JPH02248342A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPH02248342A JPH02248342A JP6997689A JP6997689A JPH02248342A JP H02248342 A JPH02248342 A JP H02248342A JP 6997689 A JP6997689 A JP 6997689A JP 6997689 A JP6997689 A JP 6997689A JP H02248342 A JPH02248342 A JP H02248342A
- Authority
- JP
- Japan
- Prior art keywords
- sol
- gel
- silica glass
- acetylacetone
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims abstract description 28
- -1 Silicon alkoxide Chemical class 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 14
- 239000010703 silicon Substances 0.000 claims abstract description 14
- 229920002689 polyvinyl acetate Polymers 0.000 claims abstract description 12
- 239000011118 polyvinyl acetate Substances 0.000 claims abstract description 12
- 239000002904 solvent Substances 0.000 claims abstract description 12
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 238000001035 drying Methods 0.000 abstract description 8
- 238000003980 solgel method Methods 0.000 abstract description 7
- 238000005336 cracking Methods 0.000 abstract description 3
- 239000012046 mixed solvent Substances 0.000 abstract 3
- KWBJSXHLCAHGRB-UHFFFAOYSA-N methanol;pentane-2,4-dione Chemical compound OC.CC(=O)CC(C)=O KWBJSXHLCAHGRB-UHFFFAOYSA-N 0.000 abstract 1
- 239000000499 gel Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 4
- 229960001231 choline Drugs 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 239000012456 homogeneous solution Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、光学用、半導体工業用、電子工業用、理化学
用等に使用されるシリカガラスの製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing silica glass used for optical applications, semiconductor industry, electronic industry, physical and chemical applications, etc.
(従来の技術)
シリカガラスは耐熱性、耐食性および光学的性質に優れ
ていることから、半導体製造に欠かせない重要な材料で
あり、さらには光ファイバやIC製造用フォトマスク基
板、TPT基板などに使用されその用途はますます拡大
されている。(Prior art) Silica glass has excellent heat resistance, corrosion resistance, and optical properties, so it is an important material indispensable for semiconductor manufacturing, and is also used for optical fibers, photomask substrates for IC manufacturing, TPT substrates, etc. It has been used for many years, and its applications are expanding more and more.
従来のシリカガラスの製造法には、天然石英を電気炉ま
たは酸水素炎により溶解する方法、あるいは四塩化ケイ
素を酸水素炎又はプラズマ炎中で高温酸化し溶解する方
法があるが、いずれの方法も製造工程に2000℃ある
いはそれ以上の高温を必要とするため大量のエネルギー
を消費し、また製造時にそのような高温に耐える材料が
必要であり、また高純度のものが得にくいなど経済的、
品質的にいくつかの問題点をもっている。Conventional methods for manufacturing silica glass include melting natural quartz in an electric furnace or oxyhydrogen flame, or oxidizing and melting silicon tetrachloride at high temperature in an oxyhydrogen flame or plasma flame. The manufacturing process requires high temperatures of 2000℃ or higher, consuming a large amount of energy, and materials that can withstand such high temperatures are required during manufacturing, and it is difficult to obtain high-purity materials, making it economical.
There are some quality issues.
これに対し、近年ゾル−ゲル法と呼ばれるシリカガラス
を低温で合成する方法が注目されている。On the other hand, in recent years, a method of synthesizing silica glass at low temperature called the sol-gel method has been attracting attention.
その概要を簡単に述べる。The outline will be briefly described below.
一般式S i (OR) a (R:アルキル基)で
表わされるシリコンアルコキシド(本発明に於いては、
その重縮合物を含む0例えば(RO)ssi・(O31
(OR)tl 、、・O3i (OR)!、(n==
0〜8、R:アルキル基))に水(アルカリまたは酸で
pHを調整してもよい)を加え、加水分解し、シリカヒ
ドロシル(本発明に於てはシリカゾルという)とする、
この時、シリコンアルコキシドと水が均一な系となる様
、一般には溶媒として適当なアルコールが添加されてい
る。このシリカゾルを静置、昇温、ゲル化剤の添加等に
よってゲル化させる。その後ゲルを蒸発乾燥することに
よリシリカ乾燥ゲルとする。−この乾燥ゲルを適当な雰
囲気中で焼結することによりシリカガラスを得る。Silicon alkoxide represented by the general formula S i (OR) a (R: alkyl group) (in the present invention,
0 containing its polycondensate, for example (RO)ssi・(O31
(OR)tl ,,・O3i (OR)! , (n==
0 to 8, R: alkyl group)) is added with water (pH may be adjusted with an alkali or acid) and hydrolyzed to produce silica hydrosil (referred to as silica sol in the present invention).
At this time, an appropriate alcohol is generally added as a solvent so that the silicon alkoxide and water form a homogeneous system. This silica sol is gelled by standing still, increasing the temperature, adding a gelling agent, etc. Thereafter, the gel is evaporated to dryness to obtain a dry silica gel. - Obtain silica glass by sintering this dried gel in a suitable atmosphere.
(発明が解決しようとする課題)
しかし、ゾル−ゲル法によるシリカガラスの製造にはま
だ未解決の問題が残されている。特にゲルを乾燥してい
く過程でゲルにクランクや割れが発生し易く、クランク
や割れのないモノリシックな大形の乾燥ゲルを歩留り良
く製造することが困難である。(Problems to be Solved by the Invention) However, there are still unresolved problems in the production of silica glass by the sol-gel method. In particular, during the process of drying the gel, cracks and cracks are likely to occur in the gel, making it difficult to produce a monolithic large-sized dried gel without any cracks or cracks with a good yield.
このような問題点を解決するために、すでに発明者等は
ゾル調製時にポリ酢酸ビニルを添加することで、ゾル中
のシリカ微粒子の成長を制御し乾燥時のゲルの割れを防
止する方法を見出した(特願昭62−294459)、
Lかしながら、この方法によってもより大形の乾燥ゲル
を作製しようとすると、乾燥時にしばしば割れが発生す
ることがあった。In order to solve these problems, the inventors have already discovered a method to control the growth of silica particles in the sol and prevent the gel from cracking during drying by adding polyvinyl acetate during sol preparation. (Special application No. 62-294459)
However, when attempting to produce a larger dried gel using this method, cracks often occur during drying.
本発明はクランクや割れの発生することのないシリカガ
ラスの製造法を提供するものである。The present invention provides a method for manufacturing silica glass that does not cause cracks or cracks.
(課題を解決するための手段)
本発明は、ゾル−ゲル法によるシリカガラスの製造法に
於て、ゾル調製時に、シリコンアルコキドの溶媒として
アセチルアセトンを含む溶媒を使用する共にポリ酢酸ビ
ニルを添加することを特徴とするものである。(Means for Solving the Problems) The present invention uses a solvent containing acetylacetone as a solvent for silicon alkoxide and also adds polyvinyl acetate during sol preparation in a method for producing silica glass by a sol-gel method. It is characterized by:
本発明において、シリコンアルコキシドのアルキル基に
ついて、特に制限はないが、加水分解のし昌さ、ゲル化
時間の点から、メチル基、エチル基、プロピル基、ブチ
ル基を有するシリコンアルコキシドを使用することが好
ましい、またこれらのシリコンアルコキシドを部分的に
重合させたものを用いることもできる。In the present invention, there are no particular restrictions on the alkyl group of the silicon alkoxide, but silicon alkoxides having a methyl group, ethyl group, propyl group, or butyl group are used from the viewpoint of hydrolysis resistance and gelation time. is preferable, and partially polymerized silicon alkoxides can also be used.
水と共に加える触媒は、塩基、酸等特に制限しないが、
ゲル化時間、また得られる乾燥ゲルの焼結のし易すさの
点から塩基の方が好ましい結果が得られる。The catalyst added with water is not particularly limited, such as bases and acids, but
From the viewpoint of gelation time and ease of sintering of the resulting dry gel, a base gives more preferable results.
ポリ酢酸ビニルの分子量については本発明では特に限定
を設けないが、水、溶媒への溶解性、ゾル中でのシリカ
微粒子の成長の度合に応じて選択される。The molecular weight of polyvinyl acetate is not particularly limited in the present invention, but it is selected depending on the solubility in water and solvents and the degree of growth of silica fine particles in the sol.
シリコンアルコキシドの溶媒として使用するアセチルア
セトンの量に関しては本発明では特に限定を設けないが
、ゾル中でのシリカ微粒子の成長の度合に応じて選択さ
れる。The amount of acetylacetone used as a solvent for silicon alkoxide is not particularly limited in the present invention, but is selected depending on the degree of growth of silica fine particles in the sol.
アセチルアセトンと共に用いられる溶媒成分としては、
メチルアルコール、エチルアルコール、1−プロピルア
ルコール、2−プロピルアルコール、ブチルアルコール
等のアルコール類、ジメチルエーテル等のエーテル類、
アセトン、エチルメチルケトン等のケトン類、酢酸エチ
ル等のエステル類の少なくとも一種が使用可能である。Solvent components used with acetylacetone include:
Alcohols such as methyl alcohol, ethyl alcohol, 1-propyl alcohol, 2-propyl alcohol, butyl alcohol, ethers such as dimethyl ether,
At least one of ketones such as acetone and ethyl methyl ketone, and esters such as ethyl acetate can be used.
シリコンアルコキシド、ポリ酢酸ビニル、アセチルアセ
トン、溶媒及び水は生成するゾルをできるだけ均一なも
のとするためにスターラなどを用いてよく混合する。ま
た超音波を照射してもよい。Silicon alkoxide, polyvinyl acetate, acetylacetone, solvent, and water are thoroughly mixed using a stirrer or the like to make the resulting sol as uniform as possible. Alternatively, ultrasonic waves may be irradiated.
ゾル調製時にシリカの微粒子を加えても良い。Fine silica particles may be added during sol preparation.
生成したゾル溶液は素早く他の容器に移してゲル化させ
る。ゲル化時には生成したゲルからの溶媒の発散を防ぐ
ために容器を密封することが好ましく、またゲル化時の
温度は0℃以上が好ましい。The generated sol solution is quickly transferred to another container and allowed to gel. During gelation, it is preferable to seal the container to prevent the solvent from escaping from the generated gel, and the temperature during gelation is preferably 0° C. or higher.
乾燥する工程では密封用の蓋を°穴のある蓋に代えて、
適当な雰囲気下で乾燥収縮固化させて乾燥ゲルとする。During the drying process, replace the sealing lid with a lid with holes.
It is dried and shrunk and solidified in an appropriate atmosphere to form a dry gel.
その後ゾル−ゲル法で焼結することによりシリカガラス
を製造する。Thereafter, silica glass is manufactured by sintering using a sol-gel method.
ゲル化する工程、乾燥する工程、焼結する工程は一般に
用いられる条件が使用される0例えばそれぞれ、0℃〜
100℃で数分〜数lθ日放置、室温〜200℃で数時
間〜数lO日放置、適当な雰囲気下で1000〜140
0℃に50〜b
(作用)
アセチルアセトン及びポリ酢酸ビニルの作用について詳
細は不明であるが、ゾル中でのシリカ微粒子の生成、成
長の制御、乾燥過程でゲル中に発生する応力の緩和等に
寄与し、ゲルの大形化が可能になったものと考えられる
。The gelling process, drying process, and sintering process are carried out under commonly used conditions.
Leave at 100°C for several minutes to several lθ days, leave at room temperature to 200°C for several hours to several lO days, and leave at 1000 to 140 in an appropriate atmosphere.
50~b at 0°C (Function) The details of the effects of acetylacetone and polyvinyl acetate are unknown, but they can be used to control the production and growth of silica fine particles in the sol, and to alleviate the stress generated in the gel during the drying process. It is thought that this contributed to the increase in the size of the gel.
実施例1
シリコンテトラメ「・キシド:アセチルアセトン−1:
1のモル比になるように量りとり、メタノールをアセチ
ルアセトンと同容量加えて撹拌し、更にポリ酢酸ビニル
をシリコンテトラメトキシド100重量部に対して10
重量部添加し均一溶液とした。この溶液に濃度が0.0
1 s+ol/ 1のコリン水溶液をシリコンテトラメ
トキシド1モルに対し水が4モルとなるように加え充分
混合してシリカゾルを得た。得られたゾルをテフロンを
コーティングした直径200鶴のガラスシャーレに深さ
10mまで入れ密封して室温でゲル化した。ゲル化した
後、密封用の蓋を穴のある蓋に代えて60℃で14日間
乾燥、その後170℃まで30℃/日で昇温し乾燥して
クランクや割れのない乾燥ゲルを得た。この乾燥ゲルを
空気中、1300℃まで60℃/時間の速度で昇温加熱
してクランクや発泡などのないシリカガラスを得た。こ
のシリカガラスには失透や気泡はなく品質の高いもので
あった。又分析の結果、このシリカガラスは市販のシリ
カガラスとその特性が一致した。Example 1 Silicon tetramer oxide: acetylacetone-1:
The molar ratio was measured to be 1:1, methanol was added in the same volume as acetylacetone, and the mixture was stirred.
Parts by weight were added to form a homogeneous solution. This solution has a concentration of 0.0
A 1 s+ol/1 choline aqueous solution was added in an amount of 4 moles of water to 1 mole of silicon tetramethoxide, and thoroughly mixed to obtain a silica sol. The obtained sol was placed in a Teflon-coated glass Petri dish with a diameter of 200 mm to a depth of 10 m, sealed, and gelatinized at room temperature. After gelatinization, the sealing lid was replaced with a lid with holes and dried at 60°C for 14 days, and then the temperature was raised to 170°C at a rate of 30°C/day to obtain a dry gel without any cracks or cracks. This dried gel was heated in air to 1300° C. at a rate of 60° C./hour to obtain silica glass free from cracks and foaming. This silica glass had no devitrification or bubbles and was of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
実施例2
シリコンテトラメトキシド:アセチルアセトン−X:t
、Sのモル比になるように量りとり、メタノールをアセ
チルアセトンの1/3容量加えて攪拌し、更にポリ酢酸
ビニルをシリコンテトラメトキシド100重量部に対し
て10重量部添加し均一溶液とした。この溶液に濃度が
0.01 mol/ 1のコリン水溶液をシリコンテト
ラメトキシド1モルに対し水が4モルとなるように加え
充分混合してシリカゾルを得た。Example 2 Silicon tetramethoxide:acetylacetone-X:t
, S were weighed so as to have a molar ratio of 1/3 of the volume of acetylacetone, and the mixture was stirred. Furthermore, 10 parts by weight of polyvinyl acetate was added to 100 parts by weight of silicon tetramethoxide to form a homogeneous solution. A choline aqueous solution having a concentration of 0.01 mol/1 was added to this solution in an amount of 4 mol of water per 1 mol of silicon tetramethoxide, and thoroughly mixed to obtain a silica sol.
以下実施例1と同様の操作を行ってシリカガラスを得た
。このシリカガラスには割れや気泡はなく品質の高いも
のであった。又分析の結果、このシリカガラスは市販の
シリカガラスとその特性が一致した。Thereafter, the same operation as in Example 1 was performed to obtain silica glass. This silica glass had no cracks or bubbles and was of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
比較例
溶媒としてアセチルアセトンを用いず、メタノールのみ
を用いた以外は実施例1と同様の操作を行った結果、乾
燥中ゲルにクランクや割れが発生し易かった。Comparative Example The same operation as in Example 1 was performed except that acetylacetone was not used as the solvent and only methanol was used. As a result, the gel was prone to cracks and cracks during drying.
実施例3
シリコンテトラメトキシドの重縮合物
((CH30)z St ・ (O・st (OCH
s)t)n・O3i (OCHs )3.n=2を中
心にもつもの)ニアセチルアセトン=1:0.5のモル
比になるように量りとり、メタノールをアセチルアセト
ンの2.5倍容量加え、攪拌し、更にポリ酢酸ビニルを
シリコンテトラメトキシドの重縮合物100重量部に対
し10重量部添加し、均一溶液とした。この溶液に濃度
が0.01 mol/ lのコリン水溶液をシリコンテ
トラメトキシドの重縮合物1モルに対し水が3モルとな
るように加え充分に混合してシリカゾルを得た。以下実
施例1と同様の操作を行ってシリカガラスを得た。得ら
れたシリカガラスにはクラックや割れ、発泡などはなく
品質の高いものであった。Example 3 Polycondensate of silicon tetramethoxide ((CH30)z St ・ (O・st (OCH
s)t)n・O3i (OCHs)3. Niacetylacetone (centered on n=2) was weighed out so that the molar ratio was 1:0.5, methanol was added 2.5 times the volume of acetylacetone, stirred, and polyvinyl acetate was added to silicone tetramethoxide. 10 parts by weight were added to 100 parts by weight of the polycondensate to form a homogeneous solution. A choline aqueous solution having a concentration of 0.01 mol/l was added to this solution in an amount of 3 mol of water per 1 mol of the polycondensate of silicon tetramethoxide, and the mixture was thoroughly mixed to obtain a silica sol. Thereafter, the same operation as in Example 1 was performed to obtain silica glass. The obtained silica glass had no cracks, breaks, or foaming, and was of high quality.
実施例4
シリコンテトラメトキシドの重縮合物ニアセチルアセト
ン−1:lのモル比になるように量りとり、メタノール
をアセチルアセトンの0.8倍容量加えて攪拌し、更に
ポリ酢酸ビニルをシリコンテトラメトキシドの重縮合物
100重量部に対して10重量部添加し均一溶液とした
。この溶液に濃度が0.01 mol/ 1のコリン水
溶液をシリコンテトラメトキシドの重縮合物1モルに対
し水が3モルとなるように加え充分に混合してシリカゾ
ルを得た。以下実施例1と同様の操作を行ってシリカガ
ラスを得た。得られたシリカガラスにはタラワクや割れ
、発泡などはなく品質の高いものであった。Example 4 Polycondensate of silicone tetramethoxide - Niacetylacetone - Weighed so that the molar ratio was 1:l, methanol was added 0.8 times the volume of acetylacetone and stirred, and then polyvinyl acetate was added to silicone tetramethoxide. 10 parts by weight were added to 100 parts by weight of the polycondensate to form a homogeneous solution. A choline aqueous solution having a concentration of 0.01 mol/1 was added to this solution in an amount of 3 mol of water per 1 mol of the polycondensate of silicone tetramethoxide and thoroughly mixed to obtain a silica sol. Thereafter, the same operation as in Example 1 was performed to obtain silica glass. The obtained silica glass had no cracks, cracks, or foaming, and was of high quality.
(発明の効果)
本発明によれば、大型のシリカガラスをゾルゲル法によ
りクラックや割れを発生することなく、容品に製造が可
能となる。その大きさは基本的には制約がなく形状も板
状のものに限らず棒状、管状のものも製造可能となり従
来よりも安価に製造することができる。(Effects of the Invention) According to the present invention, it is possible to manufacture large silica glass into containers by the sol-gel method without generating cracks or breaks. There are basically no restrictions on its size, and its shape is not limited to plate-like ones, but rod-like and tubular ones can also be manufactured, making it possible to manufacture it at a lower cost than in the past.
又、本発明によりシリカガラスは従来より安価に製造で
きるため、従来から使用されてきたIC製造用フォトマ
スク基材等の分野はもちろんのこと、これまで高価格の
ため使用されていなかった〜11□−7In addition, the present invention allows silica glass to be manufactured at a lower cost than before, so it can be used not only in fields such as photomask substrates for IC manufacturing, which have traditionally been used, but also in fields where it has not been used due to its high price. □-7
Claims (1)
し、これをゲル化し、乾燥して乾燥ゲルとし、次いで焼
結するシリカガラスの製造法に於て、シリコンアルコキ
シドを加水分解してシリカゾルとする段階で、シリコン
アルコキシドの溶媒としてアセチルアセトンを含む溶媒
を使用すると共にポリ酢酸ビニルを添加することを特徴
とするシリカガラスの製造法。1. In a method for producing silica glass in which silicon alkoxide is hydrolyzed to form silica sol, this is gelled, dried to form a dry gel, and then sintered, at the step of hydrolyzing silicon alkoxide to form silica sol, A method for producing silica glass, characterized in that a solvent containing acetylacetone is used as a solvent for silicon alkoxide, and polyvinyl acetate is added.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6997689A JPH02248342A (en) | 1989-03-22 | 1989-03-22 | Production of silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6997689A JPH02248342A (en) | 1989-03-22 | 1989-03-22 | Production of silica glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02248342A true JPH02248342A (en) | 1990-10-04 |
Family
ID=13418195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6997689A Pending JPH02248342A (en) | 1989-03-22 | 1989-03-22 | Production of silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02248342A (en) |
-
1989
- 1989-03-22 JP JP6997689A patent/JPH02248342A/en active Pending
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