JPH0268435U - - Google Patents
Info
- Publication number
- JPH0268435U JPH0268435U JP14763488U JP14763488U JPH0268435U JP H0268435 U JPH0268435 U JP H0268435U JP 14763488 U JP14763488 U JP 14763488U JP 14763488 U JP14763488 U JP 14763488U JP H0268435 U JPH0268435 U JP H0268435U
- Authority
- JP
- Japan
- Prior art keywords
- etching
- emission intensity
- end point
- plasma emission
- intensity curve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14763488U JPH0268435U (bg) | 1988-11-11 | 1988-11-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14763488U JPH0268435U (bg) | 1988-11-11 | 1988-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0268435U true JPH0268435U (bg) | 1990-05-24 |
Family
ID=31418220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14763488U Pending JPH0268435U (bg) | 1988-11-11 | 1988-11-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0268435U (bg) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009206275A (ja) * | 2008-02-27 | 2009-09-10 | Hitachi High-Technologies Corp | エッチング終点判定方法 |
| JP2012238734A (ja) * | 2011-05-12 | 2012-12-06 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法及半導体製造装置 |
| JP2013102215A (ja) * | 2013-01-31 | 2013-05-23 | Hitachi High-Technologies Corp | プラズマエッチング装置 |
-
1988
- 1988-11-11 JP JP14763488U patent/JPH0268435U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009206275A (ja) * | 2008-02-27 | 2009-09-10 | Hitachi High-Technologies Corp | エッチング終点判定方法 |
| JP2012238734A (ja) * | 2011-05-12 | 2012-12-06 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法及半導体製造装置 |
| JP2013102215A (ja) * | 2013-01-31 | 2013-05-23 | Hitachi High-Technologies Corp | プラズマエッチング装置 |