JPH0231376B2 - - Google Patents

Info

Publication number
JPH0231376B2
JPH0231376B2 JP56119333A JP11933381A JPH0231376B2 JP H0231376 B2 JPH0231376 B2 JP H0231376B2 JP 56119333 A JP56119333 A JP 56119333A JP 11933381 A JP11933381 A JP 11933381A JP H0231376 B2 JPH0231376 B2 JP H0231376B2
Authority
JP
Japan
Prior art keywords
water
weight
resin
parts
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56119333A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5837639A (ja
Inventor
Nobumasa Sasa
Akira Nogami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP11933381A priority Critical patent/JPS5837639A/ja
Publication of JPS5837639A publication Critical patent/JPS5837639A/ja
Publication of JPH0231376B2 publication Critical patent/JPH0231376B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP11933381A 1981-07-31 1981-07-31 画像形成材料 Granted JPS5837639A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11933381A JPS5837639A (ja) 1981-07-31 1981-07-31 画像形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11933381A JPS5837639A (ja) 1981-07-31 1981-07-31 画像形成材料

Publications (2)

Publication Number Publication Date
JPS5837639A JPS5837639A (ja) 1983-03-04
JPH0231376B2 true JPH0231376B2 (enrdf_load_stackoverflow) 1990-07-12

Family

ID=14758878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11933381A Granted JPS5837639A (ja) 1981-07-31 1981-07-31 画像形成材料

Country Status (1)

Country Link
JP (1) JPS5837639A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7413844A (nl) * 1974-10-23 1976-04-27 Oce Van Der Grinten Nv Lithografische kopieerfilm.
JPS5252704A (en) * 1976-10-25 1977-04-27 Fuji Photo Film Co Ltd Photoosensitive copying material
JPS5420719A (en) * 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau

Also Published As

Publication number Publication date
JPS5837639A (ja) 1983-03-04

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