JPH02297979A - Light-emitting diode array - Google Patents
Light-emitting diode arrayInfo
- Publication number
- JPH02297979A JPH02297979A JP1118039A JP11803989A JPH02297979A JP H02297979 A JPH02297979 A JP H02297979A JP 1118039 A JP1118039 A JP 1118039A JP 11803989 A JP11803989 A JP 11803989A JP H02297979 A JPH02297979 A JP H02297979A
- Authority
- JP
- Japan
- Prior art keywords
- region
- substrate
- ohmic contact
- light emitting
- emitting diode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000010931 gold Substances 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 5
- 238000003491 array Methods 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
本発明は光プリントヘッドなどに好適な発光ダイオード
アレイに関する。DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application Field The present invention relates to a light emitting diode array suitable for optical print heads and the like.
(口)従来の技術
従来、光プリンタに用いられる発光ダイオードアレイは
特開昭60− 198873号公報の如く、化合物半導
体の基板の表面に複数の発光領域を設け、表面に個別電
極、裏面に共通電極を設けていた。しかし乍ら裏面の共
通を極は発光ダイオードアレイ毎に走査駆動手段に接続
する時、あるいは発光ダイオードアレイの長い列の中央
部に電源供給部を設ける時などには配線が困難であった
。(Example) Conventional technology Conventionally, a light emitting diode array used in an optical printer has a plurality of light emitting regions on the surface of a compound semiconductor substrate, individual electrodes on the front surface, and common electrodes on the back surface, as disclosed in Japanese Patent Application Laid-Open No. 198873/1983. Electrodes were installed. However, wiring the common pole on the back surface is difficult when connecting each light emitting diode array to a scanning drive means, or when providing a power supply section in the center of a long row of light emitting diode arrays.
(ハ)発明が解決しようとする課題
そこで発光ダイオードアレイの表面に個別電極と表面電
極とを設ける事を検討した。しかし乍ら、p,nの導電
型決定金属を電極材料中に混入させても、個別電極と表
面電極の各々の主材が同じ場合には、オーミック接触が
得られず、概ねショットキー接触となった。例えばGa
AsPの表面にアルミニウムを主材とした電掻を設ける
と、p型GaAsPに対しては第2図の実線(a)の如
く良好なオーミック接触が得られるが、n型に対しては
破線(b)の如<+0.7V〜−13Vの間で極めて電
流の流れにくい領域が生じるので好ましくない。(c) Problems to be Solved by the Invention Therefore, we considered providing individual electrodes and surface electrodes on the surface of the light emitting diode array. However, even if p and n conductivity type determining metals are mixed into the electrode material, if the main material of each of the individual electrodes and the surface electrode is the same, ohmic contact cannot be obtained and it is generally a Schottky contact. became. For example, Ga
When an electric scratch made mainly of aluminum is provided on the surface of AsP, good ohmic contact is obtained for p-type GaAsP as shown by the solid line (a) in Figure 2, but for n-type it is obtained as shown by the broken line ( As shown in b), a region between <+0.7V and -13V occurs where it is extremely difficult for current to flow, which is not preferable.
(ニ)課題を解決するための手段
本発明は上述の点を改めるためになされたもので、仕事
関数と電子親和度に着目し、同一面に個別電極と共通電
極を設けるにあたりその主材をかえるものであり、例え
ばGaAsPに対し個別電極の主材をアルミニウム、共
通電極の主材を金または銀どするものである。(d) Means for Solving the Problems The present invention has been made to correct the above points, and focuses on work function and electron affinity, and when providing individual electrodes and common electrodes on the same surface, the main material is For example, in contrast to GaAsP, the main material of the individual electrodes is aluminum, and the main material of the common electrode is gold or silver.
(ホ)作用
これにより同じ面に個別i極と共通電極をオーミック性
よく設けることができる。(e) Effect This allows the individual i-poles and the common electrode to be provided on the same surface with good ohmic properties.
くべ)実施例
第1図は本発明実施例の発光ダイオードアレイを用いた
光プリントヘッドの要部斜視図で、(1)は化合物半導
体の基板であり、例えばGaAs上!:GaAsPをエ
ピタキシャル成長させたものからなる。そしてその基板
(1)のGaAsP表面上には選択拡散等により発光領
域(2)が1列に整列して設けられている。(3)はそ
の基板(1)の表面に絶縁膜を介して設けられ、発光領
域(2)とオーミック接触のとられた電極(個別電極)
である。Embodiment Figure 1 is a perspective view of the main parts of an optical print head using a light emitting diode array according to an embodiment of the present invention. (1) is a compound semiconductor substrate, for example, GaAs! : Made of epitaxially grown GaAsP. On the GaAsP surface of the substrate (1), light emitting regions (2) are arranged in a line by selective diffusion or the like. (3) is an electrode (individual electrode) provided on the surface of the substrate (1) via an insulating film and in ohmic contact with the light emitting region (2).
It is.
(1)は基板(1)の表面に設けられ、基板表面の発光
領域以外の領域とオーミック接触のとられた素子単位の
共通を極である。この電極(3)と共通電極(41)は
後述する様に異なる材料からなっている。そしてこの様
な発光ダイオードアレイは放熱性のよい絶縁基台(5)
等にシリコン熱伝導ゴム(6)等で固定し、駆動回路素
子(7)にワイヤボンド法、テープキャリヤ法等で直接
又は導電パターン等を介して配線が施こされる。(1) is provided on the surface of the substrate (1), and is a common pole of the element unit that is in ohmic contact with a region other than the light emitting region on the surface of the substrate. The electrode (3) and the common electrode (41) are made of different materials as will be described later. This type of light emitting diode array is mounted on an insulated base (5) with good heat dissipation.
etc., with a silicon heat conductive rubber (6), etc., and wiring is provided to the drive circuit element (7) directly or via a conductive pattern, etc. by a wire bonding method, a tape carrier method, etc.
この様な発光ダイオードアレイの電極(3)共通電極(
4)として、例えばアルミニウム(A2)と金(A u
)を考えると、その仕事関数はA11.20(eV)
、A u : 4.58(e V )であるから、仕事
関数のみを考慮するとAu又はAuを主材とするものは
A2又はA2を主材とする合金よりもショットキー障壁
が高くなる。しかしGaAsPに対するAuの合金化速
度は速いので、電子親和力を考慮してエネルギーバンド
の縮退を起こさせれば良好なオーミック接触を得ること
ができる。一方オーミックをとる半導体の不純物濃度を
高くしてオーミック接触をとりやすくする−とができる
が、化合物半導体の発光ダイオードの場合不純物濃度を
高くすると発光効率が低下するので、この方法は採用で
きない。GaAsPのn型の場合にはTe濃度は2.0
〜20. OX IQ’ ”cm −’である。Electrodes of such a light emitting diode array (3) Common electrode (
4), for example, aluminum (A2) and gold (A u
), its work function is A11.20 (eV)
, A u : 4.58 (e V ). Therefore, if only the work function is considered, Au or a material mainly composed of Au has a higher Schottky barrier than A2 or an alloy mainly composed of A2. However, since the rate of alloying of Au with GaAsP is fast, good ohmic contact can be obtained if the energy band is caused to degenerate in consideration of electron affinity. On the other hand, it is possible to increase the impurity concentration of an ohmic semiconductor to facilitate ohmic contact, but this method cannot be used for compound semiconductor light-emitting diodes because increasing the impurity concentration lowers the luminous efficiency. In the case of n-type GaAsP, the Te concentration is 2.0.
~20. OX IQ' is "cm-'.
この様な検討の結果、GaAsPを例に発光ダイオード
アレイに良好なオーミック接触をとることができたのは
、p型Zn拡散層(不純物濃度1〜IOX IQ”cm
−”)に対してAtが95%以上のAN又は5iSCu
、Cu−5i等を含むAt合金を用いて(個別)電極を
形成し、n型エピタキシャル層表面にAu−5n−Te
(98: 1 : 1)を用いて共通電極を形成した場
合をあげることができる。As a result of these studies, it was found that a p-type Zn diffusion layer (with an impurity concentration of 1 to IOX
AN or 5iSCu with At of 95% or more for
, Cu-5i, etc. are used to form (individual) electrodes, and Au-5n-Te is formed on the surface of the n-type epitaxial layer.
(98:1:1) is used to form the common electrode.
また、この様にAX系個別電極と同じ面に設ける共通電
極として、Au−Ge−N(88;12: 5)、Ag
−In−Ge(8: 1 : 1)又はこれらの組合せ
による合金、あるいはこれらに導電型不純物を微量加え
た合金を用いても、ショットキー障壁はほとんど生じな
かった。In addition, as a common electrode provided on the same surface as the AX-based individual electrodes, Au-Ge-N (88; 12: 5), Ag
Even when an alloy of -In-Ge (8:1:1) or a combination thereof, or an alloy in which a small amount of conductivity type impurity was added to these, almost no Schottky barrier was generated.
(ト)発明の効果
以上の如く、発光ダイオードアレイの同一面に個別電極
と共通電極とを設けるにあたり、仕事関数と電子親和度
に着目して異なる材料を用いるので発光効率を低下させ
ることなく良好なオーミック接触が得られ、それにより
隣接発光ダイオードアレイの不所望な接触導通や配線の
制約をうけないのでダイナミック駆動用配線や電力供給
が作業性よく行える。(g) Effects of the invention As described above, when providing the individual electrodes and the common electrode on the same surface of the light emitting diode array, different materials are used with a focus on work function and electron affinity, so that the light emitting efficiency is not reduced. A good ohmic contact can be obtained, which eliminates undesirable contact conduction of adjacent light emitting diode arrays and restrictions on wiring, allowing dynamic drive wiring and power supply to be performed with ease.
第1図は本発明実施例の発光ダイオードアレイを用いた
光プリントヘッドの要部斜視図で、第2図はGaAsP
と電極との電流電圧特性図である。FIG. 1 is a perspective view of the main parts of an optical print head using a light emitting diode array according to an embodiment of the present invention, and FIG.
FIG. 3 is a current-voltage characteristic diagram between the electrode and the electrode.
Claims (1)
導体の基板と、その基板の表面に設けられ、発光領域と
オーミック接触のとられた第1の材料からなる個別電極
と、基板の発光領域以外の領域とオーミック接触され基
板の表面に設けられた第1の材料とは異なる第2の材料
からなる共通電極とを具備した事を特徴とする発光ダイ
オードアレイ。 2)前記基板はGaAsP/GaAsであり、前記第1
の材料はアルミニウムを主材とするものであり、前記第
2の材料は、金又は銀を主材とするものである事を特徴
とする前記請求項1記載の発光ダイオードアレイ。[Claims] 1) A compound semiconductor substrate having a plurality of light emitting regions aligned on its surface, and an individual electrode made of a first material provided on the surface of the substrate and in ohmic contact with the light emitting regions. and a common electrode made of a second material different from the first material provided on the surface of the substrate and in ohmic contact with a region other than the light emitting region of the substrate. 2) The substrate is GaAsP/GaAs, and the first
2. The light emitting diode array according to claim 1, wherein the material is mainly aluminum, and the second material is mainly gold or silver.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1118039A JPH02297979A (en) | 1989-05-11 | 1989-05-11 | Light-emitting diode array |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1118039A JPH02297979A (en) | 1989-05-11 | 1989-05-11 | Light-emitting diode array |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02297979A true JPH02297979A (en) | 1990-12-10 |
Family
ID=14726532
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1118039A Pending JPH02297979A (en) | 1989-05-11 | 1989-05-11 | Light-emitting diode array |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02297979A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5548131A (en) * | 1991-05-23 | 1996-08-20 | Canon Kabushiki Kaisha | Light-emitting device, optical recording head utilizing said device, and optical printer utilizing said optical recording head |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098800A (en) * | 1973-12-27 | 1975-08-06 | ||
JPS60163474A (en) * | 1984-02-03 | 1985-08-26 | Kyoto Semiconductor Kk | Diode array |
JPS63274563A (en) * | 1987-05-07 | 1988-11-11 | Matsushita Electric Ind Co Ltd | Monolithic light emitting element array for optical printer head |
-
1989
- 1989-05-11 JP JP1118039A patent/JPH02297979A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098800A (en) * | 1973-12-27 | 1975-08-06 | ||
JPS60163474A (en) * | 1984-02-03 | 1985-08-26 | Kyoto Semiconductor Kk | Diode array |
JPS63274563A (en) * | 1987-05-07 | 1988-11-11 | Matsushita Electric Ind Co Ltd | Monolithic light emitting element array for optical printer head |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5548131A (en) * | 1991-05-23 | 1996-08-20 | Canon Kabushiki Kaisha | Light-emitting device, optical recording head utilizing said device, and optical printer utilizing said optical recording head |
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