JPH0233914A - Lighting optical apparatus - Google Patents
Lighting optical apparatusInfo
- Publication number
- JPH0233914A JPH0233914A JP63183571A JP18357188A JPH0233914A JP H0233914 A JPH0233914 A JP H0233914A JP 63183571 A JP63183571 A JP 63183571A JP 18357188 A JP18357188 A JP 18357188A JP H0233914 A JPH0233914 A JP H0233914A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- mixer
- light
- sealing plate
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims description 16
- 238000007789 sealing Methods 0.000 claims abstract description 11
- 238000005286 illumination Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 abstract description 4
- 239000000428 dust Substances 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は例えば超ＬＳＩ！″ｇの半導体メモリの製造
の際の露光工程に使用されるステッパに搭載される照明
光学装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention is applicable to, for example, super LSI! The present invention relates to an illumination optical device mounted on a stepper used in an exposure process during the manufacture of a semiconductor memory.
［従来の技術］
第２図はＬＳＩの製造の際の露光工程に用いられる従来
及びこの発明における照明光学装置の主要部の概略構成
を示す説明図である。第２図中、２０はランプハウスで
、このランプハウス２０は光源としてのランプ１．この
ランプ１の光を集光する集光鏡２．インテグレータ部４
１反射鏡３゜５、コンデンサレンズ６、光源からの光の
放射照度をモニタする放射照度モニタ７からなり、この
ランプハウス２０から出力される有効光線（露光に用い
られる光＆りは、原画としてのマスクパターン（以下、
レチクルという）８及びこのレチクル８からの光を露光
処理物体に結像させるための結像レンズ９を経て、シリ
コンウェハの露光面１０に照射される。[Prior Art] FIG. 2 is an explanatory diagram showing a schematic configuration of the main parts of a conventional illumination optical device and an illumination optical device according to the present invention used in an exposure process during LSI manufacturing. In FIG. 2, 20 is a lamp house, and this lamp house 20 is a lamp 1. A condensing mirror 2 that condenses the light from the lamp 1. Integrator section 4
It consists of a reflector 3°5, a condenser lens 6, and an irradiance monitor 7 that monitors the irradiance of the light from the light source.The effective light rays output from this lamp house 20 (the light used for exposure and mask pattern (below,
The light from the reticle 8 passes through an imaging lens 9 for forming an image on an object to be exposed, and is irradiated onto the exposure surface 10 of the silicon wafer.
第３図において、４２はレチクル８の解像度を高めるた
めに単色性を維持する目的て特定波長（例えば４３６ｎ
、）及びその付近の光のみを透過するバンドパスフィル
タ、４３はミキサーレンズ４４の各ロッドレンズに入射
する光の角度をそろえるインプットレンズ、４４は複数
のロッドレンズで構成され、インプ・ントレンズ４３か
らの光を各ロッドレンズで分割して各ロッドレンズから
出射した光が重なり合って加算され、均一な照度分布を
形成するためのミキサーレンズ（プライアイレンズとも
いう）、４５はミキサーレンズ４４から出射したそれぞ
れの光をレチクル８の面上で重ね合わせた際、ズレかな
いようにするためのアウトプットレンズ、４６は結像レ
ンズ９の入射瞳に入射させる光の厘及び範囲を規制する
アパーチャである。In FIG. 3, 42 indicates a specific wavelength (for example, 436 nm) for the purpose of maintaining monochromaticity in order to increase the resolution of the reticle 8.
, ) and the vicinity thereof; 43 is an input lens that aligns the angle of light incident on each rod lens of the mixer lens 44; 44 is composed of a plurality of rod lenses; A mixer lens (also called a ply eye lens) 45 is used to divide the light from each rod lens and add the lights emitted from each rod lens to form a uniform illuminance distribution. An output lens 46 is used to prevent misalignment when the respective lights are superimposed on the surface of the reticle 8, and an aperture 46 regulates the size and range of the light incident on the entrance pupil of the imaging lens 9.
インプットレンズ４３は、前述の如くミキサーレンズ４
４の各ロッドレンズに入射する光の角度をそろえるもの
である。即ち、インプットレンズ４３かないと各ロッド
レンズへ入射する光の角度は当然光軸に近いにロッドレ
ンズについては比較的ゆるい角度で入射する光か多いか
、周辺部のロッドレンズにはきつい角度て入射する光が
多くなる。つまり、各ロッドレンズ間て入射する光の角
度かバラバラになる。この場合、各ロッドレンズはすべ
て同一のものであるため、このままだと各ロッドレンズ
による光の伝達の仕方、射出角度もバラバラになってし
まうからである。The input lens 43 is the mixer lens 4 as described above.
This is to align the angles of light incident on each of the four rod lenses. In other words, without the input lens 43, the angle of light that enters each rod lens will naturally be close to the optical axis, but for the rod lens, most of the light will enter at a relatively gentle angle, or for the rod lenses in the periphery, it will enter at a tight angle. There will be more light. In other words, the angle of light incident between each rod lens varies. In this case, since the rod lenses are all the same, if left as is, the way the light is transmitted by each rod lens and the exit angle will also vary.
また、バンドパスフィルタ４２は通常石英ガラス等の基
板に誘電体膜か多層にコーティングされたものであるが
、このバンドパスフィルタ４２は光の入射角度により透
過特性か若干変化する。そこで、従来よりこのバンドパ
スフィルタ４２をインプットレンズ４３とミキサーレン
ズ４４との間に配置して、光軸付近と周辺部とで透過特
性に差が出ないようにしている。Further, the bandpass filter 42 is usually a substrate made of quartz glass or the like coated with a dielectric film or multiple layers, but the transmission characteristics of the bandpass filter 42 change slightly depending on the incident angle of light. Therefore, conventionally, this bandpass filter 42 is disposed between the input lens 43 and the mixer lens 44 so that there is no difference in transmission characteristics between the vicinity of the optical axis and the peripheral area.
上記従来の照明光学装置の結像関係は、まず。First, the imaging relationship of the conventional illumination optical device described above is as follows.
ミキサーレンズの入射面が楕円集光鏡の第２焦点の位置
であり、楕円集光鏡の像が結像する。そして、レチクル
の位置はミキサーレンズの入射面を物点とするコンデン
サレンズの焦点の位置にあり、レチクルにはコンデンサ
レンズによりミキサーレンズの入射面の像か結像される
。さらに、例えばシリコンウェハの露光面の位置はレチ
クルを物点とする結像レンズの像の位置にあり、レチク
ルの像かシリコンウェハの露光面に結像される。The entrance surface of the mixer lens is the second focal point of the elliptical condenser mirror, and an image of the elliptical condenser mirror is formed. The reticle is located at the focal point of a condenser lens whose object point is the entrance surface of the mixer lens, and an image of the entrance surface of the mixer lens is formed on the reticle by the condenser lens. Further, for example, the position of the exposed surface of the silicon wafer is at the position of the image of the imaging lens with the reticle as the object point, and the image of the reticle is formed on the exposed surface of the silicon wafer.
［発明か解決しようとする課題］
従って、ミキサーレンズの入射面にゴミ等の異物が付着
すると、その像かコンデンサレンズ、結像レンズにより
ウェハに転写される。そこて、従来はインプットレンズ
によりミキサーレンズの入射側を密封しゴミが絶対に付
着しないようにしていた。しかしながら、前述のように
、インブ・ントレンズをバントパスフィルタよりも光源
側にもってくると、ミキサーレンズの入射面か裸になっ
てしまう。この場合１バンドパスフイルタはその透過特
性の検査等のため、脱着されるので、その際、ゴミか付
着するおそれが非常に高いという問題があった。[Problems to be Solved by the Invention] Therefore, when foreign matter such as dust adheres to the entrance surface of the mixer lens, its image is transferred onto the wafer by the condenser lens and the imaging lens. Therefore, conventionally, the input lens was used to seal the input side of the mixer lens to ensure that no dust could adhere to it. However, as described above, when the inventive lens is placed closer to the light source than the bandpass filter, the entrance surface of the mixer lens becomes exposed. In this case, the 1-band pass filter is removed for inspection of its transmission characteristics, etc., and there is a problem in that there is a very high possibility that dust will adhere thereto.
この発明はかかる従来の課題を解決するためになされた
もので、ミキサーレンズに対してゴミの侵入を防ぐこと
がてきる照明光学装置を提供することを目的とする。The present invention has been made to solve such conventional problems, and it is an object of the present invention to provide an illumination optical device that can prevent dust from entering the mixer lens.
〔課題を解決するための手段］
上記の目的を達成するために、この発明の照明光学装置
はインテグレータ部は光の入射側からインプットレンズ
、バントパスフィルタ、′１！Ｅ封板。[Means for Solving the Problems] In order to achieve the above object, in the illumination optical device of the present invention, the integrator section includes an input lens, a bandpass filter, and '1!' from the light incident side. E seal board.
ミキサーレンズ、アウトプットレンズの順に配置され、
ミキサーレンズの入射面が前記密封板て密封された構成
を有するものである。The mixer lens is arranged in this order, followed by the output lens.
The entrance surface of the mixer lens is sealed by the sealing plate.
［作用］
上記の構成を有することにより、バントパスフィルタの
光軸付近と周辺部とて透過特性に差かなく、その上、密
封板を設けているので、バントパスフィルタの交換の際
もミキサーレンズの前面にゴミが侵入して付着すること
もない。[Function] With the above configuration, there is no difference in the transmission characteristics between the optical axis and the peripheral part of the bandpass filter.Furthermore, since a sealing plate is provided, the mixer can be easily removed when replacing the bandpass filter. There is no possibility of dust getting into the front of the lens and sticking to it.
［実施例］
第１図はこの発明の照明光学装置に用いるインテグレー
タ部の一実施例を示す断面図て、１１は鏡筒、１３はイ
ンプットレンズ、１６は特定波長及びその近傍の光のみ
を透過するバントパスフィルタ（Ｂ、Ｐ、Ｆ）、１８は
鏡筒１１に嵌め込み式に取り−付け、取りはずし可能な
ミキサーレンズフレーム、１９はこのミキサーレンズフ
レーム１８にゴミ等の侵入を防ぐための石英等からなり
、露光に用いる波艮域の光を透過する密封板、２１はミ
キサーレンズ、２２はこのミキサーレンズ２１の射出側
に取り付けられたアパーチャ、２３はこのアパーチャ２
２の射出側に設けられ。[Embodiment] Fig. 1 is a sectional view showing an embodiment of the integrator section used in the illumination optical device of the present invention, in which 11 is a lens barrel, 13 is an input lens, and 16 is a lens that transmits only light at a specific wavelength and its vicinity. band pass filters (B, P, F); 18 is a mixer lens frame that is fitted into the lens barrel 11 and is removable; 19 is a quartz filter or the like to prevent dust from entering the mixer lens frame 18; 21 is a mixer lens, 22 is an aperture attached to the exit side of this mixer lens 21, and 23 is this aperture 2.
Provided on the injection side of 2.
インプットレンズ１３とミキサーレンズ２１及びアパー
チャ２２とのそれぞれの中心の位置を位置決めされて取
り付けられたアウトプットレンズであり、アパーチャ２
２とアウトプットレンズ２３は一つのユニットとして取
り付けられ組み込まれている。It is an output lens attached to the input lens 13, the mixer lens 21, and the aperture 22 by positioning their respective centers, and the aperture 2
2 and the output lens 23 are attached and incorporated as one unit.
尚、密封板１９とミキサーレンズフレーム１８との間に
さらに気密性を高めるため、シリコン０リング等を介在
させると良い。Incidentally, in order to further improve the airtightness between the sealing plate 19 and the mixer lens frame 18, it is preferable to interpose a silicone O-ring or the like.
そして、第１図に示したインテグレータ部を、第２図の
照明光学装置のインテグレータ部４に適用するものであ
る。The integrator section shown in FIG. 1 is applied to the integrator section 4 of the illumination optical device shown in FIG.
また、インプットレンズ１３を射出した光かＢ、Ｐ、Ｆ
１ａに入射するので、Ｂ、Ｐ、Ｆ１ａに対して角度のそ
ろった光か入射することになり、Ｂ、Ｐ、Ｆ１ａを射出
した光は角度特性の影響を受けず、単色性のすぐれた光
が得られる。さらに、ミキサーレンズ２１は密封板１９
．アパーチャ２２及びアウトプットレンズ２３によって
非接触で近づけて一体に密封されているので、これだけ
を取り出して清掃を行うこともてきる。Also, whether the light emitted from the input lens 13 is B, P, or F.
1a, the light is incident on B, P, and F1a at the same angle, and the light emitted from B, P, and F1a is not affected by angular characteristics and is excellent monochromatic light. is obtained. Further, the mixer lens 21 has a sealing plate 19
．． Since the aperture 22 and the output lens 23 allow them to be brought close to each other in a non-contact manner and are sealed together, they can be taken out for cleaning.
［発明の効果］
以上説明した通り、この出願のインテグレータ部は光の
入射側からインプットレンズ、バンドパスフィルタ、密
月板、ミキサーレンズ、アウトプットレンズの順に設置
され、さらに前記密封板により、ミキサーレンズの入射
面が密封配置された構成を有するので、Ｂ、Ｐ、Ｆの交
換の際にミキサーレンズにはゴミ、はこりかっかない。[Effects of the Invention] As explained above, the integrator section of this application includes an input lens, a bandpass filter, a moon plate, a mixer lens, and an output lens installed in this order from the light incident side, and furthermore, the sealing plate closes the mixer lens. Since the entrance surface of the lens is arranged in a sealed manner, there is no dust or dirt on the mixer lens when replacing lenses B, P, and F.
その上、Ｂ、Ｐ、Ｆにはインプットレンズの出射光か入
射するので、Ｂ、Ｐ、Ｆ透過光に角度特性の影響がなく
、単色性の高い光が得られ、高解像度の露光を行うこと
かできる。Furthermore, since the output light from the input lens enters B, P, and F, there is no influence of angle characteristics on the transmitted light of B, P, and F, and highly monochromatic light is obtained, allowing high-resolution exposure. I can do it.
第１図はこの発明の照明光学装置に用いるインテグレー
タ部の一実施例を示す断面図、第２図は半導体装置の露
光工程に用いられる従来及びこの発明における照明光学
装置の主要部の概略構成を示す説明図、第３図は第２図
のインテグレータ部の詳細を示す説明図である。
図中。
１ ランプ
４ インテグレータ部
３．５・反射鏡
６：コンデンサレンズ
８ニレチクル
９ 結像レンズ
１３、インプットレンズ
１６・Ｂ、Ｐ、Ｆ
１８：ミキサーレンズフレーム
１９・密封板
２１、ミキサーレンズ
２２、アパーチャ
２３ニアウドプツトレンズ
代理人 弁理士 １）北 嵩 晴FIG. 1 is a sectional view showing an embodiment of an integrator section used in the illumination optical device of the present invention, and FIG. 2 is a schematic diagram of the main parts of the conventional illumination optical device used in the exposure process of semiconductor devices and in the present invention. FIG. 3 is an explanatory diagram showing details of the integrator section of FIG. 2. In the figure. 1 Lamp 4 Integrator part 3.5/Reflector 6: Condenser lens 8 Reticle 9 Imaging lens 13, Input lens 16/B, P, F 18: Mixer lens frame 19/Sealing plate 21, Mixer lens 22, Aperture 23 near Udputu Trends Representative Patent Attorney 1) Haru Kitatake
Claims (1)
いて、インテグレータ部は光の入射側からインプットレ
ンズ、バンドパスフィルタ、密封板、ミキサーレンズ、
アウトプットレンズの順に配置され、前記密封板でミキ
サーレンズの入射面か密封された構成を有することを特
徴とする照明光学装置。In an illumination optical device having a light source and an integrator section, the integrator section includes an input lens, a bandpass filter, a sealing plate, a mixer lens,
1. An illumination optical device characterized in that the output lens is arranged in this order, and the entrance surface of the mixer lens is sealed by the sealing plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63183571A JPH0233914A (en) | 1988-07-25 | 1988-07-25 | Lighting optical apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63183571A JPH0233914A (en) | 1988-07-25 | 1988-07-25 | Lighting optical apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0233914A true JPH0233914A (en) | 1990-02-05 |
| JPH0532900B2 JPH0532900B2 (en) | 1993-05-18 |
Family
ID=16138139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63183571A Granted JPH0233914A (en) | 1988-07-25 | 1988-07-25 | Lighting optical apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0233914A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6322220B1 (en) | 1994-02-14 | 2001-11-27 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
| WO2006075674A1 (en) * | 2005-01-13 | 2006-07-20 | Fujifilm Corporation | Image exposing apparatus and microlens array unit |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6356341B1 (en) | 1998-06-18 | 2002-03-12 | Nikon Corporation | Exposure device, beam shape setting device and illuminating area setting device |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5999426A (en) * | 1982-11-29 | 1984-06-08 | Canon Inc | Printing and exposing device provided with dustproof mechanism |
| JPS60168147A (en) * | 1984-02-10 | 1985-08-31 | Oak Seisakusho:Kk | Exposing device |
| JPS6191662A (en) * | 1984-10-11 | 1986-05-09 | Nippon Telegr & Teleph Corp <Ntt> | Projecting and exposing device |
| JPS61156736A (en) * | 1984-12-27 | 1986-07-16 | Canon Inc | Exposing device |
| JPS61171126A (en) * | 1985-01-25 | 1986-08-01 | Canon Inc | Projecting lens for projection exposure device |
| JPS62123423A (en) * | 1985-11-22 | 1987-06-04 | Nippon Kogaku Kk <Nikon> | Illumination optical system |
| JPS62199714U (en) * | 1986-06-06 | 1987-12-19 | ||
| JPS636553A (en) * | 1986-06-27 | 1988-01-12 | Canon Inc | Method for preventing dust from adhering to reticle |
-
1988
- 1988-07-25 JP JP63183571A patent/JPH0233914A/en active Granted
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5999426A (en) * | 1982-11-29 | 1984-06-08 | Canon Inc | Printing and exposing device provided with dustproof mechanism |
| JPS60168147A (en) * | 1984-02-10 | 1985-08-31 | Oak Seisakusho:Kk | Exposing device |
| JPS6191662A (en) * | 1984-10-11 | 1986-05-09 | Nippon Telegr & Teleph Corp <Ntt> | Projecting and exposing device |
| JPS61156736A (en) * | 1984-12-27 | 1986-07-16 | Canon Inc | Exposing device |
| JPS61171126A (en) * | 1985-01-25 | 1986-08-01 | Canon Inc | Projecting lens for projection exposure device |
| JPS62123423A (en) * | 1985-11-22 | 1987-06-04 | Nippon Kogaku Kk <Nikon> | Illumination optical system |
| JPS62199714U (en) * | 1986-06-06 | 1987-12-19 | ||
| JPS636553A (en) * | 1986-06-27 | 1988-01-12 | Canon Inc | Method for preventing dust from adhering to reticle |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6322220B1 (en) | 1994-02-14 | 2001-11-27 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method using the same |
| WO2006075674A1 (en) * | 2005-01-13 | 2006-07-20 | Fujifilm Corporation | Image exposing apparatus and microlens array unit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0532900B2 (en) | 1993-05-18 |
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| Date | Code | Title | Description |
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| LAPS | Cancellation because of no payment of annual fees |