JPH024268A - Resist peeling agent - Google Patents

Abstract

PURPOSE:To prevent pollution of underground water by adding one of chlorofluorohydrocarbons composed of 3 carbon atoms as an effective component. CONSTITUTION:One of the chlorofluorohydrocarbons composed of 3 carbon atoms is contained as an effective component in the developer. It is preferred to use the H-containing chlorofluorohydrocarbon, such as 1,1-dichloro-2,2,3,3,3- pentafluorohydrocarbon (b.p. 45.5 deg.C), or a mixture of plural kinds of such hydrocarbons. At least one of hydrocarbons, alcohols, ketones, chlorinated hydrocarbons, aromatic hydrocarbons, and esters is contained in the resist peeling agent, thus permitting the favorable resist peeling agent to be obtained in place of the ones unfavorable from the viewpoint of polluting the underground water.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a resist stripping agent used in the production of printed circuit boards and semiconductors.

[Prior Art] When producing a printed circuit board or a semiconductor circuit, there is a final step of removing the resist after etching. Conventionally, chlorinated solvents such as methylene chloride, tetrachloroethylene, and 0-dichlorobenzene have been used in this step.

[Problems to be Solved by the Invention] The present invention provides a new resist stripping agent that can replace chlorinated solvents in order to reduce the amount of chlorinated solvents used since conventionally used chlorinated solvents are undesirable in terms of groundwater contamination. The purpose is to

[Means for Solving the Problems] The present invention has been made to achieve the above-mentioned objects, and
The present invention provides a resist stripping agent containing a chlorofluorinated hydrocarbon having 3 carbon atoms as an active ingredient.

The chlorofluorinated hydrocarbon of the present invention includes 1,1-dichloro-
2,2,3,3,3-pentafluoropropane (b, p
.

45.5°C), 1,3-dichloro-1,2,2,3,3
-Pentafluoropropane (b, p, 52°C), 1
, 1,3-trichloro-2,2,3,3-tetrafluoropropane (b, p.

91.5°C), 1.3.3-trichloro-1,2,
2,3-tetrafluoropropane (b, p, 90.
5°C) l-chloro-1,2,2,3,3-pentafluoropropane (b, p, 43.9'C), 1.3-
Dichloro-2,2,3,3-tetrafluoropropane (
b, 9.68°C), l-chloro-2,2,3,3-tetrafluoropropane (b, 9.54°C), 1.1-
Dicrylo-1,2,2-trifluoropropane (b, p
, 60.2"C), 1,3-dichloro-2,2,-difluoropropane (b, p, 96.7 °C), 1,1-dichloro-2,2,-difluoropropane (b, p,
79° C.) and hydrogen-containing chlorofluorohydrocarbons such as l-chloro-2,2-difluoropropane (b, p, 55.1″c), or a mixture of two or more thereof is preferred.

The resist stripping agent of the present invention can contain various other components depending on various purposes6.For example, in order to increase the resist stripping force, hydrocarbons, alcohols, ketones, chlorinated At least one kind selected from organic solvents such as hydrocarbons, aromatics, and esters can be contained. The content ratio of these organic solvents in the resist stripping agent is 0 to 50% by weight, preferably 10 to 40% by weight.
% by weight, more preferably from 20 to 30% by weight.0 If the mixture of the chlorofluorinated hydrocarbons and organic solvent of the present invention has an azeotropic composition, it is preferred to use that azeotropic composition.

The hydrocarbons are preferably linear or cyclic saturated or unsaturated hydrocarbons having 1 to 15 carbon atoms, such as n-pentane, impentane, and n-hexane.

Isohexane, 2-methylpentane, 2.2-dimethylbutane, 2.3-dimethylbutane, n-pentane, isohexane, 3-methylhexane, 2.4-dimethylpenkune, n-octane, to 2-methyl Butane, 3-methylhebutane, 4-methylpentane, 2.2-dimethylhexane, 2.5-dimethylhexane, 3.3-dimethylhexane, 2-methyl-3-ethylpenkun, 3-methyl-3-ethylpenkun, 2゜3.3-trimethylpentane, 2.3.4-trimethylpentane, 2.2.3-trimethylpentane, isooctane, nonane, 2.2゜5
-trimethylhexane, decane, dodencane, l-pentene, 2-pentene, 1-hexene, 1-octene, l
-nonene, l-decene, cyclopenkune, methylcyclopenkune, cyclohexane, methylcyclohexane, ethylcyclohexane, bicyclohexane, cyclohexene, α-pinene, dipentene, decalin, tetralin,
It is selected from amidino, amylnaphthalene, etc. More preferred are n-pentane, n-hexane, cyclohexane, n-hebutane and the like.

The alcohols are preferably linear or cyclic saturated or unsaturated alcohols having 1 to 17 carbon atoms, including methanol, ethanol, n-propyl alcohol, isopropyl alcohol, and n-butyl alcohol. , 5ec-butyl alcohol, isobutyl alcohol, tert-butyl alcohol, pentyl alcohol, 5ec-amyl alcohol, l-ethyl-1-propanol, 2-methyl-1
-butanol, isopentyl alcohol, tert-pentyl alcohol, 3-methyl-2-butanol, neopentyl alcohol, 1-hexanol, 2-methyl-
1-heptatool, 4-methyl-2-heptatool, 2
-ethyl-1-butanol, l-heptatool, 2-
heptatool, 3-heptatool, l-octanol,
2-octanol, 2-ethyl-1-hexanol, 1
-nonanol, 3.5.5-trimethyl-1-hexanol, l-decanol, 1-undecanol, l-dodecanol, allyl alcohol, propargyl alcohol, benzyl alcohol, cyclohexanol, l-methylcyclohexanol 2-methylcyclohexanol, 3-methylcyclohexanol, 4-methylcyclohexanol, α-terpineol, avinitinol, 2
．． It is selected from 6-dimethyl-4-heptatool, trimethylnonyl alcohol, tetradecyl alcohol, heptadecyl alcohol and the like. More preferred are methanol, ethanol, isopropyl alcohol and the like.

A saturated or unsaturated hydrocarbon group having 1 to 9 carbon atoms) is preferably represented by the following formula: acetone, methyl ethyl ketone, 2-pentanone, 3-pentanone, 2-
Hexanone, methyl-n-butyl ketone, methyl butyl ketone, 2-heptanone, 4-heptanone, diisobutyl ketone, acetonylacetone, mesityl oxide, holon, methyl-〇-amyl ketone, ethyl butyl ketone, methylhexyl ketone, cyclohexanone, methyl It is selected from cyclohexanone, isophorone, 2,4-pentanedione, diacetone alcohol, acetophenone, fencheon and the like. More preferred are acetone, methyl ethyl ketone and the like.

The chlorinated hydrocarbons are preferably saturated or unsaturated chlorinated hydrocarbons having 1 to 2 carbon atoms, such as methylene chloride, carbon tetrachloride, 1.1-dichloroethane, 1.2-dichloroethane, 1.1. 1-Trichloroethane, 1.1.2-
Trichloroethane, 1.1.1.2-tetrachloroethane, 1.1.2.2-tetrachloroethane, pentachloroethane, 1.1-dichloroethylene, 1.2-dichloroethylene, trichlorethylene, It is selected from tetrachlorethylene and the like. More preferred are methylene chloride, 1.1.1-trichloroethane, trichlorethylene, tetrachlorethylene and the like.

As aromatics, benzene derivatives and naphthalene derivatives are preferred, and benzene, toluene, xylene, ethylbenzene, isopropylbenzene, diethylbenzene, sec-butylbenzene, triethylbenzene, diisopropylbenzene, styrene, alkylbenzenesulfonic acid,
Phenol, mesitylene, naphthalene, tetralin, butylbenzene, p-cymene, cyclohexylbenzene,
Pentylbenzene, dipentylbenzene, dodecylbenzene, biphenyl, 0-cresol, m-cresol,
It is selected from xylenol and the like. More preferred are alkylbenzenesulfonic acids, phenol, and the like.

As the esters, R is represented by the following general formula.

0OR4 (Here, R1, Ri, R-, R4, Ri, Rs are H, OH, or a hydrocarbon group having 1 to 19 carbon atoms and having a saturated or unsaturated bond.) Specifically, methyl formate, ethyl formate , propyl formate,
Butyl formate, isobutyl formate, pentyl formate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate,
Butyl acetate, isobutyl acetate, 5ec-butyl acetate, pentyl acetate, isopentyl acetate, 3-methoxybutyl acetate, 5ec-hexyl acetate, 2-ethylbutyl acetate, 2-ethylhexyl acetate, cyclohexyl acetate, benzyl acetate, methyl propionate, propion Ethyl acid, butyl propionate, isopentyl propionate, methyl butyrate, ethyl butyrate, butyl butyrate, isopentyl butyrate, isobutyl isobutyrate, 2-hydroxy-
Ethyl 2-methylpropionate, butyl stearate,
Pentyl stearate, methyl benzoate, ethyl benzoate, propyl benzoate, butyl benzoate, isopentyl benzoate, benzyl benzoate, ethyl abietate, benzyl abietate, bis-2-ethylhexyl adipate, γ-butyrolact, oxalic acid Diethyl, dibutyl oxalate, dibentyl oxalate, diethyl malonate, dimethyl maleate, diethyl maleate, dibutyl maleate, dibutyl tartrate, tributyl citrate, diptyl sebacate, bis-2-ethylhexyl sebacate,
Some are selected from diethyl phthalate, diethyl phthalate, diptyl phthalate, bis-2-ethylhexyl phthalate, diethyl phthalate, and the like. More preferred are methyl acetate, ethyl acetate and the like.

The resist that can be peeled off according to the present invention is not limited in any way, and examples thereof include positive or negative light exposure resists, deep ultraviolet exposure resists, and X-ray or electron beam resists. Materials for resists for light exposure include quinonediazide based on phenol and cresol novolak resin, cyclized rubber based on cis-1,4-polyisoprene, polycinnamic acid, etc. Resists include polymethylmethacrylate, polymethylisopropenylketone, etc., and electron beam and Coalescence and the like are known, but the resist stripping agent of the present invention is effective for both.

The method for removing the resist is not limited at all, and a conventional spray method, dipping and stirring, shaking, applying ultrasonic waves, etc. can be employed.

[Examples] Examples 1 to 17 A resist stripping test was conducted using resist stripping agents shown in Table 1 below. Photoresist film (Lan+1
After creating a circuit using a printed circuit board (copper-clad laminate) laminated with ner (manufactured by Guinachem) through exposure, development, and etching processes, it was immersed in a resist remover for 15 minutes at room temperature, and after being taken out, it was hardened under a microscope. The state of peeling of the film was observed.

The results are shown in Table 1.

Table 1 [Effects of the Invention] As is clear from the Examples, the resist stripping agent of the present invention has an excellent resist stripping effect.

Also, compared to conventional chlorine-based stripping agents, it has the advantage of having less adverse effects on plastics used in printed wiring boards.

(): Mixing ratio [wt%] 0: Can be peeled off well △: Trace amount remaining ○: Good quality ×: Significantly remaining

Claims (3)

[Claims] (1) A resist stripping agent containing a chlorofluorinated hydrocarbon having 3 carbon atoms as an active ingredient. (2) Chlorofluorinated hydrocarbon is 1,1-dichloro-2,2,
3,3,3-pentafluoropropane, 1,3-dichloro-1,2,2,3,3-pentafluoropropane, 1
, 1,3-trichloro-2,2,3,3-tetrafluoropropane, 1,3,3-trichloro-1,2,2,3
-tetrafluoropropane, 1-chloro-1,2,2,
3,3-pentafluoropropane, 1,3-dichloro-
2,2,3,3-tetrafluoropropane, 1-chloro-2,2,3,3-tetrafluoropropane, 1,1-
dichloro-1,2,2-trifluoropropane, 1,3
-dichloro-2,2,-difluoropropane, 1,1-
The resist stripping agent according to claim 1, which is dichloro-2,2,-difluoropropane or 1-chloro-2,2,-difluoropropane. (3) The resist stripping agent according to claim 1, wherein the resist stripping agent contains at least one selected from hydrocarbons, alcohols, ketones, chlorinated hydrocarbons, aromatics, or esters. Resist remover.