JPH02284601A - Method and glass vessel for preventing bumping - Google Patents

Method and glass vessel for preventing bumping

Info

Publication number
JPH02284601A
JPH02284601A JP10635889A JP10635889A JPH02284601A JP H02284601 A JPH02284601 A JP H02284601A JP 10635889 A JP10635889 A JP 10635889A JP 10635889 A JP10635889 A JP 10635889A JP H02284601 A JPH02284601 A JP H02284601A
Authority
JP
Japan
Prior art keywords
bubbles
quartz glass
microbubbles
bumping
thin plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10635889A
Other languages
Japanese (ja)
Other versions
JP2925576B2 (en
Inventor
Kazuo Sato
和男 佐藤
Masaru Oyamada
小山田 優
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON SEKIEI GLASS KK
Original Assignee
NIPPON SEKIEI GLASS KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON SEKIEI GLASS KK filed Critical NIPPON SEKIEI GLASS KK
Priority to JP1106358A priority Critical patent/JP2925576B2/en
Publication of JPH02284601A publication Critical patent/JPH02284601A/en
Application granted granted Critical
Publication of JP2925576B2 publication Critical patent/JP2925576B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Joining Of Glass To Other Materials (AREA)

Abstract

PURPOSE:To transform ebullient bubbles into stabilized superfine bubbles and to completely prevent bumping by welding a thin sheet cut out from a quartz glass ingot having fine bubbles to the surface of a glass device. CONSTITUTION:The thin sheet 3 is cut out from a quartz glass ingot 1 contg. fine bubbles having 100-500mu diameter at 100-200 units/cm<2> fine bubble distribution density. The sheet 3 is welded to a glass device 2 to provide uniform ruggednesses on the surface. Namely, since the fine bubbles in quartz glass are opened to form the rugged surface, uniform ruggednesses can be surely and easily formed on the surface of the glass device 2 by controlling the sizes and distribution density of the bubbles. Consequently, the ebullient bubbles in the device 2 are transformed into the stabilized superfine bubbles, and bumping can be completely prevented.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体プロセスにおいて使用される石英ガラ
ス製の洗浄槽、高純度を必要とされる洗浄槽の突沸防止
に関し、さらに具体的には、半導体プロセスにおけるウ
ェハーの洗浄槽、理化学関係の洗浄槽および、蒸留器な
どの突沸防止に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to the prevention of bumping in cleaning tanks made of quartz glass used in semiconductor processes and cleaning tanks that require high purity. , related to the prevention of bumping in wafer cleaning tanks in semiconductor processes, physical and chemical cleaning tanks, distillers, etc.

[従来の技術] 従来、ガラス容器の突沸防止にはガラス容器の底部にビ
ー玉や沸石などを入れたり、または、ガラス容器底面に
石英ガラス粒子を溶着したものが知られている。
[Prior Art] Conventionally, it has been known to prevent bumping in glass containers by placing marbles, zeolite, etc. in the bottom of the glass container, or by welding quartz glass particles to the bottom of the glass container.

さらには、特開昭62−234554には、容器底面を
シコットプラス1へによって凹凸状にして突沸を防止す
ることが開示されている。
Furthermore, Japanese Patent Application Laid-Open No. 62-234554 discloses that the bottom surface of the container is made uneven by using Cicotte Plus 1 to prevent bumping.

[発明が解決しようとする課題] ビー玉や沸石などを容器内に入れるものは、結果的に、
ガラス容器内に不純物を投入していることになり、高純
度を要求される半導体プロセスにおいて、汚染の原因と
なっていた。
[Problem to be solved by the invention] As a result, containers containing marbles, zeolites, etc.
This means that impurities are introduced into the glass container, causing contamination in semiconductor processes that require high purity.

また、容器底部に石英ガラス粒子を溶着しだものは、使
用を重ねるにしたがって石英ガラス粒子が剥離し、容器
内の溶液、薬液に混入してしまうという問題があった。
In addition, in cases where quartz glass particles are welded to the bottom of the container, there is a problem in that the quartz glass particles peel off with repeated use and become mixed into the solution or chemical solution in the container.

さらに、容器底面を凹凸にするものは、凹凸を均一に形
成することは、簡単でなく、面倒であった。
Furthermore, in cases where the bottom surface of the container is uneven, it is not easy and troublesome to form the unevenness uniformly.

[課題を解決するための手段] 微細な泡(微泡)を有する石英ガラスインゴットから薄
板を切り出し、この薄板をガラス機器に溶着し、表面に
−様な凹凸を設けることによって前記問題点を解決した
[Means for solving the problem] The above problem is solved by cutting out a thin plate from a quartz glass ingot having microbubbles (microbubbles), welding this thin plate to a glass device, and providing a --like unevenness on the surface. did.

また、微泡を有する石英ガラス薄板部分を研磨すること
によって全ての微泡を表面側に開放し、表面に微細な凹
凸を設けた。
In addition, by polishing the quartz glass thin plate portion having microbubbles, all the microbubbles were released to the surface side, and fine irregularities were created on the surface.

[作用] 一定圧力の下で、液体が一定温度に達すると、液体表面
からの蒸発のほか液体内部からも気化し始める。この現
象が沸騰である。液体が加熱される面が凹凸面であると
、凹凸面において、局部的な熱の集中が生じ、液体粒子
の熱運動が活発になり、その結果、各凹凸面から気化が
生じて細かい気泡が発生するものと推測される。
[Operation] When a liquid reaches a certain temperature under a constant pressure, vaporization begins not only from the surface of the liquid but also from within the liquid. This phenomenon is boiling. When the surface on which the liquid is heated is uneven, local heat concentration occurs on the uneven surface, and the thermal movement of the liquid particles becomes active.As a result, vaporization occurs from each uneven surface and fine bubbles are formed. It is assumed that this will occur.

したがって、ガラス容器底部に溶着した微細な泡入り石
英ガラ人薄板の表面の凹凸が沸騰状態に伴う気泡を微細
な気泡に変えるので突沸が防止される。また、石英ガラ
ス薄板が石英ガラス容器底部に面で完全に溶着されてい
るので使用中に剥離するということも無く、また、表面
の凹凸は、微泡を開放したものであり、微泡の大きさや
分布密度を適切な範囲で選択することができるので、表
面の凹凸を均一なものに仕上げることができる。
Therefore, the unevenness on the surface of the fine bubble-filled quartz glass thin plate welded to the bottom of the glass container converts the bubbles associated with the boiling state into fine bubbles, thereby preventing bumping. In addition, since the quartz glass thin plate is completely welded to the bottom of the quartz glass container, it will not peel off during use, and the unevenness on the surface is due to the release of microbubbles, and the size of the microbubbles Since the sheath distribution density can be selected within an appropriate range, the surface can be finished with uniform surface irregularities.

微泡の発生は、ガラス表面の凹凸部に付着した気泡がま
ず、解放されて泡の核となり、この気泡の内部に液体が
更に気化して安定した微細な気泡になる。したがって、
凹凸を構成する微泡の大きさが500μmより大きくな
ると、沸騰時において液体内部よりの発生気泡が大きく
なり、また、核となる泡の発生数が少なくなるため、液
面において飛沫を生じるようになり、安定した微細な気
泡を生じさせて突沸を防止するという目的に沿わなくな
る。また、1100ILより小さいと、ガラス表面の凹
凸部に付着した気泡が解放されにくくなり、過熱状態と
なり、突沸を生じ易くなる。
In the generation of microbubbles, the bubbles attached to the uneven portions of the glass surface are first released and become bubble nuclei, and the liquid inside these bubbles further evaporates to form stable fine bubbles. therefore,
If the size of the microbubbles that make up the unevenness is larger than 500 μm, the bubbles generated from inside the liquid will become larger during boiling, and the number of core bubbles will decrease, causing droplets to form on the liquid surface. This defeats the purpose of generating stable fine bubbles and preventing bumping. On the other hand, if it is smaller than 1100 IL, it becomes difficult for bubbles attached to the uneven portions of the glass surface to be released, resulting in an overheated state and a tendency to cause bumping.

したがって、凹凸の大きさを適切に制御する必要があり
、石英ガラスに混入させる微泡の大きさは100〜50
0μmが好ましい。
Therefore, it is necessary to appropriately control the size of the unevenness, and the size of the microbubbles mixed into the quartz glass is 100 to 50.
0 μm is preferred.

また泡の密度は100〜200個/dが好ましし1゜ [実施例] 実施例1 図1において、石英ガラス製の角樽に本発明を適用した
例を示す。
The density of the bubbles is preferably 100 to 200 bubbles/d, and is 1° [Example] Example 1 In FIG. 1, an example in which the present invention is applied to a square barrel made of quartz glass is shown.

まず、微細な泡を有する石英ガラスのインゴット1を用
意する。このインゴット1は、内部に微細な泡を有して
いる。この泡の大きさは100〜500μmであり、泡
の密度は100〜200個/cm2である。
First, a quartz glass ingot 1 having fine bubbles is prepared. This ingot 1 has fine bubbles inside. The size of the bubbles is 100 to 500 μm, and the density of the bubbles is 100 to 200 bubbles/cm 2 .

このインゴット1を突沸防止具を設ける石英ガラス容器
2の形状に合わせて厚さ1〜1.5am。
The thickness of this ingot 1 is 1 to 1.5 am, depending on the shape of the quartz glass container 2 in which the bumping prevention device is provided.

幅10〜15−にダイヤモンドカッタで切断し。Cut with a diamond cutter to a width of 10 to 15 mm.

薄板3とする。このインゴットからの切り出しによって
微泡の多くは切断され、石英ガラス薄板の表面で微泡は
開放され、薄板表面は微細な凹凸面を形成している。
Let it be thin plate 3. By cutting out the ingot, most of the microbubbles are cut, and the microbubbles are opened on the surface of the quartz glass thin plate, forming a finely uneven surface on the thin plate surface.

そして、石英ガラス容器2の底板4を構成する石英ガラ
ス板材とインゴットから切り出した微泡入り石英ガラス
薄板3の接合面を超音波洗浄機内に純水と陰イオン系界
面活性剤1〜2%加えた溶液で20分間、約30℃で洗
浄する。水洗後、フッ化水素(HF)5〜10%溶液に
10分間浸漬し、さらに、蒸留水で洗浄し、乾燥する。
Then, pure water and 1 to 2% of anionic surfactant were added to the joint surface of the quartz glass plate material constituting the bottom plate 4 of the quartz glass container 2 and the microfoamed quartz glass thin plate 3 cut out from the ingot into an ultrasonic cleaner. Wash with the solution for 20 minutes at about 30°C. After washing with water, it is immersed in a 5-10% hydrogen fluoride (HF) solution for 10 minutes, further washed with distilled water, and dried.

次に、空気を助燃剤とした水素炎で3分間この薄板3と
石英ガラス板4を焼く。
Next, the thin plate 3 and the quartz glass plate 4 are baked for 3 minutes in a hydrogen flame using air as a combustion aid.

そこで、石英ガラス板4に微細な泡を有する薄板3を載
せ、バーナーから酸水素炎を出して薄板3の端部から徐
々に火力を強くし完全に溶着をおこなう。
Therefore, a thin plate 3 having fine bubbles is placed on a quartz glass plate 4, and an oxyhydrogen flame is emitted from a burner, and the heating power is gradually increased from the end of the thin plate 3 to complete welding.

このままでも突沸防止には充分であるが、薄板3の表面
の凹凸を全面にわたってしかも均一に設けたい場合には
、冷却後、微細な泡を有する薄板3部分を残して、ビニ
ールや紙などでマスキングをおこない、空気圧2 kg
/、fflで炭化珪素の微粒子(#30砥粒)で薄板表
面を研磨する。すると、薄板3の表面近傍の泡は表面側
で開放され、表面に−様な凹凸が形成される。
This is sufficient to prevent bumping, but if you want to make the unevenness on the surface of the thin plate 3 uniform over the entire surface, mask it with vinyl or paper after cooling, leaving the part of the thin plate 3 that has fine bubbles. and the air pressure is 2 kg.
The surface of the thin plate is polished with silicon carbide fine particles (#30 abrasive grains) at /, ffl. Then, the bubbles near the surface of the thin plate 3 are released on the surface side, and -like unevenness is formed on the surface.

研磨手段は、サンドブラストによらず、他の手段、例え
ば、砥石による研削によっても同等の効果が得られる。
As for the polishing means, the same effect can be obtained not only by sandblasting but also by other means such as grinding with a grindstone.

また、研磨は、薄板を溶着する前に予めおこなっておい
ても良い。
Further, polishing may be performed in advance before welding the thin plates.

このようにして得られた底抜を用いて図に示す角樽を作
成する。
The square barrel shown in the figure is made using the bottom cutout thus obtained.

この角樽を電熱ヒータで加熱したところ、沸騰状態にな
ると微細な気泡が凹凸を有する薄板部分から発生するの
みで突沸は起きなかった。
When this square barrel was heated with an electric heater, when it reached a boiling state, only fine bubbles were generated from the uneven thin plate part, but no bumping occurred.

実施例2 次に、ヒータ管に応用した例を図2で説明する。Example 2 Next, an example of application to a heater tube will be explained with reference to FIG.

円形のヒータ管5の表面に、前記の実施例と同様に、微
泡入り石英ガラスインゴット1から薄板3を切り出し、
超音波洗浄を実施する。そして。
On the surface of the circular heater tube 5, a thin plate 3 is cut out from the microfoamed quartz glass ingot 1 in the same manner as in the previous embodiment.
Perform ultrasonic cleaning. and.

薄板3をヒータ管5表面に載せ、酸水素炎を適用すると
、薄板3は、熱によって軟化してヒータ管5の曲面に合
致するように曲がり、そして溶着される。次に、前記の
実施例と同様にマスキングをおこなってサンドブラスト
で薄板3の表面のみを研磨し、表面近傍の気泡を開放し
、表面に均一な凹凸面を形成する。
When the thin plate 3 is placed on the surface of the heater tube 5 and an oxyhydrogen flame is applied, the thin plate 3 is softened by heat, bent to match the curved surface of the heater tube 5, and then welded. Next, masking is performed in the same manner as in the previous embodiment, and only the surface of the thin plate 3 is polished by sandblasting to release air bubbles near the surface and form a uniform uneven surface on the surface.

このヒータ管5を使用して純水を加熱したところ前記の
実施例同様、沸騰状態になると微細な気泡が凹凸面を有
する薄板3から発生し、突沸は起きなかった。このヒー
タ管によって液体を突沸を発生させることなく加熱する
ことが可能となった。
When pure water was heated using this heater tube 5, as in the previous example, when it reached a boiling state, fine bubbles were generated from the thin plate 3 having an uneven surface, but no bumping occurred. This heater tube made it possible to heat the liquid without causing bumping.

[効果コ 以上のように、本発明によれば、石英ガラスの微泡を開
放して表面に凹凸面を形成するので、泡の大きさや、分
布密度を制御することによってガラス機器の表面に−様
な凹凸を確実にまた簡単に得ることができ、沸騰状態の
気泡を安定した極微細な気泡の発生に変換し、突沸を完
全に防止することが可能となった。
[Effects] As described above, according to the present invention, the microbubbles of quartz glass are released to form an uneven surface on the surface. It has become possible to reliably and easily obtain various irregularities, convert boiling bubbles into stable generation of extremely fine bubbles, and completely prevent bumping.

また、ガラス機器の表面に微泡を有する薄板が完全に面
で溶着されているので使用中に従来の突沸防止具のよう
に剥離してくるというようなことはなくなった。
In addition, since the thin plate with microbubbles is completely welded to the surface of the glass equipment, there is no possibility of it peeling off during use, unlike conventional bumping prevention devices.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、角樽に本願発明を適用した例を示す斜視図で
ある。 第2図は、ヒータ管に本願発明を適用した例を示す斜視
図である。 1:微泡を有する石英ガラスインゴット2:石英ガラス
容器 3:薄板 4:石英ガラス容器の底抜 5:ヒータ管 M 1 図 特許出願人 日本石英硝子株式会社
FIG. 1 is a perspective view showing an example in which the present invention is applied to a square barrel. FIG. 2 is a perspective view showing an example in which the present invention is applied to a heater tube. 1: Quartz glass ingot with microbubbles 2: Quartz glass container 3: Thin plate 4: Bottoming of quartz glass container 5: Heater tube M 1 Figure Patent applicant Nippon Quartz Glass Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] (1)ガラス機器の表面に、微泡を有する石英ガラスイ
ンゴットから切り出した薄板を溶着することを特徴とす
る突沸防止方法。
(1) A bumping prevention method characterized by welding a thin plate cut from a quartz glass ingot having microbubbles to the surface of a glass device.
(2)微泡の直径が100〜500μmであり、微泡の
分布密度が100〜200個/cm^2である特許請求
の範囲第1項の突沸防止方法。
(2) The bumping prevention method according to claim 1, wherein the diameter of the microbubbles is 100 to 500 μm, and the distribution density of the microbubbles is 100 to 200 pieces/cm^2.
(3)微泡を有する石英ガラス薄板部分のみを研磨して
微泡を表面側において開放する特許請求の範囲第1項ま
たは第2項の突沸防止方法。
(3) The method for preventing bumping according to claim 1 or 2, in which only the portion of the thin silica glass plate having microbubbles is polished to release the microbubbles on the surface side.
(4)表面側に開放された直径100〜500μmの微
泡が分布密度100〜200個/cm^2で分布してい
る石英ガラス薄板が、底面に溶着されている石英ガラス
容器。
(4) A quartz glass container in which a thin quartz glass plate in which microbubbles with a diameter of 100 to 500 μm, which are open to the surface side, are distributed at a distribution density of 100 to 200 pieces/cm^2 is welded to the bottom surface.
JP1106358A 1989-04-26 1989-04-26 Anti-bump method and anti-bump glass container Expired - Fee Related JP2925576B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1106358A JP2925576B2 (en) 1989-04-26 1989-04-26 Anti-bump method and anti-bump glass container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1106358A JP2925576B2 (en) 1989-04-26 1989-04-26 Anti-bump method and anti-bump glass container

Publications (2)

Publication Number Publication Date
JPH02284601A true JPH02284601A (en) 1990-11-22
JP2925576B2 JP2925576B2 (en) 1999-07-28

Family

ID=14431531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1106358A Expired - Fee Related JP2925576B2 (en) 1989-04-26 1989-04-26 Anti-bump method and anti-bump glass container

Country Status (1)

Country Link
JP (1) JP2925576B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0688587A3 (en) * 1994-06-21 1996-04-10 Eppendorf Geraetebau Netheler Process and system for quantitative enrichment of volatile compounds by capillary distillation
CN105084444A (en) * 2014-05-10 2015-11-25 程长青 Vacuum seawater desalination boiling facilitating device
JP2017170285A (en) * 2016-03-18 2017-09-28 公立大学法人首都大学東京 Minute bubble generation plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6388328A (en) * 1986-09-30 1988-04-19 Nissan Motor Co Ltd Torque transmitter

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6388328A (en) * 1986-09-30 1988-04-19 Nissan Motor Co Ltd Torque transmitter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0688587A3 (en) * 1994-06-21 1996-04-10 Eppendorf Geraetebau Netheler Process and system for quantitative enrichment of volatile compounds by capillary distillation
CN105084444A (en) * 2014-05-10 2015-11-25 程长青 Vacuum seawater desalination boiling facilitating device
JP2017170285A (en) * 2016-03-18 2017-09-28 公立大学法人首都大学東京 Minute bubble generation plate

Also Published As

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