JPH0248899U - - Google Patents
Info
- Publication number
- JPH0248899U JPH0248899U JP12746388U JP12746388U JPH0248899U JP H0248899 U JPH0248899 U JP H0248899U JP 12746388 U JP12746388 U JP 12746388U JP 12746388 U JP12746388 U JP 12746388U JP H0248899 U JPH0248899 U JP H0248899U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- processing chamber
- inert gas
- workpiece
- supply port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案の１実施例である電子線照射装
置の概略正面図、第２図はその供給口（排出口）
の概略拡大斜視図、第３図は供給管（排出管）の
拡大断面図、第４図は従来の電子線照射装置の概
略正面図である。
１……供給管、１ａ，１ｂ，１ｃ……供給口、
２……排出管、２ａ，２ｂ，２ｃ……排出口、３
……管、４，６，７……調整弁、１０……電子線
発生部、１１……窓部、２０……処理室、２１…
…照射部、Ａ……被処理物。
Figure 1 is a schematic front view of an electron beam irradiation device that is an embodiment of the present invention, and Figure 2 is its supply port (discharge port).
FIG. 3 is an enlarged sectional view of a supply pipe (discharge pipe), and FIG. 4 is a schematic front view of a conventional electron beam irradiation device. 1... Supply pipe, 1a, 1b, 1c... Supply port,
2...Discharge pipe, 2a, 2b, 2c...Discharge port, 3
...Tube, 4,6,7...Adjusting valve, 10...Electron beam generating section, 11...Window section, 20...Processing chamber, 21...
...Irradiation section, A...Object to be treated.
Claims (1)
搬入・搬出する出入口が設けられた処理室と、該
処理室内に配置され、該処理室内に搬入された被
処理物に前記電子線発生部より発した電子線を照
射する照射部とを有し、前記処理室内を不活性ガ
スで置換して、被処理物に電子線を照射する電子
線照射装置において、前記照射部の被処理物搬入
側近傍又は被処理物搬出側近傍の何れか一方に、
不活性ガスを供給する供給口を、他方に処理室内
の雰囲気ガスを排出する排出口を設け、電子線を
照射する際には、前記供給口から前記処理室内に
前記不活性ガスを送り込むと同時に、前記排出口
から前記処理室内の雰囲気ガスを強制的に排気す
るように構成したことを特徴とする電子線照射装
置。 A processing chamber is provided with an electron beam generation section that generates an electron beam, an entrance for carrying in and out a workpiece, and is arranged in the processing chamber, and the workpiece that is carried into the processing chamber receives the electron beam generation. an irradiation section that irradiates the object with an electron beam emitted from the irradiation section, the processing chamber is replaced with an inert gas, and the object to be processed is irradiated with the electron beam; Either near the loading side or near the unloading side of the processed material,
A supply port for supplying an inert gas is provided on the other side, and an exhaust port for discharging atmospheric gas in the processing chamber is provided on the other side, and when irradiating with an electron beam, the inert gas is fed into the processing chamber from the supply port and at the same time. . An electron beam irradiation apparatus characterized in that the atmospheric gas in the processing chamber is forcibly exhausted from the exhaust port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746388U JPH0248899U (en) | 1988-09-29 | 1988-09-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746388U JPH0248899U (en) | 1988-09-29 | 1988-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0248899U true JPH0248899U (en) | 1990-04-04 |
Family
ID=31379920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12746388U Pending JPH0248899U (en) | 1988-09-29 | 1988-09-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248899U (en) |
-
1988
- 1988-09-29 JP JP12746388U patent/JPH0248899U/ja active Pending
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