JPH0251983B2 - - Google Patents
Info
- Publication number
- JPH0251983B2 JPH0251983B2 JP4253286A JP4253286A JPH0251983B2 JP H0251983 B2 JPH0251983 B2 JP H0251983B2 JP 4253286 A JP4253286 A JP 4253286A JP 4253286 A JP4253286 A JP 4253286A JP H0251983 B2 JPH0251983 B2 JP H0251983B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plating solution
- potential range
- platinum
- formate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 34
- 230000003647 oxidation Effects 0.000 claims description 28
- 238000007254 oxidation reaction Methods 0.000 claims description 28
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 27
- -1 formate ions Chemical class 0.000 claims description 25
- 238000005868 electrolysis reaction Methods 0.000 claims description 23
- 238000007747 plating Methods 0.000 claims description 21
- 229910052697 platinum Inorganic materials 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 238000007772 electroless plating Methods 0.000 claims description 7
- 239000001569 carbon dioxide Substances 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 6
- 239000008139 complexing agent Substances 0.000 claims description 5
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims description 3
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 38
- 239000000243 solution Substances 0.000 description 22
- 235000019253 formic acid Nutrition 0.000 description 19
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 17
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000004280 Sodium formate Substances 0.000 description 3
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 3
- 235000019254 sodium formate Nutrition 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4253286A JPS62199774A (ja) | 1986-02-27 | 1986-02-27 | めつき液中に含まれるギ酸イオンの電解酸化除去方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4253286A JPS62199774A (ja) | 1986-02-27 | 1986-02-27 | めつき液中に含まれるギ酸イオンの電解酸化除去方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62199774A JPS62199774A (ja) | 1987-09-03 |
| JPH0251983B2 true JPH0251983B2 (enrdf_load_stackoverflow) | 1990-11-09 |
Family
ID=12638686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4253286A Granted JPS62199774A (ja) | 1986-02-27 | 1986-02-27 | めつき液中に含まれるギ酸イオンの電解酸化除去方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62199774A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5230782A (en) * | 1991-07-22 | 1993-07-27 | International Business Machines Corporation | Electrolytic process for reducing the organic content of an aqueous composition and apparatus therefore |
| US6942810B2 (en) * | 2003-12-31 | 2005-09-13 | The Boc Group, Inc. | Method for treating metal-containing solutions |
-
1986
- 1986-02-27 JP JP4253286A patent/JPS62199774A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62199774A (ja) | 1987-09-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4051001A (en) | Process for regenerating etching solution | |
| US4028199A (en) | Method of producing metal powder | |
| KR850000047A (ko) | 금속 여과기의 세척방법 | |
| JPH09262583A (ja) | 酸性水及びアルカリ性水の製造方法 | |
| US2945791A (en) | Inert lead dioxide anode and process of production | |
| US6827832B2 (en) | Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths | |
| CA2027656C (en) | Galvanic dezincing of galvanized steel | |
| CA1169020A (en) | Aqueous electrowinning of metals using fuel oxidizable at the anode | |
| JPH0251983B2 (enrdf_load_stackoverflow) | ||
| JPH05192662A (ja) | 水性組成物の有機物含有量を減少させるための電気分解法及びそのための装置 | |
| USRE28849E (en) | Surface preparation process for recoating of used coated metallic electrodes | |
| US3841983A (en) | Surface preparation process for recoating of used coated metallic electrodes | |
| JPH1018073A (ja) | 超音波振動を加えた電解方法 | |
| US5372683A (en) | Method and apparatus for the electrolytic extraction of metals from a solution containing metal ions | |
| US3425920A (en) | Electrolytic method of regenerating organic acid cleaning solution for ferrous metals | |
| JPH02310382A (ja) | 塩化第二鉄エツチング組成物を再生する方法 | |
| US4222826A (en) | Process for oxidizing vanadium and/or uranium | |
| JPH028794B2 (enrdf_load_stackoverflow) | ||
| JP3534367B2 (ja) | 汚水の処理方法及び装置 | |
| US4085014A (en) | Elimination of impurities from sea water cell feed to prevent anode deposits | |
| SU1474097A1 (ru) | Способ очистки воды от органических примесей | |
| JPH0333780B2 (enrdf_load_stackoverflow) | ||
| JPH08276187A (ja) | 亜硫酸塩含有溶液の電気化学的処理方法 | |
| US4319968A (en) | Electrolytically decomposing method for iron-cyanide complex | |
| Afifi et al. | The formation of lead dioxide electrodes by the planté process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |