JPH02294922A - Magnetic memory medium and production thereof - Google Patents
Magnetic memory medium and production thereofInfo
- Publication number
- JPH02294922A JPH02294922A JP11461489A JP11461489A JPH02294922A JP H02294922 A JPH02294922 A JP H02294922A JP 11461489 A JP11461489 A JP 11461489A JP 11461489 A JP11461489 A JP 11461489A JP H02294922 A JPH02294922 A JP H02294922A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- carbon
- nitride
- magnetic
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 13
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 13
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 13
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 12
- 239000010409 thin film Substances 0.000 claims abstract description 12
- 150000004767 nitrides Chemical class 0.000 claims abstract description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 9
- 150000001247 metal acetylides Chemical class 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims 2
- 239000000463 material Substances 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 230000001050 lubricating effect Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- -1 phosphorus compound Chemical class 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- QIVUCLWGARAQIO-OLIXTKCUSA-N (3s)-n-[(3s,5s,6r)-6-methyl-2-oxo-1-(2,2,2-trifluoroethyl)-5-(2,3,6-trifluorophenyl)piperidin-3-yl]-2-oxospiro[1h-pyrrolo[2,3-b]pyridine-3,6'-5,7-dihydrocyclopenta[b]pyridine]-3'-carboxamide Chemical compound C1([C@H]2[C@H](N(C(=O)[C@@H](NC(=O)C=3C=C4C[C@]5(CC4=NC=3)C3=CC=CN=C3NC5=O)C2)CC(F)(F)F)C)=C(F)C=CC(F)=C1F QIVUCLWGARAQIO-OLIXTKCUSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910004479 Ta2N Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- XULSCZPZVQIMFM-IPZQJPLYSA-N odevixibat Chemical compound C12=CC(SC)=C(OCC(=O)N[C@@H](C(=O)N[C@@H](CC)C(O)=O)C=3C=CC(O)=CC=3)C=C2S(=O)(=O)NC(CCCC)(CCCC)CN1C1=CC=CC=C1 XULSCZPZVQIMFM-IPZQJPLYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は非磁性基板上に強磁性金属薄膜を設けて成る磁
気記憶媒体及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic storage medium comprising a ferromagnetic metal thin film provided on a non-magnetic substrate, and a method for manufacturing the same.
金属媒体を有する磁気記憶媒体では、磁気ヘッドとの接
触に十分耐えうる機械的信頼性を有することが必要不可
欠である。磁気記憶媒体はドライブ構成の簡略化により
、コンタクト・スタート・ストップ(以下CSS方式と
略す)が採用され、更に磁気記録面の保護のため、磁気
記録面以外のシッピングゾーンの同一トラックでCSS
が行われる場合が多い。It is essential for a magnetic storage medium having a metal medium to have sufficient mechanical reliability to withstand contact with a magnetic head. For magnetic storage media, contact start/stop (hereinafter referred to as CSS method) has been adopted to simplify the drive configuration, and in order to protect the magnetic recording surface, CSS is used in the same track in the shipping zone other than the magnetic recording surface.
is often done.
また、磁気記録の高密度化にともない磁気ヘッドもフエ
ライトミニモノリシックヘッドから、コンポジットヘッ
ド、薄膜ヘッドと変わり、スライダー材の硬度が増加し
磁気記憶媒体の保護膜の耐久性の向上が求められている
。In addition, as magnetic recording density increases, magnetic heads change from ferrite mini-monolithic heads to composite heads and thin film heads, and as the hardness of slider materials increases, there is a need to improve the durability of the protective film of magnetic storage media. .
従来、金属磁性媒体の表面に飽和脂肪酸等の.有機潤滑
層を設ける方法(特公昭56−30609号)脂肪酸ア
ミドとリン系化合物の混合潤滑層を設ける方法(特公昭
59−165238)高級脂肪酸と脂肪酸金属塩の混合
潤滑層を設ける方法(特公昭59−177728)等が
あるが、硬度の高いスライダーを有する磁気ヘッドでの
CSSでは摩擦係数の上昇、クラッシュの問題がある。Conventionally, saturated fatty acids, etc. were coated on the surface of metal magnetic media. Method of providing an organic lubricating layer (Japanese Patent Publication No. 56-30609) Method of providing a mixed lubricating layer of fatty acid amide and phosphorus compound (Japanese Patent Publication No. 59-165238) Method of providing a mixed lubricating layer of higher fatty acids and fatty acid metal salts (Patent Publication No. 56-30609) 59-177728), etc., but CSS using a magnetic head having a slider with high hardness has problems of increased friction coefficient and crash.
潤滑層と保護膜層との両方の特性を示す炭素質膜(特公
昭54−33521)(特開昭53−143206)(
特開昭56−41524)は、CSS時に傷が入らず磁
気ヘッドの衝撃を緩衝するため、磁気特性の劣化も見ら
れないが、硬度の高いスライダーを有する磁気ヘッドで
のCSSでは、CSS回数の増加につれ炭素質膜が削れ
摩擦係数が増大するという問題を有していた。Carbonaceous film exhibiting the characteristics of both a lubricating layer and a protective film layer (Japanese Patent Publication No. 54-33521) (Japanese Patent Publication No. 53-143206) (
Japanese Patent Application Laid-Open No. 56-41524) does not cause scratches during CSS and buffers the impact of the magnetic head, so no deterioration of magnetic properties is observed. There was a problem in that as the carbonaceous film increased, the carbonaceous film was scraped and the coefficient of friction increased.
また磁気ヘッドと磁気記憶媒体の吸着と、CSSによる
摩擦係数の増大を防ぐ目的で、非磁性基板にテキスチャ
ー(微小な凹凸)加工する方法もとられるが、十分では
なかった。In addition, in order to prevent the magnetic head and the magnetic storage medium from attracting each other and to prevent an increase in the coefficient of friction due to CSS, a method of processing a texture (microscopic irregularities) on a non-magnetic substrate has been used, but this method has not been sufficient.
〔発明が解決しようとする課題及び目的〕上述のごとく
従来技術では硬度の高いスライダーを有する磁気ヘッド
とのCSSでは十分な機械的信頼性が得られず摩擦係数
の上昇を押さえることができなかフた。[Problems and Objectives to be Solved by the Invention] As mentioned above, in the conventional technology, sufficient mechanical reliability cannot be obtained with CSS using a magnetic head having a slider with high hardness, and an increase in the coefficient of friction cannot be suppressed. Ta.
そこで本発明はこの様な問題点を解決するもので、その
目的とするところは硬度の高いスライダーを有する磁気
ヘッドでのCSSでも強磁性金属媒体に機械的ダメージ
を与えず、かつ摩擦係数も増加しない磁気記憶媒体を提
供することである。The present invention is intended to solve these problems, and its purpose is to avoid mechanical damage to the ferromagnetic metal medium even during CSS in a magnetic head with a highly hard slider, and to increase the coefficient of friction. The objective is to provide a magnetic storage medium that does not.
本発明の磁気記憶媒体は、非磁性基板上に形成された強
磁性金属媒体上に、液化炭酸ガスと乾煉窒素の混合物を
高圧に噴射して微小な凹凸を形成し、更に酸化物、窒化
物、炭化物あるいは炭素から選ばれる少なくとも1種の
物質より成る薄膜を被覆せしめたことを特徴とする。The magnetic storage medium of the present invention is produced by injecting a mixture of liquefied carbon dioxide gas and dry nitrogen at high pressure onto a ferromagnetic metal medium formed on a non-magnetic substrate to form minute irregularities, and then forming fine irregularities on the ferromagnetic metal medium formed on a non-magnetic substrate. It is characterized by being coated with a thin film made of at least one substance selected from carbon, carbide, and carbon.
酸化物は、S 1 0x、TiO2、C r20s等、
窒化物はTiN,Ta2N,AIN,Si3N4等、炭
化物は、SiC,TiC等、炭素は、ダイヤモンド状、
グラファイト状、アモルフオス状の何れでもよく、膜厚
は、150人〜800人形成する。Oxides include S10x, TiO2, Cr20s, etc.
Nitride is TiN, Ta2N, AIN, Si3N4, etc. Carbide is SiC, TiC, etc. Carbon is diamond-like,
It may be either graphite or amorphous, and the film thickness is 150 to 800.
以上は真空蒸着法、スパッタリング法、イオ.ンプレー
ティング法やC V’ D法の何れの方法でも形成可能
である。The above methods include vacuum evaporation method, sputtering method, and iodine method. It can be formed by any method such as a plating method or a C V'D method.
一 3 一
凹凸の粗さは、タワステップによる測定値でRaが0.
005 〜0.02μm,Rma.xが0.03〜0.
2μmがよく、より好ましい粗さは、Raが0.01
〜0.015μm,Rmaxが0.10〜0.15μm
であった。1 3 The roughness of the unevenness is measured by tower step and Ra is 0.
005 to 0.02 μm, Rma. x is 0.03 to 0.
The roughness is preferably 2 μm, and the more preferable roughness is Ra of 0.01.
~0.015μm, Rmax is 0.10~0.15μm
Met.
強磁性金属媒体上に形成された酸化物、窒化物、炭化物
、炭素は磁気ヘッドの衝撃を緩衝する機能があるが、硬
度の高いスライダーを有する磁気ヘッドとのCSSでは
削れてしまう。そこで強磁性金属媒体の表面に微小な凹
凸を形成し、酸化物、窒化物、炭化物、炭素との密着力
を上げる。Oxides, nitrides, carbides, and carbon formed on the ferromagnetic metal medium have the function of buffering the impact of the magnetic head, but they will be scraped during CSS with a magnetic head having a highly hard slider. Therefore, minute irregularities are formed on the surface of the ferromagnetic metal medium to increase its adhesion to oxides, nitrides, carbides, and carbon.
液化炭酸ガスを噴射すると1 mm程度のソフトなドラ
イアイス粒子になる。これが基板上に窒素ガスと一緒に
吹き付けられると、基板に微小な凹凸ができ、更に基板
上の付着粒子を除去する。When liquefied carbon dioxide is injected, it becomes soft dry ice particles about 1 mm in size. When this is blown onto the substrate together with nitrogen gas, minute irregularities are created on the substrate, and furthermore, the adhered particles on the substrate are removed.
ドライアイスを吹き付けるため、基板には熱ストレスが
かからず、磁気特性の変化がない。Since dry ice is sprayed on the substrate, no thermal stress is applied to the substrate, and there is no change in magnetic properties.
またこの加工はドライプロセスで行われるため、行程中
に基板が汚れることはない。Additionally, since this processing is done in a dry process, the substrate will not become contaminated during the process.
次に実施例で具体的に説明する。Next, a concrete explanation will be given in Examples.
一 4
〔実施例−1〕
鏡面仕上げされたディスク状アルミニウム合金基板状に
非磁性合金めっきとしてNi−P合金めっきを約15μ
mの厚さにめっき後、研磨によりlOμmの厚さ、表面
粗さ0.03μm以下にし、更に金属磁性薄膜としてC
o−Ni−P合金を約0.06μm厚にめっきした。1 4 [Example-1] Ni-P alloy plating of approximately 15 μm was applied as non-magnetic alloy plating to a mirror-finished disc-shaped aluminum alloy substrate.
After plating to a thickness of m, polishing to a thickness of lOμm and a surface roughness of 0.03μm or less, and further plated as a metal magnetic thin film.
An o-Ni-P alloy was plated to a thickness of about 0.06 μm.
次に液化炭酸ガスと乾燥窒素を重量比で1対10に混合
して2kg/c+flの圧力で60秒間全面に噴射した
。Next, liquefied carbon dioxide gas and dry nitrogen were mixed at a weight ratio of 1:10 and sprayed over the entire surface for 60 seconds at a pressure of 2 kg/c+fl.
更にマグネトロンスパッタ法でアモルフォス状炭素質膜
を300人連続して形成した。Furthermore, 300 people successively formed amorphous carbonaceous films using magnetron sputtering.
〔実施例−2〕
実施例1と同様にして金属媒体を有するディスクを作成
した。[Example 2] A disk having a metal medium was produced in the same manner as in Example 1.
次に液化炭酸ガスと乾燥窒素を重量比で1対20に混合
して4kg/ciの圧力で120秒間全面に噴射した。Next, liquefied carbon dioxide gas and dry nitrogen were mixed at a weight ratio of 1:20 and sprayed over the entire surface at a pressure of 4 kg/ci for 120 seconds.
次にマグネトロンスバッタ装置でS iOxを500人
形成した。Next, 500 SiOx layers were formed using a magnetron scattering device.
〔実施例−3〕
実施例1と同様にして金属奴体を有するディスクを作成
した。[Example 3] A disk having a metal body was produced in the same manner as in Example 1.
次に液化炭酸ガスと乾煙窒素を重量比で1対2oに混合
して4. kg / cmの圧力で6o秒間全面に噴射
した。Next, mix liquefied carbon dioxide gas and dry smoke nitrogen at a weight ratio of 1:2.4. It was sprayed over the entire surface for 6o seconds at a pressure of kg/cm.
次にマグネトロンスパッタ装置てグラファイj・状炭素
を800人形成した。Next, 800 pieces of graphite J-shaped carbon were formed using a magnetron sputtering device.
〔実施例−4〕
実施例1と同様にして金属媒体を有するディスクを作成
した。[Example 4] A disk having a metal medium was produced in the same manner as in Example 1.
次に液化炭酸ガスとg’f= k窒素を重量比で1対2
5に混合して2 kg / cmの圧力て120秒間全
面に噴射した。Next, mix liquefied carbon dioxide and g'f=k nitrogen in a weight ratio of 1:2.
5 and sprayed on the entire surface for 120 seconds at a pressure of 2 kg/cm.
マグネl〜ロンスパッタ装置でグラファイト状の炭素を
500人形成した。500 pieces of graphite-like carbon were formed using a magnetron sputtering device.
〔比較例−1〕
実施例1に於いて液化炭酸ガスと窒素ガスを噴射せずサ
ンプルを作成した。[Comparative Example-1] A sample was prepared in Example 1 without injecting liquefied carbon dioxide gas and nitrogen gas.
〔比較例−2〕
実施例2に於いて液化炭酸ガスと窒素ガスを噴射せずサ
ンプルを作成した。[Comparative Example-2] A sample was prepared in Example 2 without injecting liquefied carbon dioxide gas and nitrogen gas.
〔比較例−3〕
実施例3に於いて液化炭酸ガスと窒素ガスを噴射せずサ
ンプルを作成した。[Comparative Example-3] A sample was prepared in Example 3 without injecting liquefied carbon dioxide gas and nitrogen gas.
〔比較例−4〕
実施例4に於いて液化炭酸ガスと窒素ガスを噴射せずサ
ンプルを作成した。[Comparative Example-4] A sample was prepared in Example 4 without injecting liquefied carbon dioxide gas and nitrogen gas.
〔比較例−5〕
実施例4に於いて窒素ガスのみを2kg/c+flの圧
力で120秒間全面に噴射してサンプルを作成した。[Comparative Example-5] A sample was prepared by injecting only nitrogen gas over the entire surface for 120 seconds at a pressure of 2 kg/c+fl in Example 4.
以上の実施例、比較例のディスクをCSS試験した。C
SS試験は、浮上量0.20 μm,Hvl200のス
ライダー材質アルミナチタンカーバイドの薄膜ヘッドを
用いてCSS前とCS320000回後の静摩擦係数の
測定を行った。その結果を第1表に示す。The disks of the above Examples and Comparative Examples were subjected to a CSS test. C
In the SS test, the static friction coefficient was measured before CSS and after 320,000 times of CS using a thin film head made of alumina titanium carbide as a slider material with a flying height of 0.20 μm and Hvl of 200. The results are shown in Table 1.
以上述べたように、本発明によれば、非磁性基板上に形
成された強磁性金属薄膜媒体上に、ドライプロセスを用
いて微小な凹凸を形成することにより、CSSの耐久性
が向上した。As described above, according to the present invention, the durability of CSS is improved by forming minute irregularities on a ferromagnetic metal thin film medium formed on a nonmagnetic substrate using a dry process.
また硬質磁気ヘッドでの耐久特性が向上し、高記録密度
の磁気ディスクを提供することが可能となった。Furthermore, the durability of hard magnetic heads has been improved, making it possible to provide magnetic disks with high recording density.
第1表 以上 出願人 セイコーエプソン株式会社 代理人弁理士 鈴木喜三郎(他1名)Table 1 that's all Applicant: Seiko Epson Corporation Representative Patent Attorney Kisaburo Suzuki (and 1 other person)
Claims (4)
に、微小な凹凸を形成し、更に酸化物、窒化物、炭化物
あるいは炭素から選ばれる少なくとも1種の物質より成
る薄膜を被覆せしめたことを特徴とする磁気記憶媒体。(1) Fine irregularities are formed on a ferromagnetic metal thin film medium formed on a nonmagnetic substrate, and a thin film made of at least one substance selected from oxide, nitride, carbide, or carbon is further coated. A magnetic storage medium characterized by:
合物で、高圧に噴射して加工したことを特徴とする第1
項記載の磁気記憶媒体。(2) A first feature in which the minute irregularities are processed by spraying a mixture of liquefied carbon dioxide gas and dry nitrogen at high pressure.
Magnetic storage medium as described in section.
に、微小な凹凸を形成し、更に酸化物、窒化物、炭化物
あるいは炭素から選ばれる少なくとも1種の物質を形成
する工程からなることを特徴とする磁気記憶媒体の製造
方法。(3) A step of forming minute irregularities on a ferromagnetic metal thin film medium formed on a non-magnetic substrate, and further forming at least one substance selected from oxides, nitrides, carbides, or carbon. A method of manufacturing a magnetic storage medium, characterized in that:
合物で、高圧に噴射して加工したことを特徴とする第3
項記載の磁気記憶媒体の製造方法。(4) A third feature in which the minute irregularities are processed by spraying a mixture of liquefied carbon dioxide and dry nitrogen at high pressure.
A method for manufacturing a magnetic storage medium according to section 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11461489A JPH02294922A (en) | 1989-05-08 | 1989-05-08 | Magnetic memory medium and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11461489A JPH02294922A (en) | 1989-05-08 | 1989-05-08 | Magnetic memory medium and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02294922A true JPH02294922A (en) | 1990-12-05 |
Family
ID=14642265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11461489A Pending JPH02294922A (en) | 1989-05-08 | 1989-05-08 | Magnetic memory medium and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02294922A (en) |
-
1989
- 1989-05-08 JP JP11461489A patent/JPH02294922A/en active Pending
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