JPH026085A - Electron beam processing device - Google Patents

Abstract

PURPOSE:To reduce the size and cost of the device by providing electron beam generating and accelerating sections to the device, disposing a pulse beam generator to a power source section, and installing an impedance controller further at need thereto. CONSTITUTION:The filament power source 4 which generates the electron beam 5 from the surface of a bar-shaped electrode 3A, an acceleration power source 11 and a bias power source 8 are provided. A pulse beam generator 18 is provided to the outlet side of the power source 8 and if necessary, an impedance control circuit 21 consisting of a pulse output detecting circuit 22 and a pulse output transient state control circuit 23 is disposed thereto. The electron beam 5 is converted to pulses when the output voltage of the power source 8 is on-off controlled by the generator 18. Further, the impedance control circuit 21 steepens the pulse beams. Since the continuous electron beam and pulse beams can be generated by the same device, the device is miniaturized the cost thereof is reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to improvement of an electron beam processing device.

[Conventional technology]

FIG. 3 is a route diagram showing the configuration of a conventional electron beam processing apparatus disclosed in, for example, Japanese Patent Application Laid-Open No. 59-128748.
It is configured as a welding device. In this figure, (1) is the welding chamber, (2) is the workpiece to be welded housed in this welding chamber, and (3) is the electron gun that generates the electron beam for welding, including a rod-shaped cathode (3A), a filament) ( 3B) and a Wehnelt electrode (3C). (4) is a power source for the filament, which generates an electron beam (5). (6A) and (6B) are coils for converging the electron beam (5), (7) is an impact power source for the filament power source, (8) is a bias power source for controlling the amount of electron beam, (9) ) is an electron beam current setting device, (1) is a controller that performs control corresponding to the setting value of the setting device, (111 is a power source for accelerating the electron beam,
It consists of a step-up transformer (11A), a rectifier (IIB), and a smoothing capacitor (IIC). (12A
) (12B) is a voltage dividing resistor for detecting the accelerating power supply voltage, 0Q is a detection resistor for detecting the electron beam current, Oa is an accelerating voltage setting device, (151 is the setting for the above setting device 0) A controller that performs control corresponding to the value (IE
is a voltage regulator that adjusts the voltage of the AC power supply (1η) in response to the controller.

Next, the operation of the conventional device will be explained.

First, the filament (3B) of the electron gun (3) is heated by the filament power source (4), and the thermoelectrons generated therefrom are accelerated by the impact power source (7), and then they are applied to the rod-shaped cathode (3A) for impact. When heated, thermoelectrons are generated from the surface. By accelerating this generated heat and electrons with an accelerating power source (111).

An electron beam (5) is generated. The generated electron beam (5) is focused by coils (6A) (6B) and applied to the material to be welded (2) in the welding chamber (1), thereby melting the joint surface of the material to be welded (2). and perform welding.

On the other hand, the current amount of the electron beam (5) is controlled by the Wehnelt electrode (3C), which has the same function as the grid of a triode vacuum tube.
A negative potential is applied to the rod-shaped cathode (3A) by a bias power supply (8), which has a negative potential.

The amount of electron beam current is detected by a detection resistor (IJ) and sent to the controller aol.
This is controlled by the set current of the electron beam current setter (9).

In addition, an accelerating power source fill to obtain the electron beam (5)
The voltage regulator (16) supplies the AC power (1 voltage) to the negative side of the step-up transformer (11A), and the boosted secondary voltage is passed through the rectifier (IIB) and the smoothing capacitor (IIC).
) to generate high DC voltage.

This DC high voltage control is performed using a detection resistor (12A) (12
B), the voltage is turned on to the controller Q51, and the voltage is controlled to be the set voltage of the acceleration voltage setting device (14).

[Problems to be Solved by the Invention] A conventional electron beam processing apparatus is configured as described above, and an electron beam is continuously generated.

However, depending on the type of processing, a pulsed electron beam may be required, but conventional equipment cannot meet such requirements, so it has been necessary to separately prepare a pulsed electron beam generator.

The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide an electron beam processing apparatus capable of generating a continuous electron beam and a pulsed electron beam.

[Means for Solving the Problems] An electron beam processing apparatus according to the present invention includes a power source for a control unit that controls the amount of electron beam of an electron gun that generates a continuous electron beam similar to the conventional one. A device is provided to control the amount of the electron beam by controlling the power output of the control unit by this electrical manufacturing. s It is something that is obtained in a loose form.

[Effect]

In the electron beam generator of the present invention, when the power output of the control unit is controlled by a device (pulsed beam generator) connected to the power supply of the control unit of the electron gun, a pulsed electron beam is supplied to the processing chamber. If the processing chamber is not controlled by stopping the operation of the pulsed beam generator and controlling the power output of the control unit, a continuous electron beam will be irradiated into the processing chamber, and a special device that generates a pulsed electron beam is prepared. Depending on the shape of the workpiece, continuous electron beams and pulsed electron beams can be used without

[Embodiments of the invention]

An embodiment of the present invention will be described below with reference to FIG.

In this figure, the forces (1) to 0 are equivalent to those in the conventional device shown in FIG. 3, and therefore their explanation will be omitted. In addition, (formerly, it was a pulse beam generator connected to the output side of the bias power supply (8), and was designed to control the voltage of the bias power supply (8) on and off. The main controller is a controller that controls the on/off of the pulse beam generator (formerly known as the old one) in accordance with the setting value of the pulse beam condition setter α.

Next, the operation of this embodiment will be explained.

First, the filament (3B) of the electron gun (3) is heated by the filament power source (4), and electrons are generated from the surface of the rod-shaped cathode (3A) by the impact power source (7).

A continuous electron beam (5) is generated by accelerating the generated electrons with an accelerating power source αD, and this is generated in the welding chamber (1
) is irradiated onto the workpiece (2).

The current amount of the electron beam (5) is controlled by the bias power supply (8).
It is carried out by When the output voltage of the bias power supply (8) is controlled on and off by the pulse beam generator, the current amount of the electron beam (5) can be made into a pulse.

The conditions of the pulsed electron beam can be set by the pulsed beam condition setter 4, and in accordance with this set value, the controller 2 gives an on/off signal to the pulsed beam generation wave @α to control the electron beam (5). The current amount is controlled to a predetermined pulse beam.

According to this embodiment, as described above, both a continuous electron beam and a pulsed electron beam can be generated. However, when generating a pulsed electron beam, the output section of the bias power supply circuit or the electron gun (3 ) Due to the influence of stray capacitance existing between the rod-shaped cathode (3A) and the Wehnelt electrode (3C), the pulse output does not change sharply but changes exponentially, making it difficult to obtain accurate pulse output. accompanied.

Note that if the resistance value between the rod-shaped electrode of the electron gun and the Wehnelt electrode is reduced, the effect of stray capacitance that exists between them can be avoided, but on the other hand, the power generated by the bias power supply circuit increases, and the device It has the disadvantage of being larger.

In consideration of these drawbacks, FIG. 2 shows an embodiment in which the pulse output of the electron beam can be made steeper without increasing the power generated by the bias power supply circuit.

In this figure, 211 is the pulse beam generator full
an impedance control device connected in parallel with the pulse beam generator (18);
A pulse output detection circuit that detects a transient state when a pulse beam is generated and generates an output; and a rod-shaped cathode (3A) of an electron gun (3) that operates in response to the output from the pulse output detection circuit. and a pulse output transient state control circuit (c) that reduces the impedance between the wehnelt electrode (3C) and the Wehnelt electrode (3C).

The rest of the configuration is the same as the embodiment shown in FIG. 1, so a description thereof will be omitted.

Therefore, when the pulse beam generator (older) operates and outputs a pulse beam, the pulse output detection circuit detects this, generates an output when the pulse beam is in a transient state, and controls the pulse output transient state. Operate the circuit.

As a result, the impedance between the rod-shaped cathode (3A) and the Wehnelt electrode (3C) of the electron gun (3) becomes small,
During this time, the charge accumulated as stray capacitance is instantaneously discharged. This causes the pulse beam output to change sharply.

When the pulse beam reaches a steady state, the output of the pulse output detection circuit stops, so the pulse output transient state control circuit ('
Yu also stops moving.

In this way, in this embodiment, the impedance between the rod-shaped cathode (3A) and the Wehnelt electrode (3C) is reduced only when the pulse beam is in the transient state, so the power generated by the bias power supply circuit is reduced. It becomes possible to obtain a steep pulse beam without increasing the beam size.

〔Effect of the invention〕

As described above, according to the present invention, the electron gun of the electron beam processing device is configured to be able to generate both a continuous electron beam and a pulsed electron beam, and the pulsed electron beam has a steep pulse output. Since the apparatus is constructed so that the electron beams can be obtained, the apparatus is less expensive and can be constructed more compactly than in the case where separate electron beam generating apparatuses for generating each electron beam are prepared.

[Brief explanation of the drawing]

FIG. 1 is a route map showing one embodiment of the invention, FIG. 2 is a route map showing another embodiment of the invention, and FIG. 3 is a route map showing a conventional device. In the figure, (1) is the welding room, (2) is the workpiece, (3) is the electron gun, (4) is the filament power source, (7) is the impact power source, (
8) is a bias power supply, U is an accelerating power supply, (18 is a pulse beam generator, a9 is a pulse beam condition setting device, ■ is a controller, (21) is an impedance control device, (Foundation) is a pulse output detection circuit, This is a pulse output transient state control circuit. In the figure, the same reference numerals indicate corresponding parts.

Claims (2)

[Claims] (1) A processing chamber that accommodates the workpiece, an electron beam generation section that generates a processing electron beam that is irradiated onto the workpiece, an acceleration section that accelerates the electron beam, and controls the amount of the electron beam. A pulse beam generator is connected to the power source of the control unit and controls the output of the electron gun to generate a pulsed electron beam, and the pulse beam generator is connected to a power supply of the control unit to generate a continuous electron beam and a pulsed electron beam. An electron beam processing device capable of generating a shaped electron beam. (2) A processing chamber that accommodates the workpiece, an electron beam generation section that generates a processing electron beam that is irradiated onto the workpiece, an acceleration section that accelerates the electron beam, and controls the amount of the electron beam. an electron gun having a control unit, a pulse beam generator connected to a power source of the control unit and controlling the output of the electron beam to pulse the amount of the electron beam, and a parallel relationship with the pulse beam generator; connected to,
An electron beam processing device comprising an impedance control device that detects the transient state of the pulsed beam and controls impedance between the electron beam generation section and the control section of the electron gun, and obtains a steep pulsed beam output. .