JPH02266978A - Optical information recording medium - Google Patents

Optical information recording medium

Info

Publication number
JPH02266978A
JPH02266978A JP1090363A JP9036389A JPH02266978A JP H02266978 A JPH02266978 A JP H02266978A JP 1090363 A JP1090363 A JP 1090363A JP 9036389 A JP9036389 A JP 9036389A JP H02266978 A JPH02266978 A JP H02266978A
Authority
JP
Japan
Prior art keywords
film
recording
thickness
sb2se3
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1090363A
Other languages
Japanese (ja)
Inventor
Teruo Kobayashi
輝夫 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Columbia Co Ltd
Original Assignee
Nippon Columbia Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Columbia Co Ltd filed Critical Nippon Columbia Co Ltd
Priority to JP1090363A priority Critical patent/JPH02266978A/en
Publication of JPH02266978A publication Critical patent/JPH02266978A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE:To reproduce information immediately after optically recording said information without requiring any large-scale equipment by setting the reflectances of unrecorded and recorded parts to desired values through using Sb2Se3 as an optically recording film and setting the thickness of said film within a specific range. CONSTITUTION:An apparatus is equipped with a transparent base 16, an optically recording film 17 and a reflecting film 18, and antimony triselenide(Sb2Se3) is used as said optically recording film 18 and the thickness of said film is set to 55-102nm. When the reflectances of unrecorded and recorded parts for a light beam of a wavelength 780nm incoming from the base side vary as shown by the curve 11 and the thickness of said Sb2Se3 film is selected appropriately, the title optical information recording medium can obtain a satisfactory performance of more than 70% before recording and less than 28% after recording as an exclusively reproducing optical disc. Also, when a dielectric film of less than 270nm is arranged between said Sb2Se3 recording film and reflecting film 18, the Sb2Se3 recording film can absorb a recorded light beam, prevent the dissipation of a generated heat to the reflecting film which is a good heat conductor film, and recording information by a small recording light beam energy.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光ビームを用いて情報が記録再生される光情報
記録媒体に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical information recording medium on which information is recorded and reproduced using a light beam.

〔従来の技術〕[Conventional technology]

光情報記録媒体の一つである光ディスクは、再生専用型
光ディスクと記録可能型光ディスクに分けることができ
る。
Optical discs, which are one type of optical information recording medium, can be divided into read-only optical discs and recordable optical discs.

再生専用型光ディスクは、透明な基板上に金型としての
金属原盤を用い、射出成形等の方法により微細な凹凸を
形成し、反射膜を被着したものである。
A read-only optical disk is one in which fine irregularities are formed on a transparent substrate by a method such as injection molding using a metal master disc as a mold, and a reflective film is coated on the disc.

この方法は、ガラス盤への感光剤塗布、レーザビームに
よる情報記録、現像、電気メツキ、金属原盤作製、射出
成形9反射膜形成、保護膜塗布の工程を必要とし、金属
原盤を作製するには多大な費用が必要であるため、少品
種大量生産に適した方法である。しかし、少規模な光デ
ィスクの生産には不適切であり、この場合−枚の光ディ
スクは高価になってしまう。
This method requires the following steps: coating a glass disk with a photosensitizer, recording information using a laser beam, developing, electroplating, preparing a metal master disk, forming a reflective film through injection molding, and coating a protective film. Since this method requires a large amount of cost, it is suitable for mass production of a small number of products. However, this method is not suitable for small-scale production of optical discs, and in this case, one optical disc becomes expensive.

小規模生産に適した方法として記録可能型光ディスクを
用いることが考えられる。これは従来公知のように、透
明基板上に設けられた光記録膜に半導体レーザ光を照射
して孔をあけるか、あるいは結晶相転移を生起せしめて
情報を記録したもので、反射光にて情報を再生すること
が出来る。この様に記録可能型光ディスクを用いると金
属原盤を作製する必要もなく安価に再生専用型光ディス
クを製造することができる。
One possible method suitable for small-scale production is to use a recordable optical disc. As is conventionally known, information is recorded by irradiating an optical recording film provided on a transparent substrate with semiconductor laser light to make holes or by causing crystal phase transition, and the reflected light is used to record information. Information can be reproduced. When a recordable optical disc is used in this manner, it is possible to manufacture a read-only optical disc at low cost without the need to produce a metal master disc.

しかし、この方法で作られた再生専用型光ディスクの反
射率は50%以下であり、反射率709A以上を要求さ
れる一般の再生専用型光ディスクの規格を満足すること
ができず、市販のLDプレーヤやCDプレーヤ等の再生
専用型光デイスク再生装置では再生することができない
However, the reflectance of read-only optical discs made using this method is less than 50%, and cannot meet the standard for general read-only optical discs, which requires a reflectance of 709A or higher, and is not suitable for commercially available LD players. It cannot be played on a playback-only optical disc playback device such as a DVD player or a CD player.

かかる問題を解決し、市販の再生専用型光ディスクと同
等性能のものを安価に小規模生産し、市販の再生専用型
光デイスク再生機にて再生可能な光ディスクを製造する
方法として特開昭62−119755が示されている。
In order to solve this problem, Japanese Patent Laid-Open Publication No. 1983-1999 was proposed as a method for inexpensively producing small-scale optical discs with the same performance as commercially available read-only optical discs, and producing optical discs that can be played on commercially available read-only optical disc players. 119755 is shown.

これは、透明基体上に記録光ビーム吸収性を機色素記i
!膜を形成し、光ビームを照射し、該記録膜にビットと
呼ばれる孔をあけて情報を記録し、その後記録膜を光ビ
ームに対して透明とする操作を加え、更に反射膜を被覆
する方法で、充分な反射率をもった記録媒体を得ること
ができる。
This is a method for recording light beam absorption on a transparent substrate.
! A method of forming a film, irradiating it with a light beam, drilling holes called bits in the recording film to record information, then adding an operation to make the recording film transparent to the light beam, and then coating it with a reflective film. Thus, a recording medium with sufficient reflectance can be obtained.

しかしながらこの様に、情報を記録した後光記録膜を透
明化させ、さらに反射膜を被覆させる操作を行うには、
特別な装置が必要となり、製造工程が複雑化する欠点が
あった。従って又、かかる設備を保有していない一般ユ
ーザでは、記録後直ちに再生することができない等の問
題点があった。
However, in order to make the optical recording film transparent after recording information and then cover it with a reflective film, it is necessary to
This has the drawback of requiring special equipment and complicating the manufacturing process. Therefore, general users who do not have such equipment have the problem of not being able to play back immediately after recording.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は上記欠点を解消し、光ビームにより情報を記録
した後、大がかりな装置による特別な操作を必要とせず
に情報を再生することができ、しかも反射率の高い光情
報記録媒体を堤供することを目的としてなされたもので
ある。
The present invention solves the above-mentioned drawbacks and provides an optical information recording medium that can reproduce information without the need for special operations using a large-scale device after recording information with a light beam, and has a high reflectance. It was done for that purpose.

〔課題を解決するための手段〕[Means to solve the problem]

本発明による光情報記録媒体は、透明基体1光記録膜及
び反射膜を備え、上記光記録膜として三セレン化アンチ
モン(s b、 s 63 )を用い、この膜厚を55
n−〜1021−としたことを特徴とするものである。
The optical information recording medium according to the present invention includes a transparent substrate, an optical recording film, and a reflective film, and uses antimony triselenide (s b, s 63 ) as the optical recording film, and has a film thickness of 55 mm.
It is characterized by having n- to 1021-.

〔作用〕[Effect]

5bzSesfI膜は、成膜後の無処理状態での複素屈
折率n、が、波長780rvにおいて3.8−0.15
iであり、170℃〜200℃の熱処理後の複素屈折率
n、は、4.7−0.7iに変化する。
The complex refractive index n of the 5bzSesfI film in an untreated state after film formation is 3.8-0.15 at a wavelength of 780 rv.
i, and the complex refractive index n after heat treatment at 170°C to 200°C changes to 4.7-0.7i.

従って、透明基体上に5blSe3記録膜及び反射膜を
積層した光情報記録媒体は、その基体側から入射する波
長780n@の光ビームに対する未記録部反射率及び記
録部反射率が、第2図に示す特性曲線11のごとく変化
し、sbよ5e311の膜厚を適切に選択することによ
り、記録前が70%以上、記録後が28%以下という一
般の再生専用型光ディスクとして充分満足出来る性能を
有した光情報記録媒体を得ることができる。
Therefore, for an optical information recording medium in which a 5blSe3 recording film and a reflective film are laminated on a transparent substrate, the reflectance of the unrecorded area and the reflectance of the recorded area for a light beam of wavelength 780n@ entering from the substrate side are as shown in Figure 2. By appropriately selecting the film thickness of sb and 5e311, it has a performance that is sufficiently satisfactory as a general read-only optical disc, with a performance of 70% or more before recording and 28% or less after recording. An optical information recording medium can be obtained.

〔実施例〕〔Example〕

第1図に、本発明による記録媒体の一実施例を示す。 FIG. 1 shows an embodiment of a recording medium according to the present invention.

図において透明基体16として、外径120u。In the figure, the transparent base 16 has an outer diameter of 120u.

内径5fl、厚さ1.2鶴であって、表面片側にピッチ
1゜6μm、幅0.7μm、深さ0.07μ餉のスパイ
ラル状トラッキング溝をもったポリカーボネート基板を
用い、この上に記録膜として、公知の技術であるスパッ
タリング法を用いて5blSe3Jfl117を9On
−の厚さに成膜し、続いてAu反射膜18を77.5n
−の膜厚に成膜した。
A polycarbonate substrate with an inner diameter of 5 fl, a thickness of 1.2 mm, and a spiral tracking groove with a pitch of 1°6 μm, a width of 0.7 μm, and a depth of 0.07 μm on one side of the surface was used, and a recording film was placed on this. 5blSe3Jfl117 was 9On using a well-known sputtering method.
-, and then Au reflective film 18 was formed to a thickness of 77.5n.
The film was formed to a film thickness of -.

このようにして作製した光記録媒体の反射率は、波長λ
−780nmの光ビームに対して78%であった。この
ディスクに波長λ−83on−の半4体レーザビームを
照射し情報を記録した後、情報記録部の波長780nm
における反射率を測定したところ27%であり、記録前
及び後の各反射率は再生専用型光ディスクの規格に合致
していた。
The reflectance of the optical recording medium produced in this way is the wavelength λ
-78% for a light beam of 780 nm. After recording information by irradiating this disk with a half-quad laser beam of wavelength λ-83 on-,
When the reflectance was measured, it was 27%, and the reflectance before and after recording met the standards for read-only optical discs.

なお、反射率が記録前において70%以上、記録後にお
いて28%以下となるSb2 Se3記録膜の膜厚は、
第2図斜線命妬如く90n−〜102n−の範囲であっ
た。
The film thickness of the Sb2Se3 recording film at which the reflectance is 70% or more before recording and 28% or less after recording is as follows:
The diagonal line in FIG. 2 was in the range of 90n- to 102n-.

本実施例においては、反射膜をAuとしたが、これは波
長λ−78on−における反射率が最も高いことによる
。Auの他A g *  Cu 、A Iを用いても反
射率が記録前で70%以上、記録後で28%以下の光情
報記録媒体を得ることができるが、反射膜のλ−780
nmにおける反射率が低くなるにしたがって5blSe
3の適切な膜厚範囲は小さくなる。
In this embodiment, the reflective film is made of Au, which has the highest reflectance at the wavelength λ-78on-. Although it is possible to obtain an optical information recording medium with a reflectance of 70% or more before recording and 28% or less after recording by using Ag*Cu or AI in addition to Au, the λ-780 of the reflective film
As the reflectance at nm decreases, 5blSe
The appropriate film thickness range for No. 3 is small.

本発明の他の実施例として、5JSel記録膜と反射膜
の間に透明誘電体膜を配置した例について述べる。
As another embodiment of the present invention, an example will be described in which a transparent dielectric film is disposed between a 5JSel recording film and a reflective film.

前記実施例と同様にして、ポリカーボネート基板上にS
b零Se3膜を膜厚80ns+に成膜し、さらにZnS
誘電体膜を膜厚50n−に成膜、さらにA1反射膜を7
0ローに成膜した。
In the same manner as in the previous example, S was deposited on a polycarbonate substrate.
b Zero Se3 film was formed to a film thickness of 80 ns+, and then ZnS
A dielectric film was formed to a thickness of 50 nm, and an A1 reflective film was formed to a thickness of 7 nm.
A film was formed at 0 low.

こうして作製した光情報記録媒体の、波長λ−78On
−における記録前及び後の反射率は、それぞれ73%及
び22%であり再生専用型光ディスクの反射率の規格に
合致していた。
The wavelength λ-78On of the optical information recording medium thus produced
The reflectance before and after recording at - was 73% and 22%, respectively, which met the reflectance standard for read-only optical discs.

本実施例において記録前の反射率が70%以上であり、
かつ記録後の反射率が28%以下となる5blSe1記
録膜の膜厚範囲は76n−〜82n−であった。
In this example, the reflectance before recording is 70% or more,
The film thickness range of the 5blSe1 recording film in which the reflectance after recording was 28% or less was 76n- to 82n-.

また本実施例において、A1反射膜をAu反射膜におき
かえ、SbmSe2膜の膜厚を種々変化させて反射率を
測定したところ、前述の様な一般の再生専用型光ディス
クの反射率規格を満足するであり、A1反射膜を用いた
場合に比較して、5bases記録膜の適切な膜厚範囲
を広くすることができる。
In addition, in this example, the reflectance was measured by replacing the A1 reflective film with an Au reflective film and varying the thickness of the SbmSe2 film, and the result was that it satisfied the reflectance standard for general read-only optical discs as described above. Therefore, the appropriate film thickness range of the 5bases recording film can be widened compared to the case where the A1 reflective film is used.

第3図は、前述のごとく、透明基体16上のSb、se
、記111117とAu反射119I(膜厚80rim
以上)との間に、透明誘電体膜を積層した光情報記録媒
体に、透明基体側より波長λ−780n■の光ビームを
入射させたとき、情報未記録分の反射率が70%以上で
、情報記録部の反射率が28%以下となる様にする為の
、5JSe13記録膜のおいては、再生専用型光ディス
クの反射率を満足する光情報記録媒体を得ることができ
る。
FIG. 3 shows Sb, se on the transparent substrate 16 as described above.
, 111117 and Au reflection 119I (film thickness 80rim
When a light beam with a wavelength of λ-780n is made incident from the transparent substrate side onto an optical information recording medium in which a transparent dielectric film is laminated between the In the case of a 5JSe13 recording film for making the reflectance of the information recording portion 28% or less, it is possible to obtain an optical information recording medium that satisfies the reflectance of a read-only optical disc.

上記実施例においては、誘電体膜としてZn5(I!!
折率n=2.3)を用いたが、本発明ではこれに限らず
、S % 0.S i Os 、Tag Os等の酸化
物、A I N、 S 1 s Na等の窒化物、sb
寞S、、G・S等のカルコゲン化物、MgFt、CaF
*等のフッ化物等の様に、再生光ビームの波長において
透明であれば使用することができる。
In the above embodiment, Zn5 (I!!) is used as the dielectric film.
Although the refractive index n=2.3) was used, the present invention is not limited to this, and S % 0. Oxides such as S i Os and Tag Os, nitrides such as A IN and S 1 S Na, sb
Chalcogenides such as S, G, S, MgFt, CaF
It can be used as long as it is transparent at the wavelength of the reproduction light beam, such as fluorides such as *.

本実施例の如く、sb茸Se、記録WA17と反射W4
18の間に誘電体膜を配置すると、5blSe、記録膜
が記録光ビームを吸収し、発生した熱が熱良導性膜であ
る反射膜への拡散するのを防止し、小さい記録光ビーム
エネルギにて情報を記録することができる。また、この
誘電体膜の光学厚さを例えば70〜100nsの範囲に
選択することにより、誘電体の無い場合に比べて5bs
Sl113記録膜の膜厚範囲を広くすることができる。
As in this example, sb mushroom Se, recording WA17 and reflection W4
When a dielectric film is placed between 18 and 18, the recording film absorbs the recording light beam, prevents the generated heat from diffusing to the reflective film, which is a thermally conductive film, and reduces the energy of the recording light beam. Information can be recorded in . In addition, by selecting the optical thickness of this dielectric film in the range of, for example, 70 to 100 ns, it is possible to achieve a
The thickness range of the Sl113 recording film can be widened.

〔発明の効果〕〔Effect of the invention〕

本発明においては光記録膜として3blSesを用いて
その膜厚155n−〜102asとしたので、未記録部
の反射率が70%以上かつ記録部の反射率28%以下と
することが出来、また、情報を光学記録した後は特別大
がかりな設備を必要とすることなく、直ちに情報を再生
することができる。
In the present invention, 3blSes is used as the optical recording film, and the film thickness is 155n- to 102as, so that the reflectance of the unrecorded part can be 70% or more and the reflectance of the recorded part is 28% or less, and After information is optically recorded, it can be immediately reproduced without the need for particularly large-scale equipment.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による光ディスクの一実施例を示す断面
図と、第2図はそのSb、Se、記録膜膜厚と反射率の
関係を示す図、第3図は本発明による光ディスクの他の
実施例を示す誘電体膜の光学厚さと、5blSel記録
膜膜厚の関係を示す図である。 16−・・透明基板 17−3b、S・、膜 18−Au反射膜 g。 /DQ rO sb、sa、頗厚 C?L鳴)
FIG. 1 is a cross-sectional view showing one embodiment of an optical disk according to the present invention, FIG. 2 is a diagram showing the relationship between Sb, Se, recording film thickness, and reflectance, and FIG. 3 is a cross-sectional view showing an example of an optical disk according to the present invention. FIG. 3 is a diagram showing the relationship between the optical thickness of a dielectric film and the thickness of a 5blSel recording film in an example. 16--Transparent substrate 17-3b, S., Film 18-Au reflective film g. /DQ rO sb, sa, chest thickness C? L ring)

Claims (2)

【特許請求の範囲】[Claims] (1)透明基体、光記録膜及び反射膜を備え、上記光記
録膜として三セレン化アンチモン(Sb_2Se_3)
を用い、この膜厚を55nm〜102nmとしたことを
特徴とする光情報記録媒体。
(1) A transparent substrate, an optical recording film, and a reflective film are provided, and the optical recording film is made of antimony triselenide (Sb_2Se_3).
An optical information recording medium characterized in that the film thickness is 55 nm to 102 nm.
(2)上記光記録膜と反射膜の間に透明誘電体膜を配置
し、該誘電体膜の光学厚さを270nm以下としたこと
を特徴とする請求項1記載の光情報記録媒体。
(2) The optical information recording medium according to claim 1, wherein a transparent dielectric film is disposed between the optical recording film and the reflective film, and the optical thickness of the dielectric film is 270 nm or less.
JP1090363A 1989-04-10 1989-04-10 Optical information recording medium Pending JPH02266978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1090363A JPH02266978A (en) 1989-04-10 1989-04-10 Optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1090363A JPH02266978A (en) 1989-04-10 1989-04-10 Optical information recording medium

Publications (1)

Publication Number Publication Date
JPH02266978A true JPH02266978A (en) 1990-10-31

Family

ID=13996457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1090363A Pending JPH02266978A (en) 1989-04-10 1989-04-10 Optical information recording medium

Country Status (1)

Country Link
JP (1) JPH02266978A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04228126A (en) * 1990-06-07 1992-08-18 Mitsubishi Kasei Corp Optical information recording medium
EP2199094A1 (en) 2008-12-22 2010-06-23 Mondi Uncoated Fine & Kraft Paper GmbH Method for chromophoric illustration of surfaces
CN109167009A (en) * 2018-09-12 2019-01-08 肇庆市华师大光电产业研究院 A kind of lithium battery diaphragm material and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5724039A (en) * 1980-07-18 1982-02-08 Sony Corp Information recording medium
JPS57205193A (en) * 1981-06-12 1982-12-16 Fuji Photo Film Co Ltd Optical information recording medium
JPS62154341A (en) * 1985-12-27 1987-07-09 Asahi Chem Ind Co Ltd Optical recording emdium
JPS63300441A (en) * 1987-05-29 1988-12-07 Nippon Columbia Co Ltd Optical information recording medium
JPH02217289A (en) * 1989-02-17 1990-08-30 Mitsui Petrochem Ind Ltd Optical recording medium

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JPS5724039A (en) * 1980-07-18 1982-02-08 Sony Corp Information recording medium
JPS57205193A (en) * 1981-06-12 1982-12-16 Fuji Photo Film Co Ltd Optical information recording medium
JPS62154341A (en) * 1985-12-27 1987-07-09 Asahi Chem Ind Co Ltd Optical recording emdium
JPS63300441A (en) * 1987-05-29 1988-12-07 Nippon Columbia Co Ltd Optical information recording medium
JPH02217289A (en) * 1989-02-17 1990-08-30 Mitsui Petrochem Ind Ltd Optical recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04228126A (en) * 1990-06-07 1992-08-18 Mitsubishi Kasei Corp Optical information recording medium
EP2199094A1 (en) 2008-12-22 2010-06-23 Mondi Uncoated Fine & Kraft Paper GmbH Method for chromophoric illustration of surfaces
CN109167009A (en) * 2018-09-12 2019-01-08 肇庆市华师大光电产业研究院 A kind of lithium battery diaphragm material and preparation method thereof

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