JPH02294498A - Method for removing air in preliminary chamber of apparatus for treatment in gas other than air - Google Patents
Method for removing air in preliminary chamber of apparatus for treatment in gas other than airInfo
- Publication number
- JPH02294498A JPH02294498A JP11296489A JP11296489A JPH02294498A JP H02294498 A JPH02294498 A JP H02294498A JP 11296489 A JP11296489 A JP 11296489A JP 11296489 A JP11296489 A JP 11296489A JP H02294498 A JPH02294498 A JP H02294498A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- atmosphere
- preliminary chamber
- liquid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000007747 plating Methods 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims description 39
- 239000012298 atmosphere Substances 0.000 claims description 32
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 238000009713 electroplating Methods 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 23
- 239000012299 nitrogen atmosphere Substances 0.000 abstract description 16
- 239000007789 gas Substances 0.000 abstract description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 9
- 238000002360 preparation method Methods 0.000 abstract description 6
- 229910052757 nitrogen Inorganic materials 0.000 abstract 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 17
- 238000010586 diagram Methods 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/42—Electroplating: Baths therefor from solutions of light metals
- C25D3/44—Aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、大気を除去した雰囲気下で被処理物の処理を
行なう処理室と、被処理物を大気を除去した雰囲気下に
晒した状態で処理室内に搬入するために処理室の入口に
連通して設けられた予備室とを備えた処理装置の、予備
室の大気を除去する方法に関するものである。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a processing chamber in which a workpiece is processed in an atmosphere from which air is removed, and a processing chamber in which a workpiece is exposed to an atmosphere from which air is removed. The present invention relates to a method for removing atmospheric air from a preliminary chamber of a processing apparatus including a preliminary chamber which is provided in communication with an entrance of a processing chamber for carrying the present invention into the processing chamber.
（従来の技術）
第５図は窒素雰囲気下で被処理物の表面にアルミニウム
を電気メッキする従来の処理装置を示す。(Prior Art) FIG. 5 shows a conventional processing apparatus for electroplating aluminum on the surface of a workpiece under a nitrogen atmosphere.
このようなメッキ処理はメッキ液か水分を嫌うため一般
に窒素雰囲気下で行なっている。図において、１は例え
ば鉄製の鋳物品である被処理物２の表面にアルミニウム
の電気メッキを施す処理室、３はメッキ浴、４は洗浄浴
、５は処理室１の入口１ａに連通して設けられた予価室
、５ａは予価室５の入口、６、７はそれぞれ人口１ ａ
ｓ ５ ａを開閉する扉である。このような処理装置
では、被処理物２を処理室１内に出し入れする際に処理
室１内の窒素雰囲気に悪影響が及ぶのを防止するために
、被処理物２を予備室５内で窒素雰囲気下に晒した状態
とした後に処理室１内に搬入するようにしている。Such plating treatment is generally performed under a nitrogen atmosphere because the plating solution and moisture are averse to the plating process. In the figure, 1 is a processing chamber in which aluminum electroplating is applied to the surface of a workpiece 2, which is an iron casting, for example, 3 is a plating bath, 4 is a cleaning bath, and 5 is connected to the entrance 1a of the processing chamber 1. Preparation rooms provided, 5a is the entrance of preparatory room 5, 6 and 7 each have a population of 1 a
This is a door that opens and closes s5a. In such a processing apparatus, in order to prevent an adverse effect on the nitrogen atmosphere in the processing chamber 1 when the workpiece 2 is taken in and out of the processing chamber 1, the workpiece 2 is placed in a nitrogen atmosphere in the preliminary chamber 5. After being exposed to the atmosphere, it is carried into the processing chamber 1.
予備室５内で被処理物２を窒素雰囲気に晒すのは次のよ
うに行なっている。なお処理室１は予め窒素ガスにより
充満されており、扉６は閉じた状態にある。まず扉７を
開き、被処理物２を予備室５内に搬入し、扉７を閉じて
予備室５を密閉する。The workpiece 2 is exposed to a nitrogen atmosphere in the preliminary chamber 5 as follows. Note that the processing chamber 1 is filled with nitrogen gas in advance, and the door 6 is in a closed state. First, the door 7 is opened, the workpiece 2 is carried into the preliminary chamber 5, and the door 7 is closed to seal the preliminary chamber 5.
次に予備室５内の大気を吸引除去して予備室５内を真空
状態とする。そして窒素ガスを予備室５内に注入して充
満させる。Next, the atmosphere inside the preliminary chamber 5 is removed by suction to bring the inside of the preliminary chamber 5 into a vacuum state. Then, nitrogen gas is injected into the preliminary chamber 5 to fill it.
こうして予備室５内で窒素雰囲気に晒された肢処理物２
は、扉６を開いて処理室１内に搬入され、洗浄浴４で洗
浄された後、メッキ浴３に浸漬され、表面にアルミニウ
ムメッキが施される。The limb processed material 2 is thus exposed to the nitrogen atmosphere in the preliminary chamber 5.
is carried into the processing chamber 1 by opening the door 6, and after being washed in the cleaning bath 4, it is immersed in the plating bath 3, and the surface is plated with aluminum.
（発明が解決しようとする問題点）
上記のような方法により被処理物２を予備室５内で窒素
雰囲気下に完全に晒すには、予備室５内を高度な真空状
態としなければならない。このため以下のような問題が
あった。(Problems to be Solved by the Invention) In order to completely expose the workpiece 2 to the nitrogen atmosphere in the preparatory chamber 5 using the method described above, the preparatory chamber 5 must be brought into a highly vacuum state. This caused the following problems.
（１）強力な真空ボンブが必要である。(1) A powerful vacuum bomb is required.
（２）真空ポンプを作動させるのに、大量のエネルギー
を必要とする。(2) A large amount of energy is required to operate the vacuum pump.
（３）作業時間が長くなる。例えば１００１１の容積の
予備室５内に被処理物２を搬入して窒素雰囲気下に晒す
のに、約７分を要する。(3) Working time becomes longer. For example, it takes about 7 minutes to carry the workpiece 2 into the preliminary chamber 5 having a volume of 10011 and expose it to a nitrogen atmosphere.
（４）予備室５を高真空にするため耐圧の点で危険であ
る。(4) Since the preliminary chamber 5 is made into a high vacuum, it is dangerous in terms of pressure resistance.
（５）予備室５を強固な耐圧構造としなければならず、
設備コストが大幅に増大する。(5) The preliminary chamber 5 must have a strong pressure-resistant structure,
Equipment costs will increase significantly.
（６）耐圧構造の予備室５を常に検査、監督しなければ
ならず、手間がかかる。(6) The preliminary chamber 5 having a pressure-resistant structure must be constantly inspected and supervised, which is time-consuming.
（７）扉６、７にも耐圧のための＾瓜な構造を必要とし
、そのため被処理物２の搬送にも手間がかかり、設備コ
ストが増大する。(7) The doors 6 and 7 also require a rigid structure to withstand pressure, which requires time and effort to transport the object 2 and increases equipment costs.
本発明は上記のような問題点を解消することのできる非
大気下処理装置の予備室の大気除去方法を提倶すること
を目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for removing the atmosphere from a preliminary chamber of a non-atmosphere processing apparatus, which can solve the above-mentioned problems.
（発明の構成）
本発明は、大気を除去した雰囲気下で被処理物の処理を
行なう処理室と、被処理物を大気を除去した雰囲気下に
晒した状態で処理室内に搬入するために処理室の入口に
連通して設けられた予備室とを備えた処理装置の、予備
室の人気を除去する方法において、処理室と予備室との
連通を遮断して予備室内に被処理物を搬入した後、予備
室を密閉し、予備室内に液体を流入させながら大気を排
出させて液体を充満させ、次いで液体を排出させながら
大気以外の気体を流入させてその気体を充満させるよう
にしたことを特徴とする非大気下処理装置の予備室の大
気除去方法であり、特に処理室ではアルミニウムの電気
メッキがメッキ液と反応しない気体雰囲気下で行なわれ
、液体としてはメッキ液と反応しないものを用い、′Ｆ
ｆｍ室内に流入させる気体としては処理室内の気体と同
質のものを用いるようにしたものである。(Structure of the Invention) The present invention provides a processing chamber in which a workpiece is processed in an atmosphere from which air is removed, and a processing chamber in which the workpiece is transported into the processing chamber while being exposed to an atmosphere from which the air is removed. In a method for eliminating the popularity of the preliminary chamber of a processing apparatus equipped with a preliminary chamber provided in communication with the entrance of the chamber, the communication between the processing chamber and the preliminary chamber is cut off and the material to be processed is carried into the preliminary chamber. After that, the preparatory chamber is sealed, and the preparatory chamber is filled with liquid by letting the atmosphere flow out while liquid is flowing into the preparatory chamber, and then, while the liquid is being discharged, gas other than the atmosphere is allowed to flow in to fill the preparatory chamber with that gas. This is a method for removing the atmosphere from a preliminary chamber of a non-atmospheric processing equipment, and in particular, in the processing chamber, aluminum electroplating is carried out in a gaseous atmosphere that does not react with the plating solution, and the liquid is one that does not react with the plating solution. use, 'F
The gas flowed into the fm chamber is of the same quality as the gas inside the processing chamber.
（作用）
液体を流入することにより予備室内の大気は排出され、
液体を排出させながら人気以外の気体を流入させること
により予備室内の被処理物は上記気体の雰囲気下に晒さ
れる。(Function) As the liquid flows in, the atmosphere inside the preliminary chamber is exhausted.
By allowing a gas other than the popular one to flow in while discharging the liquid, the object to be processed in the preliminary chamber is exposed to the atmosphere of the gas.
（実施例） 以下、本発明の実施例を図に基づいて説明する。(Example) Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の非大気下処理装置の予備室の大気除去
方法を採用した処理装置を示す概略構成図である。図に
おいて、第５図に対応する箇所には同じ符号を付してい
る。本装置も窒素雰囲気下で被処理物２の表面にアルミ
ニウムを電気メッキするものである。１０は窒素ガスを
貯留しているガスタンク、１１はタンク１０の開閉弁で
あり、タンク１０は開閉弁１１を介してＥ’（ｉｆ室５
に連通している。１２は予備室５内の気体の大気への開
放を制御する開閉弁、１３は予備室５内に充満させる液
体を貯留している槽であり、槽１３はポンプ１４を介し
て予備室５に連通している。液体としては主にフロリナ
ート（商品名）又はメタノール等が用いられる。１５は
予備室５内の液体の槽１３への排出を制御する開閉弁で
ある。FIG. 1 is a schematic diagram illustrating a processing apparatus employing the method for removing the atmosphere from a preliminary chamber of a non-atmospheric processing apparatus according to the present invention. In the figure, parts corresponding to those in FIG. 5 are given the same reference numerals. This apparatus also electroplates aluminum on the surface of the workpiece 2 under a nitrogen atmosphere. 10 is a gas tank storing nitrogen gas, 11 is an on-off valve for the tank 10, and the tank 10 is connected to E' (if chamber 5
is connected to. Reference numeral 12 denotes an on-off valve that controls the release of the gas in the preliminary chamber 5 to the atmosphere, and 13 is a tank that stores liquid to fill the preliminary chamber 5. The tank 13 is connected to the preliminary chamber 5 via a pump 14. It's communicating. Fluorinert (trade name), methanol, etc. are mainly used as the liquid. Reference numeral 15 denotes an on-off valve that controls discharge of liquid in the preliminary chamber 5 to the tank 13.
本装置では次のようにして被処理物２が予備室５内で窒
素雰囲気下に晒される。なお処理室１は予め窒素ガスに
より充満されており、扉６は閉じた状態にある。また開
閉弁１１、１２、１５は閉じており、ポンブ１４は作動
していない状態にある。まず扉７を開き、被処理物２を
ｒ備室５内に搬入し、扉７を閉じて予備室５を密閉する
。次に開閉弁１２を開いた後、ボンプ］４を作動させて
槽１３内の液体を予備室５内に注入する。予ｆｉｉ室５
内の大気は液体に押されて開閉弁１２を経て大気中へ放
出される。予備室５内が液体により充満されると、開閉
弁１２を閉じる。次に開閉弁１１を開き、開閉弁１５を
開く。予備室５内の液体は開閉弁１５を紅で排出されて
槽１３内に流入し、それに連れてタンク１０内の窒素ガ
スが開閉弁１１を経て予備室５内に流入する。液体が予
備室５内から全て排出されると同時に予備室５内は窒素
ガスにより充満される。そして開閉弁１１、１５を閉じ
る。In this apparatus, the workpiece 2 is exposed to a nitrogen atmosphere in the preliminary chamber 5 in the following manner. Note that the processing chamber 1 is filled with nitrogen gas in advance, and the door 6 is in a closed state. Further, the on-off valves 11, 12, and 15 are closed, and the pump 14 is in a non-operating state. First, the door 7 is opened, the workpiece 2 is carried into the preliminary chamber 5, and the door 7 is closed to seal the preliminary chamber 5. Next, after opening the on-off valve 12, the pump 4 is operated to inject the liquid in the tank 13 into the preliminary chamber 5. Prefii room 5
The atmosphere inside is pushed by the liquid and is discharged into the atmosphere through the on-off valve 12. When the preliminary chamber 5 is filled with liquid, the on-off valve 12 is closed. Next, the on-off valve 11 is opened, and the on-off valve 15 is opened. The liquid in the preliminary chamber 5 is discharged through the on-off valve 15 and flows into the tank 13, and along with this, the nitrogen gas in the tank 10 flows into the preliminary chamber 5 through the on-off valve 11. At the same time that all the liquid is discharged from the preliminary chamber 5, the preliminary chamber 5 is filled with nitrogen gas. Then, the on-off valves 11 and 15 are closed.
このように本装置では、予備室５内の大気を槽１３から
の液体により追い出し、液体をタンク１０からの窒素ガ
スで置換することにより、］Ｚ（ｉ７ｉｉ室５内の被処
理物２を窒素雰囲気下に晒すようにしている。In this way, in this apparatus, the atmosphere in the preliminary chamber 5 is expelled by the liquid from the tank 13, and the liquid is replaced with nitrogen gas from the tank 10. I try to expose it to the atmosphere.
予備室５内で窒素雰囲気下に晒された被処理物２は、扉
６を開いて処理室１内に搬入され、メッキ浴３に浸漬さ
れ、表面にアルミニウムメッキが施される。なお被処理
物２は予価室５において液体により既に洗浄されている
ので、従来例のように洗浄浴４で洗浄する必要はなく、
洗浄浴４は省略される。また液体として用いるフロリナ
ート又はメタノールは蒸発しやすいものであるので、乾
燥させる操作も必要ない。The object 2 to be processed, which has been exposed to a nitrogen atmosphere in the preliminary chamber 5, is carried into the processing chamber 1 by opening the door 6, and is immersed in the plating bath 3, so that its surface is plated with aluminum. Note that since the object to be processed 2 has already been washed with liquid in the pretreatment chamber 5, there is no need to wash it with the washing bath 4 as in the conventional example.
Washing bath 4 is omitted. Furthermore, since Fluorinert or methanol used as a liquid is easily evaporated, there is no need for a drying operation.
アルミニウムの電気メッキは第２図に示すように行なわ
れる。即ちメッキ浴３中の塩化アルミニウムを含有した
無水ベンゼン系溶液に、正電極に通じたアルミニウム板
１６と負電極に通した被処理物２とを浸漬させ、電気分
解することにより行なわれる。Electroplating of aluminum is performed as shown in FIG. That is, the plating is carried out by immersing the aluminum plate 16 connected to the positive electrode and the workpiece 2 connected to the negative electrode in an anhydrous benzene solution containing aluminum chloride in the plating bath 3, and electrolyzing the plate.
（発明の効果）
以上のように本発明によれば、子ＩＩｉ室５内の人気を
槽１３からの液体により追い出し、液体をタンク１０か
らの窒素ガスで置換することにより、予備室５内の被処
理物２を窒素雰囲気下に晒すようにしたので、従来例の
ような真空ボンブを用いて予備室５内を真空にする作業
や、予備室５、扉６、７の耐圧構造を不要とすることが
でき、以下に示すような効果を奏する。即ち、
（１）予備室５内に被処理物２を搬入して窒素雰囲気下
に晒すのに要する作業時間を、例えば従来例の約７分か
ら僅か２０秒程度にまで大幅に減少させることができる
。従って作業に要するエネルギーを大幅に低減すること
ができ、作業効率を良くすることができる。(Effects of the Invention) As described above, according to the present invention, the liquid in the secondary chamber 5 is expelled by the liquid from the tank 13, and the liquid is replaced with nitrogen gas from the tank 10. Since the object to be processed 2 is exposed to a nitrogen atmosphere, there is no need to evacuate the preliminary chamber 5 using a vacuum bomb or to provide a pressure-resistant structure for the preliminary chamber 5 and the doors 6 and 7 as in the conventional example. The following effects can be achieved. That is, (1) The work time required to carry the workpiece 2 into the preliminary chamber 5 and expose it to a nitrogen atmosphere can be significantly reduced, for example, from about 7 in the conventional example to only about 20 seconds. . Therefore, the energy required for work can be significantly reduced, and work efficiency can be improved.
（２）予備室５や、扉６、７の構造は、充満される液体
の重量に耐え得るものであれば十分であり、従来例のよ
うな高度の真空に耐え得るほど強固である必要はないの
で、予備室５や、扉６、７の構造を簡単にでき、設備コ
ストを大幅に低減することができる。(2) The structure of the preliminary chamber 5 and the doors 6 and 7 is sufficient as long as it can withstand the weight of the liquid it is filled with, and does not need to be strong enough to withstand the high degree of vacuum as in the conventional example. Therefore, the structure of the spare room 5 and the doors 6 and 7 can be simplified, and the equipment cost can be significantly reduced.
（３）扉６、７の構造を簡単なものにてきるので、被処
理物２の搬送機構も簡単且つ安（凸なものにてき、確実
な搬送機構を採用することかできる。(3) Since the structure of the doors 6 and 7 can be simplified, the transport mechanism for the object 2 to be processed can also be simple and inexpensive (a convex one can be used), and a reliable transport mechanism can be adopted.
（４）耐圧上の問題がないので、安全であり、検査、監
督等の手間を軽減ずることかできる。(4) Since there are no problems with pressure resistance, it is safe and the labor of inspection, supervision, etc. can be reduced.
（別の実施例）
第３図に示すように、真空ポンプ２１でγ・備室５内を
減圧することによって槽１３内の液体をｒ・備室５内に
導入するようにしてもよい。即ち開閉弁１１を閉じた状
懇で真空ポンブ２１で予篩室５内の大気を吸引すると、
Ｙｊ１３内の液体が予備室５内に吸い込まれる。そして
液体か予備室５内に充満した後、開閉弁１１を開くと、
タンク１０内の窒素ガスが予備室５内に供給され、液体
は自動的に槽１３内に戻り、予備室５内は窒素ガスによ
り充満される。なお予備室５内には減圧とともに液体が
導入されてくるので、予儒至５内は従来例のような高度
の耐圧構造を必要とする程に負圧とはならない。(Another Embodiment) As shown in FIG. 3, the liquid in the tank 13 may be introduced into the r/preparation chamber 5 by reducing the pressure in the γ/preparation chamber 5 with the vacuum pump 21. That is, when the air inside the pre-sieving chamber 5 is sucked with the vacuum pump 21 while the on-off valve 11 is closed,
The liquid in Yj13 is sucked into the preliminary chamber 5. After the preliminary chamber 5 is filled with liquid, the on-off valve 11 is opened.
Nitrogen gas in the tank 10 is supplied into the preliminary chamber 5, the liquid automatically returns to the tank 13, and the preliminary chamber 5 is filled with nitrogen gas. Note that, since the liquid is introduced into the preparatory chamber 5 while the pressure is reduced, the pressure inside the preparatory chamber 5 does not become negative enough to require a highly pressure-resistant structure as in the conventional example.
また第４図に示すように、予備室５内に導入した窒素ガ
スを再利用するようにしてもよい。タンク３１と槽１３
は開閉弁３２を介して連通しており、槽１３内の液体を
ポンプ１４て予備室５内に注入し充満させた際に、開閉
弁３２を開いた状態でタンク３１内には液体と、予備室
５と同じ容積の窒素ガスとが貯留されているようになっ
ている。Further, as shown in FIG. 4, the nitrogen gas introduced into the preliminary chamber 5 may be reused. Tank 31 and tank 13
are in communication via an on-off valve 32, and when the liquid in the tank 13 is injected into the preparatory chamber 5 using the pump 14 to fill it, the liquid in the tank 31 with the on-off valve 32 open, and The same volume of nitrogen gas as the preliminary chamber 5 is stored.
３３はタンク３１内の窒素ガスの予備室５への共給を制
御する開閉弁である。操作は次のように行なう。即ちま
ず扉６を閉じ、開閉弁１２、１５、３２、３３を閉じた
状態で、扉７を開き、被処理物２を予備室５内に搬入し
、扉７を閉じる。開閉弁１２を開き、ボンブ１４により
冶１３内の液体を予備室５内に注入し充満させる。開閉
弁１２を閉じ、開閉弁３２を開いた後、開閉弁３３、１
５を開く。これにより予備室５内の液体が槽１３内に流
入すると同時に、タンク３１内の窒素ガスが液体により
圧送されて予備室５内に流入して充満し、被処理物２は
窒素雰囲気下に晒される。開閉弁３３、１５を閉じ、扉
６を開き、被処理物２を処理室１内に搬入してメッキ処
理を行なった後Ｐ備室５内に移動し、扉６を閉じる。開
閉弁３３を開き、ポンプ１４により槽１３内の液体を予
備室５内に注入し充満させる。これにより予備室５内の
窒素ガスは全てタンク３１内に戻される。開閉弁３２、
３３を閉じ、開閉弁１２、１５を開き、予備室５内の液
体を槽１３内に戻す。このようにして窒素ガスの再利用
が図られる。33 is an on-off valve that controls co-supply of nitrogen gas in the tank 31 to the preliminary chamber 5. The operation is performed as follows. That is, first, the door 6 is closed, the on-off valves 12, 15, 32, and 33 are closed, the door 7 is opened, the workpiece 2 is carried into the preliminary chamber 5, and the door 7 is closed. The on-off valve 12 is opened, and the liquid in the chamber 13 is injected into the preliminary chamber 5 using the bomb 14 to fill it. After closing the on-off valve 12 and opening the on-off valve 32, the on-off valves 33, 1
Open 5. As a result, the liquid in the preliminary chamber 5 flows into the tank 13, and at the same time, the nitrogen gas in the tank 31 is pumped by the liquid and flows into the preliminary chamber 5, filling it, and the workpiece 2 is exposed to a nitrogen atmosphere. It will be done. The on-off valves 33 and 15 are closed, the door 6 is opened, and the workpiece 2 is carried into the processing chamber 1 and subjected to plating treatment, and then moved to the P-room 5, and the door 6 is closed. The on-off valve 33 is opened, and the liquid in the tank 13 is injected into the preliminary chamber 5 by the pump 14 to fill it. As a result, all the nitrogen gas in the preliminary chamber 5 is returned to the tank 31. On-off valve 32,
33 is closed, the on-off valves 12 and 15 are opened, and the liquid in the preliminary chamber 5 is returned to the tank 13. In this way, nitrogen gas can be reused.
また第１図、第３図、第４図に示す各実施例では、窒素
ガスを用いているが、代わりに乾燥空気を用いることも
できる。また処理室１内、予備室５内をそれぞれ充満さ
せる気体を異ならせてもよい。また槽１３内の液体とし
てはメッキ液を用いることもできる。更に処理室１内で
の処理は、大気を除去した雰囲気下で行なう必要のある
処理であれば、アルミニウムの電気メッキに限るもので
はない。また第１図のタンク１０は処理室１の気体を用
いることにより削除することができる。Furthermore, although nitrogen gas is used in the embodiments shown in FIGS. 1, 3, and 4, dry air may be used instead. Further, the gases filling the processing chamber 1 and the preliminary chamber 5 may be different. Furthermore, a plating solution can also be used as the liquid in the tank 13. Furthermore, the processing in the processing chamber 1 is not limited to electroplating of aluminum, as long as it is a processing that needs to be carried out in an atmosphere from which air is removed. Further, the tank 10 in FIG. 1 can be omitted by using the gas in the processing chamber 1.
第１図は本発明の非大気下処理装置の予備室の大気除去
方法を採用した処理装置を示す概略構成図、第２図は処
理室で行なうアルミニウムの電気メッキ装置を示す略図
、第３図、第４図はそれぞれ本発明の非大気下処理装置
の予備室の大気除去方法を採用した処理装置の別の実施
例を示す概略構成図、第５図は従来の処理装置を示す概
略構成図である。１・・・処理室、５・・・予備室、６
、７・・・扉、１１、１２、１５、３２、３３・・・開
閉弁、１３・・・槽、１４・・・ボンブ
第１図
特許出願人 上村工業株式会社
日新製鋼株式会社
第２図Fig. 1 is a schematic configuration diagram showing a processing apparatus that employs the method of removing the atmosphere from a pre-chamber of a non-atmosphere processing apparatus according to the present invention; Fig. 2 is a schematic diagram showing an aluminum electroplating apparatus carried out in the processing chamber; and Fig. 3 , FIG. 4 is a schematic configuration diagram showing another embodiment of a processing device that employs the method for removing the atmosphere from a preliminary chamber of a non-atmospheric processing device according to the present invention, and FIG. 5 is a schematic configuration diagram showing a conventional processing device. It is. 1...Processing room, 5...Preliminary room, 6
, 7... Door, 11, 12, 15, 32, 33... Opening/closing valve, 13... Tank, 14... Bomb Figure 1 Patent applicant Uemura Kogyo Co., Ltd. Nisshin Steel Co., Ltd. No. 2 figure
Claims (2)
う処理室と、被処理物を大気を除去した雰囲気下に晒し
た状態で処理室内に搬入するために処理室の入口に連通
して設けられた予備室とを備えた処理装置の、予備室の
大気を除去する方法において、処理室と予備室との連通
を遮断して予備室内に被処理物を搬入した後、予備室を
密閉し、予備室内に液体を流入させながら大気を排出さ
せて液体を充満させ、次いで液体を排出させながら大気
以外の気体を流入させてその気体を充満させるようにし
たことを特徴とする非大気下処理装置の予備室の大気除
去方法。(1) A processing chamber in which the objects to be processed are processed in an atmosphere from which the air has been removed, and a connection to the entrance of the processing chamber for transporting the objects to be processed into the processing chamber while exposed to the atmosphere from which the air has been removed. In a method for removing the atmosphere in the preliminary chamber of a processing apparatus equipped with a preliminary chamber provided in a A non-atmospheric chamber characterized in that it is sealed, and the preliminary chamber is filled with liquid by discharging the atmosphere while liquid is flowing into the preliminary chamber, and then, while discharging the liquid, a gas other than the atmosphere is caused to flow in and filling the preliminary chamber with that gas. A method for removing the atmosphere from the preliminary chamber of a pretreatment equipment.
と反応しない気体雰囲気下で行なわれ、液体としてはメ
ッキ液と反応しないものを用い、予備室内に流入させる
気体としては処理室内の気体と同質のものを用いる特許
請求の範囲第１項記載の非大気下処理装置の予備室の大
気除去方法。(2) In the processing chamber, aluminum electroplating is carried out in a gas atmosphere that does not react with the plating solution.The liquid used is one that does not react with the plating solution, and the gas flowing into the preliminary chamber is of the same quality as the gas in the processing chamber. A method for removing atmosphere from a preliminary chamber of a non-atmospheric treatment apparatus according to claim 1, using
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11296489A JPH02294498A (en) | 1989-05-02 | 1989-05-02 | Method for removing air in preliminary chamber of apparatus for treatment in gas other than air |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11296489A JPH02294498A (en) | 1989-05-02 | 1989-05-02 | Method for removing air in preliminary chamber of apparatus for treatment in gas other than air |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02294498A true JPH02294498A (en) | 1990-12-05 |
Family
ID=14599948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11296489A Pending JPH02294498A (en) | 1989-05-02 | 1989-05-02 | Method for removing air in preliminary chamber of apparatus for treatment in gas other than air |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02294498A (en) |
-
1989
- 1989-05-02 JP JP11296489A patent/JPH02294498A/en active Pending
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