JPH02284857A - Curved surface polishing method - Google Patents
Curved surface polishing methodInfo
- Publication number
- JPH02284857A JPH02284857A JP10388789A JP10388789A JPH02284857A JP H02284857 A JPH02284857 A JP H02284857A JP 10388789 A JP10388789 A JP 10388789A JP 10388789 A JP10388789 A JP 10388789A JP H02284857 A JPH02284857 A JP H02284857A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polisher
- curved surface
- workpiece
- arrow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims description 16
- 235000013290 Sagittaria latifolia Nutrition 0.000 abstract 5
- 235000015246 common arrowhead Nutrition 0.000 abstract 5
- 230000000694 effects Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、光学ガラスレンズ、金型等の曲面研磨方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for polishing curved surfaces of optical glass lenses, molds, etc.
従来の技術
光学部品、特に光学ガラスレンズやミラー、射出成形を
行う場合必要な金型等の高精度・高品位な仕上げ面を得
るために、高能率・高品位な曲面研磨方法が要望されて
いる。Conventional technology In order to obtain high-precision, high-quality finished surfaces for optical components, especially optical glass lenses and mirrors, and molds required for injection molding, there is a need for a highly efficient and high-quality curved surface polishing method. There is.
以下、図面を参照しながら、上述した従来の曲面研磨方
法の一例について説明する。An example of the conventional curved surface polishing method described above will be described below with reference to the drawings.
第２図は従来の曲面研磨方法を示すものである。第２図
（ａ）において、１は被加工物、２は研磨ポリシャーで
あり、研磨ポリシャー２は研磨治具３に貼付けられてい
る。４は研磨押付はビンで、圧力治具５により加圧力は
変化させられる。６は研磨軸ハウジングである。FIG. 2 shows a conventional curved surface polishing method. In FIG. 2(a), 1 is a workpiece, 2 is a polisher, and the polisher 2 is attached to a polishing jig 3. In FIG. Reference numeral 4 indicates a polishing press bottle, and the pressure jig 5 changes the pressing force. 6 is a polishing shaft housing.
以上のように構成された曲面研磨方法について、以下そ
の研磨方法について説明する。The curved surface polishing method configured as above will be described below.
被加工物１はＣ方向に１０〜１１０００ｒｐの低速で回
転し、更に前記被加工物１の回転抵抗により研磨治具３
に貼付けられた研磨ポリシャー２もＣ方向に回転する。The workpiece 1 rotates in the C direction at a low speed of 10 to 11,000 rpm, and the polishing jig 3 rotates due to the rotational resistance of the workpiece 1.
The polishing polisher 2 attached thereto also rotates in the C direction.
そして、被加工物１の半径方向矢印す方向に所定の曲面
形状をたどるように、かつ研磨ポリシャー２が常に形状
曲面に垂直になるように移動させて研磨を行う。この時
の研磨ポリシャー２の移動軌跡は同図（ｂ）の矢印ｄの
如くなる。Then, polishing is performed by moving the workpiece 1 so as to follow a predetermined curved shape in the radial direction of the workpiece 1 and so that the polishing polisher 2 is always perpendicular to the curved surface. The movement locus of the polisher 2 at this time is as indicated by the arrow d in FIG. 2(b).
発明が解決しようとする課題
しかしながら上記のような方法では、被加工物１の半径
方向（矢印す方向）の位置により加工周速度が異なるた
め、研磨量が半径方向に対して均一とならず、また研磨
量も少ないため加工時間が長い。更に、研磨ポリシャー
２を曲面形状に沿って滑らかに移動させないと、研磨面
にリップルが生じるなど、最終仕上げ面が得錐いという
問題点を有していた。Problems to be Solved by the Invention However, in the above method, since the machining peripheral speed differs depending on the position of the workpiece 1 in the radial direction (in the direction of the arrow), the amount of polishing is not uniform in the radial direction. Also, since the amount of polishing is small, the processing time is long. Furthermore, unless the polishing polisher 2 is moved smoothly along the curved surface shape, ripples occur on the polished surface, resulting in an unsatisfactory final finished surface.
本発明は上記問題点に鑑み、加工時間を短縮し、また、
全加工域の研磨量を均一に滑らかにするこきにより、高
精度・高品位な最終曲面形状を仕上げる曲面研磨方法を
提供するものである。In view of the above problems, the present invention shortens processing time, and
The present invention provides a curved surface polishing method that finishes a final curved surface shape with high precision and high quality by uniformly and smoothly polishing the entire processing area.
課題を解決するための手段
上記問題点を解決するために本発明の曲面研磨方法は、
研磨ポリシャーを常に加工面に垂直になるように配し、
かつ前記研磨ポリシャーを、加工面上を２軸方向に自由
な形状・大きさの運動軌跡を描きながら所定の曲面形状
をたどるように移動させ研磨する方法である。Means for Solving the Problems In order to solve the above problems, the curved surface polishing method of the present invention includes:
Always place the polisher perpendicular to the processing surface,
In this method, the polishing polisher is moved along a predetermined curved surface shape while drawing a movement locus of free shape and size in two axial directions on the surface to be processed.
作 用
本発明は上記した方法によって、研磨ポリシャーの運動
軌跡を２軸制御し、例えば円状・だ円状に自由にコント
ロールすることにより、研磨量を太き（研磨面を高精度
に滑らかにし、加工時間の短縮が図れ、高精度で高品位
な最終仕上げ面が得られる。Function The present invention uses the method described above to control the locus of motion of the polisher on two axes and freely control it, for example, in a circular or elliptical shape, thereby increasing the amount of polishing (making the polished surface smooth with high precision). , machining time can be shortened, and a high-precision, high-quality final finished surface can be obtained.
実施例
以下本発明の実施例について、図面を参照しながら説明
する。EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings.
第１図は本発明の実施例における曲面研磨方法を示すも
のである。第１図（ａ）、 （ｂ）、 （Ｃ）において
、７は被加工物であり、８は研磨治具９に貼付けられた
研磨ポリシャーである。１０は研磨押付はビンであり、
圧力治具１１により加圧力は変化させられる。１２は研
磨軸ハウジングである。さらに、１３・１４は研磨軸ハ
ウジング１２を２軸方向に駆動させる圧電素子であり、
１５は圧電素子１３．１４を制御するコントローラーで
ある。FIG. 1 shows a curved surface polishing method in an embodiment of the present invention. In FIGS. 1A, 1B, and 1C, 7 is a workpiece, and 8 is a polisher attached to a polishing jig 9. In FIGS. 10 is a polishing press bottle,
The pressing force is changed by the pressure jig 11. 12 is a polishing shaft housing. Furthermore, 13 and 14 are piezoelectric elements that drive the polishing shaft housing 12 in two axial directions,
15 is a controller that controls the piezoelectric elements 13 and 14.
以上のように構成された曲面研磨方法について、以下第
１図（ａ）、 （ｂ）、 （Ｃ）を用いてその方法を説
明する。The curved surface polishing method configured as described above will be explained below with reference to FIGS. 1(a), 1(b), and 1(C).
従来例と同様、まず、被加工物７は矢印ｅ方向に１０〜
１０００ ｒ ｐｍの低速で回転し、前記被加工物７の
回転抵抗により研磨治具９に貼付けられた研磨ポリシャ
ー８も矢印ｇ方向に回転する。As in the conventional example, first, the workpiece 7 is moved in the direction of the arrow e.
The polisher 8 rotates at a low speed of 1000 rpm, and due to the rotational resistance of the workpiece 7, the polisher 8 attached to the polishing jig 9 also rotates in the direction of arrow g.
更に、研磨軸ハウジング１２は、第１図（Ｃ）に示すよ
うに圧電素子１４により矢印ｉ方向に駆動させられ、圧
電素子１３により矢印１１方向にそれぞれ駆動させられ
る。圧電素子１３．１４は１５のコントローラーにより
制御されている。また、被加工物７の半径方向（矢印ｆ
方向）に所定の曲面形状をたどる如（移動し研磨を行な
う。この時、研磨ポリシャー８は常に形状曲面に垂直に
なる様に保たれている。研磨ポリシャー８の運動軌跡は
同図（ｂ）の矢印ｊの如く例えばだ円状軌跡を描（。ま
た、同図（ａ）のコントローラー１５により運動軌跡の
形状・大きさは同図（Ｃ）の矢印ｉ方向と矢印り方向に
自由に変化することができる。Furthermore, the polishing shaft housing 12 is driven by the piezoelectric element 14 in the direction of arrow i, and by the piezoelectric element 13 in the direction of arrow 11, as shown in FIG. 1(C). The piezoelectric elements 13,14 are controlled by 15 controllers. Also, in the radial direction of the workpiece 7 (arrow f
Polishing is performed by moving along a predetermined curved surface (direction).At this time, the polishing polisher 8 is always kept perpendicular to the curved surface.The locus of movement of the polishing polisher 8 is shown in the same figure (b). For example, an elliptical trajectory is drawn as shown by arrow j in the figure (.Also, the shape and size of the movement trajectory can be freely changed in the direction of arrow i and in the direction of the arrow in figure (C) using the controller 15 in figure (a). can do.
以上のように本実施例によれば、圧電素子１３１４によ
り研磨ポリシャー８の運動軌跡を加工面上２軸方向く矢
印ｉ方向と矢印り方向）に自由な形状・大きさに制御す
ることにより、研磨量が大きく高精度に加工され、非常
に滑らかな曲面を得ることができる。As described above, according to this embodiment, the piezoelectric element 1314 controls the locus of movement of the polisher 8 in two axes on the processing surface (in the direction of the arrow i and in the direction of the arrow), so that The amount of polishing is large and the process is performed with high precision, making it possible to obtain extremely smooth curved surfaces.
なお、本発明の実施例において、研磨ポリシャー８は被
加工物７との回転抵抗により回転させたが、駆動モータ
ーにて回転させてもよい。In the embodiment of the present invention, the polisher 8 was rotated by rotational resistance with the workpiece 7, but it may be rotated by a drive motor.
発明の効果
以上のように本発明は、研磨ポリシャーを常に加工面に
垂直になるように配し、この研磨ポリシャーの運動軌跡
を加工面上２軸方向に自由な形状・大きさに描かせなが
ら、所定の曲面形状をたどる如く移動させることにより
、研磨量を太き（かつ均一とし、研磨時間が短縮され、
高精度で高品位な最終仕上げ面を得ることができるとい
う特有の効果がある。Effects of the Invention As described above, the present invention allows the polisher to be arranged perpendicularly to the processing surface, and to draw the locus of movement of the polisher in a free shape and size in two axial directions on the processing surface. , by moving it so as to follow a predetermined curved surface shape, the amount of polishing becomes thick (and uniform), the polishing time is shortened,
It has the unique effect of being able to obtain a final finished surface with high precision and high quality.
第１図（ａ）は本発明の実施例における概略構成の正面
図、同図（ｂ）は同実施例の研磨ポリシャーの運動軌跡
を示す平面図、同図（Ｃ）は同図（ａ）のＣ矢視図、第
２図（ａ）は従来の曲面研磨方法における概略構成の正
面図、同図（ｂ）はその研磨ポリシャーの運動転跡を示
す平面図である。
７・・・・・・被加工物、８・・・・・・研磨ポリシャ
ー、１３゜１４・・・・・・圧電素子。
代理人の氏名 弁理士 粟野重孝 ほか１名７− 汲カ
ロエ□
８−一一石予々７丁ソシ７−FIG. 1(a) is a front view of a schematic configuration according to an embodiment of the present invention, FIG. 1(b) is a plan view showing the locus of movement of the polishing polisher of the same embodiment, and FIG. FIG. 2(a) is a front view of a schematic configuration in a conventional curved surface polishing method, and FIG. 2(b) is a plan view showing the movement trajectory of the polisher. 7...Workpiece, 8...Polishing polisher, 13°14...Piezoelectric element. Name of agent Patent attorney Shigetaka Awano and 1 other person 7- Karoe Kumi 8- 11 Koku Yozen 7 Cho Soshi 7-
Claims (1)
かつ前記研磨ポリシャーを、加工面上を２軸方向に自由
な形状・大きさの運動軌跡を描きながら所定の曲面形状
をたどるように移動させて研磨することを特徴とする曲
面研磨方法。Always place the polisher perpendicular to the processing surface,
A curved surface polishing method characterized in that the polishing polisher is polished by moving the polishing polisher along a predetermined curved surface shape while drawing a motion locus of a free shape and size in two axial directions on the surface to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10388789A JPH02284857A (en) | 1989-04-24 | 1989-04-24 | Curved surface polishing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10388789A JPH02284857A (en) | 1989-04-24 | 1989-04-24 | Curved surface polishing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02284857A true JPH02284857A (en) | 1990-11-22 |
Family
ID=14365941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10388789A Pending JPH02284857A (en) | 1989-04-24 | 1989-04-24 | Curved surface polishing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02284857A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105479295A (en) * | 2015-12-09 | 2016-04-13 | 中国科学院长春光学精密机械与物理研究所 | Generating method of polishing path with function of error normalization |
| CN110732970A (en) * | 2019-11-28 | 2020-01-31 | 中国科学院长春光学精密机械与物理研究所 | grinding head for flexibly controlled grinding and polishing |
-
1989
- 1989-04-24 JP JP10388789A patent/JPH02284857A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105479295A (en) * | 2015-12-09 | 2016-04-13 | 中国科学院长春光学精密机械与物理研究所 | Generating method of polishing path with function of error normalization |
| CN110732970A (en) * | 2019-11-28 | 2020-01-31 | 中国科学院长春光学精密机械与物理研究所 | grinding head for flexibly controlled grinding and polishing |
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