JPH0248133U - - Google Patents
Info
- Publication number
- JPH0248133U JPH0248133U JP12917088U JP12917088U JPH0248133U JP H0248133 U JPH0248133 U JP H0248133U JP 12917088 U JP12917088 U JP 12917088U JP 12917088 U JP12917088 U JP 12917088U JP H0248133 U JPH0248133 U JP H0248133U
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- potential side
- flange
- supply pipe
- gas passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 2
Landscapes
- Pipeline Systems (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
第１図イは、本考案によるガス供給管路の絶縁
装置の実施例を示す縦断面図、第１図ロは他の実
施例を示す要部の縦断面図、第２図は更に他の実
施例を示すガス供給管路の絶縁装置の縦断面図、
第３図はガス供給管路の絶縁装置の従来例を示す
縦断面図である。
１：高電位側ガス供給管路、２：接地電位側ガ
ス供給管路、３，４：フランジ、５：絶縁体、５
１：ガス通路、５２：凹部、６，６１，６２：締
付ボルト、７：絶縁カラー、８：Ｏリング。
FIG. 1A is a longitudinal sectional view showing an embodiment of the insulating device for gas supply pipelines according to the present invention, FIG. 1B is a longitudinal sectional view of the main part showing another embodiment, and FIG. A vertical cross-sectional view of an insulating device for a gas supply pipeline showing an example,
FIG. 3 is a longitudinal sectional view showing a conventional example of an insulating device for a gas supply pipeline. 1: High potential side gas supply pipeline, 2: Ground potential side gas supply pipeline, 3, 4: Flange, 5: Insulator, 5
1: Gas passage, 52: Recess, 6, 61, 62: Tightening bolt, 7: Insulating collar, 8: O-ring.
Claims (1)
側ガス供給管路のフランジ間に挾持される絶縁体
のガス通路壁面に、ガス通路の全周にわたる１個
または、複数個の凹凸部を設けたことを特徴とす
るガス供給管路の絶縁装置。 One or more uneven parts are provided around the entire circumference of the gas passage on the gas passage wall surface of the insulator sandwiched between the flange of the high potential side gas supply pipe and the flange of the ground potential side gas supply pipe. An insulating device for a gas supply pipeline, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12917088U JPH0248133U (en) | 1988-09-30 | 1988-09-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12917088U JPH0248133U (en) | 1988-09-30 | 1988-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0248133U true JPH0248133U (en) | 1990-04-03 |
Family
ID=31383198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12917088U Pending JPH0248133U (en) | 1988-09-30 | 1988-09-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248133U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003077415A (en) * | 2001-09-05 | 2003-03-14 | Mitsubishi Electric Corp | Ion implantation equipment and manufacturing method of semiconductor device using same |
| JP2007324095A (en) * | 2006-06-05 | 2007-12-13 | Canon Inc | Plasma treatment device, and its treatment method |
-
1988
- 1988-09-30 JP JP12917088U patent/JPH0248133U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003077415A (en) * | 2001-09-05 | 2003-03-14 | Mitsubishi Electric Corp | Ion implantation equipment and manufacturing method of semiconductor device using same |
| JP2007324095A (en) * | 2006-06-05 | 2007-12-13 | Canon Inc | Plasma treatment device, and its treatment method |
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