JPH0235446B2 - - Google Patents
Info
- Publication number
- JPH0235446B2 JPH0235446B2 JP61125102A JP12510286A JPH0235446B2 JP H0235446 B2 JPH0235446 B2 JP H0235446B2 JP 61125102 A JP61125102 A JP 61125102A JP 12510286 A JP12510286 A JP 12510286A JP H0235446 B2 JPH0235446 B2 JP H0235446B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- optical system
- wafer
- reticle
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 92
- 230000004075 alteration Effects 0.000 claims description 63
- 201000009310 astigmatism Diseases 0.000 claims description 23
- 238000001514 detection method Methods 0.000 claims description 16
- 206010010071 Coma Diseases 0.000 claims description 13
- 235000012431 wafers Nutrition 0.000 description 59
- 238000012937 correction Methods 0.000 description 20
- 238000003384 imaging method Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 210000001747 pupil Anatomy 0.000 description 3
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61125102A JPS62281422A (ja) | 1986-05-30 | 1986-05-30 | 露光装置 |
| US07/333,727 US4888614A (en) | 1986-05-30 | 1989-04-03 | Observation system for a projection exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61125102A JPS62281422A (ja) | 1986-05-30 | 1986-05-30 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62281422A JPS62281422A (ja) | 1987-12-07 |
| JPH0235446B2 true JPH0235446B2 (ko) | 1990-08-10 |
Family
ID=14901899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61125102A Granted JPS62281422A (ja) | 1986-05-30 | 1986-05-30 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62281422A (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2788242B2 (ja) * | 1988-02-05 | 1998-08-20 | 株式会社日立製作所 | パターン検出装置及び露光装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3963353A (en) * | 1974-09-26 | 1976-06-15 | The Perkin-Elmer Corporation | Monolithic beam splitter mirror arrangement |
| JPS56110234A (en) * | 1980-02-06 | 1981-09-01 | Canon Inc | Projection printing device |
| US4357100A (en) * | 1979-01-11 | 1982-11-02 | Censor Patent- Und Versuchs-Anstalt | Arrangement for projection copying masks on to a work piece |
-
1986
- 1986-05-30 JP JP61125102A patent/JPS62281422A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3963353A (en) * | 1974-09-26 | 1976-06-15 | The Perkin-Elmer Corporation | Monolithic beam splitter mirror arrangement |
| US4357100A (en) * | 1979-01-11 | 1982-11-02 | Censor Patent- Und Versuchs-Anstalt | Arrangement for projection copying masks on to a work piece |
| JPS56110234A (en) * | 1980-02-06 | 1981-09-01 | Canon Inc | Projection printing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62281422A (ja) | 1987-12-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |