JPH0254425B2 - - Google Patents
Info
- Publication number
- JPH0254425B2 JPH0254425B2 JP57193358A JP19335882A JPH0254425B2 JP H0254425 B2 JPH0254425 B2 JP H0254425B2 JP 57193358 A JP57193358 A JP 57193358A JP 19335882 A JP19335882 A JP 19335882A JP H0254425 B2 JPH0254425 B2 JP H0254425B2
- Authority
- JP
- Japan
- Prior art keywords
- lead
- plated
- steel sheet
- plating
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910000831 Steel Inorganic materials 0.000 claims description 22
- 239000010959 steel Substances 0.000 claims description 22
- 238000007747 plating Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 18
- 238000004140 cleaning Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 239000012298 atmosphere Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000007789 gas Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明はめつき密着性の優れた真空蒸着鉛めつ
き鋼板およびその製造方法に関する。
鉛めつき鋼板は鉛の有する優れた耐食性,耐薬
品性と鋼の有する優れた強度,加工性の両特性を
具備しているため、自動車,電気機器,建築部材
などへの広い用途が期待されている。しかしなが
ら、鉄と鉛は互いに固溶体を形成せず、すなわ
ち、鉄原子と鉛原子の結合力が弱いため、鋼板表
面に鉛の溶融めつきを施しても、鉛と鋼板の濡れ
性が悪く、優れためつき密着性が得られないとい
う欠点があつた。
このため、従来上記欠点を解消するために、鉛
と錫の合金が鋼板と良く濡れる性質を有すること
を利用して、通常10〜20%の錫を含有する鉛と錫
の合金を鋼板表面に溶融めつきし、めつき層と鋼
板の密着性を向上させる方法が採用されてきた。
しかし、この方法においては鉛に比較して資源
が少なくしかも高価(鉛の約20倍)な錫の使用を
しいられるという問題がある。このため、省資源
の点からもまた経済性の点からも錫を含有しない
鉛めつき鋼板の開発が強く要望されている。
そこで、本発明者は従来の溶融鉛合金めつきの
問題を解決すべく、真空蒸着鉛めつき方法につい
て、種々の実験を行つた結果、錫を積極的に含有
させない鉛を使用して、表面を活性化処理しため
つき基板に適切な条件下で鉛の真空蒸着を行うこ
とによつて、優れためつき密着性を有する鉛めつ
き鋼板の得られたことをみいだした。
すなわち、本発明はめつき基板鋼板の表面を通
常に用いられる方法で清浄にした後、さらに水素
を含む雰囲気中で表面を活性化し、次いでめつき
基板鋼板を真空蒸着室に導いて、雰囲気の真空圧
10-1Torr以下6×10-1Torr以上、めつき基板鋼
板温度50℃以上250℃以下で鉛の真空蒸着めつき
を施すことを特徴とする鉛めつき鋼板の製造方法
を提供する。
本発明の方法において使用する鉛は、積極的に
錫を含有しないことは勿論であるが、その純度に
ついて特に限定はないが鉛より蒸気圧の低い不純
金属成分は可及的に低い方が好ましい。
本発明において、めつき基板鋼板表面を通常の
方法で清浄する方法とは化学クリーニング又はガ
スクリーニングを意味し、化学クリーニングとは
溶剤による洗浄,オルソケイ酸ナトリウム水溶液
による処理等の既知の湿式清浄化法を意味し、ガ
スクリーニングとは鋼板を無酸化炉または酸化炉
中で油脂分を燃焼除去する方法を意味する。
本発明の方法において水素を含む雰囲気とは、
水素または水素と不活性な気体の混合物で、水素
を少なくとも10%以上含む気体の雰囲気を意味す
る。代表的な不活性気体は窒素である。
本発明の方法は既知の装置を用いて実施するこ
とができる。
蒸着に先だつて、まずめつき基板表面を通常の
方法で化学クリーニングあるいはガスクリーニン
グし表面の汚れを取り除く。この状態ではよく知
られているように表面の油などの汚れはかなり除
去されるが、表面には酸化物などが残存している
ため、めつき基板表面は不活性で、これに鉛の真
空蒸着を施しても優れためつき密着性は得られな
い。
本発明ではめつき基板表面を化学クリーニング
あるいはガスクリーニングした後、めつき基板表
面を活性するために、すなわちめつき基板表面の
酸化物を水素を含む雰囲気、例えば水素と窒素の
混合ガス雰囲気中で還元した後に鉛の蒸着を施し
てめつき密着性を向上させるものである。
めつき基板表面の活性化条件はガス組成にも依
存するが、例えば50%H2+50%N2雰囲気中では
650℃で10秒加熱で十分である。この処理はさら
に高温で施してもよいが、温度を非常に高くする
ことは熱エネルギー的にもまた炉の保守の点から
も不利であるため、900℃以下の温度が好ましい。
蒸着時の蒸着室の雰囲気の真空圧は10-1Torr
以下、好ましくは10-2Torr以下がよい。真空圧
が10-1Torrを越えて100Torr程度でもめつき密着
性は優れているが、真空圧が高いため、めつき表
面に酸化鉛が生成しこれにより白色の着色が生
じ、表面外観をそこなうようになる。真空圧は6
×10-4Torr未満にしてもそれに見合う効果はな
い。
蒸着に際して、めつき基板は50℃以上250℃以
下の温度にする必要がある。めつき基板温度が50
℃未満では鉄原子の熱運動エネルギーが小さいた
め、めつき基板表面が十分に活性とならず、優れ
ためつき密着は得られない。一方、めつき基板温
度が250℃を越えるとめつき表面に0.1〜1mmの大
きさの粒状鉛を形成し、めつき表面の外観をそこ
なうようになる。
以下に本発明の実施例を述べる。
板厚1.0mmの冷間圧延ままの鋼板をガスクリー
ニング(ブタン燃焼、600℃、5〜10秒、排ガス
組成中CO濃度1〜4%)して、めつき用基板と
した。めつき基板表面の活性化は表1に示す条件
で行つた。なお、鋼板の焼鈍もこの処理と同時に
行つた。鉛の蒸着は99.9%の鉛地金を蒸着鍋中で
980℃〜1050℃に加熱し、表1に示す条件で行つ
た。蒸着した鉛めつきの厚さは3〜5μmであつ
た。
得られためつき鋼板のめつき密着性の評価は下
記の方法で行つた。
めつき面にカツターナイフで0.5mm角の碁盤目
状のケガキを入れ、この部分が外側になるように
曲げ半径0mmの180゜曲げを行い、次にこの部分に
セロテープをはりつける。セロテープをはがした
時にセロテープにめつき層の鉛が全く付着しない
ものをめつき密着性良好(表中○記)、多量に鉛
の付着したものを密着性不良(表中×記)、その
中間のもので少量の鉛付着のものを密着性中程度
(表中△記)とした。
得られた結果を表1に示す。なお、試料記号27
は活性化処理を行わなかつたものである。本表よ
り、本発明によるものは優れためつき密着性を示
すことが明らかである。
The present invention relates to a vacuum-deposited lead-plated steel sheet with excellent plating adhesion and a method for manufacturing the same. Lead-plated steel sheets have both the excellent corrosion resistance and chemical resistance of lead, and the excellent strength and workability of steel, so they are expected to have a wide range of uses in automobiles, electrical equipment, construction materials, etc. ing. However, iron and lead do not form a solid solution with each other, that is, the bonding force between iron atoms and lead atoms is weak. The drawback was that it did not provide good adhesion. Therefore, in order to eliminate the above-mentioned drawbacks, a lead-tin alloy containing usually 10 to 20% tin was applied to the surface of the steel plate, taking advantage of the fact that the lead-tin alloy has the property of being easily wetted with the steel plate. A method of hot-dip galvanizing to improve the adhesion between the galvanized layer and the steel sheet has been adopted. However, this method has the problem of requiring the use of tin, which is less of a resource than lead and is also more expensive (approximately 20 times more expensive than lead). For this reason, there is a strong demand for the development of a lead-plated steel sheet that does not contain tin, both from the point of view of resource conservation and from the point of view of economy. Therefore, in order to solve the problems of conventional molten lead alloy plating, the present inventor conducted various experiments on the vacuum evaporation lead plating method, and found that the surface was coated using lead that does not actively contain tin. It has been found that a lead-plated steel sheet having excellent tamping adhesion can be obtained by performing vacuum evaporation of lead on an activated tamping substrate under appropriate conditions. That is, in the present invention, after cleaning the surface of a plated steel sheet by a commonly used method, the surface is further activated in an atmosphere containing hydrogen, and then the plated steel sheet is led to a vacuum deposition chamber to reduce the vacuum of the atmosphere. pressure
Provided is a method for producing a lead-plated steel sheet, characterized in that lead is vacuum evaporated and plated at a plating substrate steel sheet temperature of 50° C. or more and 250° C. or less at a plating substrate steel sheet temperature of 50 ° C. or more and 250° C. or less. It goes without saying that the lead used in the method of the present invention does not actively contain tin, but there are no particular limitations on its purity, but it is preferable that impurity metal components with a vapor pressure lower than that of lead be as low as possible. . In the present invention, a method of cleaning the surface of a plated steel sheet by a conventional method means chemical cleaning or gas cleaning, and chemical cleaning is a known wet cleaning method such as cleaning with a solvent or treatment with an aqueous sodium orthosilicate solution. Gas cleaning refers to a method of burning and removing fats and oils from steel sheets in a non-oxidizing furnace or an oxidizing furnace. In the method of the present invention, the atmosphere containing hydrogen is
Hydrogen or a mixture of hydrogen and an inert gas, meaning a gaseous atmosphere containing at least 10% hydrogen. A typical inert gas is nitrogen. The method of the invention can be carried out using known equipment. Prior to vapor deposition, the surface of the plated substrate is first chemically or gas-cleaned in a conventional manner to remove surface contaminants. In this state, as is well known, a considerable amount of dirt such as oil on the surface is removed, but since oxides and other substances remain on the surface, the surface of the plated substrate is inert, and the lead vacuum Even if vapor deposition is performed, excellent folding adhesion cannot be obtained. In the present invention, after chemically cleaning or gas cleaning the surface of a plating substrate, in order to activate the surface of the plating substrate, oxides on the surface of the plating substrate are removed in an atmosphere containing hydrogen, for example, a mixed gas atmosphere of hydrogen and nitrogen. After reduction, lead is vapor-deposited to improve plating adhesion. The activation conditions for the plated substrate surface depend on the gas composition, but for example, in a 50% H 2 + 50% N 2 atmosphere,
Heating at 650℃ for 10 seconds is sufficient. Although this treatment may be carried out at higher temperatures, temperatures below 900° C. are preferred, since very high temperatures are disadvantageous both in terms of thermal energy and in terms of furnace maintenance. The vacuum pressure of the atmosphere in the deposition chamber during deposition is 10 -1 Torr.
It is preferably 10 -2 Torr or less. Plating adhesion is excellent even when the vacuum pressure exceeds 10 -1 Torr and is around 100 Torr, but due to the high vacuum pressure, lead oxide is generated on the plating surface, which causes white coloring and deteriorates the surface appearance. begins to damage. Vacuum pressure is 6
Even if it is less than ×10 -4 Torr, there is no commensurate effect. During vapor deposition, the plated substrate needs to be heated to a temperature of 50°C or higher and 250°C or lower. Plating board temperature is 50
If the temperature is less than 0.degree. C., the thermal kinetic energy of iron atoms is small, so the surface of the plated substrate is not sufficiently activated and excellent adhesion cannot be obtained. On the other hand, if the temperature of the plated substrate exceeds 250°C, granular lead with a size of 0.1 to 1 mm will be formed on the plated surface, spoiling the appearance of the plated surface. Examples of the present invention will be described below. A cold-rolled steel plate with a thickness of 1.0 mm was gas-cleaned (butane combustion, 600°C, 5 to 10 seconds, CO concentration in the exhaust gas composition was 1 to 4%) to prepare a plating substrate. Activation of the plated substrate surface was performed under the conditions shown in Table 1. Note that annealing of the steel plate was also performed at the same time as this treatment. Lead vapor deposition is performed using 99.9% lead metal in a vapor deposition pot.
It was heated to 980°C to 1050°C under the conditions shown in Table 1. The thickness of the deposited lead plating was 3-5 μm. The plating adhesion of the obtained tempered steel plate was evaluated by the following method. Make a 0.5 mm square grid-like mark on the plating surface with a cutter knife, bend it 180 degrees with a bending radius of 0 mm so that this part is on the outside, and then attach Sellotape to this part. When the sellotape is removed, no lead in the plating layer adheres to the sellotape at all, and the adhesion is good (marked with a circle in the table), and a case with a large amount of lead adhering to it has poor adhesion (marked with a cross in the table). An intermediate type with a small amount of lead adhesion was classified as having medium adhesion (marked with △ in the table). The results obtained are shown in Table 1. In addition, sample code 27
is the one without activation processing. From this table, it is clear that the products according to the present invention exhibit excellent folding adhesion.
【表】
* 本発明 他は比較例
前記実施例では、めつき基板を活性化する前の
クリーニングとしてガスクリーニング法を用いた
場合を示したが、クリーニング法としては、ガス
クリーニングに限定する必要はなく、市販の焼鈍
済鋼板(板厚1.0mm)をオルソケイ酸ソーダ水溶
液(3%オルソケイ酸ソーダ)で化学クリーニン
グした場合も前記とまつたく同一の結果を得た。[Table] *The present invention Others are comparative examples In the above example, a case was shown in which a gas cleaning method was used for cleaning before activating the plated substrate, but the cleaning method does not need to be limited to gas cleaning. In addition, when a commercially available annealed steel plate (thickness: 1.0 mm) was chemically cleaned with an aqueous solution of sodium orthosilicate (3% sodium orthosilicate), exactly the same results as above were obtained.
Claims (1)
法で清浄にした後、さらに水素を含む雰囲気中で
表面を活性化し、次いでめつき基板鋼板を真空蒸
着室に導いて、雰囲気の真空圧10-1Torr以下6
×10-4Torr以上、めつき基板鋼板温度50℃以上
250℃以下で鉛の真空蒸着めつきを施すことを特
徴とする鉛めつき鋼板の製造方法。1. After cleaning the surface of the plated substrate steel sheet by a commonly used method, the surface is further activated in an atmosphere containing hydrogen, and then the plated substrate steel sheet is introduced into a vacuum deposition chamber where the vacuum pressure of the atmosphere is 10 - 1 Torr or less6
×10 -4 Torr or more, plated substrate steel plate temperature 50℃ or more
A method for producing a lead-plated steel sheet, characterized by applying lead vacuum evaporation plating at a temperature below 250°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19335882A JPS5983764A (en) | 1982-11-05 | 1982-11-05 | Manufacture of vacuum deposition lead plated steel sheet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19335882A JPS5983764A (en) | 1982-11-05 | 1982-11-05 | Manufacture of vacuum deposition lead plated steel sheet |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5983764A JPS5983764A (en) | 1984-05-15 |
JPH0254425B2 true JPH0254425B2 (en) | 1990-11-21 |
Family
ID=16306575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19335882A Granted JPS5983764A (en) | 1982-11-05 | 1982-11-05 | Manufacture of vacuum deposition lead plated steel sheet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5983764A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6237953A (en) * | 1985-08-12 | 1987-02-18 | Shinko Electric Ind Co Ltd | Manufacture of lead frame |
US5165809A (en) * | 1990-03-06 | 1992-11-24 | Brother Kogyo Kabushiki Kaisha | Piezoelectric actuator and print head using the actuator, having means for increasing durability of laminar piezoelectric driver |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57158374A (en) * | 1981-03-24 | 1982-09-30 | Mitsubishi Heavy Ind Ltd | Plated steel strip by vapor deposition of pb-zn binary alloy and producing device thereof |
-
1982
- 1982-11-05 JP JP19335882A patent/JPS5983764A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57158374A (en) * | 1981-03-24 | 1982-09-30 | Mitsubishi Heavy Ind Ltd | Plated steel strip by vapor deposition of pb-zn binary alloy and producing device thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS5983764A (en) | 1984-05-15 |
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