JPH02241082A - Post desmear processing of printed board - Google Patents
Post desmear processing of printed boardInfo
- Publication number
- JPH02241082A JPH02241082A JP6478389A JP6478389A JPH02241082A JP H02241082 A JPH02241082 A JP H02241082A JP 6478389 A JP6478389 A JP 6478389A JP 6478389 A JP6478389 A JP 6478389A JP H02241082 A JPH02241082 A JP H02241082A
- Authority
- JP
- Japan
- Prior art keywords
- processing
- printed board
- desmear
- smear
- inner layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 title abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 29
- 239000012670 alkaline solution Substances 0.000 claims description 4
- 238000012805 post-processing Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 abstract description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 6
- 238000007747 plating Methods 0.000 abstract description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract description 4
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 abstract description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract description 2
- 239000011889 copper foil Substances 0.000 abstract description 2
- 239000003792 electrolyte Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract 3
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 abstract 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-N Gluconic acid Natural products OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 239000000174 gluconic acid Substances 0.000 abstract 1
- 235000012208 gluconic acid Nutrition 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 206010042674 Swelling Diseases 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
- -1 5 g/It Chemical compound 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
スルーホール用加工穴内のデスミア後処理方法に関し、
スミアをより完全に除去することができるデスミア後処
理方法を提供し、プリント基板の信頼性をより向上する
ことを目的とし、
プリント基板の穴明は加工後のスルーホール用の加工穴
の内壁に対してデスミア処理をした後、更にアルカリ溶
液中で電解処理を施す構成とした。[Detailed Description of the Invention] [Summary] To provide a desmear post-processing method that can more completely remove smear, regarding a desmear post-processing method in a processed hole for a through hole, and to further improve the reliability of a printed circuit board. For this purpose, the holes in the printed circuit board are made by desmearing the inner wall of the through-hole after processing, and then electrolytically treating it in an alkaline solution.
本発明はプリント基板の製造方法に関し、特にスルーホ
ール用加工穴内のデスミア後処理方法に関するものであ
る。The present invention relates to a method for manufacturing a printed circuit board, and more particularly to a method for post-desmear processing in a processed hole for a through hole.
プリント基板は、まず、内層導体が形成され、次に各内
層導体間にプリプレグを挟んで加熱加工することによっ
て積層し、その後にスルーホールとなる加工穴が明けら
れる。その後、無電解メツキ、あるいは電解メツキ等の
工程を経て表面パターン及びスルーホールメツキが形成
されるようになっている。In a printed circuit board, first, inner layer conductors are formed, and then prepreg is sandwiched between each inner layer conductor and laminated by heat processing, and then processed holes that become through holes are made. Thereafter, a surface pattern and through-hole plating are formed through a process such as electroless plating or electrolytic plating.
上記穴明は工程はドリルを用いておこなわれるところか
ら、該ドリルの切削熱によって樹脂が溶けて表層及び内
層の導体表面に付着する、いわゆるスミアS(第4図参
照)が発生する。このスミアが発生するとスルーホール
メツキ層と各層の導体間の接続性を欠くことになる。そ
こで、上記スミアを除去するためのデスミア処理がなさ
れる。Since the drilling process is performed using a drill, the resin melts due to the cutting heat of the drill and adheres to the surface and inner conductor surfaces, resulting in so-called smear S (see FIG. 4). When this smear occurs, connectivity between the through-hole plating layer and the conductors in each layer is lost. Therefore, a desmear process is performed to remove the smear.
第3図は過マンガン酸を用いたデスミア処理の手順を示
す工程図であり、第4図はスミアの一例を示すプリント
基板の断面図である。FIG. 3 is a process diagram showing the procedure of desmear treatment using permanganic acid, and FIG. 4 is a sectional view of a printed circuit board showing an example of the smear.
まず、積層後のプリント基板1に対して穴明は加工する
ことによって、スルーホール用の加工穴11を明け(ス
テップ5ll)、この後、エーテル系溶剤で樹脂膨潤処
理(ステップS12:スミアをふやけさす処理)がなさ
れ、その後過マンガン酸カリウム、又は過マンガン酸ナ
トリウム溶液に浸されてスミアを除去する(ステップ5
13)。First, the printed circuit board 1 after lamination is processed to form holes 11 for through holes (step 5ll), and then resin swelling treatment is performed with an ether solvent (step S12: soften the smear. The smear is then soaked in a potassium permanganate or sodium permanganate solution to remove the smear (step 5).
13).
このとき、過マンガン酸溶液はプリント基板を構成する
素材に一部浸透し、このまま放置すると絶縁性に悪影響
を及ぼすので、次に硫酸系中和剤で中和(ステップ51
4)した後、無電解メツキ及び電解メツキ処理(ステッ
プ515)がなされ、この後、パターンメツキ(電解メ
ツキ)等を経て、表面パターン及びスルーホールが形成
される。At this time, the permanganic acid solution partially penetrates into the material that makes up the printed circuit board, and if left as it is, it will have a negative effect on the insulation, so next it is neutralized with a sulfuric acid neutralizer (step 51).
After 4), electroless plating and electrolytic plating processing (step 515) are performed, and thereafter, a surface pattern and through holes are formed through pattern plating (electrolytic plating) and the like.
デスミア処理は上記のように過マンガン酸を用いる方法
の他、クロム酸法、硫酸法、あるいはフロンを主体とす
るガス中でプラズマ処理する方法等があり、基板材料等
によって選択的に使用されている。In addition to the method using permanganic acid as described above, desmear treatment includes a chromic acid method, a sulfuric acid method, and a method of plasma treatment in a gas mainly composed of chlorofluorocarbons, which are used selectively depending on the substrate material, etc. There is.
上記デスミア処理は、スルーホール用の加工穴表面の樹
脂をエツチングすることによってなされるのであり、表
面に付着したスミアを除去する場合にはかなり有効に作
用するが、内層導体12表面へ深くめり込んだ形で付着
したスミアSは完全に除去することができないのが現状
である。従って、この部分でのメツキ欠けが生じ、内層
接続が不良となり、プリント基板の信頬性が欠けるとい
う問題を生じていた。The desmear process described above is performed by etching the resin on the surface of the processed hole for the through hole, and is quite effective in removing smear adhering to the surface. At present, the smear S that has adhered to the surface cannot be completely removed. Therefore, plating chipping occurs in this portion, resulting in poor inner layer connections and a problem in that the printed circuit board lacks reliability.
この発明は上記従来の事情に鑑みて提案されたものであ
って、スミアをより完全に除去することができるデスミ
ア後処理方法を提供し、プリント基板の信頼性をより向
上することを目的とするものである。This invention has been proposed in view of the above-mentioned conventional circumstances, and aims to provide a desmear post-processing method that can more completely remove smear, and further improve the reliability of printed circuit boards. It is something.
上記目的を達成するために、例えば、第1図に示すよう
に、プリント基板1の穴明は加工後のスルーホール用加
工穴11内壁に対してデスミア処理をした後、更にアル
カリ溶液4中で電解処理を施すようにしたものである。In order to achieve the above object, for example, as shown in FIG. 1, the holes in the printed circuit board 1 are made by desmearing the inner wall of the through-hole hole 11 after processing, and then in an alkaline solution 4. It is designed to undergo electrolytic treatment.
アルカリ電解液中での電解処理によって正極のプリント
基板側から発生する酸素ガスによって加工穴の内周壁面
はもとより、内層導体11の上面も洗浄されることにな
る。Due to the electrolytic treatment in the alkaline electrolyte, oxygen gas generated from the printed circuit board side of the positive electrode cleans not only the inner circumferential wall surface of the processed hole but also the upper surface of the inner layer conductor 11.
第2図は本発明のデスミア処理の手順を示すプロセスの
構成図である。穴明は加工によってスルーホール用の加
工穴が明けられた後、エーテル系溶剤で樹脂膨潤処理が
なされる(ステップSl)後、次に過マンガン酸処理(
ステップ32)をし、その後硫酸系中和剤で中和する(
ステップS3)。FIG. 2 is a process block diagram showing the desmear processing procedure of the present invention. After drilling a hole for a through hole, a resin swelling treatment is performed using an ether solvent (step Sl), and then a permanganate treatment (
Step 32) and then neutralize with a sulfuric acid neutralizer (
Step S3).
以上のデスミア処理は従来と全く同様である。The desmear process described above is completely the same as the conventional process.
この後、本発明に係るアルカリ電解洗浄が行われる(ス
テップ4)。このとき用いられる電解液4は、例えば水
酸化ナトリウム30g/l、炭酸ナトリウムLog/l
、グルコン酸ナトリウム5g/It、EDTA (エチ
レンジアミン四酢酸塩)0.5g/41で構成され、第
1図のようにプリント基板1の銅箔層が陽極となり、炭
素3が陰極となる。又、電圧は5v、温度は30±5℃
程度、処理時間は5分程度である。この後、水洗いされ
5%濃度の硫酸で2分間程度の中和処理をする。After this, alkaline electrolytic cleaning according to the present invention is performed (step 4). The electrolytic solution 4 used at this time is, for example, 30 g/l of sodium hydroxide, Log/l of sodium carbonate.
, sodium gluconate, 5 g/It, and EDTA (ethylenediaminetetraacetate), 0.5 g/41, as shown in FIG. 1, the copper foil layer of the printed circuit board 1 serves as an anode, and the carbon 3 serves as a cathode. Also, the voltage is 5V and the temperature is 30±5℃
The processing time is about 5 minutes. After that, it is washed with water and neutralized with 5% sulfuric acid for about 2 minutes.
尚、上記各ステップ81〜35間でも湯洗い、あるいは
水洗工程が入ることはもちろんである。Incidentally, it goes without saying that a hot water washing or water washing step is also included between each of the above steps 81 to 35.
以上のようなアルカリ電解処理によって、スルーホール
用の加工穴11の表面はもちろん、内層導体12の表面
からも酸素が発生し、該内層導体12の表面にもぐり込
んだスミアも除去することになる。By the alkaline electrolytic treatment as described above, oxygen is generated not only from the surface of the processed hole 11 for the through hole but also from the surface of the inner layer conductor 12, and the smear that has penetrated into the surface of the inner layer conductor 12 is also removed.
〔発明の効果〕
以上説明したようにこの発明は、アルカリ電解処理によ
って、内層導体上のスミア残渣の除去が可能となり、そ
の後のスルーホールメツキ処理によって各層間の接続性
を向上することができ、プリント基板の信顛性を向上さ
せることができる。[Effects of the Invention] As explained above, in this invention, smear residue on the inner layer conductor can be removed by alkaline electrolytic treatment, and the connectivity between each layer can be improved by the subsequent through-hole plating treatment. The reliability of printed circuit boards can be improved.
第1図はこの発明の原理図、第2図はこの発明の手順を
示す工程図、第3図は従来のデスミア処理の手順を示す
工程図、第4図は加工穴部の拡大図である。
図中、
1・・・プリント基板、11・・・加工穴、4・・・ア
ルカリ溶液。
デスミス処理工程図
第3図
加工穴部拡大図
第4図Figure 1 is a diagram showing the principle of this invention, Figure 2 is a process diagram showing the procedure of this invention, Figure 3 is a process diagram showing the procedure of conventional desmear processing, and Figure 4 is an enlarged view of the machined hole. . In the figure, 1... printed circuit board, 11... processed hole, 4... alkaline solution. Desmith processing process diagram Figure 3 Enlarged view of the machined hole Figure 4
Claims (1)
ル用の加工穴(11)の内壁に対してデスミア処理をし
た後、更にアルカリ溶液(4)中で電解処理を施すこと
を特徴とするプリント基板のデスミア後処理方法。[Claims] [1] After the printed circuit board (1) is drilled, the inner wall of the through hole (11) is subjected to desmear treatment, and then electrolytically treated in an alkaline solution (4). A desmear post-processing method for a printed circuit board, the method comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6478389A JPH02241082A (en) | 1989-03-15 | 1989-03-15 | Post desmear processing of printed board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6478389A JPH02241082A (en) | 1989-03-15 | 1989-03-15 | Post desmear processing of printed board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02241082A true JPH02241082A (en) | 1990-09-25 |
Family
ID=13268165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6478389A Pending JPH02241082A (en) | 1989-03-15 | 1989-03-15 | Post desmear processing of printed board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02241082A (en) |
-
1989
- 1989-03-15 JP JP6478389A patent/JPH02241082A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4775444A (en) | Process for fabricating multilayer circuit boards | |
US4597988A (en) | Process for preparing printed circuit board thru-holes | |
EP1799884B1 (en) | Process for preparing a non-conductive substrate for electroplating | |
JP4620713B2 (en) | Printed wiring board manufacturing method and electrolytic etching solution used in the manufacturing method | |
JP2001291954A (en) | Via-filling plating method | |
WO2009113396A1 (en) | Method of treating surface of copper and method of treating surface of printed wiring board | |
JP4694349B2 (en) | Printed wiring board using laser processing and manufacturing method thereof | |
US5213840A (en) | Method for improving adhesion to polymide surfaces | |
JPH02241082A (en) | Post desmear processing of printed board | |
US20130186764A1 (en) | Low Etch Process for Direct Metallization | |
JP2002043753A (en) | Manufacturing method of multilayer printed circuit board | |
US6454954B1 (en) | Desmear etchant and use thereof | |
JP3716613B2 (en) | Printed wiring board and manufacturing method thereof | |
JPH04229694A (en) | Method of improving fusion of metal to polyimide surface | |
JPS62188298A (en) | Manufacture of multilayer wiring board | |
CA1202734A (en) | Process for preparing printed circuit board thru- holes | |
JP2000049459A (en) | Manufacture of multilayer printed wiring board | |
JPH0136997B2 (en) | ||
KR20230160022A (en) | Pcb laser processing method | |
JP2768122B2 (en) | Method for manufacturing multilayer wiring board | |
JPH04133495A (en) | Manufacture of printed wiring board | |
JPH104272A (en) | Method of manufacturing multilayer printed wiring board | |
JPH0794871A (en) | Manufacture of multilayered wiring board | |
JPH02182900A (en) | Production of base material for printed circuit board | |
JPH02239698A (en) | Processor for multilayer printed board |