JPH02271302A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPH02271302A
JPH02271302A JP1093892A JP9389289A JPH02271302A JP H02271302 A JPH02271302 A JP H02271302A JP 1093892 A JP1093892 A JP 1093892A JP 9389289 A JP9389289 A JP 9389289A JP H02271302 A JPH02271302 A JP H02271302A
Authority
JP
Japan
Prior art keywords
glass substrate
parts
layer
color filter
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1093892A
Other languages
Japanese (ja)
Inventor
Toru Sasaya
亨 笹谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP1093892A priority Critical patent/JPH02271302A/en
Publication of JPH02271302A publication Critical patent/JPH02271302A/en
Pending legal-status Critical Current

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  • Optical Filters (AREA)

Abstract

PURPOSE:To improve quality and to obtain the production process for the color filter which is excellent in mass productivity and can deal with the trend toward the larger sizes of panels by etching the unnecessary parts of a plating layer formed by an electroless plating method on a glass substrate and forming light shielding layers, then forming filter parts. CONSTITUTION:The nickel plating layer 6 is formed by the electroless plating method on the glass substrate 1 and thereafter, a photoresist is applied thereon to form the resist layer 7, following which the resist layer is subjected to the patterning treatment of exposing and developing by using a photomask 8. After the nickel plating layer 6 of the parts not coated with the resist layer 7 is etched, the resist layer 7 is removed to form the prescribed light shielding layers 2. A dye substrate 10 is applied on such glass substrate 1 and only the parts to be dyed are exposed by using a mask 11 having light transmittability and is thereby photoset. The dye substrate 10 in the other parts is etched and thereafter, the dye substrate 10 is dyed to form the filter parts 3. Filter parts 4, 5 are similarly and successively formed, by which the color filter is produced.

Description

【発明の詳細な説明】 主栗上皇五里分夏 本発明は、カラー液晶表示装置に用いられるカラーフィ
ルタの製造方法に関し、特にカラーフィルタの光遮蔽層
の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a color filter used in a color liquid crystal display device, and more particularly to a method of manufacturing a light shielding layer of a color filter.

l米生肢歪 上記カラーフィルタの光遮蔽層は、一般に、スパッタリ
ング法或いは染色法により作成していた。
1. Rice Limb Distortion The light-shielding layer of the above-mentioned color filter is generally produced by a sputtering method or a dyeing method.

上記スパッタリング法は、ターゲットである被膜用金属
(クロム)を陰極として真空中でガス放電させる。これ
により、クロムの表面にイオンが衝突してクロムの霧が
発生し、これがガラスの表面に凝着するので、ガラスの
表面にクロム層を形成することができる。
In the sputtering method, gas discharge is performed in a vacuum using a coating metal (chromium) as a target as a cathode. As a result, ions collide with the chromium surface to generate chromium mist, which adheres to the glass surface, thereby forming a chromium layer on the glass surface.

一方、上記染色法は、ガラス基板上にスピナー法等によ
りフォトレジストを塗布した後、マスクを用いてパター
ン形成を行い、しかる後黒色の染料の水溶液に浸漬する
ことにより作製するものである。
On the other hand, the dyeing method described above involves applying a photoresist onto a glass substrate using a spinner method or the like, forming a pattern using a mask, and then immersing the photoresist in an aqueous solution of a black dye.

II<シよ°と る量 しかしながら、上記スパッタリング法では、高電圧を必
要とする等の理由によりスパッタリング装置が複雑化す
るため、スパッタリング空間を大きくすることができな
い、このため、パネルの大型化に対応することができず
、且つ大量に処理できないので量産性に劣る。加えて、
操作が複雑となり、更に高電圧が必要となるので設置場
所が限定される。
II Since it cannot be handled in large quantities and cannot be processed in large quantities, mass productivity is poor. In addition,
Since the operation is complicated and high voltage is required, installation locations are limited.

一方、上記染色法では、十分な光遮蔽性を得るためには
光遮蔽層をカラーフィルタ部より厚くする必要が生じる
いこのため、−上記カラーフィルタに配向膜を塗布して
液晶セルを作製した場合に、液晶層のギヤツブが不均一
となって、表示ムラが生じるという課題を有していた、 そこで、本発明は上記課題を考慮してなされたものであ
り、品質の向りを図ると共に、イ・産性に優れ、且つパ
ネルの大型化にも十分に対応1〜・うるカラーフィルタ
の製造方法の徒供を[1的とする。
On the other hand, in the above dyeing method, in order to obtain sufficient light-shielding properties, it is necessary to make the light-shielding layer thicker than the color filter part. Therefore, a liquid crystal cell was fabricated by coating the above-mentioned color filter with an alignment film. In some cases, the gearing of the liquid crystal layer becomes non-uniform, resulting in uneven display.The present invention has been made in consideration of the above-mentioned problems, and aims to improve quality. 1. A method for manufacturing a color filter that is excellent in productivity and sufficiently compatible with larger panels.

1糧奎−解−決jレタだ!り乃工段 ]二記目的を達成するため本発明は、無電解メッキ法に
よりガラス基板上にメッキ層を作成する第1ステップと
、上記メッキ層の不要部をエツチングして光遮蔽層を形
成する第2ステップと、上記光遮蔽層形成基板上にフィ
ルタ部を形成する第3ステップとを有することを特徴と
する。
1st ration - solution - resolution j letter! Rino Kodan] In order to achieve the second object, the present invention includes a first step of creating a plated layer on a glass substrate by electroless plating, and etching unnecessary parts of the plated layer to form a light shielding layer. The method is characterized by comprising a second step and a third step of forming a filter section on the light shielding layer forming substrate.

作−m−、川。Saku-m-, Kawa.

上記製造方法であれば、無電解メンキ用の浴槽を用いる
だけで光遮蔽層を構成するメッキ層を作製することがで
きる。
With the above manufacturing method, the plating layer constituting the light shielding layer can be manufactured simply by using a bathtub for electroless waxing.

ここで、上記浴槽は大型化が容易であるので5゜液晶パ
ネルの大型化にも十分対応することができ、且・つ−度
に大塑の処理が行うことができるので量産性に富む。
Here, since the bathtub can be easily increased in size, it can sufficiently cope with an increase in the size of a 5° liquid crystal panel, and it can be mass-produced because large plastics can be treated at one time.

また、上記製造h゛法で作製した光遮蔽層は薄くて十分
な光遮蔽性を得ることができるので、液晶セルを作製し
た場合に5.液晶層のギャップが不均一とならず、表示
ムラが生じることがない。
In addition, the light shielding layer produced by the above manufacturing method is thin and can obtain sufficient light shielding properties, so when a liquid crystal cell is produced, 5. The gap in the liquid crystal layer does not become nonuniform, and display unevenness does not occur.

加えて、浴槽に浸漬するだけでよいので操作も簡単とな
り、且つ高電圧を使用しないので設置場所が限定される
とい・うこともない。
In addition, it is easy to operate as it only needs to be immersed in a bathtub, and since high voltage is not used, there are no restrictions on where it can be installed.

実−8施−桝 本発明の一実施例を、第1図(a)〜(e)及び第2図
(a)〜(d)G:基づいて、以下に説明する。
EXAMPLE 8 An embodiment of the present invention will be described below based on FIGS. 1(a) to (e) and FIGS. 2(a) to (d)G.

本発明の方法により作製されたカラーフィルタは、第2
図(d)に示すように、ガラス基板1上にニッケルから
成る多数の光内蔽層2・・・が形成されている。−に記
光酋蔽層2・・・間におけるガラス基板1トには、赤の
フィルタ部3と緑のフィルタ部4と青のフィルタ部5と
が順に設けられている。
The color filter produced by the method of the present invention has a second
As shown in Figure (d), a large number of optically shielding layers 2 made of nickel are formed on a glass substrate 1. - A red filter section 3, a green filter section 4, and a blue filter section 5 are provided in this order on the glass substrate 1 between the light absorbing layers 2....

に記の構造を有するカラーフィルタは以下の如く製造さ
れる。
A color filter having the structure described above is manufactured as follows.

先ず、ガラス基板1の表面の洗浄と脱脂とを行−7た後
、ガラス基数1の表面を薬剤処理して膨潤させてガラス
基板1の表面調整を行う。これにより、ガラス基板1の
変形や成分粒子を正常に戻す(バルク状態にする)こと
ができる。次に、ガラス基板1を硫酸とクロム酸とに浸
漬1.てガラス基板1表面の親水性を向上させる9次い
で、ガラス基板lをフッ酸に浸漬してガラスのエツチン
グを行って、ガラス基板1の表面を多孔性にする。これ
によりガラス基板lにおけるコロイドやメッキの食いつ
き性能を向上させることができる。この後、ガラス基板
10表面を完全に洗浄した後、メッキを容易に析出させ
るべく、塩化第一スズと塩酸とによりガラス基板10表
面にスズイオ二1y・吸着さ・)えて感受性付与(セン
シタイザ〜)を行う。
First, the surface of the glass substrate 1 is cleaned and degreased (7), and then the surface of the glass substrate 1 is treated with a chemical to swell it to condition the surface of the glass substrate 1. Thereby, the deformation of the glass substrate 1 and the component particles can be returned to normal (put into a bulk state). Next, the glass substrate 1 is immersed in sulfuric acid and chromic acid. Improving the Hydrophilicity of the Surface of the Glass Substrate 1 9 Next, the glass substrate 1 is immersed in hydrofluoric acid to perform glass etching to make the surface of the glass substrate 1 porous. This makes it possible to improve the adhesion performance of colloids and plating on the glass substrate l. After that, after completely cleaning the surface of the glass substrate 10, in order to easily deposit plating, the surface of the glass substrate 10 is sensitized (sensitized) using stannous chloride and hydrochloric acid. I do.

しかる後、塩化パラジウムと塩酸とから成る溶液にガラ
ス基板1を浸漬してパラジウムを還元析出させ活性化(
アクナベータ)を行う。次いで、上記ガラス基板lを十
分に水洗する。この後、無電解ニッケルメッキを行って
、第1図(a)に示すように、ガラス基板1上にニッケ
ルメッキ層6を形成する。上記無電解ニッケルメッキで
は酸性浴(硫酸ニッケル溶液に還元剤としての次亜リン
酸すE・リウムを溶解させたもの)を使用する。また、
無電解ニッケルメッキを行う際には、pHや温度(90
〜95℃)の管理を十分に行う必要がある。
Thereafter, the glass substrate 1 is immersed in a solution consisting of palladium chloride and hydrochloric acid to reduce and precipitate palladium and activate it (
Acuna Beta). Next, the glass substrate 1 is thoroughly washed with water. Thereafter, electroless nickel plating is performed to form a nickel plating layer 6 on the glass substrate 1, as shown in FIG. 1(a). In the electroless nickel plating described above, an acid bath (in which E.lium hypophosphite as a reducing agent is dissolved in a nickel sulfate solution) is used. Also,
When performing electroless nickel plating, the pH and temperature (90
~95°C) must be adequately controlled.

次に、第1図(t))に示すよ・うに、上記ニッケルメ
ッキ層6上にホトレジス[・を塗布してレジスト層7を
形成した後、同図(c)に示すように、ホトマスク8を
用いて上記レジスト層7の必要部分のみを露光する。し
かる後、レジスト層7の現像を行、って、同図(d)に
示すよ・うに、レジスト層7のバク・−ンニングを行う
。この後、レジスト層7で覆われていない部位のニソゲ
ルメソギ層6のエツチングを行った後、レジスト層7の
除去を行う。これにより、同図(e)に示すように、所
定の光遮蔽層2・・・が作製される。
Next, as shown in FIG. 1(t), a resist layer 7 is formed by coating photoresist on the nickel plating layer 6, and then a photomask 8 is formed as shown in FIG. Then, only the necessary portions of the resist layer 7 are exposed. Thereafter, the resist layer 7 is developed, and then the resist layer 7 is back-toned as shown in FIG. Thereafter, the portions of the nisogel mesogel layer 6 not covered with the resist layer 7 are etched, and then the resist layer 7 is removed. As a result, a predetermined light shielding layer 2 . . . is produced as shown in FIG.

次に、上記光遮蔽層2・・・が形成されたガラス基板1
上に、以下の工程によりカラーフィルタを形成する。
Next, the glass substrate 1 on which the light shielding layer 2... is formed
A color filter is formed on top by the following steps.

先ず、第2図(a)に示すように、ガラス基板1上に、
光架橋性が付与されたゼラチン等の天然タンパク質から
成る染色基質10を塗布する。次に、同図(b)に示す
ように、透光性を有するマスク11を用いて染色すべき
部位のみ露光を行い上記染色基質10を光硬化させた後
、その他の部分の染色基[10のエツチングを行う、こ
れにより、同図(c)に示す所定のパターンが形成され
る。この後、上記所定のパターンが形成されたガラス基
板1を赤色の染料溶液中に浸漬して、染色基質10を染
色する。これにより、赤のフィルタ部3が形成される。
First, as shown in FIG. 2(a), on the glass substrate 1,
A dyeing substrate 10 made of a natural protein such as gelatin imparted with photo-crosslinking properties is applied. Next, as shown in FIG. 2B, only the area to be dyed is exposed to light using a light-transmitting mask 11 to photocure the dyeing substrate 10, and then the dyeing substrate [10 As a result, a predetermined pattern shown in FIG. 3(c) is formed. Thereafter, the glass substrate 1 on which the predetermined pattern is formed is immersed in a red dye solution to dye the dyed substrate 10. As a result, the red filter section 3 is formed.

しかる後、赤のフィルタ部3と同様の方法で緑のフィル
タ部4と青のフィルタ部5とを順に形成する。これによ
り、カラーフィルタが作製される。尚、上記縁のフィル
タ部4と青のフィルタ部5とを形成するにあたっては、
赤のフィルタ部3及び緑のフィルタ部4が染色されない
ように、各フィルタに防染処理を施しておく必要がある
Thereafter, a green filter section 4 and a blue filter section 5 are sequentially formed in the same manner as the red filter section 3. In this way, a color filter is produced. In addition, in forming the above-mentioned edge filter part 4 and blue filter part 5,
In order to prevent the red filter section 3 and the green filter section 4 from being dyed, it is necessary to apply anti-staining treatment to each filter.

光!Iと砺果 以上説明したように本発明によれば、液晶パネルの大型
化にも十分対応することができ、且つ一度に大量の処理
が行うことができるので量産性に富む、加えて、液晶層
のギャップが不均一とならないので表示ムラが生じず、
製品の品質を向上させることができる。更に、操作が前
便であるので操作性が向上し、且つ設置場所が限定され
ないので、流れ工程中の適所に配置することができ製造
効率を向上させることができる等の効果を奏する。
light! As explained above, according to the present invention, it is possible to sufficiently cope with the increase in the size of liquid crystal panels, and it is possible to process a large amount at once, making it highly suitable for mass production. Since the gaps between the layers are not uneven, display unevenness does not occur.
Product quality can be improved. Furthermore, since the operation is carried out beforehand, the operability is improved, and since the installation location is not limited, it can be placed at an appropriate position during the flow process, and it is possible to improve manufacturing efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(e)はガラス基板上に無電解ニッケル
メッキ法により光遮蔽層を形成する場合の工程図、第2
図(a)〜(d)は染色法によるカラーフィルタの製造
工程図である。 1・・・ガラス基板、2・・・光遮蔽層、3・・・赤の
フィルタ部、4・・・緑のフィルタ部、5・・・青のフ
ィルタ部、6・・・ニッケルメッキ層。 第1図 特許出願人:三洋電機 株式会社
Figures 1 (a) to (e) are process diagrams for forming a light shielding layer on a glass substrate by electroless nickel plating;
Figures (a) to (d) are process diagrams for manufacturing color filters using a dyeing method. DESCRIPTION OF SYMBOLS 1... Glass substrate, 2... Light shielding layer, 3... Red filter part, 4... Green filter part, 5... Blue filter part, 6... Nickel plating layer. Figure 1 Patent applicant: Sanyo Electric Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)無電解メッキ法によりガラス基板上にメッキ層を
作成する第1ステップと、 上記メッキ層の不要部をエッチングして光遮蔽層を形成
する第2ステップと、 上記光遮蔽層形成基板上に種々の色のフィルタ部を形成
する第3ステップと、 を有することを特徴とするカラーフィルタの製造方法。
(1) A first step of creating a plating layer on the glass substrate by electroless plating, a second step of etching unnecessary parts of the plating layer to form a light shielding layer, and a second step of forming a light shielding layer on the light shielding layer forming substrate. A method for manufacturing a color filter, comprising: a third step of forming filter portions of various colors on the filter.
JP1093892A 1989-04-12 1989-04-12 Production of color filter Pending JPH02271302A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1093892A JPH02271302A (en) 1989-04-12 1989-04-12 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1093892A JPH02271302A (en) 1989-04-12 1989-04-12 Production of color filter

Publications (1)

Publication Number Publication Date
JPH02271302A true JPH02271302A (en) 1990-11-06

Family

ID=14095130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1093892A Pending JPH02271302A (en) 1989-04-12 1989-04-12 Production of color filter

Country Status (1)

Country Link
JP (1) JPH02271302A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8039045B2 (en) 2004-07-27 2011-10-18 Fuji Electric Co., Ltd. Method of manufacturing a disk substrate for a magnetic recording medium

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62178905A (en) * 1986-02-03 1987-08-06 Seiko Epson Corp Production of color filter
JPH01201605A (en) * 1988-02-08 1989-08-14 Seiko Epson Corp Color filter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62178905A (en) * 1986-02-03 1987-08-06 Seiko Epson Corp Production of color filter
JPH01201605A (en) * 1988-02-08 1989-08-14 Seiko Epson Corp Color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8039045B2 (en) 2004-07-27 2011-10-18 Fuji Electric Co., Ltd. Method of manufacturing a disk substrate for a magnetic recording medium

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