JPH0244323U - - Google Patents
Info
- Publication number
- JPH0244323U JPH0244323U JP12341588U JP12341588U JPH0244323U JP H0244323 U JPH0244323 U JP H0244323U JP 12341588 U JP12341588 U JP 12341588U JP 12341588 U JP12341588 U JP 12341588U JP H0244323 U JPH0244323 U JP H0244323U
- Authority
- JP
- Japan
- Prior art keywords
- discharge tube
- processing apparatus
- plasma processing
- porous
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003989 dielectric material Substances 0.000 claims 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12341588U JPH0244323U (cs) | 1988-09-22 | 1988-09-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12341588U JPH0244323U (cs) | 1988-09-22 | 1988-09-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0244323U true JPH0244323U (cs) | 1990-03-27 |
Family
ID=31372248
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12341588U Pending JPH0244323U (cs) | 1988-09-22 | 1988-09-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0244323U (cs) |
-
1988
- 1988-09-22 JP JP12341588U patent/JPH0244323U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100219873B1 (ko) | 플라즈마 가공을 위한 장치 및 방법 | |
| JPH0244323U (cs) | ||
| KR920005282A (ko) | 미세가공 장치 및 방법 | |
| JPS5710629A (en) | Plasma treatment of hollow body | |
| JPS62129061U (cs) | ||
| JPS6237055U (cs) | ||
| JPS6426374U (cs) | ||
| JPS61168630U (cs) | ||
| JPH0323303Y2 (cs) | ||
| JPS61136537U (cs) | ||
| JPS62107439U (cs) | ||
| JPH0283017U (cs) | ||
| JPH0244324U (cs) | ||
| JPH069490Y2 (ja) | 半導体ウエハのプラズマアツシング装置 | |
| JPH024237U (cs) | ||
| JPH01154630U (cs) | ||
| JPH0295234U (cs) | ||
| JPH0267637U (cs) | ||
| JPS62191868U (cs) | ||
| JPH0171438U (cs) | ||
| JPH0425230U (cs) | ||
| JPS622245U (cs) | ||
| JPS62188138U (cs) | ||
| JPH02120833U (cs) | ||
| JPS6422772U (cs) |