JPH0259443A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPH0259443A JPH0259443A JP21180988A JP21180988A JPH0259443A JP H0259443 A JPH0259443 A JP H0259443A JP 21180988 A JP21180988 A JP 21180988A JP 21180988 A JP21180988 A JP 21180988A JP H0259443 A JPH0259443 A JP H0259443A
- Authority
- JP
- Japan
- Prior art keywords
- sol
- silica glass
- gel
- solvent
- silicon alkoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- -1 Silicon alkoxide Chemical class 0.000 claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 14
- 239000010703 silicon Substances 0.000 claims abstract description 14
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 claims abstract description 12
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000011118 polyvinyl acetate Substances 0.000 claims abstract description 8
- 229920002689 polyvinyl acetate Polymers 0.000 claims abstract description 8
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 7
- 230000003301 hydrolyzing effect Effects 0.000 claims abstract 2
- 238000003980 solgel method Methods 0.000 abstract description 5
- 150000001298 alcohols Chemical class 0.000 abstract description 2
- 150000002148 esters Chemical class 0.000 abstract description 2
- 150000002170 ethers Chemical class 0.000 abstract description 2
- 150000002576 ketones Chemical class 0.000 abstract description 2
- 239000000499 gel Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000001879 gelation Methods 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 2
- 229960001231 choline Drugs 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 239000012456 homogeneous solution Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Silicon Polymers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、光学用、半導体工業用、電子工業用、理化学
用等に使用されるシリカガラスの製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing silica glass used for optical applications, semiconductor industry, electronic industry, physical and chemical applications, etc.
(従来の技術)
シリカガラスは耐熱性、耐食性および光学的性質に優れ
ていることから、半導体製造に欠かせない重要な材料で
あり、さらには光ファイバやIC製造用フォトマスク基
板、TPT基板などに使用されその用途はますます拡大
されている。(Prior art) Silica glass has excellent heat resistance, corrosion resistance, and optical properties, so it is an important material indispensable for semiconductor manufacturing, and is also used for optical fibers, photomask substrates for IC manufacturing, TPT substrates, etc. It has been used for many years, and its applications are expanding more and more.
従来のシリカガラスの製造法には、天然石英を電気炉ま
たは酸水素炎により溶解する方法、あるいは四塩化ケイ
素を酸水素炎又はプラズマ炎中で高温酸化し溶解する方
法があるが、いずれの方法も製造工程に2000℃ある
いはそれ以上の高温を必要とするため、大量のエネルギ
ーを消費しまた製造時にそのような高温に耐える材料が
必要であり、また高純度のものが得にくいなど経済的、
品質的にいくつかの問題点をもっている。Conventional methods for manufacturing silica glass include melting natural quartz in an electric furnace or oxyhydrogen flame, or oxidizing and melting silicon tetrachloride at high temperature in an oxyhydrogen flame or plasma flame. Since the manufacturing process requires high temperatures of 2000℃ or higher, it consumes a large amount of energy, and materials that can withstand such high temperatures are required during manufacturing, and it is difficult to obtain high purity materials, making it economical.
There are some quality issues.
これに対し、近年ゾル−ゲル法と呼ばれるシリカガラス
を低温で合成する方法が注目されている。On the other hand, in recent years, a method of synthesizing silica glass at low temperature called the sol-gel method has been attracting attention.
その概要を簡単に述べる。The outline will be briefly described below.
一般式S i (OR) a (R:アルキル基)で
表わされるシリコンアルキシド(本発明に於いては、そ
の重縮合物を含む0例えば(RO)ssi・ (O31
(OR)z)−・O3i (OR)s、(n−o〜8
、R:アルキル基))に水(アルカリ土類金属でpHを
調整してもよい)を加え、加水分解し、シリカヒドロシ
ル(本発明に於てはシリカゾルという)と、する。この
時、シリコンアルコキシドと水が均一な系となる様、一
般には溶媒として適当なアルコールが添加されている。Silicon alkoxide represented by the general formula S i (OR) a (R: alkyl group) (in the present invention, silicon alkoxide including its polycondensate, for example (RO)ssi・(O31
(OR)z)-・O3i (OR)s, (n-o~8
, R: alkyl group)) is added with water (the pH may be adjusted with an alkaline earth metal) and hydrolyzed to form silica hydrosyl (referred to as silica sol in the present invention). At this time, an appropriate alcohol is generally added as a solvent so that the silicon alkoxide and water form a homogeneous system.
このシリカゾルを静置、昇温、ゲル化剤の添加等によっ
てゲル化させる。その後ゲルを蒸発乾燥することにより
シリカ乾燥ゲルとする。この乾燥ゲルを適当な雰囲気中
で焼結することによりシリカガラスを得る。This silica sol is gelled by standing still, increasing the temperature, adding a gelling agent, etc. Thereafter, the gel is evaporated to dryness to obtain a dry silica gel. Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
(発明が解決しようとする問題点)
しかし、ゾル−ゲル法によるシリカガラスの製造にはま
だ未解決の問題が残されている。特にゲルを乾燥してい
く過程でゲルにクランクや割れが発生し易(、クラック
や割れのないモノリシックな大形の乾燥ゲルを歩留り良
く製造することが困難である。(Problems to be Solved by the Invention) However, there are still unresolved problems in the production of silica glass by the sol-gel method. In particular, during the process of drying the gel, cracks and cracks are likely to occur in the gel (and it is difficult to produce a monolithic large-sized dried gel without cracks or cracks with a good yield).
本発明はクランクや割れの発生することのないシリカガ
ラスの製造法を提供するものである。The present invention provides a method for manufacturing silica glass that does not cause cracks or cracks.
(問題点を解決するための手段)
本発明は、ゾル−ゲル法によるシリカガラスの製造法に
於て、ゾル調整時に、シリコンアルコキドの溶媒として
テトラヒドロフルフリルアルコールを含む溶媒を使用す
る共にポリ酢酸ビニルを添加することを特徴とするもの
である。(Means for Solving the Problems) The present invention provides a method for producing silica glass using a sol-gel method, in which a solvent containing tetrahydrofurfuryl alcohol is used as a solvent for silicon alkoxide during sol preparation. It is characterized by the addition of vinyl acetate.
本発明において、シリコンアルコキシドのアルキル基に
ついて、特に制限はないが、加水分解のし易さ、ゲル化
時間の点から、メチル基、エチル基、プロピル基、ブチ
ル基を有するシリコンアルコキシドを使用することが好
ましい。またこれらのシリコンアルコキシドを部分的に
重合させたものを用いることもできる。In the present invention, there are no particular restrictions on the alkyl group of silicon alkoxide, but from the viewpoint of ease of hydrolysis and gelation time, silicon alkoxide having a methyl group, ethyl group, propyl group, or butyl group is used. is preferred. Furthermore, partially polymerized silicon alkoxides can also be used.
水と共に加える触媒は、塩基1酸等特に制限しないが、
ゲル化時間、また得られる乾燥ゲルの焼結のし易すさの
点から塩基の方が好ましい結果が得られる。The catalyst to be added together with water is not particularly limited, such as bases and acids, but
From the viewpoint of gelation time and ease of sintering of the resulting dry gel, a base gives more preferable results.
ポリ酢酸ビニルの分子量については本発明では特に限定
を設けないが、水、溶媒への溶解性、ゾル中でのシリカ
微粒子の成長の度合に応じて選択される。The molecular weight of polyvinyl acetate is not particularly limited in the present invention, but it is selected depending on the solubility in water and solvents and the degree of growth of silica fine particles in the sol.
シリコンアルコキシドの溶媒として使用するテトラヒド
ロフルフリルアルコールの量に関しては本発明では特に
限定を設けないが、ゾル中でのシリカ微粒子の成長の度
合に応じて選択される。The amount of tetrahydrofurfuryl alcohol used as a solvent for silicon alkoxide is not particularly limited in the present invention, but is selected depending on the degree of growth of silica fine particles in the sol.
テトラヒドロフルフリルアルコールと共に用いられる溶
媒成分としては、メチルアルコール、エチルアルコール
、■−プロピルアルコール、2−プロピルアルコール、
ブチルアルコール等のアルコール類、ジメチルエーテル
等のエーテル類、アセトン、エチルメチルケトン等のケ
トン類、酢酸エチル等のエステル類の少なくとも一種が
使用可能である。Solvent components used with tetrahydrofurfuryl alcohol include methyl alcohol, ethyl alcohol, -propyl alcohol, 2-propyl alcohol,
At least one of alcohols such as butyl alcohol, ethers such as dimethyl ether, ketones such as acetone and ethyl methyl ketone, and esters such as ethyl acetate can be used.
シリコンアルコキシドとポリ酢酸ビニル、溶媒及び水と
は生成するゾルをできるだけ均一なものとするためにス
ターテなどを用いてよく混合する。The silicon alkoxide, polyvinyl acetate, solvent, and water are thoroughly mixed using a starter or the like to make the resulting sol as uniform as possible.
また超音波を照射してもよい。ゾル調整時にシリカの微
粒子を加えても良い。Alternatively, ultrasonic waves may be irradiated. Fine silica particles may be added when preparing the sol.
生成したゾル溶液は手早く他の容器に移してゲル化させ
る。ゲル化時には生成したゲルからの溶媒の発散を防ぐ
ために容器を密封することが好ましく、またゲル化時の
温度は0℃以上が好ましい。The generated sol solution is quickly transferred to another container and allowed to gel. During gelation, it is preferable to seal the container to prevent the solvent from escaping from the generated gel, and the temperature during gelation is preferably 0° C. or higher.
乾燥する工程では穴のある蓋に代えて、適当な雰囲気下
で乾燥収縮固化させて乾燥ゲルとする。In the drying process, instead of using a lid with holes, the gel is dried and shrunk and solidified in an appropriate atmosphere to form a dry gel.
その後ゲル−ゾル法で焼結することによりシリカガラス
を製造する。Thereafter, silica glass is manufactured by sintering using a gel-sol method.
ゲル化する工程、乾燥する工程、焼結する工程は一般に
用いられる条件が使用される0例えばそれぞれ、0℃〜
100℃で数分〜数10日放置、室温〜200℃で数時
間〜数10日放置、適当な雰囲気下で1000〜140
0℃に50〜b
(作用)
テトラヒドロフルフリルアルコール、ポリ酢酸ビニルの
作用については不明であるが、ゾル中でのシリカ微粒子
の生成、成長の制御、乾燥過程でゲル中に発生する応力
の緩和に寄与し、ゲルの大形化が可能になったものと考
えられる。The gelling process, drying process, and sintering process are carried out under commonly used conditions.
Leave at 100℃ for a few minutes to several 10 days, leave at room temperature to 200℃ for several hours to several 10 days, 1000 to 140 in an appropriate atmosphere
50~b at 0°C (Effect) The effects of tetrahydrofurfuryl alcohol and polyvinyl acetate are unknown, but they can control the production and growth of silica fine particles in the sol, and relieve the stress generated in the gel during the drying process. It is thought that this contributed to the increase in the size of the gel, making it possible to increase the size of the gel.
実施例1
シリコンテトラメトキシド:テトラヒドロフルフリルア
ルコール−1=1のモル比になるように調整し、メタノ
ールをテトラヒドロフルフリルアルコールと同量加えて
攪拌し、更にポリ酢酸ビニルをシリコンテトラメトキシ
ド100重量部に対して10重量部添加し均一溶液とし
た。この溶液に濃度が0. OI Tl0L/ 1のコ
リン水溶液をシリコンテトラメトキシド1モルに対し4
モル加え充分混合してシリカゾルを得た。得られたゾル
を直径200韻のテフロンをコーティングしたガラスシ
ャーレに深さ1〇−謙まで入れ密封して室温でゲル化し
た。ゲル化した後入のある苦に代えて60℃で14日間
乾燥、その後170℃まで30℃/日で昇温し乾燥して
クラックや割れのない乾燥ゲルを得た。この乾燥ゲルを
空気中1300℃まで60℃/時間の速度で昇温加熱し
てクランクや発泡などのないシリカガラスを得た。この
シリカガラスには失透や気泡はなく品質の高いものであ
る。Example 1 Adjust the molar ratio of silicone tetramethoxide:tetrahydrofurfuryl alcohol to 1=1, add methanol in the same amount as tetrahydrofurfuryl alcohol and stir, and then add polyvinyl acetate to silicone tetramethoxide 100 10 parts by weight were added to make a homogeneous solution. This solution has a concentration of 0. OI Tl0L/1 choline aqueous solution to 1 mole of silicon tetramethoxide
A silica sol was obtained by adding moles and mixing thoroughly. The obtained sol was placed in a Teflon-coated glass Petri dish with a diameter of 200 mm to a depth of 10 cm, sealed, and gelatinized at room temperature. Instead of gelatinized gelatin, it was dried at 60°C for 14 days, and then heated to 170°C at a rate of 30°C/day to obtain a dry gel without any cracks or cracks. This dried gel was heated in air to 1300° C. at a rate of 60° C./hour to obtain silica glass without cracks or foaming. This silica glass has no devitrification or bubbles and is of high quality.
又分析の結果、このシリカガラスは市販のシリカガラス
とその特性が一致した。Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
実施例2
シリコンテトラメトキシド:テトラヒドロフルフリルア
ルコール;1:1のモル比になるように調整し、メタノ
ールをテトラヒドロフルフリルアルコールの半量加えて
攪拌し、更にポリ酢酸ビニルをシリコンテトラメトキシ
ド100重量部に対して10重量部添加し均一溶液とし
た。この溶液に濃度が0.01 mol/ 1のコリン
水溶液をシリコンテトラメトキシド1モルに対し4モル
加え充分混合してシリカゾルを得た。Example 2 Silicone tetramethoxide:tetrahydrofurfuryl alcohol; Adjust the molar ratio to 1:1, add half the amount of methanol to the tetrahydrofurfuryl alcohol and stir, and then add polyvinyl acetate to 100% by weight of silicone tetramethoxide. 10 parts by weight were added to make a homogeneous solution. To this solution, 4 mol of choline aqueous solution having a concentration of 0.01 mol/1 per 1 mol of silicon tetramethoxide was added and thoroughly mixed to obtain a silica sol.
以下実施例1と同様の操作を行ってシリカガラスを得た
。このシリカガラスには失透や気泡はなく品質の高いも
のである。又分析の結果、このシリカガラスは市販のシ
リカガラスとその特性が一致した。Thereafter, the same operation as in Example 1 was performed to obtain silica glass. This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
比較例
溶媒としてテトラヒドロフルフリルアルコールを用いず
、メタノールのみを用いた以外は実施例1と同様の操作
を行った結果、乾燥中ゲルにクランクや割れが発生し易
かった。Comparative Example The same operation as in Example 1 was carried out except that tetrahydrofurfuryl alcohol was not used as the solvent and only methanol was used. As a result, the gel was likely to crack or crack during drying.
(発明の効果)
本発明によれば、大型のシリカガラスをゾル−ゲル法に
よりクランクや割れを発生することなく、容易に製造が
可能となる。その大きさは基本的には制約がなく形状も
板状の物に限らず棒状、管状のものも製造可能となり従
来よりも安価に製造することができる。(Effects of the Invention) According to the present invention, large-sized silica glass can be easily manufactured by the sol-gel method without causing cracks or cracks. There are basically no restrictions on its size, and its shape is not limited to plate-like ones, but also rod-like and tubular ones, which can be manufactured at a lower cost than in the past.
Claims (1)
し、これをゲル化し、乾燥して乾燥ゲルとし、次いで焼
結するシリカガラスの製造法に於て、シリコンアルコキ
シドを加水分解してシリカゾルとする段階で、シリコン
アルコキシドの溶媒としてテトラヒドロフルフリルアル
コールを含む溶媒を使用すると共にポリ酢酸ビニルを添
加することを特徴とするシリカガラスの製造法。1. In a method for producing silica glass in which silicon alkoxide is hydrolyzed to form silica sol, this is gelled, dried to form a dry gel, and then sintered, at the step of hydrolyzing silicon alkoxide to form silica sol, A method for producing silica glass, characterized in that a solvent containing tetrahydrofurfuryl alcohol is used as a solvent for silicon alkoxide, and polyvinyl acetate is added.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21180988A JPH0825758B2 (en) | 1988-08-26 | 1988-08-26 | Silica glass manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21180988A JPH0825758B2 (en) | 1988-08-26 | 1988-08-26 | Silica glass manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0259443A true JPH0259443A (en) | 1990-02-28 |
JPH0825758B2 JPH0825758B2 (en) | 1996-03-13 |
Family
ID=16611957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21180988A Expired - Lifetime JPH0825758B2 (en) | 1988-08-26 | 1988-08-26 | Silica glass manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0825758B2 (en) |
-
1988
- 1988-08-26 JP JP21180988A patent/JPH0825758B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0825758B2 (en) | 1996-03-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62265130A (en) | Production of silica glass | |
JPH0259446A (en) | Production of silica glass | |
JPH0259443A (en) | Production of silica glass | |
JPH0259448A (en) | Production of silica glass | |
JPH02248331A (en) | Production of silica glass | |
JP2621467B2 (en) | Method for producing silica glass | |
JPH0259447A (en) | Production of silica glass | |
JPH01138137A (en) | Production of silica glass | |
JPH0259437A (en) | Production of silica glass | |
JPH01119526A (en) | Production of silica glass | |
JPH0259444A (en) | Production of silica glass | |
JPH01119528A (en) | Production of silica glass | |
JPH02248332A (en) | Production of silica glass | |
JPH02248342A (en) | Production of silica glass | |
JPH0259445A (en) | Production of silica glass | |
JPH02248333A (en) | Production of silica glass | |
JPH01138138A (en) | Production of silica glass | |
JPH0259435A (en) | Production of silica glass | |
JPH0259442A (en) | Production of silica glass | |
JPH01138139A (en) | Production of silica glass | |
JPH0259440A (en) | Production of silica glass | |
JPH01138142A (en) | Production of silica glass | |
JPH0259441A (en) | Production of silica glass | |
JPH03137029A (en) | Production of silica glass | |
JPH0259436A (en) | Production of silica glass |