JPH02229041A - Heat-resistant laminated sheet - Google Patents
Heat-resistant laminated sheetInfo
- Publication number
- JPH02229041A JPH02229041A JP4964389A JP4964389A JPH02229041A JP H02229041 A JPH02229041 A JP H02229041A JP 4964389 A JP4964389 A JP 4964389A JP 4964389 A JP4964389 A JP 4964389A JP H02229041 A JPH02229041 A JP H02229041A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- heat
- formulas
- tables
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 36
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 12
- 229920001721 polyimide Polymers 0.000 claims abstract description 11
- 239000011342 resin composition Substances 0.000 claims abstract description 10
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000005843 halogen group Chemical group 0.000 claims abstract description 8
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 4
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 claims abstract 2
- 238000007259 addition reaction Methods 0.000 claims description 18
- 239000007795 chemical reaction product Substances 0.000 claims description 16
- 150000004984 aromatic diamines Chemical class 0.000 claims description 14
- 239000004642 Polyimide Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 8
- 239000002966 varnish Substances 0.000 abstract description 16
- 239000004697 Polyetherimide Substances 0.000 abstract description 11
- 229920001601 polyetherimide Polymers 0.000 abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 239000009719 polyimide resin Substances 0.000 abstract description 7
- 125000003118 aryl group Chemical group 0.000 abstract description 3
- 238000012986 modification Methods 0.000 abstract description 2
- 230000004048 modification Effects 0.000 abstract description 2
- 230000002349 favourable effect Effects 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid group Chemical group C(\C=C/C(=O)O)(=O)O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 22
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 21
- 239000011976 maleic acid Substances 0.000 description 21
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 150000001991 dicarboxylic acids Chemical class 0.000 description 12
- 150000001412 amines Chemical class 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229920004747 ULTEM® 1000 Polymers 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- SWFNPENEBHAHEB-UHFFFAOYSA-N 2-amino-4-chlorophenol Chemical compound NC1=CC(Cl)=CC=C1O SWFNPENEBHAHEB-UHFFFAOYSA-N 0.000 description 1
- -1 2-amino-4-ri00phenol Chemical compound 0.000 description 1
- ZMXYNJXDULEQCK-UHFFFAOYSA-N 2-amino-p-cresol Chemical compound CC1=CC=C(O)C(N)=C1 ZMXYNJXDULEQCK-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- IBOFVQJTBBUKMU-UHFFFAOYSA-N 4,4'-methylene-bis-(2-chloroaniline) Chemical compound C1=C(Cl)C(N)=CC=C1CC1=CC=C(N)C(Cl)=C1 IBOFVQJTBBUKMU-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920004738 ULTEM® Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical group OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical group OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は、エポキシ樹脂変性等他の樹脂による変性のな
い純ポリイミドを用いた、層間接着力に優れた耐熱性積
層板に関する。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention provides a heat-resistant laminate with excellent interlayer adhesion using pure polyimide that has not been modified with other resins such as epoxy resin modification. Regarding.
(従来の技術)
近年、電子機器の発達は目覚ましく、銅張積層板は、そ
の用途・加工条件も多種多様となり、かつ優れた特性の
ものが要求されている。 とりわけ、配線の高密度化に
伴って配線板の多層化、スルーホールの小径化が進み、
ドリル加工時のスミアの発生が少ないなど、加工性の良
好な銅張積層板が要求されている。(Prior Art) In recent years, the development of electronic devices has been remarkable, and the uses and processing conditions for copper-clad laminates have become diverse, and excellent properties are required. In particular, as wiring density increases, wiring boards become more multi-layered and through-holes become smaller in diameter.
There is a demand for copper-clad laminates with good workability, such as less smearing during drilling.
一方、生産性の向上、低コス1へ化の要請に伴い、配線
板の実装工程てポットエアーレヘラーやりフローハンダ
付は等ますまず厳しい加」−条件が加えられている。
このようななかで、基板である銅張積層板の耐熱性、耐
湿性はこれまで以上に優れたものか求められるようにな
ってきた。 近年、これらの要求を満たずために、銅張
積層板に広く用いられているエポキシ樹脂に代わって、
付加反応型のポリイミド樹脂が利用されるようになって
きている。 このポリイミド樹脂を銅張積層板用プリプ
レグに用いた場合、ドリル加工時のスミアの発生がほと
んどゼロになり、また、加工工程や長期試験ての耐熱性
が格段に改良される。On the other hand, with the demand for improved productivity and lower costs, increasingly strict conditions have been added to the wiring board mounting process, such as pot air refilling and flow soldering.
Under these circumstances, copper-clad laminates that serve as substrates are required to have better heat resistance and moisture resistance than ever before. In recent years, in order to meet these demands, epoxy resins have been widely used in copper-clad laminates.
Addition reaction type polyimide resins have come into use. When this polyimide resin is used in prepreg for copper-clad laminates, the occurrence of smear during drilling becomes almost zero, and the heat resistance during processing and long-term tests is significantly improved.
しかしながら、従来用いられてきた付加反応型のポリイ
ミド樹脂は、以4′:に述べるような種々の問題があっ
た。 すなわち、不飽和ジカルボン酸のN、N′−ビス
イミドとジアミノジフェニルメタンとを反応させたもの
は、積層板用として優れたものであるが、反面、ジアミ
ノジフェニルメタンは反応性が高く、ワニスやプリプレ
グの可使時間が短いという問題かある。 不飽和ジカル
ボン酸のN、N′−ビスイミドとアミノフェノールとを
反応成分とするものは、積層板用としてバランスのとれ
た特性を示し加工性も優れているが、耐湿性に雑煮があ
り、例えば得られたプリプレグや積層板の長期保存には
、吸湿に格別の注意を払わなければならない。 不飽和
ジカルボン酸のN、N′−ビスイミドとアミン安息香酸
とを反応させたものは、積層板用として好適であるが、
低沸点溶媒に対して溶解性が悪く、カラスクロス等への
塗布に難点があり、さらに樹脂溶液の保存にも注意しな
りればならない等の問題があった。 マレイミド系化合
物を単独に重合さぜなものは、熱的性質において擾れて
いるが、その分子構造からどうしても機械的強度に劣る
ため、熱的性質をある程度犠牲にしても機械的強度を改
良しているのが現状である。 また、有機溶媒可溶性ポ
リエーテルイミドは、射出成形可能な高性能エンジニア
リングプラスチックとして注目されており、フィルムや
成形材料などに種々応用されているが、熱可塑性のため
高温での信頼性にやや劣る欠点があった。However, the conventionally used addition reaction type polyimide resins have had various problems as described in 4' below. That is, a product made by reacting N,N'-bisimide, an unsaturated dicarboxylic acid, with diaminodiphenylmethane is excellent for use in laminates, but on the other hand, diaminodiphenylmethane is highly reactive and is not suitable for use in varnishes and prepregs. The problem is that the usage time is short. Products containing N,N'-bisimide, an unsaturated dicarboxylic acid, and aminophenol as the reaction components have well-balanced properties and excellent processability for use in laminates, but have poor moisture resistance, such as For long-term storage of the obtained prepregs and laminates, special attention must be paid to moisture absorption. A product obtained by reacting an unsaturated dicarboxylic acid N,N'-bisimide with amine benzoic acid is suitable for use in laminates, but
It has poor solubility in low-boiling point solvents, making it difficult to apply to crow cloth, etc., and also requires care in storing the resin solution. Maleimide-based compounds that are not polymerized alone have poor thermal properties, but their molecular structure inevitably leads to inferior mechanical strength, so it is not possible to improve mechanical strength even at the cost of sacrificing thermal properties to some extent. The current situation is that In addition, organic solvent-soluble polyetherimide is attracting attention as a high-performance engineering plastic that can be injection molded, and is used in various applications such as films and molding materials. was there.
なおまた、一般的に純ポリイミド系樹脂積層板の共通の
問題点として、銀箔との接着力、カラスクロスとカラス
クロスとの層間接着力が弱いという欠点があった。Additionally, a common problem with pure polyimide resin laminates is that the adhesive strength with silver foil and the interlayer adhesive strength between crow cloth are weak.
(発明が解決しようとする課題)
本発明は、上記の欠点を解消するためになされなものて
、その目的は、ワニスやプリプレグ可使時間が長く、耐
熱性、耐湿性、溶解性、機織的特性、成形性に優れた純
ボリイミlく樹脂を用いて、なおかつ層間接着力のよい
耐熱性積層板を提供しようとするものである。(Problems to be Solved by the Invention) The present invention has been made to solve the above-mentioned drawbacks. The present invention aims to provide a heat-resistant laminate that uses a pure polyimide resin with excellent properties and moldability and also has good interlayer adhesion.
[発明の構成]
(課題を解決するための手段)
本発明者は、上記の目的を達成しようと鋭意研究を重ね
た結果、有機溶媒可溶性ポリエーテルイミドと、不飽和
ジカルボン酸のN、N’−ヒスイミド化合物、アミンフ
ェノール、および芳香族ジアミンの付加反応物とからな
る耐熱性樹脂組成物を使用することによって、上記目的
を達成できることを見いたし、本発明を完成したもので
ある。[Structure of the Invention] (Means for Solving the Problems) As a result of extensive research in an attempt to achieve the above object, the present inventor has discovered that organic solvent-soluble polyetherimide and unsaturated dicarboxylic acid N,N' - We have found that the above object can be achieved by using a heat-resistant resin composition consisting of a hisimide compound, an amine phenol, and an addition reaction product of an aromatic diamine, and have completed the present invention.
すなわち、本発明は、
<A>−服代
を、nは2以上の整数を表す)で示される有機溶媒可溶
性ポリエーテルイミドと、
(B) <a )−服代
(但し、式中R2は少なくとも2個の炭素原子を有する
2価の基、R3は炭素原子間の二重結合を含む2価の基
を表す)で示される不飽和ジカルボン酸のN、N′−ビ
スイミド化合物、
(但し、式中R4は水素原子、ハロゲン原子又はアルキ
ル基を表す)で示されるアミノフェノール、(C)−服
代
(但し、式中x’ 、x2.x3.x’は同−又は異な
るハロゲン原子を表す)で示される芳香族ジアミン
の付加反応物とを必須成分とする純ポリイミド系熱性樹
脂組成物、並びに基材からなることを特徴とする耐熱性
積層板である。That is, the present invention comprises an organic solvent-soluble polyetherimide represented by <A>-clothing cost, n represents an integer of 2 or more), and (B) <a)-clothing cost (wherein R2 is A N,N'-bisimide compound of an unsaturated dicarboxylic acid represented by a divalent group having at least 2 carbon atoms (R3 represents a divalent group containing a double bond between carbon atoms); Aminophenol represented by the formula (R4 represents a hydrogen atom, a halogen atom or an alkyl group), (C)-Fukudai (wherein x', x2, x3, x' represent the same or different halogen atoms) ) A heat-resistant laminate characterized by comprising a pure polyimide-based thermal resin composition containing as an essential component an addition reaction product of an aromatic diamine, and a base material.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
本発明に用いる(A)有機溶媒可溶性ポリエーテルイミ
ドとしては、例えばウルテム(ULTEM)CGE社製
ポリエーテルイミド、商品名)が挙げられる。 これは
先述の一般式で示されるものでポリエーテル生成反応(
ニトロ基の脱離を伴う芳香族求核置換重合)によって得
られ、ジメチルホルムアミド、ジメチルアセトアミド、
N−メチル−2−ピロリドン等の非プロトン系有機溶媒
に可溶性のものである。 ここでニトロ基含有ポリイミ
ド中間体を合成する際のポリアミン類としては、4.4
′−ジアミノジフェニルメタン、4,4′−ジアミノジ
フェニルエーテル、4,4′−ジアミノジフェニルスル
ホン、4,4′−ジアミノ−3,3′−ジクロロジフェ
ニルメタン、3−タロロフェニレンジアミン等が挙げら
れる。Examples of the organic solvent-soluble polyetherimide (A) used in the present invention include ULTEM polyetherimide (trade name, manufactured by CGE). This is shown by the general formula mentioned above, and is a polyether production reaction (
obtained by aromatic nucleophilic substitution polymerization with elimination of nitro group), dimethylformamide, dimethylacetamide,
It is soluble in aprotic organic solvents such as N-methyl-2-pyrrolidone. Here, as polyamines when synthesizing the nitro group-containing polyimide intermediate, 4.4
Examples include '-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylsulfone, 4,4'-diamino-3,3'-dichlorodiphenylmethane, and 3-talolophenylenediamine.
本発明に用いる(B)付加反応物としては、<a >不
飽和ジカルボン酸のN、N’−ビスイミド化合物、(b
)アミンフェノール、(C)芳香族ジアミンを付加反応
させたものを使用する。The addition reaction product (B) used in the present invention includes <a> an N,N'-bisimide compound of an unsaturated dicarboxylic acid;
) amine phenol and (C) aromatic diamine are used.
(a)不飽和ジカルボン酸のN、N′−ビスイミド化合
物としては次の一般式を有するものを使用する。(a) As the N,N'-bisimide compound of unsaturated dicarboxylic acid, one having the following general formula is used.
但し、式中R2は少なくとも2個の炭素原子を有する2
価の基、R3は炭素原子間の二重結合を含む2価の基を
示ず。 すなわぢ、R2としては、直鎖状もしくは分岐
状のアルキレン基、炭素原子5〜6個の環をもつシクロ
アルキレン基、酸素、窒素または硫黄原子のうち少なく
とも 1個を含む2価の複素環式基、フェニレン基また
は2価多環式芳香族基をはじめ−NHCO+、−NR5
−3iR6R’−もしくは−802−などにより結合さ
れた複数個の芳香族基や脂環式基などを挙けることがで
きる。 なお、R’ 、R6,R’は炭素数1〜4のア
ルキル基、炭素数5〜6個の環をもつシクロアルキル基
、フェニル基を示す。However, in the formula, R2 is 2 having at least 2 carbon atoms.
The valent group R3 does not represent a divalent group containing a double bond between carbon atoms. In other words, R2 is a linear or branched alkylene group, a cycloalkylene group having a ring of 5 to 6 carbon atoms, or a divalent heterocycle containing at least one of oxygen, nitrogen, or sulfur atoms. -NHCO+, -NR5 including formula group, phenylene group or divalent polycyclic aromatic group
Examples include a plurality of aromatic groups and alicyclic groups bonded by -3iR6R'- or -802-. Incidentally, R', R6, and R' represent an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having a ring having 5 to 6 carbon atoms, or a phenyl group.
またR3、つまり炭素原子間の二重結合を含む2価の基
としては、例えばマレイン酸残基、シトラコン酸残基、
テトラヒドロフタル酸残基等が挙げられる。 従って、
上述したR2およびR3の条件を満たす不飽和ジカルボ
ン酸のN、N′−ビスイミド化合物としては、具体的に
は次のようなものがあり、これらは各々 1種又は2種
以上の混合系で使用することがてきる。 マレイン酸N
、N′−4,4′−ジフェニルメタンヒスイミド、マレ
イン酸N、 N′−44′−ジフェニルエーテルビスイ
ミド、マレイン酸N、N′−パラフェニレンビスイミド
、マレイン酸N、N′−ベンジジンピスイミI’、マレ
イン酸N、N′−メタキシレンヒスイミド、マレイン酸
N、N′−15−ナフタレン−ヒスイミド、マレイン酸
N、 N′−4,4′−ジフェニルスルホン−ビスイミ
ド、マレイン酸N、 N′−2,2′−4,4′−ジメ
チレン−シクロヘキサン−ビスイミド、マレイン酸N、
N′−4,4’−ジシクロヘキシル−メタンビスイミ
ド、マレイン酸N、 N′−44’−ジフェニルシクロ
ヘキサン−ビスイミド、マレイン酸N、N′−44′−
ジフェニル−フェニルアミン−ビスイミド、マレイン酸
N、 N′−44′−ジフェニル−ジフェニルシラン−
ビスイミド、マレイン酸N、N′−44′−ジフェニル
硫黄−ヒスイミド、マレイン酸NN′−2,2′−(4
,4′−ジフェニル)−プロパン−ビスイミド、マレイ
ンIN、N′−メタフェニレンビスイミド、マレイン酸
N、 N′−3,3′−(NN′−メタフェニレン−ビ
スベンツアミド)ピスイミドなどがある。Further, R3, that is, a divalent group containing a double bond between carbon atoms, includes, for example, a maleic acid residue, a citraconic acid residue,
Examples include tetrahydrophthalic acid residues. Therefore,
Specifically, the N,N'-bisimide compounds of unsaturated dicarboxylic acids that satisfy the above-mentioned conditions of R2 and R3 include the following, and each of these can be used singly or in a mixed system of two or more. I can do that. maleic acid N
, N'-4,4'-diphenylmethane hisimide, N maleic acid, N'-44'-diphenyl ether bisimide, N maleic acid, N'-paraphenylene bisimide, N maleic acid, N'-benzidine pisimide I ', maleic acid N, N'-metaxylene hisimide, maleic acid N, N'-15-naphthalene-hisimide, maleic acid N, N'-4,4'-diphenylsulfone-bisimide, maleic acid N, N'-2,2'-4,4'-dimethylene-cyclohexane-bisimide, maleic acid N,
N'-4,4'-dicyclohexyl-methane bisimide, N maleic acid, N'-44'-diphenylcyclohexane-bisimide, N maleic acid, N'-44'-
Diphenyl-phenylamine-bisimide, N maleic acid, N'-44'-diphenyl-diphenylsilane-
Bisimide, maleic acid N, N'-44'-diphenyl sulfur-hisimide, maleic acid NN'-2,2'-(4
, 4'-diphenyl)-propane-bisimide, malein IN, N'-metaphenylene bisimide, maleic acid N, and N'-3,3'-(NN'-metaphenylene-bisbenzamide) pisimide.
また、(b)アミンフェノールとしては次の一般式を有
するものを使用する。Moreover, as the amine phenol (b), one having the following general formula is used.
但し、式中R4は水素原子、ハロゲン原子又はアルキル
基を表す。 これらの具体的な化合物としては、0−ア
ミンフェノール、m−アミノフェノール、p−アミノフ
ェノール、2−アミノ−4−り00フエノール、2−ア
ミノ−4−メチルフェノール等が挙げられ、これらは単
独又は2種以上混合して使用することがてきる。However, in the formula, R4 represents a hydrogen atom, a halogen atom, or an alkyl group. Specific examples of these compounds include 0-aminephenol, m-aminophenol, p-aminophenol, 2-amino-4-ri00phenol, 2-amino-4-methylphenol, etc. Alternatively, two or more types can be used in combination.
更に、(C)芳香族ジアミンとしては次の一般式を有す
る芳香族ジアミンを使用する。Further, as the aromatic diamine (C), an aromatic diamine having the following general formula is used.
但し、式中X1
X4は同−又は異
なるハロゲン原子を表すもので、具体的な化合物として
は、例えば4,4′−ジアミノ−3,3′、 5.5’
−テ1へラクロルジフェニルメタン、4,4′−ジアミ
ノ−33′、55′−テトラブロムジフェニルメタン等
が挙げられ、これらは単独又は2種以上混合して使用す
ることができる。However, in the formula, X1 and X4 represent the same or different halogen atoms, and specific compounds include, for example, 4,4'-diamino-3,3', 5.5'
Examples include -te1herachlordiphenylmethane, 4,4'-diamino-33', and 55'-tetrabromidiphenylmethane, and these can be used alone or in a mixture of two or more.
前述した(a )不飽和ジカルボン酸のN、N′−ビス
イミド化合物と(b)アミノフェノールと(C)芳香族
ジアミンとを、無溶剤もしくは不活性溶媒中で加熱反応
させて付加反応物を製造することができる。 これら3
成分の配合割合は、不飽和ジカルボン酸のN、N′−ビ
スイミド化合物1モルに対し、アミンフェノールと芳香
族ジアミンとの合#1量を0.1〜1,0モル配合する
ことが望ましい。 その割合が0.1モル未満では反応
が進まず耐熱性、靭性等の特性が低下し、まな1,0モ
ルを超えると未反応のアミンが残留し、耐熱性が著しく
低下し好ましくない。 3成分の配合順序や反応温度
、溶媒は適宜選択することができ、特に限定されるもの
ではない。The above-mentioned (a) N,N'-bisimide compound of unsaturated dicarboxylic acid, (b) aminophenol, and (C) aromatic diamine are heated and reacted in a solvent-free or inert solvent to produce an addition reaction product. can do. These 3
As for the blending ratio of the components, it is desirable to blend 0.1 to 1.0 moles of amine phenol and aromatic diamine in a total amount of #1 to 1 mole of N,N'-bisimide compound of unsaturated dicarboxylic acid. If the proportion is less than 0.1 mole, the reaction will not proceed and properties such as heat resistance and toughness will deteriorate, while if it exceeds 1.0 mole, unreacted amine will remain, which is not preferable since the heat resistance will be significantly reduced. The order of blending the three components, the reaction temperature, and the solvent can be selected as appropriate and are not particularly limited.
こうして製造される(B)付加反応物は、(A)有機溶
媒可溶性ポリエーテルイミドと配合して耐熱性樹脂組成
物をつくることができる。 付加反応物は、全体の樹脂
組成物に対して20〜95重量%含有するように配合す
ることが望ましい。 配合量が20重量%未満であると
加工性が低下し、また95重量%を超えると機械的強度
が低下し好ましくないからである。The addition reaction product (B) thus produced can be blended with the organic solvent-soluble polyetherimide (A) to produce a heat-resistant resin composition. It is desirable that the addition reaction product be blended in an amount of 20 to 95% by weight based on the entire resin composition. This is because if the blending amount is less than 20% by weight, processability will decrease, and if it exceeds 95% by weight, mechanical strength will decrease, which is not preferred.
次に、代表的な製造工程を例にあげて説明する。Next, a typical manufacturing process will be explained as an example.
反応容器内に不飽和ジカルボン酸のN、N′−ビスイミ
ド化合物とアミノフェノールと芳香族ジアミンとを所定
の割合で仕込み、100〜・200°Cに加熱して内容
物を熔融し、所定の粘度、キュアタイムまで反応を進め
る。 この反応物に有機溶媒可溶性ポリエーテルイミド
を配合し、さらにアセトン、メチルエヂルケトン、ジオ
キサン、テトラヒドロフラン、ジメチルホルムアミドな
どの溶媒に溶解して、積層板用として好適な特性を有す
る樹脂溶液を製造することができる。 また最初から溶
媒を使用することもできる。 例えは反応容器中に、不
飽和ジカルボン酸のN、N′−ビスイミド化合物とアミ
ノフェノールと芳香族ジアミンとをジオキサンと共に仕
込み、ジオキサンを還流させながら所定の粘度、キュア
タイムまで反応させ、その後ジメチルホルムアミド等の
溶媒を加えて冷却すれば積層板用の樹脂組成物溶液を製
造することかできる。 こうして調製された樹脂組成物
溶液は、用途に応じて種々の添加剤や充填剤を配合する
ことができる。 例えば硬化速度の調整のためイミダゾ
ール等の触媒、接着性付与のためカップリング剤を配合
することもできる。 また、離燃性付与のなめ、難燃剤
、無機充填剤を適宜配合することができる。N,N'-bisimide compounds of unsaturated dicarboxylic acids, aminophenols, and aromatic diamines are charged into a reaction vessel in a predetermined ratio, and the contents are melted by heating to 100 to 200°C to achieve a predetermined viscosity. , proceed the reaction until cure time. An organic solvent-soluble polyetherimide is blended with this reaction product and further dissolved in a solvent such as acetone, methyl edyl ketone, dioxane, tetrahydrofuran, dimethylformamide, etc. to produce a resin solution having properties suitable for use in laminates. be able to. It is also possible to use a solvent from the beginning. For example, an unsaturated dicarboxylic acid N,N'-bisimide compound, aminophenol, and aromatic diamine are charged together with dioxane into a reaction vessel, and the dioxane is refluxed to a predetermined viscosity and cure time, and then dimethylformamide is added. A resin composition solution for a laminate can be produced by adding a solvent such as the following and cooling it. The resin composition solution thus prepared can be blended with various additives and fillers depending on the intended use. For example, a catalyst such as imidazole may be added to adjust the curing rate, and a coupling agent may be added to provide adhesiveness. In addition, a filler that imparts flame retardant properties, a flame retardant, and an inorganic filler may be appropriately blended.
以上のようにして製造した耐熱性樹脂組成物をガラスク
ロス、カラス不織布などの基材に塗布含浸した後、乾燥
塔内で100〜200℃の温度範囲内で乾燥して耐熱性
積層板用プリプレグを製造することができる。 このプ
リプレグは、所定の方法で加熱加圧して積層板、銅張積
層板または印刷配線板の製造に使用することができる。The heat-resistant resin composition produced as described above is coated and impregnated onto a base material such as glass cloth or glass nonwoven fabric, and then dried in a drying tower within a temperature range of 100 to 200°C to form a prepreg for heat-resistant laminates. can be manufactured. This prepreg can be heated and pressed by a predetermined method and used for manufacturing a laminate, a copper-clad laminate, or a printed wiring board.
(作用)
本発明の耐熱性積層板は、有機溶媒可溶性ポリエーテル
イミドと、N、N′−ビスイミド化合物、アミノフェノ
ールおよび芳香族ジアミンの付加反応物とからなる耐熱
性樹脂組成物を用いたことによって、本発明の効果を奏
したものである。(Function) The heat-resistant laminate of the present invention uses a heat-resistant resin composition comprising an organic solvent-soluble polyetherimide and an addition reaction product of an N,N'-bisimide compound, an aminophenol, and an aromatic diamine. Therefore, the effects of the present invention were achieved.
有機溶媒可溶性ポリエーテルイミドをベースとして、良
好な成形性と溶解性を保持させ、それにN、N’−ビス
イミド化合物、アミノフェノールおよび芳香族ジアミン
からなる付加反応物を導入して、プリプレグの可使時間
を改善するとともに、有機溶媒可溶性ポリエーテルイミ
ドの耐熱性を向上させた。 また、ビスマレイミド単独
重合の機械的強さの改良を行い、特定の芳香族ジアミン
の使用によって接着力、耐湿性を向上させ、併せて、従
来の利点である加工性を保持させることができたもので
ある。Based on organic solvent-soluble polyetherimide, it maintains good moldability and solubility, and by introducing an addition reaction product consisting of an N,N'-bisimide compound, aminophenol, and aromatic diamine, it can be used as a prepreg. In addition to improving the time, the heat resistance of organic solvent-soluble polyetherimide was also improved. In addition, we improved the mechanical strength of bismaleimide homopolymerization, and by using a specific aromatic diamine, we were able to improve adhesive strength and moisture resistance, and at the same time, we were able to maintain the conventional advantages of processability. It is something.
(実施例) 次に、本発明を実施例によって具体的に説明する。(Example) Next, the present invention will be specifically explained using examples.
実施例 1
攪拌機と温度計を備えたフラスコに、マレイン酸N、N
’−44′−ジフェニルメタンビスイミド358gと、
2−アミノ−4−タロロフェノール45[と、4.4′
−ジアミノ−3,3′、5.5 ′−テトラクロルジフ
ェニルメタン25 (]を仕込み、撹拌しながら加熱す
る。Example 1 In a flask equipped with a stirrer and a thermometer, maleic acid N, N
358 g of '-44'-diphenylmethane bisimide,
2-amino-4-talolophenol 45[and 4.4'
-Diamino-3,3',5.5'-tetrachlorodiphenylmethane 25 () was charged and heated while stirring.
100℃を超えると次第に溶解をはじめ、褐色の液体と
なる。 この液体を120°Cに昇温しで 1時間撹拌
した。 こうして完全にヒスマレイミドにアミンフェノ
ール、芳香族ジアミンを付加して付加反応物を得た。
この付加反応e140重量部と、ウルテム1000(G
E社製、商品名)60部をジオキサン、ジメチルホルム
アミド混合溶媒で溶解して50%溶液とし、撹拌して−
様なワニスとした。When the temperature exceeds 100°C, it gradually begins to dissolve and becomes a brown liquid. This liquid was heated to 120°C and stirred for 1 hour. In this way, the amine phenol and the aromatic diamine were completely added to hismaleimide to obtain an addition reaction product.
This addition reaction e140 parts by weight and Ultem 1000 (G
Manufactured by Company E, trade name) 60 parts was dissolved in a mixed solvent of dioxane and dimethylformamide to make a 50% solution, and stirred.
It was made into a similar varnish.
次に、厚さ 180μmのガラスクロスに調製したワニ
スを塗布・含浸し、ieo’cの温度で乾燥して樹脂分
43重量%のプリプレグを製造した。 このプリプレグ
8枚と厚さ18μ■の銀箔2枚を用い、170℃の温度
、 40kg/am2の圧力で90分間加熱加圧一体に
成形して、板厚1 、6nunの耐熱性銅張積層板を製
造した。 得られた積層板について緒特性を試験したの
で第1表に示した。 本発明はいずれも優れた特性を示
し、本発明の効果が確認されノご。Next, a glass cloth having a thickness of 180 μm was coated and impregnated with the prepared varnish and dried at a temperature of IEO'C to produce a prepreg having a resin content of 43% by weight. Using 8 sheets of this prepreg and 2 sheets of silver foil with a thickness of 18 μι, they were heated and pressed together at a temperature of 170°C and a pressure of 40 kg/am2 for 90 minutes to form a heat-resistant copper-clad laminate with a thickness of 1.6 nm. was manufactured. The properties of the obtained laminate were tested and are shown in Table 1. The present invention exhibits excellent characteristics, and the effects of the present invention have been confirmed.
実施例 2
マレイン酸N、 N’−4,4′−ジフェニルメタンビ
スイミド358gと、0−アミンフェノール16gと、
4.4′−ジアミノ−3,3′、 5.5’−テトラク
ロルジフェニルメタン55gをフラスコに仕込み、実施
例1と同様にして付加反応物を製造した。 この付加反
応物50重量部と、ウルテム1000(前出)50重量
部をジオキサン、ジメチルホルムアミド混合溶媒で溶解
して50%溶液とし、攪拌して−様なワニスとした。
次にこのワニスを用いて実施例1と同じくプリプレグお
よび耐熱性積層板を製造した。Example 2 N maleic acid, 358 g of N'-4,4'-diphenylmethane bisimide, and 16 g of 0-amine phenol.
55 g of 4.4'-diamino-3,3',5.5'-tetrachlorodiphenylmethane was charged into a flask, and an addition reaction product was produced in the same manner as in Example 1. Fifty parts by weight of this addition reaction product and 50 parts by weight of Ultem 1000 (mentioned above) were dissolved in a mixed solvent of dioxane and dimethylformamide to form a 50% solution, and the mixture was stirred to form a -like varnish.
Next, a prepreg and a heat-resistant laminate were manufactured using this varnish in the same manner as in Example 1.
また、実施例1と同じく緒特性を試験したのて、その結
果を第1表に示した。 いずれも本発明のものが優れて
おり、本発明の効果が確認された。In addition, the same properties as in Example 1 were tested, and the results are shown in Table 1. The products of the present invention were superior in all cases, and the effects of the present invention were confirmed.
実施例 3
マレイン酸N、 N′−4,4’−ジフェニルメタンと
スイミド358g と、■−アミノフェノール45 (
Jと、4.4′−ジアミノ−3,3′、5.5 ′−テ
lへラクロルジフェニルメタン30(Iをフラスコに仕
込み実施例1と同様にして付加反応物を製造しな。 こ
の付加反応物65重量部と、ウルテム1000 (前出
)35重量部を、ジオキサン、ジメチルホルムアミド混
合溶媒で溶解して50%溶液とし、撹拌して−様なワニ
スとしな。 次に、このワニスを用いて実施例1と同じ
くプリプレグおよび耐熱性積層板を製造した。 また実
施例1と同じく緒特性を試験しなので、その結果を第1
表に示しな。 いずれも本発明のものが優れており、本
発明の効果が確認された。Example 3 Maleic acid N, N'-4,4'-diphenylmethane, 358 g of simide, and ■-aminophenol 45 (
J and 4,4'-diamino-3,3',5,5'-terachlorodiphenylmethane 30 (I) were charged into a flask and an addition reaction product was prepared in the same manner as in Example 1. 65 parts by weight of the reactant and 35 parts by weight of Ultem 1000 (mentioned above) are dissolved in a mixed solvent of dioxane and dimethylformamide to make a 50% solution, and stirred to form a --like varnish.Next, using this varnish, A prepreg and a heat-resistant laminate were manufactured in the same manner as in Example 1. Also, as in Example 1, the elastic properties were tested, so the results were
Show it in the table. The products of the present invention were superior in all cases, and the effects of the present invention were confirmed.
比較例 1
マレイン酸N、 N′−4,4’−ジフェニルメタンビ
スイミド358gと、2−アミノ−4−クロロフェノー
ル45(]と、]4,4′−ジアミノー3.3′、55
′−テトラクロルジフェニルメタン25(lをフラス
コに仕込み、実施例1と同様にして付加反応物及びワニ
スを製造した。 このワニスを用いて実施例1と同じく
プリプレグ及び耐熱性積層板を製造した。 また、同じ
く緒特性を試験したのて、その結果を第1表に示した。Comparative Example 1 Maleic acid N, 358 g of N'-4,4'-diphenylmethane bisimide, 2-amino-4-chlorophenol 45(], and ]4,4'-diamino-3.3',55
25 (l) of '-tetrachlorodiphenylmethane was charged into a flask, and an addition reaction product and varnish were produced in the same manner as in Example 1. Using this varnish, prepregs and heat-resistant laminates were produced in the same manner as in Example 1. , the cord properties were also tested and the results are shown in Table 1.
比較例 2
マレイン酸N、 N′−4,4′−ジフェニルメタンビ
スイミド358gと、0−アミノフェノール16 gと
、4.4′−ジアミノ−3,3′、 5.5′−テトラ
クロルジフェニルメタン55 gをフラスコに仕込み、
実施例2と同様にして付加反応物及びワニスを製造しな
。Comparative Example 2 Maleic acid N, 358 g of N'-4,4'-diphenylmethane bisimide, 16 g of 0-aminophenol, and 55 g of 4,4'-diamino-3,3', 5.5'-tetrachlorodiphenylmethane. Pour g into the flask,
The addition reactant and varnish were prepared in the same manner as in Example 2.
このワニスを用いて、実施例2と同じくプリプレグ及び
耐熱性積層板を製造した。 また、同じく緒特性を試験
しためて、その結果を第1表に示しな。Using this varnish, a prepreg and a heat-resistant laminate were manufactured in the same manner as in Example 2. In addition, the characteristics of the cord were also tested and the results are shown in Table 1.
比較例 3
マレイン酸N、 N′−4,4′−ジフェニルメタンビ
スイミド358gと、■−アミノフェノール45gと、
4.4′−ジアミノ−3,3′、5.5 ′−テトラク
ロルジフェニルメタン30qをフラスコに仕込み、実施
例3と同様にして付加反応物及びワニスを製造した。Comparative Example 3 N maleic acid, 358 g of N'-4,4'-diphenylmethane bisimide, and 45 g of ■-aminophenol,
30q of 4.4'-diamino-3,3',5.5'-tetrachlorodiphenylmethane was charged into a flask, and an addition reaction product and varnish were produced in the same manner as in Example 3.
このワニスを用いて実施例3と同じくプリプレグ及び耐
熱性積層板を製造した。 また、同じく緒特性を試験し
たのて、その結果を第1表に示しな。A prepreg and a heat-resistant laminate were manufactured in the same manner as in Example 3 using this varnish. In addition, the same characteristics were tested and the results are shown in Table 1.
[発明の効果ユ
以上の説明および第1表から明らかなように、本発明の
耐熱性積層板は、変性のない特定の純ポリイミド樹脂を
用いたことによって、ワニスの溶解性が良く、ワニスや
プリプレグの可使時間を長くすることができな。 また
、積層板の耐熱性、耐湿性、接着力、機械的特性や加工
性に優れ、特に層間接着力がよく、近年の厳しい要求に
対して好適なものである。[Effects of the Invention] As is clear from the above explanation and Table 1, the heat-resistant laminate of the present invention has good varnish solubility due to the use of a specific unmodified pure polyimide resin. It is not possible to extend the pot life of prepreg. In addition, the laminate has excellent heat resistance, moisture resistance, adhesive strength, mechanical properties, and workability, and particularly good interlayer adhesive strength, making it suitable for meeting the strict demands of recent years.
Claims (1)
表等があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼ 又は▲数式、化学式、表等があります▼ を、nは2以上の整数を表す)で示される 有機溶媒可溶性ポリエーテルイミドと、 (B)(a)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^2は少なくとも2個 の炭素原子を有する2価の基、R^3 は炭素原子間の二重結合を含む2価 の基を表す)で示される不飽和ジカ ルボン酸のN,N′−ビスイミド化合 物、 (b)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^4は水素原子、ハロ ゲン原子又はアルキル基を表す)で 示されるアミノフェノール、 (c)一般式 ▲数式、化学式、表等があります▼ (但し式中X^1、X^2、X^3、X^4は同一又は
異なるハロゲン原子を表 す)で示される芳香族ジアミン の付加反応物とを 必須成分とする純ポリイミド系耐熱性樹脂組成物、並び
に基材からなることを特徴とする耐熱性積層板。[Claims] 1 (A) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, R^1 in the formula ▲ There are ▲ mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Numerical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. , tables, etc.▼ (However, in the formula, R^2 represents a divalent group having at least two carbon atoms, and R^3 represents a divalent group containing a double bond between carbon atoms.) N,N'-bisimide compound of unsaturated dicarboxylic acid, (b) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, in the formula, R^4 represents a hydrogen atom, a halogen atom or an alkyl group) Aminophenol represented by (c) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, in the formula, X^1, X^2, X^3, and X^4 represent the same or different halogen atoms) 1. A heat-resistant laminate comprising a pure polyimide-based heat-resistant resin composition containing as an essential component an addition reaction product of an aromatic diamine, and a base material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4964389A JPH02229041A (en) | 1989-03-01 | 1989-03-01 | Heat-resistant laminated sheet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4964389A JPH02229041A (en) | 1989-03-01 | 1989-03-01 | Heat-resistant laminated sheet |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02229041A true JPH02229041A (en) | 1990-09-11 |
Family
ID=12836893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4964389A Pending JPH02229041A (en) | 1989-03-01 | 1989-03-01 | Heat-resistant laminated sheet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02229041A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017538794A (en) * | 2014-10-10 | 2017-12-28 | サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ | Polyetherimide varnish composition, process for producing the same, and article produced therefrom |
CN111635616A (en) * | 2019-03-01 | 2020-09-08 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
-
1989
- 1989-03-01 JP JP4964389A patent/JPH02229041A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017538794A (en) * | 2014-10-10 | 2017-12-28 | サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ | Polyetherimide varnish composition, process for producing the same, and article produced therefrom |
US10822499B2 (en) | 2014-10-10 | 2020-11-03 | Sabic Global Technologies B.V. | Polyetherimide varnish compositions, methods of manufacture, and articles prepared therefrom |
CN111635616A (en) * | 2019-03-01 | 2020-09-08 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
CN111635616B (en) * | 2019-03-01 | 2021-07-30 | 广东生益科技股份有限公司 | Halogen-free flame-retardant thermosetting resin composition, prepreg for printed circuit, and metal-clad laminate |
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