JPH02166186A - Resist peeling agent - Google Patents

Abstract

PURPOSE:To reduce the pollution of underground water and adverse effects on plastics used for a printed wiring board and to improve the effect of peeling a resist by incorporating a chlorofluorohydrocarbon as an effective component. CONSTITUTION:A 3C chlorofluorohydrocarbon selected from 3,3-dichloro-1,1,2,2,3- pentafluoropropane, 1,3-dichloro-1,2,2,3-tetrafluoropropane, 3,3-dichloro-1,1,2,2- tetrafluoropropane, 3-chloro-1,2,2,3-tetrafluoropropane, 3-chloro-1,1,1,2,2- pentafluoropropane, 1,3-dichloro-2,2,3-trifluoropropane, 3-chloro-1,2,2- trifluoropropane, 1,3-dichloro-1,2,2,3-tetrafluoropropane, 1-chloro-1,1,2,2- tetrafluoropropane, 3,3-dichloro-1,2,2-trifluoropropane, 3-chloro-2,2,3- trifluoropropane, etc., is compound with 0-50wt.% org. solvent selected from (chlorinated) hydrocarbons, alcohols, ketones, aromatics and esters.

Description

[Detailed description of the invention]

[Industrial Field of Application] The present invention relates to a resist stripping agent used in the manufacture of printed circuit boards and semiconductors. [Prior Art] When producing a printed circuit board or a semiconductor circuit, there is a final step of removing the resist after etching. Conventionally, chlorinated solvents such as methylene chloride, tetrachloroethylene, and 0-dichlorobenzene have been used in this step. [Problems to be Solved by the Invention] The present invention provides a new resist stripping agent that can replace chlorinated solvents in order to reduce the amount of chlorinated solvents used since conventionally used chlorinated solvents are undesirable in terms of groundwater contamination. The purpose is to [Means for Solving the Problems] The present invention has been made to achieve the above-mentioned objects, and
The present invention provides a resist stripping agent containing a specific chlorofluorinated hydrocarbon having 3 carbon atoms as an active ingredient. The chlorofluorinated hydrocarbon of the present invention is 3,3-dichloro-
1,1,2,2,3-pentafluoropropane (C)I
F! -CFs-CC1*F, b, p, 64.1℃)
, 1.3-dichloro-1°2.2.3-tetrafluoropropane (CHCIF-CFI-CHCIF, b,
p, 82.6°C), 3,3-dichloro-1,1,2,2
-Tetrafluoropropane (CIIFI-CFg-CH
Clffi. b, p, 82.1'C), 3-chloro-1,2
,2,3-tetrafluoropropane (CH!F-CFi
-CHCIF, b, p. 78.8°C), 3-chloro-1,1,1,2,2-pentafluoropropane (CF, -CFm-CHmCl,
b, p, 27-2℃),! -Kuroro 1.1.2.
2.3-pentafluoropropane ((:CIFm-CF
g-CHJ, b, p, 36.2°C), 1.
3-dichloro-2,2,3-)-lifluoropropane (
CH, C1-CFm-C) ICIP, b, p, 9
3.4°C), 3-chloro-1,2,2-trifluoropropane (C:HIF-CFI-CHtCl, b, p. 96.1'C), 3.3-dichloro-1,2,2 ，
3-tetrafluoropropane (CH,F-CFt-CG
I□P, b, p, 58.1℃), 1-chloro-1,
1,2,2-tetrafluoropropane (CGiFa-C
FI-C)Is, b-Il+-19,9℃), 3.3
-dichloro-1,2,2-trifluoropropane (C)
1. F-CFI-CHCl, b, p, 69.8°C
), 3-chloro-2,2,3-trifluoropropane (
CHI-(:Ft-C)ICIP, b, p. 1fI selected from hydrogen-containing chlorofluorinated hydrocarbons such as 37.8°C) or a mixture of two or more thereof is preferred. The resist stripping agent of the present invention may contain various other components depending on various purposes. For example, in order to increase the resist stripping force, hydrocarbons, alcohols, ketones, chlorinated hydrocarbons, etc. At least one organic solvent selected from organic solvents such as esters, aromatics, and esters can be contained. The content ratio of these organic solvents in the resist stripping agent is 0 to 50% by weight, preferably 10 to 40% by weight.
% by weight, more preferably from 20 to 30% by weight.6 When an azeotropic composition exists in the mixture of the chlorofluorinated hydrocarbon and organic solvent of the present invention, it is preferred to use the azeotropic composition. The hydrocarbons are preferably linear or cyclic saturated or unsaturated hydrocarbons having 1 to 15 carbon atoms, such as n-pentane, impentane, n-hexane, isohexane, 2-methylpentane, 2,2-dimethylbutane. , 2.3-dimethylbutane, n-hebutane, isohebane, 3-methylhexane, 2.4-dimethylbencune, n-octane%2-
Methylhebutane, 3-methylhebutane, 4-methylhebutane, 2,2-dimethylhexane, 2,5-dimethylhexane, 3,3-dimethylhexane, 2-methyl-3-
Ethylpentane, 3-methyl-3-ethylpentane, 2
゜3.3-Trimethylpentane, 2.3.4-trimethylpentane, 2.2.3-trimethylpentane, isooctane, nonane, 2.2.5-trimethylhexane,
Decane, dodencane, l-pentene, 2-pentene, 1
-hexene, l-octene, l-nonene, 1-decene,
It is selected from cyclobencune, methylcyclobencune, cyclohexane, methylcyclohexane, ethylcyclohexane, bicyclohexane, cyclohexene, α-pinene, dipentene, decalin, tetralin, amidino, amylnaphthalene, and the like. More preferably n-
These include pentane, n-hexane, cyclohexane, n-hebutane, and the like. The alcohols are preferably linear or cyclic saturated or unsaturated alcohols having 1 to 17 carbon atoms, such as methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, 5ec-butyl alcohol, isobutyl alcohol, tert-butyl alcohol. Pentyl alcohol%5ec-amyl alcohol, 1-
Ethyl-1-propatol, 2-methyl-1-butanol, isopentyl alcohol, tert-pentyl alcohol, 3-methyl-2-butanol, neopentyl alcohol, l-hexanol, 2-methyl-1-pentanol, 4 -Methyl-2-pentanol, 2-ethyl-
1-Butanol, l-heptatool, 2-heptatool, 3-heptatool, 1-octatool, 2-octatool, 2-ethyl-1-hexanol, l-nonanol, 3.5.5-trimethyl-1 -Hexanol, 1-decanol, l-undecanol, 1-dodecanol, allyl alcohol, propargyl alcohol, benzyl alcohol, cyclohexanol, l-methylcyclohexanol, 2-methylcyclohexanol, 3-methylcyclohexanol, 4-methylcyclohexanol ,
It is selected from α-terpineol, atonitinol, 2,6-dimethyl-4-heptanoyl, trimethylnonyl alcohol, tetradecyl alcohol, heptadecyl alcohol and the like. More preferably methanol,
Ethanol, isopropyl alcohol, etc. , as rockettones, R-GO-R, 1l-CQ, R-C
D-R-Saturated or unsaturated hydrocarbon group having 1 to 9 carbon atoms. -butyl ketone, methyl butyl ketone, 2-heptanone, 4-heptanone, diisobutyl ketone, acetonylacetone, mesityl oxide, holon, methyl-〇-amyl ketone, ethyl butyl ketone, methylhexyl ketone, cyclohexanone,
Methylcyclohexanone, isophorone. It is selected from 2.4-pentanedione, diacetone alcohol, acetophenone, phentimine, and the like. More preferred are acetone, methyl ethyl ketone and the like. The chlorinated hydrocarbons are preferably saturated or unsaturated chlorinated hydrocarbons having 1 to 2 carbon atoms, such as methylene chloride, carbon tetrachloride, 1,1-dichloroethane, 1,2-dichloroethane, 1,1. 1-Trichloroethane! , 1. Z-
Trichloroethane, 1.1.1.2-tetrachloroethane, 1,1,2.2-tetrachloroethane, pentachloroethane, 1.1-dichloroethylene, 1.2-dichloroethylene, trichlorethylene, It is selected from tetrachlorethylene and the like. More preferred are methylene chloride, 1,1,1-)-dichloroethane, trichlorethylene, tetrachloroethylene, and the like. As aromatics, benzene derivatives and naphthalene derivatives are preferred, and benzene, toluene, xylene, ethylbenzene, isopropylbenzene, diethylbenzene, sec-butylbenzene, triethylbenzene, diisopropylbenzene, styrene, alkylbenzenesulfonic acid,
Phenol, mesitylene, naphthalene, tetralin, butylbenzene, p-cymene, cyclohexylbenzene,
Pentylbenzene, dipentylbenzene, dodecylbenzene, biphenyl, 0-cresol, m-cresol,
It is selected from xylenol and the like. More preferred are alkylbenzenesulfonic acids, phenol, and the like. As the ester, GOOR is represented by the following general formula. (Here, R+, Rs, Rs, R4, Ri, and Ra are H, OH, or a hydrocarbon group having 1 to 19 carbon atoms and having a saturated or unsaturated bond.) Specifically, methyl formate, ethyl formate, formic acid propyl,
Butyl formate, isobutyl formate, pentyl formate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, 5ec-butyl acetate, pentyl acetate, isopentyl acetate, 3-methoxybutyl acetate, 138C-hexyl acetate, 2 -Ethyl butyl acetate, 2-ethylhexyl acetate, cyclohexyl acetate, benzyl acetate, methyl propionate, ethyl propionate, butyl propionate, isopentyl propionate, methyl butyrate, ethyl butyrate, butyl butyrate, isopentyl butyrate, isobutyl isobutyrate, 2- hydroxy-
Ethyl 2-methylpropionate, butyl stearate,
Pentyl stearin, methyl benzoate, ethyl benzoate, propyl benzoate, butyl benzoate, isopentyl benzoate, benzyl benzoate, ethyl abietate,
Benzyl abietate, bis-2-ethylhexyl adipate, γ-butyrolact, diethyl oxalate, dibutyl oxalate, dipentyl oxalate, diethyl magonate,
Dimethyl maleate, diethyl maleate, dibutyl maleate, dibutyl tartrate, tributyl citrate, dibutyl sebacate, bis-2-ethylhexyl sebacate, dimethyl phthalate, diethyl phthalate, dibutyl phthalate. Some are selected from bis-2-ethylhexyl phthalate, dioctyl phthalate, and the like. More preferred are methyl acetate, ethyl acetate and the like. The resist that can be peeled off according to the present invention is not limited in any way, and examples thereof include positive or negative light exposure resists, deep ultraviolet exposure resists, and X-ray or electron beam resists. Materials for resists for light exposure include quinone diazide based on phenol and cresol novolac resins, cyclized rubber based on cis-1,4-polyisoprene, and polycinnamic acid. Resists include polymethyl methacrylate, polymethyl isopropenyl ketone, etc., and electron beam and Coalescence and the like are known, but the resist stripping agent of the present invention is effective for both. The method for removing the resist is not limited at all, and a conventional spray method, dipping and stirring, shaking, applying ultrasonic waves, etc. can be employed. [Examples] Examples 1 to 18 A resist stripping test was conducted using resist stripping agents shown in Table 1 below. Photoresist film (Lamin
After creating a circuit using a printed circuit board (copper-clad laminate board) laminated with a printed circuit board (copper-clad laminate board) made by Dynachem, it was immersed in a resist remover for 15 minutes at room temperature, and after being taken out, the cured film was examined under a microscope. The peeling status was observed. The results are shown in Table 1. Table 1 Δ; Slightly remaining ×; Significantly remaining

【Effect of the invention】

As is clear from the examples, the resist stripping agent of the present invention has an excellent resist stripping effect. Also, compared to conventional chlorine-based stripping agents, it has the advantage of having less adverse effects on plastics used in printed wiring boards.

Claims (2)

[Claims] (1) 3,3-dichloro-1,1,2,2,3-pentafluoropropane, 1,3-dichloro-1,2,2,3
-tetrafluoropropane, 3,3-dichloro-1,1
, 2,2-tetrafluoropropane, 3-chloro-1,
2,2,3-tetrafluoropropane, 3-chloro-1
, 1,1,2,2-pentafluoropropane, 1-chloro-1,1,2,2,3-pentafluoropropane, 1
, 3-dichloro-2,2,3-trifluoropropane,
3-chloro-1,2,2-trifluoropropane, 3,
3-dichloro-1,2,2,3-tetrafluoropropane, 1-chloro-1,1,2,2-tetrafluoropropane, 3,3-dichloro-1,2,2-trifluoropropane and 3- A resist stripper containing as an active ingredient at least one member selected from the group of chloro-2,2,3-trifluoropropanes. (2) The resist stripping agent according to claim 1, wherein the resist stripping agent contains at least one selected from hydrocarbons, alcohols, ketones, chlorinated hydrocarbons, aromatics, or esters. agent.