JPH0249195A - Method of washing organic solvent and method of deducing volume of waste washing liquid - Google Patents
Method of washing organic solvent and method of deducing volume of waste washing liquidInfo
- Publication number
- JPH0249195A JPH0249195A JP63198891A JP19889188A JPH0249195A JP H0249195 A JPH0249195 A JP H0249195A JP 63198891 A JP63198891 A JP 63198891A JP 19889188 A JP19889188 A JP 19889188A JP H0249195 A JPH0249195 A JP H0249195A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- solvent
- choline
- org
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 18
- 239000002699 waste material Substances 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 17
- 239000003960 organic solvent Substances 0.000 title claims description 8
- 238000005406 washing Methods 0.000 title 2
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229960001231 choline Drugs 0.000 claims abstract description 13
- 238000004140 cleaning Methods 0.000 claims description 14
- 238000006864 oxidative decomposition reaction Methods 0.000 claims 1
- 238000005979 thermal decomposition reaction Methods 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 18
- 239000002904 solvent Substances 0.000 abstract description 17
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract description 6
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 abstract description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 abstract description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract description 2
- 238000007664 blowing Methods 0.000 abstract description 2
- 238000002485 combustion reaction Methods 0.000 abstract description 2
- 230000001172 regenerating effect Effects 0.000 abstract 3
- 238000004321 preservation Methods 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 abstract 1
- 229940086542 triethylamine Drugs 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000010887 waste solvent Substances 0.000 description 6
- 239000012459 cleaning agent Substances 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 238000012958 reprocessing Methods 0.000 description 4
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical group CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000010802 sludge Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 3
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 235000012501 ammonium carbonate Nutrition 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- OQAQJWFVENTVSM-UHFFFAOYSA-N azorous acid Chemical group ON(O)O OQAQJWFVENTVSM-UHFFFAOYSA-N 0.000 description 2
- BNMJSBUIDQYHIN-UHFFFAOYSA-N butyl dihydrogen phosphate Chemical compound CCCCOP(O)(O)=O BNMJSBUIDQYHIN-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910017464 nitrogen compound Inorganic materials 0.000 description 2
- 150000002830 nitrogen compounds Chemical group 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000002915 spent fuel radioactive waste Substances 0.000 description 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- PTYMQUSHTAONGW-UHFFFAOYSA-N carbonic acid;hydrazine Chemical compound NN.OC(O)=O PTYMQUSHTAONGW-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000000909 electrodialysis Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- LOEUCBBZEHMJQN-UHFFFAOYSA-N hydrazine;oxalic acid Chemical compound NN.OC(=O)C(O)=O LOEUCBBZEHMJQN-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- JUINSXZKUKVTMD-UHFFFAOYSA-N hydrogen azide Chemical compound N=[N+]=[N-] JUINSXZKUKVTMD-UHFFFAOYSA-N 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 239000002925 low-level radioactive waste Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229940094933 n-dodecane Drugs 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- -1 pyrimidinequinoline Chemical compound 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002901 radioactive waste Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
Landscapes
- Extraction Or Liquid Replacement (AREA)
Abstract
Description
使用済核燃料工場において抽出溶媒として用いられるリ
ン酸トリブチル（ＴＢＰ）は、その使用の過程において
硝酸、放射線等の作用によって一部分解し、抽出性能が
低下する。分解生成物は種々のものがあるが、主要なも
のは、ＴＢＰからリン酸基が一つとれたリン酸ジブチル
（ＤＢＰ）。
二つとれたリン酸モノブチル（ＭＢＰ）である。
これらの分解生成物は、溶解液中のジルコニウム、ウラ
ン等と強固な錯体を形成し、微量存在するだけで抽出性
能に著しい悪影響を与える。また、他の分解生成物は沈
澱となって有機相と水相の間にエマルジョン相（第三相
）を形成し、抽出器における有機相と水相の物理的相分
離に悪影響を与える。
したがって、抽出溶媒を再利用する際は、これらの分解
生成物を十分に除去することが必要である。このため、
再処理プロセスには溶媒再生工程が付加され、洗浄剤を
用いて劣化溶媒から分解生成物が除去されている。
洗浄剤としては、従来から水酸化ナトリウム。
炭酸ナトリウム等のアルカリが用いられている。
この工程から発生するアルカリ廃液は、再処理工場の酸
性廃液と混合処理され、Ｎ ａ Ｎ Ｏ３を含む放射性
廃液（含塩廃液と呼ぶ）となる。含塩廃液は、最終的に
は蒸発濃縮したのち固化し、中低レベル廃棄物として保
管される。この固化体には、β、γ核種だけでなく、α
核種も含まれているため、取り扱いには注意を要する上
、発生量もドラム缶にして数本／トン−Ｕに達すると言
われている。処理量８００ ｔｏｎ ／ｙｒの再処理工
場の場合、ドラム缶の発生数は年間数千本に及ぶ。した
がって、この量を減らすことは、廃棄物処理処分の負担
の軽減につながる重要な課題と言える。
この問題に対する対策としては、
■含塩廃液から問題となる核種を分離する。
■Ｎａ Ｎ Ｏ：＋を電解透析法によってＮａＯＨとＨ
ＮＯ３に分解し、これらを回収再使用する。
■水和ヒドラジンなどの分解処理可能な洗浄剤の使用に
よりソルトフリー化する
等の方法が検討されている。
第一、第二の方法の場合は、溶媒再生法自身は既存のも
のを使用し、生成する廃スラツジの処分法を新たに開発
するわけで、大量の廃スラツジが一度は生成してしまう
という問題がある。これに対して分解処理可能な洗浄剤
を使用する第三の方法の場合には、スラッジの生成量が
大幅に抑制されるという特徴がある。Tributyl phosphate (TBP), which is used as an extraction solvent in spent nuclear fuel plants, is partially decomposed by the effects of nitric acid, radiation, etc. during its use, resulting in a decrease in extraction performance. There are various decomposition products, but the main one is dibutyl phosphate (DBP), which has one phosphate group removed from TBP. This is monobutyl phosphate (MBP). These decomposition products form strong complexes with zirconium, uranium, etc. in the solution, and their presence in even a trace amount has a significant adverse effect on extraction performance. In addition, other decomposition products precipitate to form an emulsion phase (third phase) between the organic phase and the aqueous phase, which adversely affects the physical phase separation between the organic phase and the aqueous phase in the extractor. Therefore, when reusing the extraction solvent, it is necessary to sufficiently remove these decomposition products. For this reason,
A solvent regeneration step is added to the reprocessing process, in which decomposition products are removed from the degraded solvent using a cleaning agent. Sodium hydroxide has traditionally been used as a cleaning agent. Alkali such as sodium carbonate is used. The alkaline waste liquid generated from this process is mixed with the acidic waste liquid from the reprocessing plant to become a radioactive waste liquid containing NaNO3 (referred to as salt-containing waste liquid). The salt-containing waste liquid is finally evaporated and concentrated, solidified, and stored as medium-low level waste. This solidified material contains not only β and γ nuclides, but also α
Because it contains nuclides, care must be taken when handling it, and the amount generated is said to reach several drums/ton-U. In the case of a reprocessing plant with a processing capacity of 800 tons/yr, the number of drums generated is several thousand per year. Therefore, reducing this amount is an important issue that will lead to reducing the burden of waste treatment and disposal. Measures to address this problem include: 1) Separating the problematic nuclides from the salt-containing waste liquid. ■NaNO: + is converted into NaOH and H by electrodialysis method.
It is decomposed into NO3 and these are recovered and reused. ■Methods such as making it salt-free by using detergents that can be decomposed such as hydrated hydrazine are being considered. In the case of the first and second methods, the existing solvent regeneration method itself is used, and a new method for disposing of the waste sludge that is generated is developed, which means that a large amount of waste sludge will be generated at once. There's a problem. On the other hand, the third method using a decomposable cleaning agent is characterized in that the amount of sludge produced is significantly suppressed.
分解処理可能な溶媒再生用洗浄剤として炭酸アンモニウ
ム、炭酸ヒドラジン、蓚酸ヒドラジン。
水酸化第４級チッ素化合物などが提案されている。
このうち、炭酸アンモニウムやヒドラジン系の化合物は
、分解生成物の濃度が高くなると洗浄能力が低下すると
いう問題がある。また、これらは、硝酸と反応して爆発
危険性の高い硝酸アンモニウムやアジ化水素を生成する
ため、取り扱いには細心の注意を必要とする。このほか
、ヒドラジン系の化合物は常温でも分解しやすく保存し
にくいという問題がある。
水酸化第４級チッ素化合物の具体例としては、特開昭６
２−２００２９８号で水酸化テトラアルキルアンモニウ
ム、特に水酸化テトラメチルアンモニウムおよび水酸化
テ１〜ラエチルアンモニウムが報告されている。しかし
ながら、これらの化合物は熱に弱く、ゆるやかな加温で
も分解が起るため、再処理工程中の溶媒洗浄のように、
酸を含む溶媒を洗浄する場合は、中和熱による分解に注
意を払う必要がある。また、水酸化テトラアルキルアン
モニウムは、合成が容易ではなく、したがって高価であ
るという欠点がある。
この他の水酸化第４級チッ素化合物の例として特開昭６
２−２００２９８号では、ピロール、オキサゾール、チ
アゾール、イミダゾール３ ピリジン、ピリミジンキノ
リン、キノキサリン、プリン。
プテリジン、カルバゾール、アクリジン５ フェナジン
の水酸化第４級化合物が挙げられている。しかし、これ
らの化合物を４級化して水酸化第４級化合物を合成する
ことは、水酸化テトラアルキルアンモニウムの合成より
もはるかに困難であり、したがって高価にならざるを得
ない。
この他にも数多くの第４級アンモニウム塩が知られてお
り、これらをＯＨ化することができれば水酸化第４級チ
ン素化合物を得ることができる。
しかし、上記の例、および水酸化テトラアルキルアンモ
ニウムでも、アルキル基の分子量が大きくなると、親油
性が増すために溶媒洗浄に使えなくなるという例からも
容易に類推し得るように、水酸化第４級チッ素化合物な
ら何でも溶媒洗浄に使えるわけではなく、使用目的にか
なう高性能の溶媒洗浄剤を開発するには、個々の化合物
について注意深く実験検討する必要がある。
以上のように、公知の方法のどれに関しても、洗浄能力
が不十分であるか、取り扱いに細心の注意を要するか、
保存しにくいか、あるいは高価である等の問題点の一部
または全部があてはまる。
本発明は、これらの問題点のすべてを解決することを目
的としてなされた。Ammonium carbonate, hydrazine carbonate, and hydrazine oxalate are used as detergents for solvent regeneration that can be decomposed. Hydroxylated quaternary nitrogen compounds and the like have been proposed. Among these, ammonium carbonate and hydrazine compounds have a problem in that their cleaning ability decreases when the concentration of decomposition products increases. In addition, since these react with nitric acid to produce ammonium nitrate and hydrogen azide, which are highly explosive, they must be handled with great care. In addition, hydrazine-based compounds have the problem of being easily decomposed even at room temperature and difficult to store. Specific examples of quaternary nitrogen hydroxide compounds include JP-A No. 6
No. 2-200298 reports tetraalkylammonium hydroxides, in particular tetramethylammonium hydroxide and tetraethylammonium hydroxide. However, these compounds are sensitive to heat and decompose even with gentle heating, so
When cleaning solvents containing acids, it is necessary to pay attention to decomposition due to heat of neutralization. Tetraalkylammonium hydroxides also have the disadvantage of not being easy to synthesize and therefore expensive. As an example of other quaternary nitrogen hydroxide compounds,
No. 2-200298, pyrrole, oxazole, thiazole, imidazole 3 pyridine, pyrimidinequinoline, quinoxaline, purine. Hydroxylated quaternary compounds of pteridine, carbazole, acridine 5 and phenazine are mentioned. However, quaternizing these compounds to synthesize hydroxylated quaternary compounds is much more difficult than the synthesis of tetraalkylammonium hydroxides, and therefore cannot help but be expensive. Many other quaternary ammonium salts are known, and if these can be converted into OH, a hydroxylated quaternary tinine compound can be obtained. However, as can be easily inferred from the above example and also from the example that when the molecular weight of the alkyl group becomes large, the tetraalkyl ammonium hydroxide cannot be used for solvent cleaning due to the increased lipophilicity. Not all nitrogen compounds can be used for solvent cleaning, and in order to develop a high-performance solvent cleaning agent that meets the intended use, it is necessary to carefully conduct experiments on each compound. As mentioned above, all of the known methods either have insufficient cleaning ability or require extreme care in handling.
Some or all of the following problems apply, such as being difficult to store or being expensive. The present invention was made with the aim of solving all of these problems.
本発明者等は、上記の目的を達成するために種々の物質
について試験を行った結果、コリンがこの目的のために
効果的に使用し得ることを見出し、本発明を完成するに
至った。
コリンは、
Ｈ３
ＣＣＨ，−Ｎ” −ｃｔｉｚｏＨ）ＯＨＨ３
で表わされる強塩基性の有機化合物であり、水酸化ナト
リウムとほぼ同等の溶媒再生能力を持ち、発生した再生
廃液を乾留または燃焼により容易に減容することができ
る。
コリンは、半導体工業においてシリコン基板の洗浄剤と
して大量に使用されており、トリエチルアミン水溶液に
エチレンオキサイドを吹き込むことにより容易に合成す
ることができるので、水酸化テトラメチルアンモニウム
等の水酸化テトラアルキルアンモニウムに比べるとはる
かに安価である。
以下に本発明の実施例、および本発明によらない対照例
を示す。
対照例
３０ｖｏ１％ＴＢＰ−ｎ−ドデカン混合溶媒２５０ｍ１
と３Ｎ硝酸２５０ｍ１を分液ロート中で１０分間振盪後
、有機相を分離し、Ｃｏ−６０のγ線を４Ｍ ｒａｄ照
射した。こうして作成した模擬廃溶媒中のＤ Ｂ Ｐ
？Ｍ度は、イオンクロマトグラフ分析によれば１１２０
ｐｐｍであった。この模擬廃溶媒１００ｍ１とＩＮ
ＮａＯＨ溶液１００ｍ１を分液ロート中で１０分間ｆｉ
盪後有機相を分離し、同一の操作を再度繰り返した。こ
の洗浄済み廃溶媒中のＤＢＰ濃度は、５２ρρｍであっ
た。
実施例
対照例で用いたものと同一の模擬廃溶媒１００ｍ１を、
ＩＮコリン水溶液１００ｍ１で２回洗浄した。
この洗浄済み廃溶媒中のＤ Ｂ Ｐ ｒａ度は、４８ｐ
ｐｍであった。このように、コリン水溶液の廃溶媒洗浄
能力は、ＮａＯＨ溶液と同等かもしくはそれ以上である
ことがわかる。The present inventors conducted tests on various substances to achieve the above object, and as a result found that choline can be effectively used for this purpose, and completed the present invention. Choline is a strongly basic organic compound represented by H3CCH,-N"-ctizoH)OHH3, and has almost the same solvent regeneration ability as sodium hydroxide, and the generated regenerated waste liquid can be easily reduced by carbonization or combustion. Choline is used in large quantities as a cleaning agent for silicon substrates in the semiconductor industry, and can be easily synthesized by blowing ethylene oxide into an aqueous solution of triethylamine. It is much cheaper than tetraalkylammonium hydroxide. Examples of the present invention and control examples not according to the present invention are shown below. Control Example 30 vol 1% TBP-n-dodecane mixed solvent 250 ml
After shaking 250 ml of 3N nitric acid in a separatory funnel for 10 minutes, the organic phase was separated and irradiated with 4M rad of Co-60 gamma rays. D B P in the simulated waste solvent thus created
? The M degree is 1120 according to ion chromatography analysis.
It was ppm. 100ml of this simulated waste solvent and IN
100 ml of NaOH solution in a separatory funnel for 10 minutes
After shaking, the organic phase was separated and the same operation was repeated again. The DBP concentration in this washed waste solvent was 52ρρm. 100 ml of the same simulated waste solvent as that used in the Examples and Control Examples,
Washed twice with 100 ml of IN choline aqueous solution. The D B P ra degree in this washed waste solvent is 48p.
It was pm. Thus, it can be seen that the waste solvent cleaning ability of the choline aqueous solution is equal to or greater than that of the NaOH solution.
Claims (2)
この液−液接触後に前記コリン溶液と前記有機溶媒とを
分離することを特徴とする有機溶媒の洗浄方法。(1) Bringing a solution containing choline into liquid-liquid contact with an organic solvent,
A method for cleaning an organic solvent, which comprises separating the choline solution and the organic solvent after this liquid-liquid contact.
廃液を、熱分解または酸化分解により減容することを特
徴とする有機溶媒の洗浄廃液の減容法。(2) A method for reducing the volume of an organic solvent cleaning waste liquid, which comprises reducing the volume of the cleaning waste liquid generated in the cleaning method according to claim 1 by thermal decomposition or oxidative decomposition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19889188A JPH07107557B2 (en) | 1988-08-11 | 1988-08-11 | Washing method of organic solvent and volume reduction method of washing waste liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19889188A JPH07107557B2 (en) | 1988-08-11 | 1988-08-11 | Washing method of organic solvent and volume reduction method of washing waste liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0249195A true JPH0249195A (en) | 1990-02-19 |
| JPH07107557B2 JPH07107557B2 (en) | 1995-11-15 |
Family
ID=16398656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19889188A Expired - Lifetime JPH07107557B2 (en) | 1988-08-11 | 1988-08-11 | Washing method of organic solvent and volume reduction method of washing waste liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07107557B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008038454A (en) * | 2006-08-04 | 2008-02-21 | Hitachi Metals Techno Ltd | Fixing mechanism |
| JP2015127673A (en) * | 2013-12-27 | 2015-07-09 | 株式会社Ihi | Radioactive waste liquid processing method and radioactive waste liquid processing apparatus |
| US9152122B2 (en) | 2011-05-30 | 2015-10-06 | Canon Finetech Inc. | Static-electricity-blocking mounting unit and electronic apparatus |
| WO2022010367A1 (en) * | 2020-07-10 | 2022-01-13 | Aquafortus Technologies Limited | A solvent drying solution and processes therefor |
-
1988
- 1988-08-11 JP JP19889188A patent/JPH07107557B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008038454A (en) * | 2006-08-04 | 2008-02-21 | Hitachi Metals Techno Ltd | Fixing mechanism |
| US9152122B2 (en) | 2011-05-30 | 2015-10-06 | Canon Finetech Inc. | Static-electricity-blocking mounting unit and electronic apparatus |
| JP2015127673A (en) * | 2013-12-27 | 2015-07-09 | 株式会社Ihi | Radioactive waste liquid processing method and radioactive waste liquid processing apparatus |
| WO2022010367A1 (en) * | 2020-07-10 | 2022-01-13 | Aquafortus Technologies Limited | A solvent drying solution and processes therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07107557B2 (en) | 1995-11-15 |
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