JPH02259094A - Method for electrodepositing amorphous iron-molybdenum tungsten alloy plating film - Google Patents
Method for electrodepositing amorphous iron-molybdenum tungsten alloy plating filmInfo
- Publication number
- JPH02259094A JPH02259094A JP7806989A JP7806989A JPH02259094A JP H02259094 A JPH02259094 A JP H02259094A JP 7806989 A JP7806989 A JP 7806989A JP 7806989 A JP7806989 A JP 7806989A JP H02259094 A JPH02259094 A JP H02259094A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- molybdenum
- iron
- plating film
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 48
- 229910001080 W alloy Inorganic materials 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims description 13
- FZLXQNVEUSTQJM-UHFFFAOYSA-N [Fe].[Mo].[W] Chemical compound [Fe].[Mo].[W] FZLXQNVEUSTQJM-UHFFFAOYSA-N 0.000 title claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 12
- 229910052742 iron Inorganic materials 0.000 claims abstract description 10
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 claims abstract description 9
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims abstract description 9
- 230000002378 acidificating effect Effects 0.000 claims abstract description 7
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims abstract description 6
- 229940095064 tartrate Drugs 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 9
- 239000011733 molybdenum Substances 0.000 claims description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- 238000004070 electrodeposition Methods 0.000 claims 1
- 238000005260 corrosion Methods 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 4
- 239000002659 electrodeposit Substances 0.000 abstract 2
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 6
- 238000005280 amorphization Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- -1 iron group metals Chemical class 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- JHOPGIQVBWUSNH-UHFFFAOYSA-N iron tungsten Chemical compound [Fe].[Fe].[W] JHOPGIQVBWUSNH-UHFFFAOYSA-N 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910002058 ternary alloy Inorganic materials 0.000 description 3
- 229910001182 Mo alloy Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- DSMZRNNAYQIMOM-UHFFFAOYSA-N iron molybdenum Chemical compound [Fe].[Fe].[Mo] DSMZRNNAYQIMOM-UHFFFAOYSA-N 0.000 description 2
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 235000015393 sodium molybdate Nutrition 0.000 description 2
- 239000011684 sodium molybdate Substances 0.000 description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 2
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical class [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910017116 Fe—Mo Inorganic materials 0.000 description 1
- 229910004619 Na2MoO4 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 1
- AVTYONGGKAJVTE-OLXYHTOASA-L potassium L-tartrate Chemical compound [K+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O AVTYONGGKAJVTE-OLXYHTOASA-L 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001476 sodium potassium tartrate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、非晶質鉄−モリブデン−タングステン合金め
っき皮膜の電析方法番こ関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for electrodepositing an amorphous iron-molybdenum-tungsten alloy plating film.
〔従来の技術及び発明が解決しようとする課題〕モリブ
デンやタングステンは、水溶液中から単独では電析し得
ないが、鉄族金属と共析することができる誘起共析型金
属であることが知られており、このため従来から種々の
鉄−モリブデン合金めっき方法や鉄−タングステン合金
めっき方法が提案されている。[Prior art and problems to be solved by the invention] It is known that molybdenum and tungsten are induced eutectoid metals that cannot be deposited alone from an aqueous solution, but can be eutectoid with iron group metals. Therefore, various iron-molybdenum alloy plating methods and iron-tungsten alloy plating methods have been proposed.
しかし、従来の鉄−モリブデン合金めっき方法や鉄−タ
ングステン合金めっき方法により得られるめっき皮膜は
結晶構造のものが多く、耐食性等の面から非晶質皮膜が
望まれるが、従来、かかる非晶質皮膜を確実に得ること
についての提案は少なく、特に非晶質の鉄−モリブデン
−タング、ステン三元合金めっきを得る方法は提案がな
い。However, many of the plating films obtained by conventional iron-molybdenum alloy plating methods and iron-tungsten alloy plating methods have a crystalline structure, and an amorphous film is desired from the viewpoint of corrosion resistance. There are few proposals on how to reliably obtain a film, and in particular, there are no proposals on how to obtain an amorphous iron-molybdenum-tung/stain ternary alloy plating.
本発明は上記事情に鑑みなされたもので、非晶質鉄−モ
リブデン−タングステン三元合金皮膜を確実にしかも工
業的有利に電析する方法を提供することを目的とする。The present invention was made in view of the above circumstances, and an object of the present invention is to provide a method for depositing an amorphous iron-molybdenum-tungsten ternary alloy film reliably and industrially advantageously.
〔課題を解決するための手段及び作用〕本発明者らは、
上記目的を達成するため種々検討を行なった結果、水溶
性第１鉄塩と錯化剤として水溶性モリブデン酸塩と水溶
性タングステン酸塩と水溶性酒石酸塩とを含有する酸性
のめっき浴を使用し、被めっき物を電気めっきして、鉄
量が６０重量％以下で残部がモリブデンとタングステン
、又は鉄量が７５重量％以下でモリブデン量が１５重量
％以上かつ残部がタングステンからなる鉄−モリブデン
−タングステン合金めっき皮膜を得ることにより、非晶
質化が達成されると共に、かかる非晶質鉄−モリブデン
−タングステン合金めっき皮膜が高い耐食性を有し、ま
た上記方法はめっき温度を低温とすることができるので
、コスト的にメリットが大きく、実用性の高いものであ
ることを知見したものである。[Means and effects for solving the problem] The present inventors,
As a result of various studies to achieve the above objective, we used an acidic plating bath containing a water-soluble ferrous salt and a water-soluble molybdate, a water-soluble tungstate, and a water-soluble tartrate as complexing agents. When the object to be plated is electroplated, the iron content is 60% by weight or less and the balance is molybdenum and tungsten, or the iron content is 75% by weight or less, the molybdenum content is 15% by weight or more, and the balance is tungsten. - By obtaining a tungsten alloy plating film, not only is the amorphous state achieved, but also the amorphous iron-molybdenum-tungsten alloy plating film has high corrosion resistance, and the above method requires a low plating temperature. It was discovered that this method has great cost advantages and is highly practical.
以下、本発明につき更に詳述する。The present invention will be explained in more detail below.
本発明方法において使用するめっき浴は、上述したよう
に水溶性第１鉄塩と水溶性モリブデン酸塩と水溶性タン
グステン酸塩と水溶性酒石酸塩とを含有する酸性のもの
である。The plating bath used in the method of the present invention is an acidic one containing a water-soluble ferrous salt, a water-soluble molybdate, a water-soluble tungstate, and a water-soluble tartrate, as described above.
ここで、水溶性第１鉄塩としては、従来から鉄−タング
ステン合金めっきに用いられる硫酸第１鉄が使用され、
水溶性モリブデン酸塩としては、モリブデン酸ナトリウ
ム等のモリブデン酸アルカリ金属塩が使用され、水溶性
タングステン酸塩としては、タングステン酸ナトリウム
等のタングステン酸アルカリ金属塩が使用され、水溶性
酒石酸塩としては、酒石酸アンモニウム、酒石酸ナトリ
ウム、酒石酸カリウム、酒石酸ナトリウムカリウムが使
用される。Here, as the water-soluble ferrous salt, ferrous sulfate, which is conventionally used for iron-tungsten alloy plating, is used.
As the water-soluble molybdate, an alkali metal salt of molybdate such as sodium molybdate is used, as the water-soluble tungstate, an alkali metal salt of tungstate such as sodium tungstate is used, and as the water-soluble tartrate, an alkali metal salt of molybdate such as sodium tungstate is used. , ammonium tartrate, sodium tartrate, potassium tartrate, sodium potassium tartrate are used.
上記成分の濃度は、目的とするめっき皮膜組成に応じて
選定され、この場合めっき浴中のモリブデン、タングス
テン量が多くなる程、めっき皮膜中のモリブデン、タン
グステン量が多くなるものであるが、本発明においては
、非晶質化の点からめっき皮膜中の鉄量が６０重量％以
下、残部がモリブデンとタングステン、又は鉄量が７５
％重量以下、モリブデン量が１５重量％以上、残部がタ
ングステンとなるようにめっき浴組成を選定する。従っ
て、かかる点から水溶性第１鉄塩は２〜３６ ｇ ／
Ｑ、水溶性モリブデン酸塩は１〜３１．５ｇ ／ Ｑ、
水溶性タングステン酸塩は２〜４３ ｇ ／ Ｑとする
ことが好ましい。また、水溶性酒石酸塩は、第１鉄塩、
モリブデン酸塩、タングステン酸塩の合計モル量に対し
等価になるように使用することが好ましく、通常７２
ｇ ／ Ｑ以下とされる。The concentration of the above components is selected depending on the target plating film composition, and in this case, the larger the amount of molybdenum and tungsten in the plating bath, the higher the amount of molybdenum and tungsten in the plating film. In the invention, from the viewpoint of amorphization, the amount of iron in the plating film is 60% by weight or less, the balance is molybdenum and tungsten, or the amount of iron is 75% by weight.
% weight or less, the plating bath composition is selected so that the amount of molybdenum is 15 weight % or more, and the balance is tungsten. Therefore, from this point of view, the amount of water-soluble ferrous salt is 2 to 36 g/
Q, water-soluble molybdate is 1-31.5g/Q,
The amount of water-soluble tungstate is preferably 2 to 43 g/Q. In addition, water-soluble tartrates include ferrous salts,
It is preferable to use the amount equivalent to the total molar amount of molybdate and tungstate, and usually 72
g/Q or less.
また、本発明のめっき浴は、酸性、特にｐＨ３〜６に調
整される。Furthermore, the plating bath of the present invention is adjusted to be acidic, particularly to have a pH of 3 to 6.
上記めっき浴を用いて適宜な被めっき物に電気めっきを
行なう場合、めっき温度は５０℃以下、より好ましくは
４０℃以下とするものであり、本発明においては３０℃
以下の室温でも十分めっきが可能である。また、陰極電
流密度は２〜２０Ａ／ｄｒｒｒとすることができる。When electroplating a suitable object to be plated using the above plating bath, the plating temperature is 50°C or less, more preferably 40°C or less, and in the present invention, the plating temperature is 30°C or less.
Plating is possible even at room temperature below. Moreover, the cathode current density can be 2 to 20 A/drrr.
なお、撹拌は無撹拌でもよいが、スターター等を用いて
撹拌することが好ましく、また、陽極は通常白金めっき
チタン網等の不溶性陽極が用いられるが、鉄陽極を用い
ることも可能である。Note that stirring may be performed without stirring, but it is preferable to use a starter or the like for stirring.Although an insoluble anode such as a platinum-plated titanium mesh is usually used as the anode, it is also possible to use an iron anode.
次に実施例により本発明を更に具体的に説明する。Next, the present invention will be explained in more detail with reference to Examples.
めっき浴としてＦｅＳＯ４・７Ｈ２０，Ｎａ２ＭｏＯ４
・２Ｈ２０，Ｎａ２Ｗｏ４・２Ｈ２０，（ＮＨ４）２Ｃ
４Ｈ４ｏ６を下記濃度で使用し、ｐＨ３〜８．めっき温
度２８〜８０℃、陰極電流密度２〜２０Ａ／ｄボでめっ
きを行なった。FeSO4・7H20, Na2MoO4 as plating bath
・2H20, Na2Wo4・2H20, (NH4)2C
4H4o6 was used at the following concentration, pH 3-8. Plating was carried out at a plating temperature of 28 to 80° C. and a cathode current density of 2 to 20 A/d.
なお、電解槽としては５００ｍＱのガラス製円筒容器を
用い、陽極は白金めっきチタン網（９５×６５ｍｎ）と
し、陰極（被めっき物）は円形銅板（６ａｉ？×０．３
９を脱脂、酸洗して用いた。In addition, a 500 mQ glass cylindrical container was used as the electrolytic cell, the anode was a platinum-plated titanium mesh (95 x 65 mm), and the cathode (object to be plated) was a circular copper plate (6ai? x 0.3 mm).
No. 9 was degreased and pickled before use.
なおまた、非晶質構造の判定にはＸ線回折法を用い、電
着膜中のＦｅ、Ｍｏ及びＷはプラズマ発光分析法と蛍光
Ｘ線法を併用した。皮膜構造はＡＥＳを用いて構成成分
の分布状態を求めた。電析膜の電気化学的挙動は北斗電
工製自動分極測定装置を用いた。Furthermore, an X-ray diffraction method was used to determine the amorphous structure, and a combination of a plasma emission spectrometry method and a fluorescent X-ray method was used to determine Fe, Mo, and W in the electrodeposited film. Regarding the film structure, the distribution state of the constituent components was determined using AES. The electrochemical behavior of the deposited film was measured using an automatic polarization measuring device manufactured by Hokuto Denko.
（１）Ｆｅ−Ｍｏ−Ｗ合金皮膜の非晶質化に及ぼすめっ
き の
ＦｅＳＯ４・７Ｈ２ｏ、Ｎａ２ＭｏＯ４・２Ｈ２０，Ｎ
ａ２ＷＯ４・２Ｈ２０を種々の濃度と、（ＮＨ４）ｚＣ
，Ｈ４０１，を７２ ｇ ／ Ｑの濃度で含むｐＨ４の
めっき浴を使用し、めっき温度３０±２℃、陰極電流密
度６．ＯＡ ／ ｄ ｍでめっきを行ない、得られため
っき皮膜の組成を分析すると共に、それが非晶質である
か否かを評価した。結果を第１図に示す。(1) Effect of plating on amorphization of Fe-Mo-W alloy film FeSO4.7H2o, Na2MoO4.2H20, N
a2WO4・2H20 at various concentrations and (NH4)zC
, H401, at a concentration of 72 g/Q, a plating temperature of 30 ± 2 °C, and a cathode current density of 6. Plating was performed at OA/dm, and the composition of the resulting plated film was analyzed and whether or not it was amorphous was evaluated. The results are shown in Figure 1.
第１図の結果より、Ｆｅ−Ｍｏ−Ｗ合金皮膜中のＦｅ量
が６０％以下、Ｍｏ量が２０％以上、Ｗ量が残部である
場合、非晶質皮膜が得られることが認められた。From the results shown in Figure 1, it was confirmed that an amorphous film can be obtained when the Fe content in the Fe-Mo-W alloy film is 60% or less, the Mo content is 20% or more, and the W content is the balance. .
（２）Ｆｅ−Ｍｏ−Ｗ合金皮膜の非晶質化に及ぼすＨの
下記組成
ＦｅＳＯ４・７Ｈ２０３６ｇ／Ｑ
Ｎａ２ＭｏＯ４・２Ｈ２０３１，５〃
Ｎａ２ＷＯ４・２Ｈ２０４３
（ＮＨ４）２Ｃ４Ｈ４０６７２ｌ！
のめっき浴を使用い、ｐＨを変化させて、めっき温度３
０±２°Ｃにおいて種々の陰極電流密度でめっきを行な
い、得られためっき皮膜が非晶質であるか否かを評価し
た。結果を第２図に示す。(2) The following composition of H on the amorphization of Fe-Mo-W alloy film FeSO4.7H2036g/Q Na2MoO4.2H2031,5〃 Na2WO4.2H2043 (NH4)2C4H40672l! Using a plating bath of
Plating was performed at 0±2° C. at various cathode current densities, and it was evaluated whether the resulting plated films were amorphous or not. The results are shown in Figure 2.
＝７−
第２図の結果から、めっき浴が酸性である場合にめっき
が可能で、しかも非晶質皮膜が得られることが認められ
た。=7- From the results shown in FIG. 2, it was confirmed that plating is possible when the plating bath is acidic, and that an amorphous film can be obtained.
（３）Ｆｅ−Ｍｏ Ｗ入金 の
Ｆｅ−１２％Ｍｏ−８％Ｗ及びＦｅ−６％Ｍｏ −４３
％Ｗのめっき皮膜を１規定塩酸溶液中に３０℃において
浸漬し、アノード分極曲線を求めた。(3) Fe-Mo W deposit of Fe-12%Mo-8%W and Fe-6%Mo-43
%W plating film was immersed in a 1N hydrochloric acid solution at 30°C, and an anode polarization curve was determined.
結果を第３図に示す。The results are shown in Figure 3.
第３図の結果より、非晶質のＦｅ−６％Ｍｏ −４３％
Ｗ合金めっき皮膜が良好な耐食性を有していることが認
められた。From the results shown in Figure 3, amorphous Fe-6%Mo-43%
It was found that the W alloy plating film had good corrosion resistance.
本発明によれば、非晶質で耐食性に優れた鉄−モリブデ
ン−タングステン三元合金めつき皮膜を確実にかつ工業
的有利に電析することができる。According to the present invention, an iron-molybdenum-tungsten ternary alloy plating film that is amorphous and has excellent corrosion resistance can be deposited reliably and industrially advantageously.
第１図はＦｅ−Ｍｏ−Ｗ合金皮膜組成と非晶質化の関係
を示すグラフ、第２図はめっき浴のｐＨとＦｅ−Ｍｏ−
Ｗ合金皮膜の非晶質化の関係を示すグラフ、第３図は各
種Ｆｅ−Ｍｏ−Ｗ合金めつき皮膜の１規定塩酸中でのア
ノード分極曲線を示す。
出願人 上 村 工 業 株式会社
代理人 弁理士 小 島 隆 同
第１図
Ｈｏ／ ｗｔ％Figure 1 is a graph showing the relationship between Fe-Mo-W alloy film composition and amorphization, and Figure 2 is a graph showing the relationship between plating bath pH and Fe-Mo-W alloy film composition.
FIG. 3 is a graph showing the relationship between the amorphization of the W alloy film and the anodic polarization curves of various Fe-Mo-W alloy plating films in 1N hydrochloric acid. Applicant Uemura Kogyo Co., Ltd. Agent Patent Attorney Takashi Kojima Figure 1 Ho/wt%
Claims (1)
ングステン酸塩と水溶性酒石酸塩とを含有する酸性のめ
っき浴を使用し、被めっき物を電気めっきして、鉄量が
６０重量％以下で残部がモリブデンとタングステン、又
は鉄量が７５重量％以下でモリブデン量が１５重量％以
上かつ残部がタングステンからなる鉄−モリブデン−タ
ングステン合金めっき皮膜を得ることを特徴とする非晶
質鉄−モリブデン−タングステン合金皮膜の電析方法。1. Electroplating the object to be plated using an acidic plating bath containing a water-soluble ferrous salt, a water-soluble molybdate, a water-soluble tungstate, and a water-soluble tartrate, so that the amount of iron is 60 An amorphous iron-molybdenum-tungsten alloy plating film comprising molybdenum and tungsten with an iron content of 75 wt% or less and a molybdenum content of 15 wt% or more with the balance being tungsten. Electrodeposition method for iron-molybdenum-tungsten alloy film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7806989A JPH0826473B2 (en) | 1989-03-31 | 1989-03-31 | Electrodeposition method of amorphous iron-molybdenum-tungsten alloy coating. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7806989A JPH0826473B2 (en) | 1989-03-31 | 1989-03-31 | Electrodeposition method of amorphous iron-molybdenum-tungsten alloy coating. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02259094A true JPH02259094A (en) | 1990-10-19 |
| JPH0826473B2 JPH0826473B2 (en) | 1996-03-13 |
Family
ID=13651559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7806989A Expired - Lifetime JPH0826473B2 (en) | 1989-03-31 | 1989-03-31 | Electrodeposition method of amorphous iron-molybdenum-tungsten alloy coating. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0826473B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105945565A (en) * | 2016-04-29 | 2016-09-21 | 中冶天工集团天津有限公司 | Kiln shell assembly adjusting device and applying method thereof |
-
1989
- 1989-03-31 JP JP7806989A patent/JPH0826473B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0826473B2 (en) | 1996-03-13 |
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