JPH0241400U - - Google Patents
Info
- Publication number
- JPH0241400U JPH0241400U JP12018788U JP12018788U JPH0241400U JP H0241400 U JPH0241400 U JP H0241400U JP 12018788 U JP12018788 U JP 12018788U JP 12018788 U JP12018788 U JP 12018788U JP H0241400 U JPH0241400 U JP H0241400U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- plasma source
- container
- chamber container
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12018788U JPH0241400U (un) | 1988-09-13 | 1988-09-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12018788U JPH0241400U (un) | 1988-09-13 | 1988-09-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0241400U true JPH0241400U (un) | 1990-03-22 |
Family
ID=31366074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12018788U Pending JPH0241400U (un) | 1988-09-13 | 1988-09-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0241400U (un) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000018198A1 (fr) * | 1998-09-24 | 2000-03-30 | Seiko Epson Corporation | Generateur de plasma a electrodes de substrat et procede de traitement de substances/materiaux |
-
1988
- 1988-09-13 JP JP12018788U patent/JPH0241400U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000018198A1 (fr) * | 1998-09-24 | 2000-03-30 | Seiko Epson Corporation | Generateur de plasma a electrodes de substrat et procede de traitement de substances/materiaux |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES296059U (es) | Un quemador de plasma | |
JPH0241400U (un) | ||
JPS6384892U (un) | ||
JPS6237200U (un) | ||
JP2697413B2 (ja) | 高周波イオン源 | |
JPH0298451U (un) | ||
JPH0379152U (un) | ||
JPS6182958U (un) | ||
JPS62121762U (un) | ||
JPH028853U (un) | ||
JPS58117053U (ja) | 電界電離型イオン源 | |
JPS62110266U (un) | ||
JPS6319745U (un) | ||
JPS59152555U (ja) | イオン源装置 | |
JPS645431U (un) | ||
JPS63121356U (un) | ||
JPS6375937U (un) | ||
JPS6240756U (un) | ||
JPH028854U (un) | ||
JPH0355846U (un) | ||
JPH0262650U (un) | ||
JPS6276532U (un) | ||
JPS6190265U (un) | ||
JPH01104757U (un) | ||
JPS6282599U (un) |