JPH02298397A - Production of pure water - Google Patents
Production of pure waterInfo
- Publication number
- JPH02298397A JPH02298397A JP11604489A JP11604489A JPH02298397A JP H02298397 A JPH02298397 A JP H02298397A JP 11604489 A JP11604489 A JP 11604489A JP 11604489 A JP11604489 A JP 11604489A JP H02298397 A JPH02298397 A JP H02298397A
- Authority
- JP
- Japan
- Prior art keywords
- pure water
- electric field
- piping
- reverse osmosis
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 84
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000000126 substance Substances 0.000 claims abstract description 27
- 239000012528 membrane Substances 0.000 claims abstract description 24
- 230000005684 electric field Effects 0.000 claims abstract description 22
- 239000010419 fine particle Substances 0.000 claims abstract description 21
- 238000001223 reverse osmosis Methods 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- 230000001954 sterilising effect Effects 0.000 claims description 3
- 238000004659 sterilization and disinfection Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 4
- 238000000926 separation method Methods 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000007872 degassing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000013535 sea water Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000010977 unit operation Methods 0.000 description 2
- 238000009849 vacuum degassing Methods 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000009287 sand filtration Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は純水の製造方法に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for producing pure water.
さらに詳しくは、本発明は原水を比抵抗１〜１０ＭΩ・
ａｍ程度の１次純水に清浄化し、さらに電界処理ならび
に逆浸透膜処理をすることによる、純水の製造方法に関
するものである。More specifically, the present invention provides raw water with a specific resistance of 1 to 10 MΩ.
The present invention relates to a method for producing pure water by purifying it to primary pure water of about 1.0 am and then subjecting it to electric field treatment and reverse osmosis membrane treatment.
近年、半導体製造をはじめとする電子部品工業、あるい
は化学工業において、純水の利用はその量の増大ととも
に、純度の向上も極限まで求められてきている。純水の
製造にあたっては、凝集、濾過、イオン交換、脱気、逆
浸透、蒸留等の単位操作を組み合わせて、所望の純水製
造能力となる最適のプロセスになるように設計する。現
在、一般に行われている純水製造工程のフローは、第３
図に示すとおりである。以下これについて概要を説明す
る。BACKGROUND ART In recent years, in the electronic parts industry including semiconductor manufacturing, and the chemical industry, the amount of pure water used has increased, and the purity has been required to be improved to the utmost. When producing pure water, unit operations such as coagulation, filtration, ion exchange, degassing, reverse osmosis, and distillation are combined to create an optimal process that achieves the desired pure water production capacity. Currently, the flow of the pure water production process that is generally carried out is as follows:
As shown in the figure. An outline of this will be explained below.
まず、原水を原水槽（１）に受けた後、凝集沈澱ｒ過槽
（２）において凝集剤を用いて原水を沈澱濾過し、さら
にポリッシングｒ過槽（３）で沢過した水を、Ｎ２ガス
シールされた前処理槽（４）に有水する。以上ここまで
の処理は前処理といわれ、原水中の大きなゴミ、不純物
を砂濾過により減少させるのが主目的である。First, raw water is received in the raw water tank (1), and then the raw water is sediment-filtered using a flocculant in the coagulation sedimentation r-filtration tank (2), and the water filtered in the polishing r-filtration tank (3) is filtered with N2 Water is placed in a gas-sealed pretreatment tank (4). The treatment up to this point is called pretreatment, and its main purpose is to reduce large particles and impurities in the raw water through sand filtration.
次に前処理を完了した原水を、カチオン樹脂槽（５）、
脱二酸化炭素塔（６）、アニオン樹脂槽（７）に通して
原水中の陽イオンや陰イオンを除き、１次純水槽８に貯
える。このときの原水は、比抵抗的ＩＭΩ・ｃｐｓ程度
の水質となっている。また、イオン交換樹脂槽（５）、
（７）では水中の微粒子や有機物の吸着も起こるので、
毎日−同程度のイオン交換樹脂の再生の際、系外へ吸着
したものを排出させる必要がある。Next, the raw water that has been pretreated is transferred to a cation resin tank (5).
The raw water is passed through a carbon dioxide removal tower (6) and an anion resin tank (7) to remove cations and anions from the raw water, and is stored in a primary pure water tank 8. The quality of the raw water at this time is approximately IMΩ·cps in terms of resistivity. In addition, an ion exchange resin tank (5),
In (7), adsorption of fine particles and organic matter in the water also occurs, so
Every day - When regenerating the same amount of ion exchange resin, it is necessary to discharge the adsorbed substances out of the system.
次に、１次純水槽（８）からの純水を、熱交換器（９）
、プレフィルタ（１０）、逆浸透Ｍ（ＲｅｖｅｒｓｅＯ
ｓｍｏｓｉｓ Ｆｉｌｍ）（１１）を通して精製し、Ｎ
２ガスシールされたＲＯ処理水槽（逆浸透処理水槽）（
１２）に貯水する。上記逆浸透膜（１１）は、海水を淡
水化する為に開発されたもので、５〜１０人のポアサイ
ズの膜であり、２０〜３０ ｋｇ／ ａｍ”の高圧をか
けて、不純物を除去し純水にしている。この膜は海水を
淡水にするくらいの能力があり、脱塩率９０〜９９％、
分子量３００〜５００以上の高分子物質で、特に高分子
有機物をほぼ１００％除去することができる。また、ポ
アサイズが小さいので水中の微粒子もかなり除去できる
。しかしながら、この逆浸透膜（１１）は薄い膜であり
、そのうえスパイラル状に数ｌ１２の面積を持つ膜であ
るので、高圧をかけて運転すると水中の微粒子は一部捕
捉されないで通過する。特にコロイド状物質の除去率は
非常に低い。Next, the pure water from the primary pure water tank (8) is transferred to the heat exchanger (9).
, Prefilter (10), Reverse Osmosis M (ReverseO
smosis Film) (11) and purified through N
2 Gas-sealed RO treatment water tank (reverse osmosis treatment water tank) (
12) Store water. The above reverse osmosis membrane (11) was developed to desalinate seawater, and has a pore size of 5 to 10 people, and removes impurities by applying a high pressure of 20 to 30 kg/am. This membrane has the ability to turn seawater into fresh water, with a desalination rate of 90-99%.
With polymer substances having a molecular weight of 300 to 500 or more, in particular, almost 100% of high molecular organic substances can be removed. Additionally, the small pore size makes it possible to remove a considerable amount of fine particles from the water. However, this reverse osmosis membrane (11) is a thin membrane and has an area of several liters in a spiral shape, so when it is operated under high pressure, part of the fine particles in the water pass through without being captured. In particular, the removal rate of colloidal substances is very low.
この後、ＲＯ処理水槽（１２）からの精製水を真空脱気
塔（１３〉、アニオン・カチオン混床塔（１４）および
Ｎ２ガスシールされた２次純水槽（１５）を通し、それ
から使用場所で使用されてもよいし、あるいはさらに超
々純水製造工程で処理すれば一層良い水質の超々純水が
得られる。この工程で、真空脱気塔（１３）は水に溶け
ているガスを減圧て脱気し、以降の工程でガスが泡状に
なって出てくるのを防止するものである。After this, purified water from the RO treated water tank (12) is passed through a vacuum degassing tower (13), an anion/cation mixed bed tower (14), and a secondary pure water tank (15) sealed with N2 gas, and then sent to the place of use. Alternatively, ultra-ultra-pure water of even better quality can be obtained by further processing it in an ultra-ultra-pure water production process.In this process, the vacuum degassing tower (13) depressurizes the gas dissolved in the water. This prevents gas from coming out in the form of bubbles in subsequent steps.
従来の純水の製造方法は以上のように構成されているが
、前記のように、この逆浸透Ｊｌｉ（１１）は薄い膜で
あり、そのうえスパイラル状に敵情２の面積を持つ膜で
あるので、高圧をかけて運転すると水中の微粒子は一部
捕捉されないで通過する。特にコロイド状物質の除去率
は非常に低い。そのため、水中に含まれるコロイド状シ
リカやコロイド状金Ｒ（Ｆｅ、Ｐ、Ｓ等）等のコロイド
状物質および微粒子は除去しきれないという問題点があ
った。The conventional method for producing pure water is configured as described above, but as mentioned above, this reverse osmosis Jli (11) is a thin membrane, and furthermore, it is a spiral membrane with an area of 2. When operating under high pressure, some particulates in the water pass through without being captured. In particular, the removal rate of colloidal substances is very low. Therefore, there is a problem that colloidal substances such as colloidal silica and colloidal gold R (Fe, P, S, etc.) and fine particles contained in water cannot be completely removed.
最近の超ＬＳＩ用洗浄水としての超純水の水質を得る上
で、最も大きな問題となっているのがコロイド状・シリ
カ、コロイド状金属等のコロイド状物質や微粒子である
。したがって、逆浸透膜を用いた純水の製造においても
、このようなコロイド状微粒子の除去が大きな課題であ
った。In recent years, the biggest problem in obtaining ultrapure water quality as cleaning water for VLSIs is colloidal substances such as colloidal silica and colloidal metals, and fine particles. Therefore, even in the production of pure water using reverse osmosis membranes, removal of such colloidal particles has been a major issue.
本発明は上記のような課題を解消するためになされたも
ので、膜分離で除去しきれないコロイド状物質や微粒子
を、効率良く除去することができる、純水の製造方法を
提供することを目的とするものである。The present invention has been made to solve the above problems, and aims to provide a method for producing pure water that can efficiently remove colloidal substances and fine particles that cannot be removed by membrane separation. This is the purpose.
すなわち本発明は、原水を清浄化して得た１次純水を、
さらに逆浸透膜処理することによって純水を製造する方
法において、該逆浸透膜処理の前および／または後に、
純水配管の一部区間を分極し、該配管内に電界を生じさ
せることによって、純水中のコロイド状物質や微粒子を
除去することを特徴とする純水の製造方法を提供するも
のである。In other words, the present invention uses primary pure water obtained by purifying raw water,
Furthermore, in a method for producing pure water by reverse osmosis membrane treatment, before and/or after the reverse osmosis membrane treatment,
This invention provides a method for producing pure water, characterized in that colloidal substances and fine particles in pure water are removed by polarizing a part of a pure water pipe and generating an electric field within the pipe. .
さらに本発明は、上記の方法において、配管内に蓄積し
たコロイド状物質や微粒子の除去を、配管内の電界を解
除し、過酸化水素水、オゾン、熱殺菌等により配管内洗
浄により行うことを特徴とする、純水の製造方法を提供
するものである。Furthermore, in the above method, the present invention includes removing colloidal substances and fine particles accumulated in the pipe by removing the electric field in the pipe and cleaning the pipe with hydrogen peroxide, ozone, heat sterilization, etc. The present invention provides a method for producing pure water.
この発明における純水の製造方法は、−次純水を逆浸透
膜処理する前および／または後に、純水配管を分極し、
電界をもった純水配管内に被処理水を通過させることに
より、純水中に含まれるコロイド状物および微粒子を配
管内壁に付着させて除去することができる。このことに
より、コロイド状微粒子を、従来方法に比較して著しく
低減させることができる。The method for producing pure water in the present invention includes polarizing the pure water piping before and/or after subjecting the next pure water to reverse osmosis membrane treatment,
By passing the water to be treated through a pure water pipe with an electric field, colloidal substances and fine particles contained in the pure water can be removed by adhering to the inner wall of the pipe. This allows the amount of colloidal particles to be significantly reduced compared to conventional methods.
以下、実施例により本発明を、図を参照してさらに説明
する。Hereinafter, the present invention will be further explained by way of examples with reference to the drawings.
第１図は本発明の一実施例による純水の製造工程のフロ
ー図を示す。図において、第３図と同一符号は同一のも
のを示す。図において（１６）は、配管を分極し内部に
電界を作ることによってコロイド状物質や微粒子を除去
するようにした、電界を形成する純水配管である。本実
施例においては、この電界形成純水配管は、逆浸透膜（
１１）の前および後にそれぞれ設けられた。FIG. 1 shows a flow diagram of a process for producing pure water according to an embodiment of the present invention. In the figure, the same reference numerals as in FIG. 3 indicate the same parts. In the figure, (16) is a pure water pipe that generates an electric field, which removes colloidal substances and fine particles by polarizing the pipe and creating an electric field inside. In this example, this electric field forming pure water piping is equipped with a reverse osmosis membrane (
11), respectively.
また第２図は、上記の電界形成純水配管の断面ｆｉｌ造
および配線を示す図である。図中、（１７ａ）および（
１７ｂ）は配管内に電界を形成する半円筒形の電極であ
り、５ＵＳ３１６Ｌの材料で内面が電界研磨されたもの
が使用された。（１８）は電極（１７ａ）および（１７
ｂ）に一定電圧（１〜５０に■）を印加する定電圧源、
（１９）は電極（１７ａ）および（１７ｂ）を分離、絶
縁する絶縁体、（２０）はこれらを覆って感電や純水の
漏れを防ぎ配管の保護をするチューブであり、塩化ビニ
ル等の絶縁材料が使用された。FIG. 2 is a diagram showing the cross-sectional structure and wiring of the electric field forming pure water piping. In the figure, (17a) and (
Reference numeral 17b) is a semi-cylindrical electrode that forms an electric field within the pipe, and the electrode was made of 5US316L and had its inner surface electropolished. (18) is the electrode (17a) and (17
b) a constant voltage source that applies a constant voltage (■ to 1 to 50);
(19) is an insulator that separates and insulates the electrodes (17a) and (17b), and (20) is a tube that covers these to prevent electric shock and pure water leakage and protects the piping. material was used.
以下、この装置の動作について説明する。The operation of this device will be explained below.
電極＜１７ ａ）、（１７ｂ）に一定電圧＜１〜５０Ｋ
Ｖ）を定電圧源１８によって印加し、電界形成純水配管
内に電界を形成する。純水中のコロイド状物質や微粒子
はいずれかの帯電をしているので、純水がこの配管内を
通過する間に、電ａｉ（１７ａ）または（１７ｂ）のど
ちらか、に引きつけられて配管内壁に付着する。このよ
うにして、ある区間（数１０ｍ）（−例においては、逆
浸透膜の前で１０ｚ、ｆ＆で１０１）を通過する間に、
コロイド状物質や微粒子は効率良く除去される。Electrode <17 a), (17b) constant voltage <1~50K
V) is applied by a constant voltage source 18 to form an electric field in the pure water pipe. Colloidal substances and fine particles in pure water are electrically charged, so while the pure water passes through the pipe, they are attracted to either the electric charge (17a) or (17b) and the pipe is charged. Adheres to inner walls. In this way, while passing through a certain section (several tens of meters) (in the example - 10z in front of the reverse osmosis membrane, 101 at f&),
Colloidal substances and fine particles are efficiently removed.
電界形成純水配管（１６）の内壁に付着したコロイド状
物質や微粒子は、使用中に堆積して、管内流路を狭くし
たり、コロイド付着効率を悪くしたりするので、定期的
に（週１回程度）配管内の洗浄をすることが望ましい、
この場合は、印加電圧を切り、内壁への付着力を弱めた
上で、過酸化水素水やオゾン、熱殺菌等の洗浄処理を行
い、配管内壁に付着したコロイド状物質や微粒子を排液
ラインを通じて除去する。このような操作により、この
配管によるコロイド状物質や微粒子の除去効率は常に一
定であり、フィルターの様な定期交換の必要がなく、半
永久的に使用が可能である。Colloidal substances and fine particles attached to the inner wall of the electric field-forming pure water pipe (16) accumulate during use, narrowing the channel inside the pipe and reducing colloid adhesion efficiency. It is recommended to clean the inside of the piping (about once).
In this case, turn off the applied voltage to weaken the adhesion to the inner wall, and then perform a cleaning process such as hydrogen peroxide, ozone, or heat sterilization to remove colloidal substances and fine particles that have adhered to the inner wall of the pipe from the drain line. Remove through. By such an operation, the removal efficiency of colloidal substances and particulates by this piping is always constant, and there is no need for periodic replacement like a filter, and it can be used semi-permanently.
なお、本実施例では従来と同様の径をもつ一本の配管を
直列にして用いたが、電界を形成する配管を複数に分割
し、並列にして全体として同じ流量になるようにしても
よい。この場合、一本の配管の径が小さくなるためコロ
イド状物質や微粒子の除去効率が高まり、電界形成純水
配管の距離を短くすることができる。In this example, a single pipe having the same diameter as the conventional one was used in series, but the pipe that forms the electric field may be divided into multiple parts and placed in parallel so that the overall flow rate is the same. . In this case, since the diameter of one pipe becomes smaller, the removal efficiency of colloidal substances and fine particles increases, and the distance of the electric field forming pure water pipe can be shortened.
また、電界形成純水配管の位置は、逆浸透膜の前、後あ
るいはその両方のいずれでもよい。さらに他の精製単位
操作例えば脱気、イオン交換等は、必要に応じ、適宜取
捨選択して組み合わせることができるのは勿論である。Further, the electric field forming pure water piping may be located before, after, or both of the reverse osmosis membrane. It goes without saying that other purification unit operations such as degassing, ion exchange, etc. can be selected and combined as necessary.
以上のように、本発明によれば、−次純水の逆浸透膜処
理の前および／または後で、配管のある区間を内部の電
極によって電界を生じさせることによって、膜分離等で
除去しきれないコロイド状物質や微粒子を、効率良く分
離除去することができる純水の製造方法を提供すること
ができる。As described above, according to the present invention, before and/or after reverse osmosis membrane treatment of sub-pure water, an electric field is generated in a certain section of the piping by an internal electrode to remove the water by membrane separation or the like. It is possible to provide a method for producing pure water that can efficiently separate and remove unrefined colloidal substances and fine particles.
第１図は本発明の一実施例による純水の製造工程のフロ
ー図、第２図は本発明による電界を形成する純水配管の
構造図、第３図は従来の純水の製造工程のフロー図であ
る。
２、凝集沈澱ｒ過
５、カチオン樹脂槽
６、脱二酸化炭素槽
７、アニオン樹脂槽
８、−次純水槽
１１、逆浸透膜
１６、電界形成純水配管
＋６： 、１４ｙｋｏｅ、￥１
１９；廁吋に本
２０：糸色ね秘九１ブ′Fig. 1 is a flow diagram of a pure water production process according to an embodiment of the present invention, Fig. 2 is a structural diagram of a pure water piping that forms an electric field according to the present invention, and Fig. 3 is a diagram of a conventional pure water production process. It is a flow diagram. 2, coagulation sedimentation r filtration 5, cation resin tank 6, carbon dioxide removal tank 7, anion resin tank 8, secondary pure water tank 11, reverse osmosis membrane 16, electric field forming pure water piping +6: , 14ykoe, ¥1 19; Book 20: Itirone Secret 91 Book
Claims (2)
膜処理することによって純水を製造する方法において、
該逆浸透膜処理の前および／または後に、純水配管の一
部区間を分極し、該配管内に電界を生じさせることによ
って、純水中のコロイド状物質や微粒子を除去すること
を特徴とする純水の製造方法。(1) In a method for producing pure water by further treating primary pure water obtained by purifying raw water with a reverse osmosis membrane,
Before and/or after the reverse osmosis membrane treatment, a part of the pure water piping is polarized to generate an electric field within the pipe to remove colloidal substances and fine particles in the pure water. A method for producing pure water.
は、該配管内の電界を解除し、過酸化水素水、オゾン、
熱殺菌等による配管内洗浄により行うことを特徴とする
請求項第１項記載の純水の製造方法。(2) To remove colloidal substances and particulates that have accumulated inside the pipes, remove the electric field inside the pipes, use hydrogen peroxide solution, ozone,
2. The method for producing pure water according to claim 1, wherein the method is carried out by cleaning the inside of the pipe by heat sterilization or the like.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1116044A JPH0741244B2 (en) | 1989-05-11 | 1989-05-11 | Method for producing pure water and apparatus therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1116044A JPH0741244B2 (en) | 1989-05-11 | 1989-05-11 | Method for producing pure water and apparatus therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02298397A true JPH02298397A (en) | 1990-12-10 |
| JPH0741244B2 JPH0741244B2 (en) | 1995-05-10 |
Family
ID=14677324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1116044A Expired - Fee Related JPH0741244B2 (en) | 1989-05-11 | 1989-05-11 | Method for producing pure water and apparatus therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0741244B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1292372A2 (en) * | 1999-10-12 | 2003-03-19 | M. Michael Pitts, Jr. | Electrostatic enhancement for membrane-separation systems |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110104839A (en) * | 2019-06-04 | 2019-08-09 | 北京赛科康仑环保科技有限公司 | One kind being used for the reverse osmosis concentrated water pretreatment system of industrial wastewater and its method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60209204A (en) * | 1984-03-31 | 1985-10-21 | Kimihiko Okanoe | Preparation of ultrapure water |
| JPS61187989A (en) * | 1985-02-18 | 1986-08-21 | Mitsubishi Electric Corp | Apparatus for producing pure water |
| JPS634893A (en) * | 1986-06-25 | 1988-01-09 | Daicel Chem Ind Ltd | Fine particle removing device from ultrapure water |
-
1989
- 1989-05-11 JP JP1116044A patent/JPH0741244B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60209204A (en) * | 1984-03-31 | 1985-10-21 | Kimihiko Okanoe | Preparation of ultrapure water |
| JPS61187989A (en) * | 1985-02-18 | 1986-08-21 | Mitsubishi Electric Corp | Apparatus for producing pure water |
| JPS634893A (en) * | 1986-06-25 | 1988-01-09 | Daicel Chem Ind Ltd | Fine particle removing device from ultrapure water |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7578919B2 (en) | 1994-02-16 | 2009-08-25 | Pitts Jr M Michael | Capacitive electrostatic process for inhibiting the formation of biofilm deposits in membrane-separation systems |
| EP1292372A2 (en) * | 1999-10-12 | 2003-03-19 | M. Michael Pitts, Jr. | Electrostatic enhancement for membrane-separation systems |
| EP1292372A4 (en) * | 1999-10-12 | 2003-05-14 | M Michael Pitts Jr | Electrostatic enhancement for membrane-separation systems |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0741244B2 (en) | 1995-05-10 |
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