JPH0249451A - Cap for semiconductor device - Google Patents
Cap for semiconductor deviceInfo
- Publication number
- JPH0249451A JPH0249451A JP20067788A JP20067788A JPH0249451A JP H0249451 A JPH0249451 A JP H0249451A JP 20067788 A JP20067788 A JP 20067788A JP 20067788 A JP20067788 A JP 20067788A JP H0249451 A JPH0249451 A JP H0249451A
- Authority
- JP
- Japan
- Prior art keywords
- cap
- amorphous metal
- metal thin
- thin plate
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 31
- 239000005300 metallic glass Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000002178 crystalline material Substances 0.000 claims abstract description 13
- 229920001721 polyimide Polymers 0.000 claims abstract description 11
- 239000009719 polyimide resin Substances 0.000 claims abstract description 11
- 230000005389 magnetism Effects 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910000976 Electrical steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- NCEXYHBECQHGNR-UHFFFAOYSA-N chembl421 Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=CC(=CC=2)S(=O)(=O)NC=2N=CC=CC=2)=C1 NCEXYHBECQHGNR-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体用キャップに関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a semiconductor cap.
(従来の技術)
たとえば遮光用カバーフィルムがあり、半導体における
窓に同カバーフィルムをマスクし、窓より紫外線が入ら
ぬようにして、プログラムされたデーターの内容が紫外
線で消去されないようにしている。(Prior art) For example, there is a light-shielding cover film, which is used to mask the window of a semiconductor device to prevent ultraviolet rays from entering through the window, thereby preventing programmed data from being erased by ultraviolet rays.
(発明が解決しようとする問題点)
ところで、半導体にとっては前記の紫外線のみならず、
電磁波、磁気、アルファ線も極めて有害で、これらによ
ってもデーターの内容が消去されてしまう問題がある。(Problems to be solved by the invention) By the way, for semiconductors, not only the above-mentioned ultraviolet rays, but also
Electromagnetic waves, magnetism, and alpha rays are also extremely harmful, and there is also the problem that data can be erased by these.
一方、非晶質材料のアモルファス金属はその優れた高透
磁性により半導体工場、電子機器工場。On the other hand, amorphous metal, which is an amorphous material, is used in semiconductor factories and electronic equipment factories due to its excellent high magnetic permeability.
磁気計測研究施設などの建築物の磁気シールド材として
使用可能である。It can be used as a magnetic shielding material for buildings such as magnetic measurement research facilities.
そこで、磁気シールドについて、建築物全体を磁気シー
ルド構造とする間接的な手法によらず、半導体そのもの
をアモルファス金属でカバーして、直接に磁気゛シール
ドすることが考えられる。Therefore, regarding magnetic shielding, instead of relying on the indirect method of making the entire building a magnetic shield structure, it is possible to cover the semiconductor itself with amorphous metal and provide direct magnetic shielding.
しかしながら、アモルファス金属の優れた特性の一つで
ある高強靭性および高硬度性が欠点として働いてしまう
問題がある。However, there is a problem in that the high strength and toughness, which are one of the excellent properties of amorphous metals, and high hardness act as drawbacks.
すなわち、天板部と側板部そして掛合部を有するキレツ
ブ形状に折り曲げ成形した場合、そのコーナーの屈曲部
分が裂損し易くなり、しかも内部応力が生じて透磁性お
よび耐食性が低下した。That is, when it is bent into a shape having a top plate, side plates, and a hooking part, the bent portions at the corners are likely to tear and break, and internal stress is generated, resulting in a decrease in magnetic permeability and corrosion resistance.
又、これら透磁性および耐食性の低下を避けるため、そ
のコーナ部分をアールを持たせた曲げ程度に加工しよう
としても、優れた高強靭性によるスプリングバックが強
すぎるために、原形の板状に弾性復帰してしまい、キャ
ップ形状にならなかった。In addition, in order to avoid deterioration of magnetic permeability and corrosion resistance, attempts were made to bend the corner portions with a radius, but the springback caused by the excellent high strength and toughness was too strong, making the original plate shape less elastic. It returned and did not take the cap shape.
又、板状のアモルファス金属を半導体における上面部中
に埋設することも考えられるが、そのプログラムされた
データーの内容を積極的に消去したい場合には、埋設さ
れているアモルファス金属が妨げとなり、しかも半導体
の側面が磁気、電磁波に対して無防備であるから消去の
心配が残り、結局、半導体を直接磁気シールドすること
は不可能であった。It is also possible to bury a plate-shaped amorphous metal in the upper surface of the semiconductor, but if you want to actively erase the programmed data, the buried amorphous metal will be an obstacle. Since the sides of semiconductors are vulnerable to magnetic and electromagnetic waves, there remains a concern about erasure, and in the end, it was impossible to directly magnetically shield semiconductors.
又、半導体の側面に並列しているビンとの絶縁性が問題
である。Another problem is the insulation with the bottles that are parallel to the side of the semiconductor.
そこで、発明者は、非晶質材料であるアモルファス金属
と結晶質材料を組合せることに着眼し、夫々キャップの
展開形状に型抜き成形したアモルファス金S薄板と結晶
質材料製の薄基板を接着して一体的に重合し、乾燥後に
プレスしてキャップ形状に成形した。Therefore, the inventor focused on combining an amorphous metal, which is an amorphous material, with a crystalline material, and bonded an amorphous gold S thin plate cut and formed into the expanded shape of the cap and a thin substrate made of a crystalline material. The mixture was integrally polymerized, dried, and then pressed into a cap shape.
ところが、結晶質材料はその折り曲げ部が予測通りに所
望の異形状に塑性変形したのに対し、アモルファス金属
は長所である高強靭性が災いして折り曲げ部において接
着面から剥れてしまい、結果としてキャップ形状になら
なかった。However, while the crystalline material plastically deforms into the desired irregular shape at the bend as predicted, the amorphous metal suffers from its high strength and toughness and peels off from the adhesive surface at the bend. It didn't take on a cap shape.
又、接着されたキャップは、結晶質材料の熱伸縮がアモ
ルファス金属に影響を及ぼして、アモルファスの軟磁性
や磁歪性等の特性が低下することを確認した。In addition, it was confirmed that in the bonded cap, the thermal expansion and contraction of the crystalline material affects the amorphous metal, resulting in a decrease in the properties of the amorphous, such as soft magnetism and magnetostriction.
本発明はこのような事情に鑑みてなされたもので、その
目的とするところは、所望のキャップ形状を呈していて
且つ半導体との絶縁性を有し、そして、半導体に着脱自
在であり、紫外線はもとより磁気、N磁波そしてアルフ
ァ線までシールドすることのできる半導体用キャップを
提供しようとするものである。The present invention has been made in view of the above circumstances, and its purpose is to have a desired cap shape, have insulation properties from the semiconductor, be detachable from the semiconductor, and be resistant to ultraviolet rays. The present invention aims to provide a cap for semiconductors that can shield not only magnetism but also magnetism, N magnetic waves, and even alpha rays.
(問題点を解決するための手段)
本発明の半導体用キャップでは、アモルファス金に薄板
と、このアモルファス金属薄板の重ね面と反対の面にポ
リイミド樹脂層を形成した結晶質材料製薄基板との二重
構造状で、天板部の四方の折曲げ状の各側板部が、アモ
ルファス金ff1il板の側壁部全体を薄基板の側壁部
である把持部で挾み把持されていて、側板部の先端に顎
状の掛合部が形成されたものとしたものである。(Means for Solving the Problems) The semiconductor cap of the present invention includes a thin amorphous gold plate and a thin substrate made of a crystalline material with a polyimide resin layer formed on the surface opposite to the overlapping surface of the amorphous metal thin plates. It has a double structure, and each of the four folded side plates of the top plate part holds the entire side wall part of the amorphous gold ff1il plate between the grip parts, which are the side walls of the thin substrate, and the sides of the side plate part A jaw-like engaging part is formed at the tip.
本発明におけるアモルファス金属としては各種の合金が
挙げられ、又、電磁波のシールド効果を上げる銅メツキ
等しているものからも選択される。The amorphous metal in the present invention includes various alloys, and is also selected from those coated with copper plating, etc., which enhances the electromagnetic wave shielding effect.
又、アモルファス金属薄板は二枚重ね以上の多層状のも
のであっても良く、シールド効率の向上に有効である。Further, the amorphous metal thin plate may be in the form of two or more layers, which is effective in improving shielding efficiency.
結晶質材料としては塑性変形良好な金属が対象となるが
、一般金属に比べて透磁性、磁歪性、鉄損、^周波磁気
特性、11場中の冷却効果が優れている高機能磁性薄鋼
板(但し、アモルファス金属と比べると一段劣る)たと
えばケイ素鋼板等が挙げられる。The target crystalline materials are metals with good plastic deformation, and high-performance magnetic thin steel sheets have superior magnetic permeability, magnetostriction, core loss, ^frequency magnetic properties, and cooling effect in 11 fields compared to general metals. (However, it is one step inferior to amorphous metals.) Examples include silicon steel plates.
(作用)
天板部、側板部、掛合部における結晶質材料製薄基板が
塑性変形していてキャップ形状を呈すると共にその把持
部がアモルファス金属薄板の側壁部全体を挾み把持して
、同キャップ形状にアモルファス金属薄板を保形してい
る。(Function) The thin substrates made of crystalline material in the top plate, side plates, and hooking portions are plastically deformed and take on the shape of a cap, and their gripping portions sandwich and grip the entire side wall portion of the amorphous metal thin plate, thereby creating the same cap. The shape is held by an amorphous metal thin plate.
天板部および側板部における薄基板とアモルファス金属
薄板とは相互に面方向に干渉しない重合関係になる。The thin substrate and the amorphous metal thin plate in the top plate part and the side plate part have an overlapping relationship that does not interfere with each other in the planar direction.
そして、ポリイミド樹脂層が側板部内面を含むキャップ
全体を覆っている。The polyimide resin layer covers the entire cap including the inner surface of the side plate.
(実施例)
以下図面を参照して本発明の実施の一例を詳細に説明す
る。(Example) An example of implementation of the present invention will be described in detail below with reference to the drawings.
第1図乃至第4図には本発明の半導体用キャップを例示
しており、このキャップ(A)はアモルファス金属薄板
(1)と、同金属薄板(1)の重ね面(2a)と反対の
面(2b)にポリイミド樹脂層(3)をコーティング形
成した結晶質材料製薄基板(2)との二重構造状のもの
で、半導体(B)にその上面および周側面を覆うように
被着可能に、天板部(4)の四方に側板部(5)を夫々
折曲げ形成している。FIGS. 1 to 4 illustrate the semiconductor cap of the present invention, and this cap (A) is composed of an amorphous metal thin plate (1) and an overlapping surface (2a) of the same metal thin plate (1) opposite to the overlapping surface (2a). It has a double structure with a thin substrate (2) made of a crystalline material whose surface (2b) is coated with a polyimide resin layer (3), and is adhered to the semiconductor (B) so as to cover its upper surface and peripheral side. As possible, side plate portions (5) are formed by bending each of the four sides of the top plate portion (4).
そして、各銅板部(5)はアモルファス金属薄板(1)
における側曵部(6)全体を薄基板(2)の側壁部(7
)である把持部(8)で挾み把持し、ポリイミド樹脂層
(3)がキャップ(A)の外表面の全てと側板部(5)
内面の全てを形成するようにしている。具体的には、プ
レスして、把持部(8)における外側部(8a)を側壁
部(6)面に折返して挾み把持し、この把持部(8)を
側壁部(6〉ともども外側部(8a)先端を谷部として
折り曲げすることにより形成している。And each copper plate part (5) is an amorphous metal thin plate (1)
The entire side basin part (6) is attached to the side wall part (7) of the thin substrate (2).
), and the polyimide resin layer (3) covers all of the outer surface of the cap (A) and the side plate part (5).
I try to form everything on the inside. Specifically, by pressing, the outer part (8a) of the gripping part (8) is folded back to the side wall part (6) and gripped, and this gripping part (8) is held together with the side wall part (6>). (8a) Formed by bending the tip as a trough.
又、短辺側の側板部(5)先端には同先端部のN基板(
2)部分を顎状にプレス成形することにより掛合部(9
)を形成している。In addition, the N substrate (
2) The engaging part (9
) is formed.
掛合部(9)は外側に伸びる指掛は部(10)を有して
いて、同指掛けi!gl(10)を銅板部(5)に近づ
くように押すことにより、半導体(B)に対して着脱し
易くしている。The engaging portion (9) has a finger hook portion (10) extending outward, and the finger hook i! By pushing the gl (10) closer to the copper plate part (5), it can be easily attached to and detached from the semiconductor (B).
第6図では他の実施例の半導体用キャップ(A)を例示
しており、このキャップ(A>は前記実施例のものと基
本的に同構成で、相違点は側板部(5)を、外側部(8
a)先端を山部として折り曲げ形成していることで、そ
して、ポリイミド樹脂層(3)がキャップの内側全面と
側板部(5)外面の全てを形成している。FIG. 6 shows a semiconductor cap (A) according to another embodiment. This cap (A) has basically the same structure as that of the previous embodiment, and the difference is that the side plate part (5) is Outer part (8
a) The tip is bent to form a peak, and the polyimide resin layer (3) forms the entire inside surface of the cap and the entire outside surface of the side plate portion (5).
又、上記実施例において、掛合部(9)を短辺側の両側
面部(5)に形成したが、その片側にのみ形成する態様
とするも任意である。Further, in the above embodiment, the engaging portions (9) are formed on both side surfaces (5) on the short side, but it is also possible to form them only on one side.
(発明の効果) したがうて本発明によれば次の利点がある。(Effect of the invention) Therefore, the present invention has the following advantages.
■ ポリイミド樹脂層を有する結晶質材料vJ薄基板と
アモルファス金属薄板との二重構造状の天板部および側
板部からなるキャップ形状を呈していて、半導体をその
上面および周側面から磁気、1磁波、紫外線そしてアル
ファ線までシールドすることができ、不用意にデーター
の内容が消去されてしまうような事故を解消することが
できる。■ It has a cap shape consisting of a top plate part and side plate part with a double structure of a crystalline material vJ thin substrate with a polyimide resin layer and an amorphous metal thin plate, and the semiconductor is exposed to magnetism and one magnetic wave from its top and peripheral sides. It can shield from ultraviolet rays and even alpha rays, eliminating accidents such as data being accidentally erased.
■ 天板部および側板部におけるアモルファス金属薄板
と結晶質材料製薄基板とが相互に面に沿う方向に干渉し
ない関係の二重構造状になっていることにより、薄基板
の熱伸縮がアモルファス金属におよばず、アモルファス
金属の特性を維持して当初のシールド効果を持続するこ
とができる。■ The amorphous metal thin plate and the crystalline thin substrate in the top plate and side plate have a double structure in which they do not interfere with each other in the direction along the surface, so that thermal expansion and contraction of the thin substrate is more similar to that of the amorphous metal. It is possible to maintain the characteristics of the amorphous metal and maintain the original shielding effect.
■ 各側板部の折曲げ部におけるアモルファス金i薄板
部分は必要最少限の屈曲角度状になっていて、同部分の
内部応力も僅かに生じるだけで、シールド効果にほとん
ど影響しない。(2) The amorphous gold i-thin plate portion at the bent portion of each side plate has the minimum required bending angle, and only a small amount of internal stress is generated in the same portion, which has almost no effect on the shielding effect.
■ アモルファス金属が半導体の熱を奪って放熱し且つ
外圧を防いで、半導体を保護すことができる。(2) The amorphous metal absorbs heat from the semiconductor and dissipates it, and protects the semiconductor by preventing external pressure.
■ 側板部内面がポリイミド樹脂層で絶縁面になってい
るから、半導体におけるピンとの絶縁性を保つことがで
き、支障なく半導体に被着してシールドできる。- Since the inner surface of the side plate is an insulating surface made of a polyimide resin layer, insulation from the pins in the semiconductor can be maintained, and it can be attached to the semiconductor and shielded without any problems.
■ 半導体に対して掛合部を¥n脱して容易に着脱する
ことができ、データーの内容の消去に際しては外して、
自在に消去することができる自在性がある。■ It can be easily attached and detached by removing the hooking part from the semiconductor, and when erasing data contents, it can be removed and removed.
It has the flexibility to be erased at will.
第1図は本発明の半導体用キャップの一実施例を示す平
面図。第2図はn−n断面図。第3図は第2図の(P)
矢視拡大断面図。第4図はIV−rV拡大断面図。第5
図はアモルファス金1iIn板と薄基板の縮小斜視図。
第6図は他の実施例のキャップの部分拡大断面図。第7
図は第1図に例示したキャップを半導体に被着した状態
の一部切欠して示す縮小斜視図である。
図中、
(1)はアモルファス金属薄板
(2)は結晶質材料製薄基板
(2a)は重ね面
(2b)は面
(3)はポリイミド樹脂層
(4)は天板部
(5)は側板部
は側壁部
は把持部
(9)は掛合部
特
許
出
願
人
磐田電工株式会社
第
図
第
図FIG. 1 is a plan view showing an embodiment of the semiconductor cap of the present invention. FIG. 2 is a sectional view taken along line nn. Figure 3 is (P) of Figure 2.
An enlarged cross-sectional view in the direction of arrows. FIG. 4 is an enlarged sectional view taken along IV-rV. Fifth
The figure is a reduced perspective view of an amorphous gold 1iIn plate and a thin substrate. FIG. 6 is a partially enlarged sectional view of a cap of another embodiment. 7th
This figure is a partially cutaway, reduced perspective view showing the cap illustrated in FIG. 1 attached to a semiconductor. In the figure, (1) is an amorphous metal thin plate (2) is a crystalline material thin substrate (2a) is a layered surface (2b) is a surface (3) is a polyimide resin layer (4) is a top plate (5) is a side plate The side wall part is the grip part (9) and the engaging part is owned by patent applicant Iwata Electric Works Co., Ltd.
Claims (1)
重ね面と反対の面にポリイミド樹脂層を形成した結晶質
材料製薄基板との二重構造状で、天板部の四方の折曲げ
状の各側板部が、アモルファス金属薄板の側壁部全体を
薄基板の側壁部である把持部で挾み把持されていて、側
板部の先端に顎状の掛合部が形成された半導体用キャッ
プ。It has a double structure of an amorphous metal thin plate and a thin substrate made of a crystalline material with a polyimide resin layer formed on the surface opposite to the overlapping surface of the amorphous metal thin plate, and each side plate is bent on four sides of the top plate. is a semiconductor cap in which the entire side wall portion of an amorphous metal thin plate is held between gripping portions that are side wall portions of a thin substrate, and a jaw-like engaging portion is formed at the tip of the side plate portion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20067788A JPH0249451A (en) | 1988-08-10 | 1988-08-10 | Cap for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20067788A JPH0249451A (en) | 1988-08-10 | 1988-08-10 | Cap for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0249451A true JPH0249451A (en) | 1990-02-19 |
Family
ID=16428409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20067788A Pending JPH0249451A (en) | 1988-08-10 | 1988-08-10 | Cap for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0249451A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5519246A (en) * | 1992-02-28 | 1996-05-21 | Mitsubishi Denki Kabushiki Kaisha | Nonvolatile memory apparatus using an ultraviolet impermeable resin film |
JP4870847B1 (en) * | 2011-05-06 | 2012-02-08 | 初子 今中 | Tombstone hat made of foam with elasticity |
-
1988
- 1988-08-10 JP JP20067788A patent/JPH0249451A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5519246A (en) * | 1992-02-28 | 1996-05-21 | Mitsubishi Denki Kabushiki Kaisha | Nonvolatile memory apparatus using an ultraviolet impermeable resin film |
JP4870847B1 (en) * | 2011-05-06 | 2012-02-08 | 初子 今中 | Tombstone hat made of foam with elasticity |
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