JPH0225744B2 - - Google Patents

Description

Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a barrel polishing device that can accurately polish the inner surface of a hollow part of a cylindrical object with or without a bottom or a hollow workpiece with a deep recess. It is something.

(Prior art) Barrel polishing devices have been widely used for polishing workpieces with complex surface shapes. Since the surface polishing efficiency is several to several tens of times better, if the inner surface is sufficiently polished, the outer surface will be over-polished, and conversely, if the polishing is performed based on the polishing of the outer surface, the inner surface will be insufficiently polished. Therefore, as shown in Japanese Patent Application Laid-Open No. 60-146671, a technique for polishing the inner surface of the hollow part by chemically treating it while barrel polishing is proposed. Techniques have already been proposed for magnetically polishing the inner surface of a workpiece by chucking it.

(Problem to be solved by the invention) However, the former technique, in which chemical treatment is performed while barrel polishing, requires complicated equipment, waste liquid treatment, etc., which increases equipment costs. Although the polishing time can be shortened, over-polishing of the outer surface is unavoidable because the polishing time is reduced, and the latter technique requires an expensive magnetic polishing device itself and a Since a side magnetic pole and an inner diameter side magnetic pole are required, there is a problem that the polishing cost becomes high.

(Means for Solving the Problems) The present invention eliminates the above-mentioned problems, and performs low-cost barrel polishing on the inner surface of the hollow part of a cylindrical object with a bottom or without a bottom, or a hollow workpiece with a recess. It was completed with the aim of being a barrel polishing device that can perform accurate polishing using a method of polishing. A workpiece holding device is provided with a holding part at the lower end to hold and set the workpiece in the free abrasive material flowing in the polishing tank, and the workpiece holding device is provided above the polishing tank so as to be movable up and down by an elevating cylinder. The system consists of a rotary resistor drive device equipped with a rotary resistor at the lower end that stirs and flows the loose abrasive in the hollow part of the workpiece held in the polishing tank. This method is characterized in that the inner surface of the hollow part is barrel-polished by stirring and flowing free abrasive material in the hollow part by rotating a rotating resistor while replenishing the hollow part of the workpiece.

(Function) In order to polish the inner surface of a hollow workpiece using such a barrel polishing device, loose abrasive material is charged into a polishing tank, and a workpiece placed oppositely above the polishing tank is loaded with free abrasive material. The workpiece is attached to the holding part of the object holding device, and the holding part is lowered or the polishing tank is raised to sneak into the loose abrasive material in the polishing tank while the workpiece is held in the holding part. and set it. Next, while the polishing tank is vibrated or rotated to cause the free abrasive in the tank to flow, a rotary resistor, which is rotated by the rotary resistor drive device, is placed in the hollow part of the workpiece, and the free abrasive is removed by the operation of the lifting cylinder. Through the polishing tank, the free abrasive material flowing in the tank is constantly replenished into the hollow part, and the rotating resistor stirs and flows the free abrasive material in the hollow part, causing it to collide with the inner surface of the hollow part. Then polish. When the polishing is completed, the rotation resistor is returned to its original position and rotation is stopped, and subsequently the holding section of the workpiece holding device is also returned to its original position.

(Example) Next, the present invention will be described in detail with reference to the illustrated example.

Reference numeral 1 denotes a vertical polishing tank supported on a base so as to be rotated by a motor 2, and a loose abrasive consisting of an abrasive with an extremely small particle size, water, and a compound is charged inside the tank. ing. Reference numeral 3 denotes a workpiece holding device that is attached to a side frame erected on the base. The link mechanism 5a is activated by the operation of the cylinder 4.
A holding section 5 which is held and set via the holding section 5;
It consists of an air-type lifting cylinder 7 that moves up and down under the guidance of a guide 6. Reference numeral 8 denotes a rotary resistor drive device attached to the ceiling frame on one side of the workpiece holding device 3, and the rotary resistor drive device 8 rotates the workpiece held by the holding portion 5 in the polishing tank 1. a rotational resistor 10 that is rotated forward and backward by a drive motor 9 in a hollow portion;
Lifting cylinder 1 that lifts and lowers the rotational resistor 10
1. A shower 12 is movably provided above the polishing tank 1 for cleaning the workpiece, and is used to wash off loose abrasive material adhering to the workpiece after polishing. Note that the holding part 5 of the workpiece holding device 3 can be freely rotated to perform barrel polishing while rotating the workpiece, or the polishing tank 1 can be moved up and down so that the workpiece can be set in the polishing tank 1. As shown in FIG. 5, the polishing tank 1 may be supported on a base via a spring 13 and vibrated by an oscillating body 15 driven by a motor 14. Good too.

With this structure, the holding part 5 of the workpiece holding device 3 is raised and the hollow workpiece 20 is held by the operation of the air cylinder 4, and the holding part 5 is moved into the lifting cylinder. 7 to lower the workpiece 20 and set it in a state where the workpiece 20 is buried in the loose abrasive material in the polishing tank 1. At the same time, the lifting cylinder 11 of the rotary resistor drive device 8 is operated to raise and lower the rotary resistor 10. is inserted into the hollow part of the workpiece 20 held in the free abrasive, and the polishing tank 1 is vibrated or rotated to flow the free abrasive in the tank and constantly replenish the hollow part. By driving the driving motor 9 and rotating the rotary resistor 10, the free abrasive material in the hollow portion is stirred and flowed. Then, after a predetermined polishing time has elapsed, the drive motor 9 is stopped and, contrary to the above, the rotational resistor 10 is
At the same time, the holding part 5 is also raised, and then the shower 12 is brought close to the workpiece to wash off the attached loose abrasive with water using the shower 12, and then the workpiece 20 is removed. In addition, when we finished the edges of the inner slit part of a machined cooler part with an inner diameter of 80φmm to 0.05 to 0.07R in this way, the required roundness was obtained in 1 minute of polishing time, which was faster than conventional barrel polishing. The polishing time was reduced to 1/30 compared to the previous 30 minutes required. In addition, when edge finishing the slit portion of a heat-treated bearing retainer with an outer diameter of 40 to 60 mm, it is possible to polish the workpiece in 3 minutes while rotating it, compared to the 90 minutes required with normal centrifugal barrel polishing. Ta. The free abrasive material charged into the polishing tank 1 used in the present invention may be a well-known free abrasive material made of abrasive material, water, and compound used in conventional barrel polishing. Although the shape is not particularly limited, it is preferable that the shape is such that as much free abrasive material as possible is pressed against the inner surface of the hollow part and stirred and flowed. The rotating shaft may be positioned at the center of a circle that is placed in the part to be polished of the workpiece, or the workpiece 20 may be rotated while moving against the inner surface of the part to be polished. By keeping the barrel in the same position, even and efficient barrel polishing can be performed. Note that the workpiece is polished while being rotated in the opposite direction to the rotational direction of the rotational resistor 10 to increase the relative speed between the inner surface of the hollow part and the free abrasive material, thereby increasing the polishing efficiency and at the same time reducing the outside of the workpiece 20. The surface may also be polished at the same time.

When barrel polishing is performed in this way, polishing tank 1
The free abrasive material flowing within the workpiece 20 by vibration or rotation accurately polishes areas other than the hollow part of the workpiece 20, and at the same time, part of the free abrasive material is sent to the hollow part of the workpiece 20 and inserted into this hollow part. The free abrasive material is agitated and flowed by the rotational resistor 10 and forcibly collides with the inner surface of the hollow portion, so that the inner surface of the hollow portion is efficiently polished in a short time, and the free abrasive material used is Since the particle size of the polishing material may be small, the workpiece 20 is not clogged with free abrasive material, and the workpieces do not collide with each other, so there is no fear of dents that are likely to occur during polishing work. In addition,
When polishing a workpiece that does not have a cylindrical hole or a deep hole, do not operate the lifting cylinder 11 and rotate the rotational resistor 1.
It goes without saying that barrel polishing may be performed while the 0 is held in the raised position.

(Effects of the Invention) As is clear from the above description, the present invention holds and sets a workpiece having a hollow portion in a loose abrasive material that is charged into a polishing tank and flows due to vibration or rotation of the polishing tank. While constantly feeding the free abrasive material in the tank into the hollow part of the lever, the free abrasive material is agitated and flowed in the hollow part by the rotation of a rotating resistor inserted downward into the hollow part, thereby accurately cleaning the inner surface of the hollow part in a short time. It can be easily barrel-polished, has a simple structure and is easy to operate, and has lower equipment and running costs than internal polishing using chemical treatment or magnetic polishing equipment. It is a barrel polishing device that can perform barrel polishing of both the hollow part and the outer surface of a workpiece having a hollow part in a simple manner and with a good finish, and it will greatly contribute to the development of the industry.

[Brief explanation of drawings]

Fig. 1 is a partially cutaway front view showing an embodiment of the present invention, Fig. 2 is a plan view of the workpiece holding device, Fig. 3 is a side view, and Fig. 4 is the rotary resistor drive device. Partially cut away front view, FIG. 5 is a partially cutaway front view showing another embodiment in which the polishing tank is of a vibrating type. 1: Polishing tank, 3: Workpiece holding device, 5: Holding section, 8: Rotating resistor driving device, 10: Rotating resistor, 11: Lifting cylinder.

Claims (1)

[Claims] 1 A vertical polishing tank 1 that vibrates or rotates to flow free abrasive material contained therein, and the polishing tank 1
A workpiece holding device 3 is provided at the lower end with a holding section 5 for holding and setting a workpiece in loose abrasive material flowing in the tank, and a workpiece holding device 3 is provided above the polishing tank 1 and is lifted and lowered by a lift cylinder 11. The polishing tank 1 includes a rotary resistor driving device 8 equipped at the lower end with a rotary resistor 10 that is movably provided and that stirs and flows the free abrasive in the hollow part of the workpiece held in the holding part 5. The inner surface of the hollow part is barrel-polished by supplying the free abrasive material flowing by the vibration or rotation into the hollow part of the workpiece and stirring and flowing the free abrasive material in the hollow part by the rotation of the rotating resistor 10. A barrel polishing device characterized by: