JPH0261773B2 - - Google Patents
Info
- Publication number
- JPH0261773B2 JPH0261773B2 JP9091883A JP9091883A JPH0261773B2 JP H0261773 B2 JPH0261773 B2 JP H0261773B2 JP 9091883 A JP9091883 A JP 9091883A JP 9091883 A JP9091883 A JP 9091883A JP H0261773 B2 JPH0261773 B2 JP H0261773B2
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- ripple
- electron beam
- ripples
- accelerating voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 11
- 230000001133 acceleration Effects 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 description 8
- 238000009499 grossing Methods 0.000 description 8
- 230000004075 alteration Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
- H01J37/241—High voltage power supply or regulation circuits
Description
【発明の詳細な説明】
この発明は、電子ビーム溶接機や電子ビーム加
工機などの電子ビーム機器の改良に関するもの
で、特に、ビーム電流中のリツプル含有率の低減
を図つた電子ビーム発生装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in electron beam equipment such as electron beam welding machines and electron beam processing machines, and particularly relates to an electron beam generator that aims to reduce ripple content in beam current. .
電子ビーム機器で溶接、加工等を行う場合、そ
の加速電圧中にリツプルが多く含まれると、ビー
ムの絞りの色収差が大きくなり、シヤープに集束
されたビームが得られない事は良く知られている
所である。ところが、実際に微細な溶接や加工を
行わせると、その他に、ビーム電流中のリツプル
も、溶接又は加工の仕上がり精度に多大に影響
し、ビーム電流中のリツプルを低く抑える為、色
収差からの要求以上に加速電圧中のリツプルを減
少させて使用しているのが現状である。第1図
が、従来のこの種装置の構成を示すブロツクダイ
ヤグラムで、13は、交流電源1からの交流電力
を制御して、昇圧トランス2に供給するためのト
ライアツクやSCRなどの電力制御素子で、サー
ポアンプ12の出力により駆動される。サーポア
ンプ12は、加速電圧出力を分圧するための倍率
器9と8′で接地される検出抵抗9′により得られ
る加速電圧検出信号と基準電源10と加速電圧設
定器11により作成される加速電圧指令信号を比
較し、誤差があれば、それをなくす方向に電力制
御素子13に対して信号を出す。3は整流器で、
昇圧トランス2により所要の電圧にされた交流を
整流し、チヨーク4、平滑コンデンサ5により構
成される平滑回路に供給する。31は直熱型カソ
ードのフイラメントで加熱電源6により加熱さ
れ、一端を加速電圧出力、すなわち平滑コンデン
サ5の高圧側に接続されている。32は、グリツ
ドで、バイアス電源7より供給される、バイアス
電圧によりビーム電流34を制御する。33は、
アノードで8″で接地される。35は、ビーム被
照射物、すなわちワークで8で接地される。50
はフイラメント6、グリツド32、アノード33
を収容する電子ビーム室で、図示されない排気装
置で、その内部を所要の真空度まで排気されてい
るものとする。この様な構成で示される装置のビ
ーム電流中に含まれるリツプル分ipは、バークハ
ウゼンの方程式より、次のように示される。 It is well known that when performing welding, processing, etc. with electron beam equipment, if the accelerating voltage contains many ripples, the chromatic aberration of the beam aperture increases, making it impossible to obtain a sharply focused beam. It's a place. However, when detailed welding or processing is actually performed, ripples in the beam current also greatly affect the finishing accuracy of the welding or processing, and in order to keep ripples in the beam current low, requirements due to chromatic aberration are Currently, the ripple in the accelerating voltage is reduced in use. FIG. 1 is a block diagram showing the configuration of a conventional device of this type. Reference numeral 13 denotes a power control element such as a triac or SCR for controlling the AC power from the AC power supply 1 and supplying it to the step-up transformer 2. , driven by the output of the servo amplifier 12. The servo amplifier 12 receives an acceleration voltage detection signal obtained by a detection resistor 9' grounded by multipliers 9 and 8' for dividing the acceleration voltage output, and an acceleration voltage command created by a reference power supply 10 and an acceleration voltage setting device 11. The signals are compared, and if there is an error, a signal is sent to the power control element 13 in a direction to eliminate the error. 3 is a rectifier,
The alternating current that has been made to a required voltage by the step-up transformer 2 is rectified and supplied to a smoothing circuit constituted by a choke 4 and a smoothing capacitor 5. Reference numeral 31 denotes a directly heated cathode filament which is heated by the heating power source 6 and has one end connected to the accelerating voltage output, that is, the high voltage side of the smoothing capacitor 5 . A grid 32 controls the beam current 34 using a bias voltage supplied from the bias power supply 7. 33 is
8" is grounded at the anode. 35 is grounded at 8" at the beam irradiated object, that is, the workpiece. 50
are filament 6, grid 32, anode 33
It is assumed that the inside of the electron beam chamber is evacuated to a required degree of vacuum using an exhaust device (not shown). The ripple component ip contained in the beam current of an apparatus having such a configuration can be expressed as follows from Barkhausen's equation.
ip=gmeg+1/ρep
ここで、
ip…ビーム電流中の微小変動分(リツプル)
ep…バイアス電圧中の微小変動分(リツプル)
gm…電子銃の増幅率
ρ…電子銃の内部抵抗
egは、一般に殆んどゼロに近い値に選ばれる
ので、この項を無視すると、ビーム電流中のリツ
プルは、加速電圧中のリツプルにより決定され
る。したがつてビーム電流中のリツプルを減らし
て、特性の良いビームを得ようとする時は、高圧
のリツプルを減らしてepを少なくする方法が用
いられて来た。ところが十分なリツプル低減効果
を得ようとする場合、平滑チヨーク4、平滑コン
デンサ5の容量が多大なものとなり、サーポアン
プ12のレスポンス特性を悪化し、急速な負荷変
動や電源電圧変動に追従できなくなるという欠点
を有していた。 ip=gmeg+1/ρep Where, ip...minimal variation in beam current (ripple) ep...minimal variation in bias voltage (ripple) gm...amplification factor of electron gun ρ...internal resistance of electron gun eg is generally If this term is ignored since it is chosen to be almost zero, the ripple in the beam current is determined by the ripple in the accelerating voltage. Therefore, when trying to obtain a beam with good characteristics by reducing ripples in the beam current, methods have been used to reduce high voltage ripples and reduce ep. However, in order to obtain a sufficient ripple reduction effect, the capacitance of the smoothing circuit 4 and the smoothing capacitor 5 becomes large, which deteriorates the response characteristics of the servo amplifier 12 and makes it impossible to follow rapid load fluctuations and power supply voltage fluctuations. It had drawbacks.
この発明は、かかる不具合をなくすべく構成し
たもので、加速電圧中のリツプルを、ビームの絞
りの色収差を所要の値に収めるため必要な値ま
で、許容値をひろげ、平滑用チヨーク4、平滑用
コンデンサ5の値を必要最小限に留めてサーボア
ンプ12のレスポンス特性を所要の値まで向上さ
せ、ビーム電流中のリツプルは、アノードに加速
電圧中のリツプルと、同相で振幅の同じ交流補正
信号を印加する事により、アノードとカソード間
の電圧に含まれるリツプル成分を相殺し、極めて
わずかな値にしようとするものである。 The present invention is configured to eliminate such problems, and expands the allowable value of ripples in the accelerating voltage to the value necessary to keep the chromatic aberration of the beam aperture within the required value. The response characteristics of the servo amplifier 12 are improved to the required value by keeping the value of the capacitor 5 to the minimum necessary value, and the ripples in the beam current are handled by sending an AC correction signal that is in phase and has the same amplitude as the ripples in the accelerating voltage to the anode. By applying this voltage, the ripple component contained in the voltage between the anode and the cathode is canceled out, and the ripple component is reduced to an extremely small value.
第2図は、この発明の一実施例を示す図であ
る。図で第1図の構成要素と同じものには、同一
番号を付してあるので、説明を省略する。14
は、コンデンサに流れるリツプル電流から、補正
信号を作成するための補正用昇圧トランスで、一
次側は平滑コンデンサ5と直列に加速電圧出力端
に接続され、二次側は、一次側と同相となるよう
に、一端は8で接地、他端はアノードに接続さ
れる。15は補助電極で、8′′′′で接地される。
したがつて実質的な加速電圧はフイラメント31
と、この補助電極15の間の電圧という事にな
る。アノード33を補助電極15間には静電レン
ズが構成される事になるが、補助電極に印加され
る電圧が、加速電圧の数%である事から、その影
響は無視出来る。このような構成の装置では、干
滑コンデンサ5の容量は、ビームの絞りの色収差
だけを考えて選定出来るので、その値は小さくサ
ーボアンプ12のレスポンスに悪影響を与える事
はない。又、アノードに印加される補正電圧は、
位相が加速電圧のリツプルと同相で、振幅が同じ
であり、かつビーム電流の増減に伴つて、リツプ
ル電圧が変化しても、それに追従して、補正電圧
も増減するので、フイラメントとアノード間の電
圧のリツプル電圧成分は常に極めて小さな値に保
たれる。その結果、ビーム電流中のリツプルも極
めて小さな値となり、特性の良いビームを得る事
が出来る。 FIG. 2 is a diagram showing an embodiment of the present invention. Components in the figure that are the same as those in FIG. 1 are designated by the same numbers, and their explanations will be omitted. 14
is a correction step-up transformer for creating a correction signal from the ripple current flowing through the capacitor.The primary side is connected to the accelerating voltage output terminal in series with the smoothing capacitor 5, and the secondary side is in phase with the primary side. , one end is grounded at 8 and the other end is connected to the anode. Reference numeral 15 denotes an auxiliary electrode, which is grounded at 8'''''.
Therefore, the actual accelerating voltage is the filament 31
This is the voltage between this auxiliary electrode 15. An electrostatic lens is formed between the anode 33 and the auxiliary electrode 15, but since the voltage applied to the auxiliary electrode is several percent of the accelerating voltage, its influence can be ignored. In an apparatus having such a configuration, the capacitance of the drying capacitor 5 can be selected by considering only the chromatic aberration of the beam aperture, and therefore its value is small and does not adversely affect the response of the servo amplifier 12. Also, the correction voltage applied to the anode is
The phase is in the same phase as the ripple of the accelerating voltage, the amplitude is the same, and even if the ripple voltage changes as the beam current increases or decreases, the correction voltage also increases or decreases accordingly. The ripple voltage component of the voltage is always kept at a very small value. As a result, the ripple in the beam current becomes extremely small, making it possible to obtain a beam with good characteristics.
以上を要するに、この発明は簡単な構成で、加
速電圧制御のレスポンスが良く、ビーム電流中の
リツプルも極めて少ない特性の良いビームが得ら
れるものであり、工業的価値の極めて高いもので
ある。 In summary, the present invention has a simple configuration, a good response in accelerating voltage control, and a beam with good characteristics with extremely few ripples in the beam current, and is of extremely high industrial value.
第1図は、従来のこの種装置の構成を示すブロ
ツクダイヤグラム、第2図は、この発明の一実施
例を示すブロツクダイヤグラムである。
図で、1は交流電源、2は昇圧トランス、3は
整流器、4は平滑チヨーク、5は平滑コンデン
サ、6はフイラメント31の加熱電源、7はグリ
ツド32にバイアス電圧を供給するバイアス電
源、33はアノード、34は電子ビーム、35は
ビーム被照射物、9は倍率器、9′は加速電圧検
出器、8,8′,8″,8,8′′′′は接地点であ
る。13は電力制御素子、50は電子ビーム室、
12はサーボアンプ、10は基準電源、11は加
速電圧調整器、14は補正用昇圧トランス、15
は補助電極である。
FIG. 1 is a block diagram showing the configuration of a conventional device of this type, and FIG. 2 is a block diagram showing an embodiment of the present invention. In the figure, 1 is an AC power supply, 2 is a step-up transformer, 3 is a rectifier, 4 is a smoothing choke, 5 is a smoothing capacitor, 6 is a heating power supply for the filament 31, 7 is a bias power supply that supplies bias voltage to the grid 32, and 33 is a 34 is an electron beam, 35 is a beam irradiated object, 9 is a magnifier, 9' is an accelerating voltage detector, 8, 8', 8'', 8, 8''''' is a ground point. 13 is a a power control element, 50 an electron beam chamber;
12 is a servo amplifier, 10 is a reference power supply, 11 is an accelerating voltage regulator, 14 is a correction step-up transformer, 15
is an auxiliary electrode.
Claims (1)
き、接地電位に置かれたビーム被照射物に加速さ
れた電子ビームを照射する電子ビーム発生装置に
おいて、アノード電極に加速電圧中のリツプル分
電圧と同相で約同量の補正電圧を接地に対して印
加するようにしたことを特徴とする電子ビーム発
生装置。1. In an electron beam generator that places the cathode at a negative high potential equal to the acceleration voltage and irradiates an accelerated electron beam onto a beam irradiated object placed at ground potential, the anode electrode is placed at a negative high potential corresponding to the acceleration voltage. An electron beam generator characterized in that correction voltages of approximately the same amount in the same phase are applied to ground.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9091883A JPS59215648A (en) | 1983-05-24 | 1983-05-24 | Electron beam generator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9091883A JPS59215648A (en) | 1983-05-24 | 1983-05-24 | Electron beam generator |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59215648A JPS59215648A (en) | 1984-12-05 |
JPH0261773B2 true JPH0261773B2 (en) | 1990-12-21 |
Family
ID=14011800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9091883A Granted JPS59215648A (en) | 1983-05-24 | 1983-05-24 | Electron beam generator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59215648A (en) |
-
1983
- 1983-05-24 JP JP9091883A patent/JPS59215648A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59215648A (en) | 1984-12-05 |
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