JPH0230100U - - Google Patents
Info
- Publication number
- JPH0230100U JPH0230100U JP10774088U JP10774088U JPH0230100U JP H0230100 U JPH0230100 U JP H0230100U JP 10774088 U JP10774088 U JP 10774088U JP 10774088 U JP10774088 U JP 10774088U JP H0230100 U JPH0230100 U JP H0230100U
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- vacuum chamber
- electron beam
- filament
- irradiation device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012212 insulator Substances 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 1
Description
第1図はこの考案の実施例を示す断面図、第2
図は従来例の断面図である。
1……真空チヤンバー、2……カソード、3…
…フイラメント、5……供電線、10,12……
絶縁碍子。
Figure 1 is a sectional view showing an embodiment of this invention, Figure 2 is a sectional view showing an embodiment of this invention.
The figure is a sectional view of a conventional example. 1... Vacuum chamber, 2... Cathode, 3...
...Filament, 5...Power line, 10, 12...
Insulator.
Claims (1)
カソードの内部のフイラメントより放射される電
子線を、照射窓から外部に向けて照射するように
してなる電子線照射装置において、 前記カソードをその上部から絶縁碍子によつて
吊り下げるようにして機械的に支持するとともに
、前記真空チヤンバーの端面に取り付けられた別
の絶縁碍子によつて、前記フイラメントの加熱の
ための供電線を、前記真空チヤンバーの内部に導
入してなる電子線照射装置。[Claims for Utility Model Registration] In an electron beam irradiation device, a cathode is provided inside a vacuum chamber, and an electron beam emitted from a filament inside the cathode is irradiated outward from an irradiation window, The cathode is mechanically supported by being suspended from the upper part by an insulator, and a power supply line for heating the filament is connected by another insulator attached to the end face of the vacuum chamber. , an electron beam irradiation device introduced into the vacuum chamber.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988107740U JPH0752640Y2 (en) | 1988-08-16 | 1988-08-16 | Electron beam irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988107740U JPH0752640Y2 (en) | 1988-08-16 | 1988-08-16 | Electron beam irradiation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0230100U true JPH0230100U (en) | 1990-02-26 |
JPH0752640Y2 JPH0752640Y2 (en) | 1995-11-29 |
Family
ID=31342425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988107740U Expired - Lifetime JPH0752640Y2 (en) | 1988-08-16 | 1988-08-16 | Electron beam irradiation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0752640Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008209410A (en) * | 1997-01-02 | 2008-09-11 | Advanced Electron Beams Inc | Electron beam accelerator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5027557A (en) * | 1973-03-21 | 1975-03-20 | ||
JPS6344198U (en) * | 1986-09-08 | 1988-03-24 |
-
1988
- 1988-08-16 JP JP1988107740U patent/JPH0752640Y2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5027557A (en) * | 1973-03-21 | 1975-03-20 | ||
JPS6344198U (en) * | 1986-09-08 | 1988-03-24 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008209410A (en) * | 1997-01-02 | 2008-09-11 | Advanced Electron Beams Inc | Electron beam accelerator |
JP2009259848A (en) * | 1997-01-02 | 2009-11-05 | Advanced Electron Beams Inc | Electron beam accelerator |
JP4684342B2 (en) * | 1997-01-02 | 2011-05-18 | アドバンスト・エレクトロン・ビームズ・インコーポレーテッド | Electron acceleration method |
Also Published As
Publication number | Publication date |
---|---|
JPH0752640Y2 (en) | 1995-11-29 |