the shaft 105 with a boss 104 at a predetermined interval.

Each guide plate 102 has an inclined portion 103 as a convex portion inclined at a predetermined angle with respect to the conveying direction of the photosensitive material 200.

FIG. 7 is a front view showing the configuration of guides 100, 101, which are modified examples of the guides 100 and 101.

As shown in the figure, the guides 10 and 101 are connected to the shaft 1 installed between the side plates 41 and 42.
05, and a flat guide plate 106 is fixed to the shaft 105 with a boss 107 at a predetermined interval. This guide 100・, 101
-, the entire side end portion of the guide plate 106 functions as a convex portion.

In the guides 100, 101, 100, and 101, the installation pattern of the inclined portion 103 or the guide plate 106, the inclination angle α, the application target of the guide, the constituent materials, etc. are the same as those of the guides 61 to 64 in the first configuration example. The same is true.

[Third Configuration Example] FIG. 3 is a cross-sectional side view showing another configuration example of the photosensitive material processing apparatus of the present invention, and FIG. 6 is a perspective view showing the configuration of a guide installed in the apparatus.

The photosensitive material processing apparatus 1c shown in FIG. 3 differs from the photosensitive material processing apparatus la of the first configuration example in the shape of the guide, but the other configurations and functions are the same, so a description thereof will be omitted.

As shown in FIG. 3, the guide 120 serves as the guides 61 and 64 in the photosensitive material processing apparatus 1a, and the guide 121 also serves as the guides 62 and 63.

These guides 120 and 121 occupy most of the inner space S, and are intended to reduce dead space within the processing tank 2. This reduces the amount of processing liquid in the processing tank 2 and increases the exchange rate of the processing liquid, thereby stabilizing the processing liquid.

In addition, in order to sufficiently reduce the dead space, the occupation rate of the inner space S by the guides 120 and 121 is set to 70
% or more is preferable.

As shown in FIG. 6, such guides 120 and 121 are in the form of a block having a predetermined volume in order to occupy the inner space S, and are preferably shaped like side plates 41 and 42.
Kake is passed as a continuum between . Further, the guides 120 and 121 may be hollow or solid, but hollow members are preferable from the viewpoint of reducing material costs and reducing weight.

On the opposing surface of this guide 120, 121, there is a photosensitive material 20
Guide surfaces 122 and 123 are formed for guiding the 0 to between the conveying rollers on the downstream side in the conveying direction. This guide surface 1
22 and 123 have linear convex portions 124 that are inclined at a predetermined angle with respect to the conveying direction of the photosensitive material 200.
They are formed at predetermined intervals in the width direction of 0.

In addition, in the guides 120 and 121, the installation pattern of the convex portions 124, the inclination angle α, the application target of the guide, the constituent material, the surface treatment, etc. are the same as the guide 6 in the first configuration example.
] to 64.

Further, in the illustrated example, the guides 120 and 121 are separate members, but they may be connected or may be formed as a single piece.

Although the first, second, and third configuration examples have been representatively described above, it goes without saying that the present invention is not limited to these examples.

Function> Next, the function of the photosensitive material processing apparatus 1a of the present invention will be explained.

The processing liquid 3 is supplied into the processing tank 2 from the liquid supply port 21 at the bottom of the processing tank and circulates within the processing tank 2 .

At the upper part of the processing tank, the processing liquid 3 overflows and is discharged from the drain port 22.

When conveying the photosensitive material 200, each conveyance roller is rotated by the operation of the aforementioned photosensitive material conveyance driving means (not shown), the photosensitive material 200 is conveyed along a predetermined path, and is immersed in the processing liquid 3 for processing. That is, the photosensitive material 200 that has passed through the guide 91 and the pair of conveyor rollers 51 is carried into the processing liquid 3 through the inlet 84, and is held between the pair of conveyor rollers 52, between the guides 61 and 71, between the pair of conveyor rollers 53, and between the guides 61 and 71, between the pair of conveyor rollers 53, and 62.7
It passes through the two rollers and the pair of transport rollers 54 in order, and then descends inside the processing tank 2 .

The photosensitive material 200 sent out from the conveyance roller pair 54 is
It is reversed by the reversing guide 75, held between the pair of conveyance rollers 55, and ascends within the processing tank 2 through sequentially between the guides 63 and 73, between the pair of conveyance rollers 56, between the guides 64 and 74, and between the conveyance roller 'A57. The photosensitive material 200 sent out from the transport roller pair 57 is pulled up from the processing liquid 3 and transported out of the processing tank through the transport port 85.
8 and a guide 92 before being sent to the next process.

When the photosensitive material 200 is conveyed along such a conveyance route, the convex portion 66 is formed on the guide surface of the guide, so that when the photosensitive material 200 and the guide surface 65 come into contact, they are prevented from coming into close contact. Therefore, sliding resistance is reduced.

Further, since the convex portion 66 is formed in a direction inclined at a predetermined angle with respect to the conveyance direction A of the photosensitive material 200, the convex portion 66 covers almost the entire surface of the photosensitive material 200 over time when the photosensitive material 200 is conveyed. Therefore, defects such as uneven processing of the photosensitive material and generation of streaks are prevented.

<Effects of the Invention> According to the photosensitive material processing apparatus of the present invention, defects such as uneven processing of the photosensitive material can be avoided by using a guide formed with a convex portion extending in a direction oblique to the conveying direction of the photosensitive material. can be prevented.

[Brief explanation of the drawing]

FIG. 1, FIG. 2, and FIG. 3 are sectional side views each showing a configuration example of a photosensitive material processing apparatus of the present invention. FIG. 4 is a front view showing the configuration of a guide used in the photosensitive material processing apparatus shown in FIG. 1. FIG. FIG. 5 is a front view showing the configuration of a guide used in the photosensitive material processing apparatus shown in FIG. 2. FIG. 6 is a perspective view showing the configuration of a guide used in the photosensitive material processing apparatus shown in FIG. 3. FIG. 7 is a front view showing a modification of the guide shown in FIG. 5. FIG. Explanation of symbols 1a, 1b, 1c...Photosensitive material processing apparatus, 2...
- Processing tank, 21...Liquid supply port, 22...Drain port, 3...Processing liquid, 4...Rack, 41.42...Side plate, 51.52. 53.54.55.56.57.58...
...Transport roller pair, 61.62.63.64...Guide, 65...
Guide surface, 66...Protrusion, 67...Opening, 71.72.73.74-Skewer...Guide, 75...
Reversing guide, 8... Lid body, 81.82.83... Lid piece, 84... Carrying inlet, 85... Carrying out outlet, 91.92... Guide, 100, 101.10 Discharge, 101... Guide, 102.106... Guide plate, 103... Inclined part, 104.107... Boss, 105... Shaft. 120.121...Guide. 122.123... Guide surface, 124... Convex portion, 200... Photosensitive material, 202... Tip, S... Inner space FIG, 1 FIG, 2 Ml('' :, Ft

Claims (2)

[Claims] (1) A processing tank for processing the photosensitive material by immersing it in a processing solution, a group of transport rollers for transporting the photosensitive material along a predetermined route within the processing tank, and a group of transport rollers installed along the transport route of the photosensitive material. A photosensitive material processing apparatus having a plurality of guides, wherein at least a part of the guides has a convex portion extending in a direction oblique to the conveying direction of the photosensitive material on a side facing the photosensitive material. A photosensitive material processing device characterized by: (2) The photosensitive material processing apparatus according to claim 1, wherein the guide installed on the emulsion side of the photosensitive material is a guide having the convex portion.