JPH023535B2 - - Google Patents

Info

Publication number
JPH023535B2
JPH023535B2 JP55188949A JP18894980A JPH023535B2 JP H023535 B2 JPH023535 B2 JP H023535B2 JP 55188949 A JP55188949 A JP 55188949A JP 18894980 A JP18894980 A JP 18894980A JP H023535 B2 JPH023535 B2 JP H023535B2
Authority
JP
Japan
Prior art keywords
irradiation
pattern data
dose
irradiation amount
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55188949A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57111026A (en
Inventor
Akihira Fujinami
Korehito Matsuda
Shigeru Morya
Susumu Ozasa
Tadakatsu Ishiga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP55188949A priority Critical patent/JPS57111026A/ja
Publication of JPS57111026A publication Critical patent/JPS57111026A/ja
Publication of JPH023535B2 publication Critical patent/JPH023535B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP55188949A 1980-12-26 1980-12-26 Exposure device for electron beam Granted JPS57111026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55188949A JPS57111026A (en) 1980-12-26 1980-12-26 Exposure device for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55188949A JPS57111026A (en) 1980-12-26 1980-12-26 Exposure device for electron beam

Publications (2)

Publication Number Publication Date
JPS57111026A JPS57111026A (en) 1982-07-10
JPH023535B2 true JPH023535B2 (https=) 1990-01-24

Family

ID=16232729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55188949A Granted JPS57111026A (en) 1980-12-26 1980-12-26 Exposure device for electron beam

Country Status (1)

Country Link
JP (1) JPS57111026A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021020187A1 (ja) * 2019-07-26 2021-02-04 知明 久慈 医療システム、医療デバイス及び医療プログラム

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6209369B2 (ja) * 2013-06-13 2017-10-04 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5721822A (en) * 1980-07-16 1982-02-04 Jeol Ltd Exposing method for electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021020187A1 (ja) * 2019-07-26 2021-02-04 知明 久慈 医療システム、医療デバイス及び医療プログラム

Also Published As

Publication number Publication date
JPS57111026A (en) 1982-07-10

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