JPH0223681A - Magnetoresistance effect element - Google Patents

Magnetoresistance effect element

Info

Publication number
JPH0223681A
JPH0223681A JP63174743A JP17474388A JPH0223681A JP H0223681 A JPH0223681 A JP H0223681A JP 63174743 A JP63174743 A JP 63174743A JP 17474388 A JP17474388 A JP 17474388A JP H0223681 A JPH0223681 A JP H0223681A
Authority
JP
Japan
Prior art keywords
metal conductor
layer
substrate
magnetoresistance effect
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63174743A
Other languages
Japanese (ja)
Inventor
Yoshihiro Motomura
嘉啓 本村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63174743A priority Critical patent/JPH0223681A/en
Publication of JPH0223681A publication Critical patent/JPH0223681A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)

Abstract

PURPOSE:To acquire a magnetoresistance variation type element having a large magnetoresistance variation rate and high sensitivity by applying a multilayer film which is made by laminating a ferromagnetic thin film having magnetoresistance effect and a metal conductor thin film having a high electric conductivity alternately. CONSTITUTION:A non-magnetic substrate 1, and a ferro magnetic layer 2 having magnetoresistance effect and a metal conductor layer 3 of high electric conductivity which are laminated thereon alternately are included. Firstly, the ferro magnetic layer 2 is formed on the substrate 1, then the metal conductor layer 3 is formed, and the last layer is a metal conductor layer; however, characteristics of a magnetoresistance effect element are independent of the sequence of lamination. As for a material of the non-magnetic substrate 1, Si, Al2O3, TiC, SiC, a sintered body of Al2O3 and TiC, ferrite, etc., can be used. A ferro magnetic alloy such as Fe-Ni alloy and Co-Ni alloy or a material made by applying additive thereto can be used for the ferro magnetic layer 2. As for a material of the metal conductor layer 3, a metal having high electric conductivity such as Au, Ag, Cu and Al or a material made by applying additive thereto can be used.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気抵抗効果を利用した磁界センサに係わり、
特に磁界検出用センサ、磁気ヘッドに好適な磁気抵抗効
果素子に関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a magnetic field sensor using magnetoresistive effect,
In particular, the present invention relates to a magnetoresistive element suitable for magnetic field detection sensors and magnetic heads.

(従来の技術) 周知のように、磁気抵抗効果を利用した磁気抵抗効果型
素子は高感度で比較的大きな出力が得られるため、磁界
センサ、磁気ヘッドとして広く利用されている。このよ
うな磁界センサ、磁気ヘッドにおいては感度を高めるた
め及び線形応答に近づけるためにバイアスとして直流磁
界を印加している。従来、磁気抵抗効果型素子には2%
程度の磁気抵抗変化率を示すパーマロイ合金薄膜が広く
用いられている。
(Prior Art) As is well known, magnetoresistive elements that utilize magnetoresistive effects have high sensitivity and can provide a relatively large output, and are therefore widely used as magnetic field sensors and magnetic heads. In such magnetic field sensors and magnetic heads, a DC magnetic field is applied as a bias in order to increase the sensitivity and approximate linear response. Conventionally, 2% for magnetoresistive elements
Permalloy alloy thin films exhibiting a rate of change in magnetoresistance of about 100% are widely used.

(発明が解決しようとする課題) しかし、パーマロイ合金薄膜の磁気抵抗変化率は微弱な
磁界を測定するためにはまだ/卦さく、高感度磁気セン
サ、高密度磁気記録用磁気ヘッド等に用いた場合に充分
な感度が得られないという問題点があった。
(Problem to be solved by the invention) However, the rate of change in magnetoresistance of permalloy alloy thin films is still insufficient for measuring weak magnetic fields. There was a problem that sufficient sensitivity could not be obtained in some cases.

本発明の目的は上記従来技術の欠点をなくし、磁気抵抗
変化率が大きく高感度な磁気抵抗変化型素子を提供する
ことにある。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art described above and to provide a variable magnetoresistive element with a large magnetoresistive rate and high sensitivity.

(課題を解決するだめの手段) 上記問題点を解決するために、本発明では磁気抵抗効果
を有する強磁性薄膜と電気伝導度の高い金属導体薄膜と
を交互に積層した多層膜を用いる。
(Means for Solving the Problems) In order to solve the above problems, the present invention uses a multilayer film in which ferromagnetic thin films having a magnetoresistive effect and metal conductor thin films with high electrical conductivity are alternately laminated.

以下、図面を参照して本発明をさらに詳細に説明する。Hereinafter, the present invention will be explained in more detail with reference to the drawings.

第1図は本発明の磁気抵抗効果素子の一例を示す部分断
面構造図である。非磁性基板1と、その上に交互に積層
された磁気抵抗効果を有する強磁性層2と電気伝導度の
高い金属導体層3を含む。
FIG. 1 is a partial cross-sectional structural diagram showing an example of the magnetoresistive element of the present invention. It includes a non-magnetic substrate 1, ferromagnetic layers 2 having a magnetoresistive effect and metal conductor layers 3 having high electrical conductivity, which are alternately laminated on the non-magnetic substrate 1.

第1図では基板1上にまず強磁性層2を形成し、次に金
属導体層3を形成し最後の層も金属導体層で終わるよう
に記しであるが、本発明の磁気抵抗効果素子の特性はこ
れらの層の積層順序には依らない。
In FIG. 1, the ferromagnetic layer 2 is first formed on the substrate 1, then the metal conductor layer 3 is formed, and the last layer ends with the metal conductor layer. The properties do not depend on the stacking order of these layers.

本発明に係わる非磁性基板1の材料にはガラス、Si、
 Al□03、TiC,5iC1A1203とTiCと
の焼結体、フェライト等を用いることが出来、また強磁
性層2にはFe−Ni合金、Co−Ni合金等の強磁性
合金、あるいはこれらに添加物を加えたものを用いるこ
とが出来る。また、本発明に係わる金属導体層3の材料
としてはAu、 Ag、 Cu、 A1等の電気伝導度
の高い金属、あるいはこれらに添加物を加えたものを用
いることが出来る。
The materials of the non-magnetic substrate 1 according to the present invention include glass, Si,
Al□03, TiC, a sintered body of 5iC1A1203 and TiC, ferrite, etc. can be used, and for the ferromagnetic layer 2, ferromagnetic alloys such as Fe-Ni alloy, Co-Ni alloy, or additives to these can be used. can be used with the addition of Further, as the material for the metal conductor layer 3 according to the present invention, metals with high electrical conductivity such as Au, Ag, Cu, A1, etc., or materials in which additives are added to these metals can be used.

上記の強磁性材料と金属導体材料とを2基の蒸発源を持
つ真空蒸着装置、もしくは2基のターゲットを持つスパ
ッタリング装置で蒸発させ、2基の蒸発源シャッターを
交互に開閉したり、あるいは基板を2基の蒸発源上を交
互に通過させることによって、基板上に2種類の材料を
交互に積層させ、本発明の多層膜構造を作ることが出来
る。
The above ferromagnetic material and metal conductor material are evaporated using a vacuum evaporation device with two evaporation sources or a sputtering device with two targets, and the two evaporation source shutters are alternately opened and closed, or the substrate By passing the evaporation source alternately over two evaporation sources, two types of materials can be alternately laminated on the substrate, thereby producing the multilayer film structure of the present invention.

(実施例) 以下に本発明の詳細を実施例により説明する。(Example) The details of the present invention will be explained below using Examples.

2基のターゲットを用いたArガス中でのrfマグネト
ロンスパッタリングにより、第1表に示す強磁性層と金
属導体層とを交互に連続的に積層した多層膜試料1〜6
を作成した。基板にはサファイア基板を用い、基板温度
は200°Cとした。成膜速度は1人/秒とし、シャッ
ターの開閉時間を変えて各層の膜厚を制御した、スパッ
タ電力は1.3W/am2、スパッタ圧力は5X10−
3Torrであった。ここで、膜全体の厚さは全て10
0OAと一定した。これらの試料の磁気特性を振動試料
型磁力計で測定したところ異方性磁界はいずれも100
e以下であり、磁気抵抗効果素子に適した軟磁気特性を
示した。
Multilayer film samples 1 to 6 in which ferromagnetic layers and metal conductor layers shown in Table 1 were alternately and continuously laminated by RF magnetron sputtering in Ar gas using two targets.
It was created. A sapphire substrate was used as the substrate, and the substrate temperature was 200°C. The film formation rate was 1 person/second, and the film thickness of each layer was controlled by changing the opening and closing time of the shutter.The sputtering power was 1.3W/am2, and the sputtering pressure was 5X10-
It was 3 Torr. Here, the thickness of the entire film is all 10
It remained constant at 0OA. When the magnetic properties of these samples were measured using a vibrating sample magnetometer, the anisotropic magnetic field was 100
e, and exhibited soft magnetic properties suitable for a magnetoresistive element.

これらの試料の磁気抵抗変化率を1kOeの回転磁場中
での4端子法によって測定し、第1表にまとめた。第1
表から明らかなように、強磁性薄膜と金属導体薄膜とを
交互に積層した多層膜においては従来材料であるパーマ
ロイ合金薄膜の数倍の大きな第1表 次に2基の蒸発源を用いた電子ビーム真空蒸着法により
第2表に示す強磁性層と金属導体層とを交互に連続的に
積層した多層膜試料7〜12を作成した。
The rate of change in magnetoresistance of these samples was measured by the four-terminal method in a rotating magnetic field of 1 kOe, and is summarized in Table 1. 1st
As is clear from the table, in a multilayer film made by laminating alternately ferromagnetic thin films and metal conductor thin films, the electron Multilayer film samples 7 to 12 in which ferromagnetic layers and metal conductor layers shown in Table 2 were alternately and continuously laminated were prepared by beam vacuum evaporation.

基板にはガラス基板を用い、基板温度は100°Cとし
た。成膜速度は1人1秒とし、各蒸発源のシャッターの
開閉時間を変えて各層の膜厚を制御した、蒸着中の真空
度は5 X 10=Torrであった。ここで、膜全体
の厚さは全て100OAと一定にした。これらの試料の
磁気特性を振動試料型磁力計で測定したところ異方性磁
界はいずれも100e以下であり、磁気抵抗効果素子に
適した軟磁気特性を示した。
A glass substrate was used as the substrate, and the substrate temperature was 100°C. The film-forming speed was 1 second per person, and the film thickness of each layer was controlled by changing the opening and closing time of the shutter of each evaporation source.The degree of vacuum during evaporation was 5×10 Torr. Here, the thickness of the entire film was kept constant at 100 OA. When the magnetic properties of these samples were measured using a vibrating sample magnetometer, the anisotropic magnetic field was 100 e or less in all cases, indicating soft magnetic properties suitable for magnetoresistive elements.

これらの試料の磁気抵抗変化率を1kOeの回転磁場中
での4端子法によって測定し、第2表にまとめた。第2
表から明らかなように、強磁性薄膜と金属導体薄膜とを
交互に積層した多層膜においては従来材料であるパーマ
ロイ合金薄膜の2倍以上の太き(発明の効果) 本発明は磁気抵抗効果素子において、非磁性基板上に磁
気抵抗効果を有する強磁性薄膜と電気伝導度の高い金属
導体薄膜とを交互に積層した多層構造を持つことによっ
て、磁気抵抗変化率が大きく、高感度な磁気抵抗変化型
素子が得られるという効果がある。
The rate of change in magnetoresistance of these samples was measured by the four-terminal method in a rotating magnetic field of 1 kOe, and is summarized in Table 2. Second
As is clear from the table, the multilayer film in which ferromagnetic thin films and metal conductor thin films are alternately laminated is more than twice as thick as the conventional permalloy alloy thin film (effects of the invention). By having a multilayer structure in which ferromagnetic thin films with a magnetoresistive effect and metal conductor thin films with high electrical conductivity are alternately laminated on a nonmagnetic substrate, the magnetoresistive rate is large and the magnetoresistive change is highly sensitive. This has the effect that a type element can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の磁気抵抗効果素子の構造を示す部分断
面図である。 1・・・非磁性基板、2・・・第1の強磁性層、3・・
・第2の強磁性
FIG. 1 is a partial sectional view showing the structure of the magnetoresistive element of the present invention. DESCRIPTION OF SYMBOLS 1... Nonmagnetic substrate, 2... First ferromagnetic layer, 3...
・Second ferromagnetism

Claims (1)

【特許請求の範囲】[Claims] 磁気抵抗効果を有する強磁性薄膜と電気伝導度の高い金
属導体薄膜とを交互に積層した多層膜からなることを特
徴とする磁気抵抗効果素子。
A magnetoresistive element comprising a multilayer film in which a ferromagnetic thin film having a magnetoresistive effect and a metal conductor thin film having high electrical conductivity are alternately laminated.
JP63174743A 1988-07-12 1988-07-12 Magnetoresistance effect element Pending JPH0223681A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63174743A JPH0223681A (en) 1988-07-12 1988-07-12 Magnetoresistance effect element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63174743A JPH0223681A (en) 1988-07-12 1988-07-12 Magnetoresistance effect element

Publications (1)

Publication Number Publication Date
JPH0223681A true JPH0223681A (en) 1990-01-25

Family

ID=15983902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63174743A Pending JPH0223681A (en) 1988-07-12 1988-07-12 Magnetoresistance effect element

Country Status (1)

Country Link
JP (1) JPH0223681A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991018424A1 (en) * 1990-05-21 1991-11-28 Ube Industries, Ltd. Magnetoresistance effect element
EP0490327A1 (en) * 1990-12-10 1992-06-17 Hitachi, Ltd. Multilayer which shows magnetoresistive effect and magnetoresistive element using the same
JPH04360009A (en) * 1991-02-08 1992-12-14 Internatl Business Mach Corp <Ibm> Magnetic reluctance sensor
US5243316A (en) * 1991-02-04 1993-09-07 Matsushita Electric Industrial Co., Ltd. Magnetoresistance effect element
US5277991A (en) * 1991-03-08 1994-01-11 Matsushita Electric Industrial Co., Ltd. Magnetoresistive materials
EP0581295A1 (en) * 1992-07-31 1994-02-02 Sony Corporation Magnetoresistance film and method of manufacturing same
JPH06244476A (en) * 1993-02-16 1994-09-02 Nec Corp Magnetoresistance effect element thin film
US5514452A (en) * 1992-08-27 1996-05-07 Tdk Corporation Magnetic multilayer film and magnetoresistance element
US5523172A (en) * 1991-03-29 1996-06-04 Kabushiki Kaisha Toshiba Magnetoresistance effect element
US5563752A (en) * 1993-09-09 1996-10-08 Hitachi, Ltd. Magnetic recording and reproducing device using a giant magnetoresistive film
US5591533A (en) * 1993-12-14 1997-01-07 International Business Machines Corporation Thin film magnetic transducer having a stable soft film for reducing asymmetry variations
EP0485129B1 (en) * 1990-11-01 1998-10-14 Kabushiki Kaisha Toshiba Method of making a GMR device
US6125019A (en) * 1992-04-13 2000-09-26 Hitachi, Ltd. Magnetic head including magnetoresistive element

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5315282A (en) * 1990-05-21 1994-05-24 Ube Industries, Ltd. Magnetoresistance effect element
WO1991018424A1 (en) * 1990-05-21 1991-11-28 Ube Industries, Ltd. Magnetoresistance effect element
EP0485129B1 (en) * 1990-11-01 1998-10-14 Kabushiki Kaisha Toshiba Method of making a GMR device
EP0490327A1 (en) * 1990-12-10 1992-06-17 Hitachi, Ltd. Multilayer which shows magnetoresistive effect and magnetoresistive element using the same
US5998040A (en) * 1990-12-10 1999-12-07 Hitachi, Ltd. Multilayer which shows magnetoresistive effect and magnetoresistive element using the same
US5243316A (en) * 1991-02-04 1993-09-07 Matsushita Electric Industrial Co., Ltd. Magnetoresistance effect element
JP2612988B2 (en) * 1991-02-08 1997-05-21 インターナショナル・ビジネス・マシーンズ・コーポレイション Multilayer magnetic structure and magnetoresistive sensor
JPH04360009A (en) * 1991-02-08 1992-12-14 Internatl Business Mach Corp <Ibm> Magnetic reluctance sensor
US5277991A (en) * 1991-03-08 1994-01-11 Matsushita Electric Industrial Co., Ltd. Magnetoresistive materials
US5700588A (en) * 1991-03-29 1997-12-23 Kabushiki Kaisha Toshiba Magnetoresistance effect element
US5523172A (en) * 1991-03-29 1996-06-04 Kabushiki Kaisha Toshiba Magnetoresistance effect element
US5578385A (en) * 1991-03-29 1996-11-26 Kabushiki Kaisha Toshiba Magnetoresistance effect element
US6125019A (en) * 1992-04-13 2000-09-26 Hitachi, Ltd. Magnetic head including magnetoresistive element
US6249405B1 (en) 1992-04-13 2001-06-19 Hitachi, Ltd. Magnetic head including magnetoresistive element
US6633465B2 (en) 1992-04-13 2003-10-14 Hitachi, Ltd. Magnetoresistive element
US5447781A (en) * 1992-07-31 1995-09-05 Sony Corporation Magnetoresistance film and method of manufacturing same
EP0581295A1 (en) * 1992-07-31 1994-02-02 Sony Corporation Magnetoresistance film and method of manufacturing same
US5514452A (en) * 1992-08-27 1996-05-07 Tdk Corporation Magnetic multilayer film and magnetoresistance element
JPH06244476A (en) * 1993-02-16 1994-09-02 Nec Corp Magnetoresistance effect element thin film
US5563752A (en) * 1993-09-09 1996-10-08 Hitachi, Ltd. Magnetic recording and reproducing device using a giant magnetoresistive film
US5591533A (en) * 1993-12-14 1997-01-07 International Business Machines Corporation Thin film magnetic transducer having a stable soft film for reducing asymmetry variations
US5811155A (en) * 1993-12-14 1998-09-22 International Business Machines Corporation Method of fabricating a layered magnetic head

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